JPS60243954A - Ion source - Google Patents
Ion sourceInfo
- Publication number
- JPS60243954A JPS60243954A JP9872784A JP9872784A JPS60243954A JP S60243954 A JPS60243954 A JP S60243954A JP 9872784 A JP9872784 A JP 9872784A JP 9872784 A JP9872784 A JP 9872784A JP S60243954 A JPS60243954 A JP S60243954A
- Authority
- JP
- Japan
- Prior art keywords
- ion source
- lead
- extraction electrode
- oxide
- oxygen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
- H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は酸素ビーム取得用のマイクロ波イオン源に係り
、特に安定に酸素ビームを引出すに好適な材質および植
成の引出し電極に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a microwave ion source for obtaining an oxygen beam, and particularly to an extraction electrode made of a material and implanted that is suitable for extracting an oxygen beam stably.
従来のマイクロ波イオン源を用いた酸素イオン打込み装
置を第１図で説明する。マイクロ波イオン源（Ｊ、Ｖａ
ｃ、Ｓｃｉ、Ｔｅｃｈｎｏｌ、±７ （１９８０）１２
４７）ではコイル１を用いて軸方向磁場を発生させ、同
時にマイクロ波をプラズマ室８に導入する。プラズマ室
８には試料ガスがガスリークバルブ６を通し導入される
。この様な構成で高密度プラズマを発生し、正電圧、負
電圧、および接地電位にある三枚−組の多孔形引出し電
極系２を使い、大電流ビーム４を引出す。このビームを
試料基板３に直接、照射してイオン打込みする。引出し
電極２材としては、銅、アルミニウム、鉄などが使われ
ている。An oxygen ion implantation device using a conventional microwave ion source will be explained with reference to FIG. Microwave ion source (J, Va
c, Sci, Technol, ±7 (1980) 12
In step 47), an axial magnetic field is generated using the coil 1, and at the same time, microwaves are introduced into the plasma chamber 8. A sample gas is introduced into the plasma chamber 8 through the gas leak valve 6 . With such a configuration, a high-density plasma is generated, and a large current beam 4 is extracted using a three-hole porous extraction electrode system 2 at positive voltage, negative voltage, and ground potential. This beam is directly irradiated onto the sample substrate 3 to implant ions. Copper, aluminum, iron, etc. are used as the material for the extraction electrode 2.
しかし、第１図に示した従来例で酸素ガスを導入し、酸
素プラズマから大電流イオンビームを引出で酸化され、
電極２表面が酸化物層に変質し、これが電気的絶縁物で
あるため、引出し電極２近傍での電界分布が乱された。However, in the conventional example shown in Fig. 1, oxygen gas is introduced and a large current ion beam is extracted from the oxygen plasma to cause oxidation.
The surface of the electrode 2 was transformed into an oxide layer, and since this is an electrical insulator, the electric field distribution near the extraction electrode 2 was disturbed.
したがって、効率よくイオンビームを、長時間引出すこ
とは困難であった。Therefore, it has been difficult to efficiently extract the ion beam for a long time.
本発明の目的は、酸素イオンビームを引出す時、引出し
電極表面が酸化物層になっても、引出し電極部の電界形
状が変化しないマイクロ波イオン源を提供することにあ
る。An object of the present invention is to provide a microwave ion source in which the shape of the electric field at the extraction electrode portion does not change even if the surface of the extraction electrode becomes an oxide layer when extracting an oxygen ion beam.
従来、イオン源で安定に長時間、酸素ビームを引出すこ
とは困難であった理由は、引出し電極材が銅、アルミ、
鉄等であり、その酸化物が電気的絶縁物であるためであ
る。そこで、本発明では、その酸化物が電気的に導電性
を有する材質を用いて従来イオン源の問題点を解消した
ものである。Conventionally, it was difficult to extract an oxygen beam stably for a long time using an ion source because the extraction electrode material was made of copper, aluminum,
This is because the oxide of iron is an electrical insulator. Therefore, in the present invention, the problems of the conventional ion source are solved by using a material whose oxide is electrically conductive.
また、電極構造材をはじめから導電性酸化物で作ってお
いても良い。Alternatively, the electrode structure material may be made of a conductive oxide from the beginning.
以下、本発明の一実施域を第２図により説明する。第２
図の実施例の構成は第１図と同じであるが、引出し電極
２に錫（スズ）製のものを使った。Hereinafter, one implementation area of the present invention will be explained with reference to FIG. Second
The configuration of the illustrated embodiment is the same as that in FIG. 1, but the extraction electrode 2 is made of tin.
これは酸化錫が導電性を持つからである。またプラズマ
室８は、プラズマが壁材料をたたいて金属不純物を出さ
ないように、石英管円筒７で壁の内表面を蔽った。錫製
電極２で酸素ビームを引出したところ、口径１００＋ｏ
ｍφ、ビームエネルギ数１０ｋｅｖ〜数１００ｋｅＶの
数１００ｍＡの電流が得られた。従来法では、絶縁性の
酸化物ができるため、引出し条件がかわり、ピームロ径
やビーム電流の変動が１〜２時間後に発生した。本発明
では、数１０時間にわたって安定に酸素ビームが引出せ
ている。なお、引出し電極２を酸化錫で作製したところ
、同様に長時間、安定にビームが引き出せた。This is because tin oxide has electrical conductivity. Furthermore, the inner surface of the wall of the plasma chamber 8 was covered with a quartz tube cylinder 7 so that the plasma would not hit the wall material and release metal impurities. When the oxygen beam was drawn out using the tin electrode 2, the diameter was 100+o.
mφ, a beam energy of several 10 keV to several 100 keV, and a current of several 100 mA was obtained. In the conventional method, since an insulating oxide is formed, the extraction conditions change, and fluctuations in the beam diameter and beam current occur after 1 to 2 hours. In the present invention, an oxygen beam can be stably extracted for several tens of hours. Note that when the extraction electrode 2 was made of tin oxide, the beam could be extracted stably for a long period of time as well.
次に、第３図は、本発明に基づく別の引出し電極構造で
ある。第３図は銅製多孔形引出し電極２′に酸化錫被膜
２′ （半透明の導電性被膜）を塗布した構成を示す。Next, FIG. 3 shows another extraction electrode structure based on the present invention. FIG. 3 shows a structure in which a tin oxide coating 2' (semi-transparent conductive coating) is applied to a copper porous extraction electrode 2'.
銅製電極２″′は厚みＩＩＩＩＩｌ、酸化錫製被覆層２
′は１μｍ以上である。本実施例でも、第２図と同様に
、１００ｍＡ以上の大電流酸素ビームが数１０時間にわ
たって安定に得ら九た。The copper electrode 2'' has a thickness of III and a tin oxide coating layer 2.
' is 1 μm or more. In this example as well, as in FIG. 2, a large current oxygen beam of 100 mA or more was stably obtained over several tens of hours.
なお、本実施例では、銅をベースにつかつているため、
この鋼材を引き出し電極周辺部で水冷することにより、
酸化錫Ｍ２’の温度が上がらないようにできる。Note that in this example, since copper is used as the base,
By water-cooling this steel material around the extraction electrode,
It is possible to prevent the temperature of tin oxide M2' from rising.
ここでは、同軸形マイクロ波イオン源を対象に発明を説
明したが、酸素プラズマからイオンビームを引き出せる
他のイオン源、例えばＲＦイオン源、リッジ形マイクロ
波イオン源にも適用できることは明らかである。Although the invention has been described herein with reference to a coaxial microwave ion source, it is clear that it is applicable to other ion sources capable of extracting an ion beam from oxygen plasma, such as an RF ion source and a ridge-type microwave ion source.
本発明によれば、マイクロ波放電形イオン源で酸素イオ
ンビームを引出す場合、引出し電極近傍の電界分布形状
が長時間、一定に保てるため、安定に１００ｍＡ以上の
酸素イオン打込みが可能となる。すなわちイオン源動作
やビーム出し条件に対し、安全性に著しく効果がある。According to the present invention, when extracting an oxygen ion beam with a microwave discharge type ion source, the electric field distribution shape near the extraction electrode can be kept constant for a long time, making it possible to stably implant oxygen ions at 100 mA or more. In other words, this has a significant effect on safety regarding ion source operation and beam extraction conditions.
第１図は、従来技術によるマイクロ波イオン源を説明す
る図、第２図は本発明に基づ〈実施例を説明する図、第
３図は、本発明に基づく別の実施例を説明する図である
。FIG. 1 is a diagram explaining a microwave ion source according to the prior art, FIG. 2 is a diagram explaining an embodiment based on the present invention, and FIG. 3 is a diagram explaining another embodiment based on the present invention. It is a diagram.
Claims (1)
ビームを引出すイオン源において、引出し電極の材質と
してその金属酸化物が導電性を持つ金属、あるいはその
酸化物で栢成したイオン源。 ２、特許請求の範囲第１項記載のイオン源において、電
極材が錫（Ｓｎ）あるいは錫酸化物材であることを特徴
としてイオン源。 ３、特許請求の範囲第１項記載のイオン源において、引
出し電極が金属材であり、その表面に錫あるいは錫酸化
物が被覆されたイオン源。 ４、特許請求の範囲第１項記載のイオン源において、磁
場中のマイクロ波放電で高密度プラズマを発生し、引出
し電極を用いてイオンビームを引出すマイクロ波イオン
源であることを特徴としたイオン源。[Claims] 1. In an ion source that extracts an ion beam from a high-density plasma source using an extraction electrode, the metal oxide of the extraction electrode is made of a conductive metal or an oxide thereof. ion source. 2. The ion source according to claim 1, wherein the electrode material is tin (Sn) or a tin oxide material. 3. The ion source according to claim 1, wherein the extraction electrode is made of a metal material and the surface thereof is coated with tin or tin oxide. 4. The ion source according to claim 1, characterized in that it is a microwave ion source that generates high-density plasma by microwave discharge in a magnetic field and extracts an ion beam using an extraction electrode. source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9872784A JPS60243954A (en) | 1984-05-18 | 1984-05-18 | Ion source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9872784A JPS60243954A (en) | 1984-05-18 | 1984-05-18 | Ion source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60243954A true JPS60243954A (en) | 1985-12-03 |
Family
ID=14227553
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9872784A Pending JPS60243954A (en) | 1984-05-18 | 1984-05-18 | Ion source |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60243954A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6418568U (en) * | 1987-07-23 | 1989-01-30 |
-
1984
- 1984-05-18 JP JP9872784A patent/JPS60243954A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6418568U (en) * | 1987-07-23 | 1989-01-30 |
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