JPS60241055A - Device for opening and closing shutter - Google Patents

Device for opening and closing shutter

Info

Publication number
JPS60241055A
JPS60241055A JP59097344A JP9734484A JPS60241055A JP S60241055 A JPS60241055 A JP S60241055A JP 59097344 A JP59097344 A JP 59097344A JP 9734484 A JP9734484 A JP 9734484A JP S60241055 A JPS60241055 A JP S60241055A
Authority
JP
Japan
Prior art keywords
opening
shutter
plate
exposure
solenoid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59097344A
Other languages
Japanese (ja)
Other versions
JPH0254936B2 (en
Inventor
Yoshio Yazaki
矢崎 好夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OAK SEISAKUSHO KK
Original Assignee
OAK SEISAKUSHO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OAK SEISAKUSHO KK filed Critical OAK SEISAKUSHO KK
Priority to JP59097344A priority Critical patent/JPS60241055A/en
Publication of JPS60241055A publication Critical patent/JPS60241055A/en
Publication of JPH0254936B2 publication Critical patent/JPH0254936B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shutter-Related Mechanisms (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To prevent uneven printing by moving two light intercepting plates each fixed with two cylinders, respectively, always in the same direction, one later than the other by predetermined time duration, to open and close the upper part of the opening of the shutter, and controlling the shutter opening time to render the final time length of the exposure of a work to a luminous exposure flux constant. CONSTITUTION:The upper part of each of light intercepting plates 36, 37 is fixed with screws to one end of each of piston rods 34, 35 fitted into each of cylinders 21, 22, respectively, and each of the plates 36, 37 are arranged in parallel to the opening part 20 of the shutter. The plate 36 covering the part 20 is moved in the direction of the side 20b to fully open it, and passes the luminous flux through it to print the work. The other plate 37 staying on the side 20a is moved with an arithmetic unit to cover the part 20, and next, the plate 36 is moved on the right side, then the plate 37 is moved on the right side to return them to the initial state, thus opening and closing the opening part 20. Since the shutter is opened and closed in the same direction and the exposure time length is kept constantly, uneven printing can be prevented.

Description

【発明の詳細な説明】 この発明は、マスク上のパターンをワークに焼付ける露
光装置のシャッターに関し、特にシャッターの開閉時間
を制御するシャッター開閉装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a shutter for an exposure apparatus that prints a pattern on a mask onto a workpiece, and more particularly to a shutter opening/closing device for controlling the opening/closing time of the shutter.

一般にこのようなシャッター開閉装置では、シャッター
の開口部上を一枚の遮蔽板が往復動作することにより、
一定の露光時間でマスク上のパターンをワークに焼付け
ていた。
Generally, in such a shutter opening/closing device, a single shielding plate moves back and forth over the opening of the shutter.
The pattern on the mask was printed onto the workpiece using a fixed exposure time.

しかし、このようなシャッター開閉装置では、第1図に
示すように、遮蔽板3がシャッター1の開口部2上を完
全遮蔽および完全開口するように往復動するので、開口
時と遮蔽時とでは開口部2に対して逆の動作となる。し
たがって、開口部2の開口発端側2aと遮蔽発端側2b
とでは、ワークへの露光時間が異なってしまい、焼付け
にむらを生じてしまう問題点があった。
However, in such a shutter opening/closing device, as shown in FIG. 1, the shielding plate 3 reciprocates over the opening 2 of the shutter 1 so as to completely shield and completely open, so there is no difference between opening and shielding. The operation is the opposite for opening 2. Therefore, the opening starting side 2a and the shielding starting side 2b of the opening 2
There is a problem in that the exposure time for the workpiece differs between the two methods, resulting in uneven printing.

本発明は、上記問題点に鑑みなされたものであって、2
個のシリンダに夫々装着された遮蔽板を常に同一方向か
らシャッター開口部上を経時的に開閉制御するようにし
、露光光束によるワークへの最終的な露光時間を一定に
して、焼付にむらの生じないシャッター開閉装置を提供
するものである。
The present invention has been made in view of the above problems, and includes:
The shielding plates attached to each cylinder are controlled to open and close over the shutter opening from the same direction over time, and the final exposure time to the workpiece by the exposure light beam is kept constant to prevent uneven printing. The present invention provides a shutter opening/closing device that does not require a conventional shutter.

以下、本発明を図面に基づいて説明する。Hereinafter, the present invention will be explained based on the drawings.

第2図乃至第5図は、本発明の原理および第1実施例を
示す図である。
2 to 5 are diagrams illustrating the principle and first embodiment of the present invention.

第2図の原理図に示すように、11は空気ボンプで、こ
の空気ポンプ11には原動機12が機械的に接続されて
いる。またこの空気ポンプ11には、管路13を介して
2個のソレノイド14.15および16.17により切
換わるソレノイド操作弁18.19が夫々接続されてい
る。このソレノイド操作弁18.19には、シリンダ2
1.22が管路13を介して夫々接続されている。
As shown in the principle diagram of FIG. 2, 11 is an air pump, and a prime mover 12 is mechanically connected to this air pump 11. Also connected to this air pump 11 are solenoid-operated valves 18.19, which are switched by two solenoids 14.15 and 16.17, respectively, via lines 13. This solenoid operated valve 18.19 has cylinder 2.
1 and 22 are connected to each other via a conduit 13.

また、前記ソレノイド14,15,16.17は中央処
理装置23(以下、CPUという)に電気的に接続され
ている。
Further, the solenoids 14, 15, 16, and 17 are electrically connected to a central processing unit 23 (hereinafter referred to as CPU).

第3図乃至第5図に示すように、10はシャッターで、
このシャッター10には露光用の開口部20が設けられ
ている。また前記シャンク−10には、該開口部20を
囲むように上板10aと側板10bとが設けられている
As shown in FIGS. 3 to 5, 10 is a shutter;
This shutter 10 is provided with an opening 20 for exposure. Further, the shank 10 is provided with an upper plate 10a and a side plate 10b so as to surround the opening 20.

前記上板10aの囲み側下面には、断面り字形の保持板
31の一辺31aが該上板10aの長手方向に沿ってボ
ルト等で固着されていて、また該保持板31の他辺31
bは前記上板10a下面から懸装されている。前期保持
板31の他辺31b両面には、該他辺の長手方向に対し
て、対称的な位置に断面コ字形の一対のガイド部材32
が互に背面を接して設けられている。ガイド部材32は
、両端部32aが夫々外側に湾曲していて、後述する支
持部材を把持している。
One side 31a of a retaining plate 31 having a rectangular cross-section is fixed to the lower surface of the upper plate 10a on the enclosure side with bolts or the like along the longitudinal direction of the upper plate 10a, and the other side 31 of the retaining plate 31
b is suspended from the lower surface of the upper plate 10a. On both sides of the other side 31b of the former holding plate 31, a pair of guide members 32 having a U-shaped cross section are provided at symmetrical positions with respect to the longitudinal direction of the other side.
are provided with their backs touching each other. The guide member 32 has both ends 32a curved outward, and grips a support member to be described later.

前期シャッター10の側板10b囲み側内面には、断面
り字形の保持部材33の一辺33aが該側板10bの長
手方向に沿ってボルト等で固着されており、他辺33b
は前記側板10bに対し垂設されている。この保持部材
33の他辺3.1(bには、前記側板10bに対し略垂
直に立設され、一定距離離隔したシリンダ21.22の
一端が夫々固設されている。なお前記シリンダ21.2
2は、前記保持板31の他端31bの長手方向に沿って
対称的に、かつ平行に離隔して位置する。このシリンダ
21.22には、ピストンロンド34.35が夫々内装
され、このピストンロンド34.35の一端は、管路か
ら圧入される空気圧エネルギーによりシリンダ21.2
2の他端から往復動可能に突出している。前記ピストン
ロンド34.35の一端には、遮蔽板36.37の上部
が前記保持板31の他辺31b側で、対面するよう夫々
螺合されており、該遮蔽板36.37の下部は前記開口
部20と夫々平行になるよう、上部に対し略45度上方
に折曲している。前記遮蔽板36.37の上部には、矩
形の支持部材38:39が前記保持板31の他辺31b
に対し、対称的に付設されていて、この支持部材38.
39の上面および下面には、突出部38a、39aが設
けられている。
One side 33a of a holding member 33 having a rectangular cross-section is fixed to the inner surface of the side plate 10b of the former shutter 10 along the longitudinal direction of the side plate 10b with a bolt or the like, and the other side 33b
is vertically provided to the side plate 10b. On the other side 3.1(b) of this holding member 33, one ends of cylinders 21.22, which stand approximately perpendicular to the side plate 10b and are spaced apart from each other by a certain distance, are fixed. 2
2 are located symmetrically and spaced apart from each other in parallel along the longitudinal direction of the other end 31b of the holding plate 31. Piston ronds 34.35 are installed inside each cylinder 21.22, and one end of each piston rond 34.35 is connected to the cylinder 21.2 by pneumatic energy press-fitted from a pipe.
2 protrudes reciprocably from the other end. The upper part of a shielding plate 36.37 is screwed to one end of the piston rond 34.35 so as to face the other side 31b of the retaining plate 31, and the lower part of the shielding plate 36.37 They are bent upward at approximately 45 degrees with respect to the upper portion so as to be parallel to the openings 20, respectively. A rectangular support member 38:39 is provided on the upper part of the shielding plate 36, 37 to support the other side 31b of the holding plate 31.
The support member 38. is attached symmetrically to the supporting member 38.
Projections 38a and 39a are provided on the upper and lower surfaces of 39.

また前記支持部材38,39ば、該突出部38a。Further, the supporting members 38, 39 and the protruding portion 38a.

39aが前記ガイド部材32の湾曲した先端部32aと
係合するように、ガイド部材32内に夫々摺動可能に把
持されている。
39a are each slidably gripped within the guide member 32 so as to engage with the curved tip 32a of the guide member 32.

以上のように、本発明は構成されているので、図示しな
いスイッチを押すと第2図に示すように、原動機12が
作動し、この原動機12の機械エネルギーをうけ、空気
ポンプ11が該機械エネルギーを圧力をもった空気の流
体エネルギーに変換する。この空気ポンプによって発生
された空気圧のエネルギーは、管路13を経てソレノイ
ド14゜15および16.17の励磁により切換わるソ
レノイド操作弁18.19に伝達される。このソレノイ
ド14.15および16.17の励磁によるソレノイド
操作弁18.19の切換えは、CPU23によって行な
われ、第6図のタイムチャートに示すように、所定の適
正露光時間Tを算出して、この露光時間Tによって各ソ
レノイドを励磁させるパルス信号t、〜t4を出力し、
ソレノイドを制御している。つまり、前記スイッチが押
されると、CPU23からソレノイド14にパルス信号
1.が出力され、該ソレノイド14を励磁させる。この
ソレノイド14の励磁により、ソレノイド操作弁18は
該ソレノイド14側に開き、前記空気圧のエネルギーは
管路13を経てシリンダ21のピストンロッド34を第
2図中Aの方向に動作させる。この動作によりシャッタ
ー10の開口部20を蔽っていた遮蔽板36は、遮蔽発
端側20bに移動して開口部20を全開にし、露光光束
を通過させるので、該露光光束により図示しないマスク
上のパターンはワークに焼付けられる。
As described above, since the present invention is configured, when a switch (not shown) is pressed, the prime mover 12 is activated as shown in FIG. 2, receiving the mechanical energy of the prime mover 12, and the air pump 11 is converted into fluid energy of air under pressure. The pneumatic energy generated by this air pump is transmitted via line 13 to a solenoid-operated valve 18.19 which is switched by energizing solenoids 14.15 and 16.17. The switching of the solenoid operating valve 18.19 by the excitation of the solenoids 14.15 and 16.17 is performed by the CPU 23, which calculates a predetermined appropriate exposure time T as shown in the time chart of FIG. Output pulse signals t, ~t4 that excite each solenoid according to the exposure time T,
Controls the solenoid. That is, when the switch is pressed, the CPU 23 sends a pulse signal 1. to the solenoid 14. is output, and the solenoid 14 is energized. This energization of the solenoid 14 causes the solenoid operating valve 18 to open toward the solenoid 14, and the air pressure energy moves the piston rod 34 of the cylinder 21 in the direction A in FIG. 2 through the conduit 13. As a result of this operation, the shielding plate 36 that was covering the opening 20 of the shutter 10 moves to the shielding starting side 20b and fully opens the opening 20 to allow the exposure light beam to pass through. The pattern is burned onto the workpiece.

次に前記CPtJ23は、適正露光時間T経過後にパル
ス信号t2をソレノイド16に出力し、該ソレノイド1
6を励磁させる。このソレノイド16の励磁により、ソ
レノイド操作弁19は該ソレノイド16側に開き、前記
空気圧エネルギーは管路13を経てシリンダ22のピス
トンロッド35を第2図中Bの方向に動作させる。この
動作により前記開口部20の開口発端側20aに停止し
ていた遮蔽板37は、開口部20上に移動し、該開口部
20を完全に蔽って停止する。したがって前記露光光束
は遮蔽板37により遮断される、即ちA方向とB方向と
は同一方向である。
Next, the CPtJ23 outputs a pulse signal t2 to the solenoid 16 after the appropriate exposure time T has elapsed, and the solenoid 1
6 is excited. By energizing the solenoid 16, the solenoid operating valve 19 opens toward the solenoid 16, and the air pressure energy moves the piston rod 35 of the cylinder 22 in the direction of B in FIG. 2 through the conduit 13. By this operation, the shielding plate 37, which had been stopped at the opening end side 20a of the opening 20, moves above the opening 20, completely covers the opening 20, and stops. Therefore, the exposure light beam is blocked by the shielding plate 37, that is, the A direction and the B direction are the same direction.

また、ここで前記CPU23は前記スイッチが押される
まで待機中となり、この間にパターンやワークの交換を
行うことができる。
Further, at this point, the CPU 23 is on standby until the switch is pressed, and patterns and workpieces can be exchanged during this time.

次に前記スイッチが押されると、CPU23はソレノイ
ド17にパルス信号t3を出力し、該ソレノイド17を
励磁させる。このソレノイド17の励磁により、前記ソ
レノイド操作弁19は該ソレノイド17側に開き、前記
空気圧エネルギーは管路t3t−11で前記シリンダ2
2のピストンロッド35を第2図中C方向に動作させる
。この動作により前記開口部20を蔽っていた遮蔽板3
7は、開口発端側20bに移動して開口部20を全開に
し、露光光束を通過させるので、該露光光束により前記
マスク上のパターンはワークに焼付けられる。次にCP
U23は、適正露光時間T経過後にパルス信号t4をソ
レノイド15に出力し、該ソレノイド15を励磁させる
。このソレノイド15の励磁により、ソレノイド操作弁
18は該ソレノイド15側に開き、前記空気圧エネルギ
ーは管路13を経て、シリンダ21のピストンロッド3
4を第2図中り方向に動作させる。この動作により前記
遮蔽発端側20bに停止していた前記遮蔽板36は、開
口部20上に移動し、該開口部20をを完全に蔽って停
止する、即ちC方向とD方向は同一方向である。よって
前記露光光束は遮蔽板36により再び遮断される。また
、ここで前記CPU23は前記スイッチが押されるまで
待機中となる。
Next, when the switch is pressed, the CPU 23 outputs a pulse signal t3 to the solenoid 17 to excite the solenoid 17. By energizing the solenoid 17, the solenoid operating valve 19 opens toward the solenoid 17, and the pneumatic energy is transferred to the cylinder 2 through the pipe t3t-11.
The second piston rod 35 is moved in the direction C in FIG. This operation causes the shielding plate 3 that was covering the opening 20 to
7 moves to the aperture starting side 20b to fully open the aperture 20 and allows the exposure light flux to pass therethrough, so that the pattern on the mask is printed onto the workpiece by the exposure light flux. Next, CP
U23 outputs a pulse signal t4 to the solenoid 15 after the proper exposure time T has elapsed, and excites the solenoid 15. By energizing the solenoid 15, the solenoid operating valve 18 opens toward the solenoid 15, and the pneumatic energy is transferred to the piston rod 3 of the cylinder 21 through the conduit 13.
4 in the direction of FIG. 2. Through this operation, the shielding plate 36, which had been stopped on the shielding starting side 20b, moves above the opening 20 and stops completely covering the opening 20, that is, the C direction and the D direction are in the same direction. It is. Therefore, the exposure light beam is blocked again by the shielding plate 36. Also, at this point, the CPU 23 is on standby until the switch is pressed.

したがってシャッター開閉装置は、初期の状態にもどり
順次上記の動作を繰り返すことができるまた本発明は第
1実施例とは別に、第7図、第8図に示すような第2実
施例のシャッター開閉装置とすることもできる。
Therefore, the shutter opening/closing device can return to the initial state and repeat the above operations sequentially.In addition to the first embodiment, the present invention also provides a second embodiment of the shutter opening/closing device as shown in FIGS. 7 and 8. It can also be a device.

40はシャッターで、このシャッター40は円板形に形
成され、板面には複数個の同一形の開口部50が、一定
の距離離隔して開口している。この開口部50は、2つ
の同心円を所定の半径放射線で切りとって作られ、該開
口部50間の板面は遮蔽部60と成っている。
Reference numeral 40 denotes a shutter, and this shutter 40 is formed into a disk shape, and a plurality of openings 50 of the same shape are opened at a constant distance from the plate surface. The opening 50 is made by cutting two concentric circles at a predetermined radius, and the plate surface between the openings 50 forms a shielding portion 60.

前記シャッター40の中心には回転軸41が軸着され、
この回転軸41は減速装置42を介してパルスモータ4
3に機械的に接続されている。また前記シャッター40
の近隣には、該シャッター40の回転角度を検知する検
出器44が設けられている。前記パルスモータ43と検
出器44とはCPU45に夫々電気的に接続されている
A rotating shaft 41 is attached to the center of the shutter 40,
This rotating shaft 41 is connected to a pulse motor 4 via a reduction gear device 42.
Mechanically connected to 3. Further, the shutter 40
A detector 44 for detecting the rotation angle of the shutter 40 is provided near the shutter 40 . The pulse motor 43 and the detector 44 are electrically connected to the CPU 45, respectively.

本発明の第2実施例は以上のように構成されるので、図
示しないスイッチが押されると、CPU45は所定の適
正露光時間、開口部50間の離隔角度および検出器が検
知したシャッター40の回転角度に基づいて、パルスモ
ータ43にパルス信号を出力し該パルスモータ43の回
転数を制御する。このパルスモータ43の回転により減
速装置42を介して、前記シャッター40を回転させ、
図示しないワークの露光位置に開口部50をセントさせ
る。次にCPU45は適正露光時間経過後に、前記シャ
ッターの回転と同一方向に回転させ、遮蔽部60で露光
位置を完全に蔽って停止する。
Since the second embodiment of the present invention is configured as described above, when a switch (not shown) is pressed, the CPU 45 determines the predetermined appropriate exposure time, the separation angle between the openings 50, and the rotation of the shutter 40 detected by the detector. Based on the angle, a pulse signal is output to the pulse motor 43 to control the rotation speed of the pulse motor 43. The rotation of the pulse motor 43 causes the shutter 40 to rotate via the speed reduction device 42,
The opening 50 is centered at the exposure position of a workpiece (not shown). Next, after the proper exposure time has elapsed, the CPU 45 rotates the shutter in the same direction as the rotation of the shutter, completely covers the exposure position with the shielding part 60, and stops.

また、ここで次の露光が開始されるまで前記CPU45
は待機中となる。そして前記スイッチが押されると、シ
ャッター開閉装置は上記の動作を繰り返し行なうことが
できる。
In addition, the CPU 45 waits until the next exposure starts.
is on standby. When the switch is pressed, the shutter opening/closing device can repeat the above operation.

よって本発明によれば、第1実施例においては、2個の
シリンダにそれぞれ装着した2枚の遮蔽板が、常に同一
方向から開口部を開閉するので、露光光束によるワーク
全体への露光照射時間が常に一定となる。また第2実施
例においては、シャッターを円板形に形成し、この円板
の中心から同一距離に形成される開口部と遮蔽部を交互
に設けて、同一方向にシャッターを回転させるので、露
光光束によるワーク全体への露光照射時間が常に一定と
なる。したがって本発明の第1.第2実施例は、ともに
ワークへの焼付にむらを生じることなく良好な露光照射
を行うことのできるシャッター開閉装置である。
Therefore, according to the present invention, in the first embodiment, since the two shielding plates attached to the two cylinders always open and close the openings from the same direction, the exposure irradiation time for the entire workpiece with the exposure light beam can be reduced. is always constant. Furthermore, in the second embodiment, the shutter is formed into a disk shape, and openings and shielding portions formed at the same distance from the center of the disk are provided alternately, and the shutter is rotated in the same direction. The exposure time of the entire workpiece by the light beam is always constant. Therefore, the first aspect of the present invention. The second embodiment is a shutter opening/closing device that can perform good exposure irradiation without causing uneven printing on a workpiece.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のシャッター開閉装置の動作説明図、第2
図は本発明第1実施例の原理図、第3図は同じく第1実
施例の要部正面図、第4図は同じく要部平面図、第5図
は同じく要部側面図、第6図はタイムチャート、第7図
は第2実施例の原理図、第8図は同じく要部説明図。 10・・・シャッター 20・・・開口部21.22・
・・シリンダ 23・・・中央処理装置 (CPU)3
6.37・・・遮蔽板 T・・・適正露光時間特許出願
人 株式会社オーク製作所 1 牙5図 牙6図 牙7図 牙8図
Figure 1 is an explanatory diagram of the operation of a conventional shutter opening/closing device;
The figure is a principle diagram of the first embodiment of the present invention, FIG. 3 is a front view of the main part of the first embodiment, FIG. 4 is a plan view of the main part, FIG. 5 is a side view of the main part, and FIG. is a time chart, FIG. 7 is a principle diagram of the second embodiment, and FIG. 8 is an explanatory diagram of the main parts. 10... Shutter 20... Opening 21.22.
...Cylinder 23...Central processing unit (CPU) 3
6.37...Shielding plate T...Appropriate exposure time Patent applicant Oak Manufacturing Co., Ltd. 1 Fang 5 Fig. Fang 6 Fig. Fang 7 Fig. Fang 8

Claims (1)

【特許請求の範囲】[Claims] 露光装置の開口部を有するシャッターにおいて、このシ
ャッタ一本体に設けた2個のシリンダと、このシリンダ
に夫々装置され前記開口部上を往復動する遮蔽板と、ワ
ークへの適正露光時間を算出し、該露光時間に基づいて
前記遮蔽板が同一方向から前記シャッターの開口部を順
次開閉制御する中央処理装置とを備えたことを特徴とす
るシャッター開閉装置。
In a shutter having an opening of an exposure device, two cylinders are provided in the main body of the shutter, a shielding plate is attached to each cylinder and moves back and forth over the opening, and an appropriate exposure time for the workpiece is calculated. and a central processing unit that sequentially controls opening and closing of the opening of the shutter from the same direction of the shielding plate based on the exposure time.
JP59097344A 1984-05-15 1984-05-15 Device for opening and closing shutter Granted JPS60241055A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59097344A JPS60241055A (en) 1984-05-15 1984-05-15 Device for opening and closing shutter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59097344A JPS60241055A (en) 1984-05-15 1984-05-15 Device for opening and closing shutter

Publications (2)

Publication Number Publication Date
JPS60241055A true JPS60241055A (en) 1985-11-29
JPH0254936B2 JPH0254936B2 (en) 1990-11-26

Family

ID=14189858

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59097344A Granted JPS60241055A (en) 1984-05-15 1984-05-15 Device for opening and closing shutter

Country Status (1)

Country Link
JP (1) JPS60241055A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008219000A (en) * 2007-02-26 2008-09-18 Asml Netherlands Bv Lithographic apparatus and method
KR20180124968A (en) * 2016-03-31 2018-11-21 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 A shutter device used for exposure in a lithography machine and a method for its use

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008219000A (en) * 2007-02-26 2008-09-18 Asml Netherlands Bv Lithographic apparatus and method
KR20180124968A (en) * 2016-03-31 2018-11-21 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 A shutter device used for exposure in a lithography machine and a method for its use
JP2019516125A (en) * 2016-03-31 2019-06-13 シャンハイ マイクロ エレクトロニクス イクイプメント(グループ)カンパニー リミティド Shutter device for use in lithography machine exposure and method of using the same
US10712668B2 (en) 2016-03-31 2020-07-14 Shanghai Micro Electronics Equipment (Group) Co., Ltd. Shutter device used for exposure in lithography machine, and method for use thereof

Also Published As

Publication number Publication date
JPH0254936B2 (en) 1990-11-26

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