JPS60239473A - 2-trihalomethyl-5-penyl-1,3,4-oxadiazole compound - Google Patents

2-trihalomethyl-5-penyl-1,3,4-oxadiazole compound

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Publication number
JPS60239473A
JPS60239473A JP59097010A JP9701084A JPS60239473A JP S60239473 A JPS60239473 A JP S60239473A JP 59097010 A JP59097010 A JP 59097010A JP 9701084 A JP9701084 A JP 9701084A JP S60239473 A JPS60239473 A JP S60239473A
Authority
JP
Japan
Prior art keywords
compound
formula
light
water
oxadiazole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59097010A
Other languages
Japanese (ja)
Inventor
Teruo Nagano
長野 照男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP59097010A priority Critical patent/JPS60239473A/en
Publication of JPS60239473A publication Critical patent/JPS60239473A/en
Pending legal-status Critical Current

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  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

NEW MATERIAL:A compound of formula I (R is H, Cl, Br, 1-4C alkoxyl or 1-4C alkyl; X is Cl or Br). EXAMPLE:2-Trichloromethyl-5-(p-styrylphenyl)-1,3,4-oxadiazole. USE:A photochemical reaction initiator used in a photosensitive composition and element, which is a substance having high sensitivity to light and liberating and producing ability, and incorporable with photopolymerizable compositions useful for producing printing plates, e.g. lithography, letterpress printing and intaglio printing plates, IC circuits, photoresists, photographic elements and baking compositions and photosensitive resist forming compositions capable of giving visible images only by exposure to light. PREPARATION:A carboxylic acid hydrazide derivative of formula II is reacted with a compound of formula III (R' is CF3, CBr3, Cl, Br, O-CO-CCl3 or O-CO- CBr3) in a solvent to form a compound of formula IV, which is then heated with POCl2 or acetic anhydride, etc. in a molar amount of 2 times or more, etc. to afford the aimed compound of formula I.

Description

【発明の詳細な説明】 「産業上の利用分野」 本発明はλ−トリクロロメチルー!−フェニル−i、3
.t−オキサジアゾール化合物に属する新規な物質に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION "Field of Industrial Application" The present invention relates to λ-trichloromethyl! -phenyl-i, 3
.. This invention relates to a new substance belonging to t-oxadiazole compounds.

「従来の技術」 光に曝すことにより分解して遊離基を生成する化合物(
遊離基生成剤)Fiグラフイイソアーツの分野でよく知
られている。それらは光重合性組成物中の光重合開始剤
、遊離基写真組成物中の光活性剤および光で生じる酸に
より触媒される反応の光開始剤として広く用いられてい
る。そのような遊離基生成剤を用いて印刷、複製、複写
およびその他の画像形成系で有用な種々の感光性材料が
作られる。
“Conventional technology” Compounds that decompose and generate free radicals when exposed to light (
Free radical generator) Fi is well known in the field of graphite isoarts. They are widely used as photoinitiators in photopolymerizable compositions, photoactivators in free radical photographic compositions, and photoinitiators for reactions catalyzed by photogenerated acids. Such free radical generators are used to make a variety of photosensitive materials useful in printing, duplication, copying and other imaging systems.

有機ハロゲン化合物は光によりハロゲン遊離基を生成す
るので光開始剤として有用である。この種の光の作用に
よりハロゲン遊離基を生じる化合物としては、これまで
四臭化炭素、ヨードホルム、トリブロモアセトフェノン
などが代表的なものであり、広く用いられてきた。しか
しながらこれらの遊離基生成剤はかなり限られた波長領
域の光でしか分解しないという欠点を有していた。つま
りそれは通常用いられる光源の主波長より短波の紫外領
域に感度があった。それゆえこれらの化合物は光源の発
する近紫外から可視域の光を有効に利用する能力がない
ため、遊離基生成能が劣っていた。
Organic halogen compounds are useful as photoinitiators because they generate halogen free radicals when exposed to light. Conventionally, carbon tetrabromide, iodoform, tribromoacetophenone, and the like are representative compounds that generate halogen free radicals by the action of light, and have been widely used. However, these free radical generators have the disadvantage that they are only decomposed by light in a very limited wavelength range. In other words, it was sensitive to the ultraviolet region, which is shorter than the dominant wavelength of commonly used light sources. Therefore, these compounds lack the ability to effectively utilize light in the near-ultraviolet to visible range emitted by a light source, and therefore have poor free radical-generating ability.

このような欠点が改良でき、しかも光に対する感度の高
い遊離基生成能力を有する物質として下記一般式(1)
で示される新規な化合物が有用であることがわかった。
The following general formula (1) is a substance that can improve these drawbacks and has the ability to generate free radicals with high sensitivity to light.
It has been found that the novel compound shown is useful.

「発明の構成」 すなわち、本発明は下記一般式CI)で表ゎさレルλ−
トリハロメチルーj−フェニル−7,3゜p−オキサジ
アゾール化合物を提供するものである。
"Structure of the Invention" That is, the present invention has the following general formula CI).
A trihalomethyl-j-phenyl-7,3゜p-oxadiazole compound is provided.

式中、几は、水素原子、塩素原子、臭素原子、炭素数/
〜参個のアルコキシ基または炭素数l〜参個のアルキル
基を表わし、 Xは、塩素原子または臭素原子を表わす。
In the formula, 几 is a hydrogen atom, a chlorine atom, a bromine atom, the number of carbon atoms/
represents an alkoxy group having 1 to 3 carbon atoms, and X represents a chlorine atom or a bromine atom.

本発明の新規なコートリハロメチルーj−フェニル−/
、3.II−オキサジアゾール化合物類ハ次の反応式に
示した一連の反応により有利に合成することができる。
Novel coat trihalomethyl-j-phenyl-/ of the present invention
, 3. II-oxadiazole compounds can be advantageously synthesized by a series of reactions shown in the following reaction formula.

+ α3cmC0−R’ −〉 (III) 本発明の化合物の製造に使用される一般式(II)のカ
ルボン酸ヒドラジド誘導体の合成は、W、0゜Godt
fredsen & S、Vangedal著Acta
 Chem、5cand、 タ /4Cりr(/りjj
)およびS 、Harada & H、Konao著、
Bull、Chem、Soc、J’ap、II / (
/ 0 )2jコl(lり+a’)に記載の方法に準じ
て行なうことができる。つまり、カルボン酸類のアルカ
リ金属塩とクロル炭酸エチルとから合成した混合酸無水
物(Mixed−acidanhydride)を氷冷
した抱水ヒドラジンクロロホルム分散液中に添加し o
 Ocで一晩放置する方法及びカヤポン酸類Dシアノメ
チルエステル又はp−ニトロフェニルエステル等の活性
化(Activated )エステルをメタノール、ク
ロロホルム等に溶解又は分散後、泡水ヒドラジンを加え
て室温から還流温度の範囲で攪拌する方法である。得ら
れた粗製カルボ/酸ヒドラジド類はエタノール又はメタ
ノール又は水よシ再結晶により精製することができる。
+ α3cmC0-R'-> (III) The synthesis of the carboxylic acid hydrazide derivative of general formula (II) used for the production of the compound of the present invention is carried out using W, 0° Godt
Acta by fredsen & S., Vangedal
Chem, 5cand, ta /4Crir(/rijj
) and S. Harada & H. Konao,
Bull, Chem, Soc, J'ap, II / (
/0) It can be carried out according to the method described in 2j. That is, a mixed acid anhydride synthesized from an alkali metal salt of a carboxylic acid and ethyl chlorocarbonate is added to an ice-cooled dispersion of hydrazine hydrate in chloroform.
After dissolving or dispersing an activated ester such as Kayaponic acid D cyanomethyl ester or p-nitrophenyl ester in methanol, chloroform, etc., add foamy hydrazine and heat from room temperature to reflux temperature. This method involves stirring within a range. The resulting crude carbo/acid hydrazide can be purified by recrystallization in ethanol or methanol or water.

一般式■と一般式Iの化合物より一般式■の化合物に導
くのは公知の方法で行なうことができる。
The compound of general formula (2) can be derived from the compound of general formula (1) and general formula I by a known method.

例工ばカルボン酸ヒドラジド類をやや過剰のへキサクロ
ジアセトンとアセトニトリルのような溶媒中室温へ還流
温度で攪拌する方法、カルボン酸ヒドラジド類を等モル
のトリクロロ酢酸無水物と室温で攪拌する方法、ジオキ
サン、テトラヒドロフランのような溶媒を用いて室温で
2モルのカルボン酸ヒドラジド類と1モルのトリクロロ
酢酸クロリドを攪拌する方法等がある。粗生成物はアセ
トニトリル、エタノール、メタノール等で再結晶するこ
とにより精製できる。
For example, a method in which carboxylic acid hydrazides are stirred in a slight excess of hexaclodiacetone and a solvent such as acetonitrile at room temperature at reflux temperature, a method in which carboxylic acid hydrazides are stirred with an equimolar amount of trichloroacetic anhydride at room temperature, There is a method in which 2 moles of carboxylic acid hydrazide and 1 mole of trichloroacetic acid chloride are stirred at room temperature using a solvent such as dioxane or tetrahydrofuran. The crude product can be purified by recrystallization with acetonitrile, ethanol, methanol, etc.

−mIyの化合物から対応するl、3.≠−オキサジア
ゾールに導くのは、M 、 P 、 Hutt。
-mIy from the corresponding l,3. M, P, Hutt lead to ≠-oxadiazole.

E、F、Elslager 、 L、M、Werbel
著J、Heterocylic Chem、7 (J 
)s/ i(lり7(17)に記載の方法に準じて実施
される。
Elslager, E.F., Werbel, L.M.
Author J, Heterocylic Chem, 7 (J
) s/i (performed according to the method described in 7(17)).

すなわちN−アクリロイル−N/−ハロアセチルヒドラ
ジド類を2倍モル以上のオキシ塩化リン、又は無水酢酸
等で、加熱還流することにより合成できる。反応溶媒と
してはトルエン、ベンゼン等を用いることができる。粗
生成物はエタノール含水エタノール等より再結晶するこ
とによりfffffる。
That is, it can be synthesized by heating and refluxing N-acryloyl-N/-haloacetyl hydrazide with phosphorus oxychloride or acetic anhydride in an amount of 2 times the mole or more. Toluene, benzene, etc. can be used as a reaction solvent. The crude product is ffffffed by recrystallization from ethanol-containing ethanol or the like.

本発明の具体的化合物例としては以下のものである。Specific examples of compounds of the present invention are as follows.

「発明の効果」 イ 約300から約500nmの波長の活性光線で放射
された時、本発明の/、J、44−オキサジアゾール化
合物は遊離基を発生する。この理由よシ、この化合物は
感光性組成物及び要素に用いられる光反応開始剤として
有用である。かくして、これらは平版、凸版、凹版な・
どの印刷版、フォトレジスト及び写真要素を製造するた
めに使用される光重合性組成物及び焼付は組成物および
露光のみにより可視像の得られる感光性レジスト形成性
組成物に配合できる。
"Effects of the Invention" (a) When irradiated with active light having a wavelength of about 300 to about 500 nm, the /,J,44-oxadiazole compound of the present invention generates free radicals. For this reason, the compounds are useful as photoinitiators for use in photosensitive compositions and elements. Thus, these are lithography, letterpress, intaglio, etc.
The photopolymerizable compositions and bakes used to make any printing plate, photoresist, and photographic element can be formulated into a photosensitive resist-forming composition that provides a visible image upon exposure to light alone.

本発明の遊離基生成剤は、平版印刷版、IC回路、フォ
トマスク製造のための感光性レジスト形成性組成物に、
露光により現像することなく可視像を与える性能を与え
る場合に特に有用である。
The free radical generating agent of the present invention can be used in photosensitive resist-forming compositions for producing lithographic printing plates, IC circuits, and photomasks.
It is particularly useful in providing the ability to provide a visible image upon exposure without development.

このような感光性レジスト組成物は露光作業における黄
色安全灯下で、露光のみによって可視画像が得られるた
め、例えば、同時に多くの印刷版を露光する過程で、例
えば仕事が中断された時など製版者に与えられた版が露
光されているかどうかを知ることが可能となる。
Since such a photosensitive resist composition can obtain a visible image only by exposure under a yellow safety light during the exposure process, it can be used, for example, in the process of exposing many printing plates at the same time, for example, when the work is interrupted, etc. This makes it possible for a person to know whether a given plate has been exposed or not.

同様に例えば、平版印刷版を作るときのいわゆる殖版焼
付は法のように一枚の大きな版に対して何度も露光を与
える場合、作業者はどの部分が露光済であるかを直ちに
確かめることができる。
Similarly, for example, when making a lithographic printing plate, when a large plate is exposed to light many times, as is the case with the so-called plate printing process, the operator immediately checks which areas have been exposed. be able to.

本発明の遊離基生成剤が有利に使用、できる、露光によ
シ直ちに可視画像を与える感光性レジスト形成性組成物
は必須成分として感光性レジスト形成性化合物、遊離基
生成剤、変色剤および任意に一つ又は複数の可塑剤、結
合剤、変色剤でない染料、顔料、かぶシ防止剤、感光性
レジスト形成性化合物用増感剤等から通常構成される。
The free radical generator of the present invention can be advantageously used in a photosensitive resist-forming composition that provides a visible image immediately upon exposure, which contains as essential ingredients a photosensitive resist-forming compound, a free radical generator, a color change agent and an optional It usually consists of one or more plasticizers, binders, non-color-changing dyes, pigments, antifogging agents, sensitizers for photosensitive resist-forming compounds, etc.

実施例 1 p−アミン安息香酸!0.79を濃塩酸io。Example 1 p-Aminebenzoic acid! 0.79 in concentrated hydrochloric acid io.

mlに加え、さらに水100m1を加えた後に氷冷しな
がら亜硝酸ナトリウム23.jtfを水30清1に溶か
した溶液を滴下した。さらに、この反応液にケイ皮酸5
μ2g2をアセトン2.t Owrlに溶解させた溶液
を滴下させた後に引続き氷冷させながら酢酸ナトリウム
709.塩化第コ銅/j、jtを水IIJt@lに溶解
させた溶液を加えた。水冷下にて2時間さらに室温にて
2時間攪拌し、反応させた後l夜装置し反応を完結させ
た。減圧下にてアセトンを留去させた後水冷し生成する
沈澱をP集した。酢酸さらにはエタノールより再結晶す
るととによシ、スチルベ/−≠−カルボン酸を得た。
ml, add 100 ml of water, and add 23.ml of sodium nitrite while cooling on ice. A solution of jtf dissolved in 30 parts water and 1 part water was added dropwise. Furthermore, cinnamic acid 5
μ2g2 and acetone 2. After dropping the solution dissolved in Owrl, add sodium acetate 709. A solution of cupric chloride/j, jt in water IIJt@l was added. The mixture was stirred for 2 hours under water cooling and further stirred for 2 hours at room temperature to react, and then left in the apparatus overnight to complete the reaction. After acetone was distilled off under reduced pressure, the mixture was cooled with water and the resulting precipitate was collected. Recrystallization from acetic acid and further from ethanol gave stilbe/-≠-carboxylic acid.

スチルベン−参−カルボン酸コ≠、o?、p−ニトロフ
ェノール/l、7?、塩化チオニル3/。
Stilbene-triple-carboxylic acid co≠, o? , p-nitrophenol/l, 7? , thionyl chloride 3/.

oyおよびトルエン200 耐を2時間加熱還流した。oy and toluene were heated under reflux for 2 hours.

過剰の塩化チオニルを留去させた後、反応液を冷却し、
析出するスチルベン−弘−カルボン酸p−ニトロフェニ
ルエステルヲチ集した。
After distilling off excess thionyl chloride, the reaction solution was cooled,
The precipitated stilbene-Hiro-carboxylic acid p-nitrophenyl ester was collected.

スチルベン=≠−カルボン酸p−ニトロフェニルエステ
ル/2.Ofおよびgo%抱水ヒドラジンs、oyをメ
タノール30 肩1に加え、30分間加熱還流させた。
Stilbene=≠-carboxylic acid p-nitrophenyl ester/2. Of and go% hydrazine hydrate were added to 30 ml of methanol and heated to reflux for 30 minutes.

冷却後、反応液に水酸化す) IJウム≠7を水30@
lに溶解させた溶液を加え、スチルベン−≠−カルボン
酸ヒドラジドを得た。
After cooling, hydroxide the reaction solution) IJum≠7 and water 30@
1 was added to obtain stilbene-≠-carboxylic acid hydrazide.

スチルベン−≠−カルホン酸ヒドラジドlj。Stilbene-≠-carphonic acid hydrazide lj.

弘fをヘキサクロロアセトン21.29とアセトニトリ
ル1so7の溶液に加え、30分間加熱還流した。反応
液を冷却し、沈澱物をp集して、N−(p−スチリルベ
ンゾイル)−N’−)リクロロアセチ少ヒドラジドを得
た。
Hirof was added to a solution of 21.29 kg of hexachloroacetone and 1 so7 acetonitrile, and the mixture was heated under reflux for 30 minutes. The reaction solution was cooled, and the precipitate was collected to obtain N-(p-styrylbenzoyl)-N'-)lichloroacetylhydrazide.

N−(p−スチリルベンゾイル)−N’−トリクロロア
セチルヒドラジド/、?、09とオキシ塩化リン!0@
lを2時間加熱還流後、氷水5ooyに反応液を投入し
、得られる沈澱をアセトニトリルより再結晶し、コート
リクロロメチルーS −(p−スチリルフェニル)−/
、J、弘−オキサジアゾールr 、syを得た。得られ
た化合物の融点とCH3CNに溶解した溶液の紫外吸収
スペクトルを測定し最大吸収波長(λmax) と分子
吸光係数(ε)をめた。結果を第7表に示す。
N-(p-styrylbenzoyl)-N'-trichloroacetylhydrazide/? , 09 and phosphorus oxychloride! 0@
After heating under reflux for 2 hours, the reaction solution was poured into 5 oz of ice water, and the resulting precipitate was recrystallized from acetonitrile to give trichloromethyl-S-(p-styrylphenyl)-/
, J, Hiro-oxadiazole r, sy was obtained. The melting point of the obtained compound and the ultraviolet absorption spectrum of the solution dissolved in CH3CN were measured, and the maximum absorption wavelength (λmax) and molecular extinction coefficient (ε) were determined. The results are shown in Table 7.

実施例 2 p−アミン安息香酸3≠、32に濃塩酸70.1を加え
、さらに水loOglを加えた後に氷冷しながら亜硝酸
ナトリウム/7.タグを水30@lに溶解させた溶液を
滴下した。この反応液にp−クロロケイ皮酸≠5.62
をテトラヒドロ7ランヒ00m1に溶解させた溶液を滴
下した後に引続き氷冷1 させながら酢酸ナトリウムs
jy、塩化第2銅73.6fを水30@lに溶解させた
溶液を加えた。
Example 2 p-aminebenzoic acid 3≠, 70.1 of concentrated hydrochloric acid was added to 32, and after adding water loOgl, sodium nitrite/7. A solution of the tag dissolved in 30@l of water was added dropwise. In this reaction solution, p-chlorocinnamic acid≠5.62
After dropping a solution prepared by dissolving 7 ml of tetrahydrochloride in 00 ml of tetrahydrochloride, add sodium acetate while cooling on ice.
A solution of 73.6f of cupric chloride dissolved in 30@l of water was added.

水冷下にて2時間さらに室温にて2時間攪拌し、反応さ
せた後l夜装置し反応を完結させた。減圧下にてテトラ
ヒドロフランを留去させた後氷冷して生成する沈澱を戸
集した。アセトニトリルさらにはエタノールより再結晶
することにより、<2−(p−クロロスチリル)安息香
酸を得た。
The mixture was stirred for 2 hours under water cooling and further stirred for 2 hours at room temperature to react, and then left in the apparatus overnight to complete the reaction. Tetrahydrofuran was distilled off under reduced pressure, and the resulting precipitate was collected by cooling on ice. By recrystallizing from acetonitrile and further from ethanol, <2-(p-chlorostyryl)benzoic acid was obtained.

≠−(p−クロロスチリル)安息香酸3/、01、p−
ニトロフェノール/l、、7t、塩化チオニル3/、0
?およびトルエン2sotnltコ時間還流した。過剰
の塩化チオニルを留去させた後、反応液を冷却し析出す
る≠−(p−クロロスチリル)安息香酸p−ニトロフェ
ニルエステルをp集した。
≠-(p-chlorostyryl)benzoic acid 3/, 01, p-
Nitrophenol/l, 7t, thionyl chloride 3/, 0
? and toluene were refluxed for 2 hours. After distilling off excess thionyl chloride, the reaction solution was cooled and the precipitated ≠-(p-chlorostyryl)benzoic acid p-nitrophenyl ester was collected.

≠−(p−クロロスチリル)安息香酸p−ニトロフェニ
ルエステル2j、jWおよびIrO%抱水ヒドラジンi
o、orをメタノール/20@lに加え、30分間加熱
還流させた。冷却後、反応液に水酸化ナトリウムIr2
を水10011に溶解させた溶液を加え、弘−(p−ク
ロロスチリル)安息香酸ヒドラジドを得た。
≠-(p-chlorostyryl)benzoic acid p-nitrophenyl ester 2j, jW and IrO% hydrazine hydrate i
o, or were added to methanol/20@l and heated under reflux for 30 minutes. After cooling, sodium hydroxide Ir2 was added to the reaction solution.
A solution prepared by dissolving 10011 of water was added to obtain Hiro-(p-chlorostyryl)benzoic acid hydrazide.

’I−(p−クロロスチリル)安息香酸ヒドラジド7.
32とへキサクロロアセトン7.12をアセトニトリル
100@lに加え、1時間加熱還流した。反応液を冷却
し、沈澱物を戸集して、N −(p −(p−クロロス
チリル)ベンゾイル) −N−トリクロロアセチルヒド
ラジドを得た。
'I-(p-chlorostyryl)benzoic acid hydrazide 7.
32 and hexachloroacetone (7.12) were added to 100@l of acetonitrile, and the mixture was heated under reflux for 1 hour. The reaction solution was cooled and the precipitate was collected to obtain N-(p-(p-chlorostyryl)benzoyl)-N-trichloroacetylhydrazide.

N−(p −(p−クロロスチリル)ベンゾイル)−N
’−)リクロロアセチルヒドラジド10 、JVとオキ
シ塩化リンフ0.lを2時間加熱還流の後、氷水5oo
yに反応液を投入した。得られる沈澱をアセトニトリル
より再結晶して、コートリクロロメチルーj−(p−(
p−クロロスチリル)フェニル)−i、3.≠−オキサ
ジアゾールを得た。
N-(p-(p-chlorostyryl)benzoyl)-N
'-) Lichloroacetyl hydrazide 10, JV and oxychloride lymph 0. After heating under reflux for 2 hours, add 5 oz of ice water.
The reaction solution was poured into y. The resulting precipitate was recrystallized from acetonitrile to give trichloromethyl-j-(p-(
p-chlorostyryl)phenyl)-i, 3. ≠-Oxadiazole was obtained.

得られた化合物の融点、λmax 及びεを測定し第1
表に示す。
The melting point, λmax and ε of the obtained compound were measured.
Shown in the table.

実施例 3 p−アミン安息香酸3≠、JfiC@塩酸70禦lを加
えさらに水100tttlを加えた後に氷冷しながら亜
硝酸ナトリウム/7.り2を水30.lに溶解させた溶
液を滴下した。この反応液にp−メトキシケイ皮酸≠≠
、&fをテトラヒドロ7ラン5OO1に溶解させた溶液
を滴下した後に引続き水冷させながら酢酸ナトリウム3
31、塩化第2銅13.62を水J O@lに溶解させ
た溶液を加えた。
Example 3 After adding p-amine benzoic acid 3≠, JfiC@hydrochloric acid 70 liters and further adding water 100 tttl, sodium nitrite/7. 2 ml of water and 30 ml of water. A solution dissolved in 100 ml was added dropwise. In this reaction solution, p-methoxycinnamic acid≠≠
, &f in 5OO1 of tetrahydro7ran was added dropwise, followed by addition of 33 sodium acetate while cooling with water.
31. A solution of 13.62 cupric chloride dissolved in water JO@l was added.

水冷下にて2時間さらに室温にて2時間攪拌し、反応さ
せた後l夜装置し反応を完結させた。減圧下にてテトラ
ヒドロフランを留去させた後水冷して生成する沈澱をp
果した。アセトニトリルさらにはエタノールより再結晶
することにより、≠−(p−メトキシスチリル)安息香
酸を得た。
The mixture was stirred for 2 hours under water cooling and further stirred for 2 hours at room temperature to react, and then left in the apparatus overnight to complete the reaction. After distilling off tetrahydrofuran under reduced pressure, the resulting precipitate was cooled with water.
I accomplished it. By recrystallizing from acetonitrile and further from ethanol, ≠-(p-methoxystyryl)benzoic acid was obtained.

弘−(p−メトキシスチリル)安息香酸30゜t2、p
−ニトロフェノール/l、、79、塩化チオニル3/ 
、09およびトルエン260 @lを2時間還流した。
Hiro-(p-methoxystyryl)benzoic acid 30°t2, p
-nitrophenol/l, 79, thionyl chloride 3/
, 09 and 260 @l of toluene were refluxed for 2 hours.

過剰の塩化チオニルを留去式せた後、反応液を冷却し析
出する≠−(p−メトキシスチリル) 安息香e p−
二トロフェニルエステル−tF集した。
After removing excess thionyl chloride by distillation, the reaction solution is cooled to precipitate ≠-(p-methoxystyryl) benzoate e p-
Nitrophenyl ester-tF was collected.

’I−(p−メトキシスチリル)安息香[p−ニトロフ
ェニルエステル2 ! 、 0 ?オヨ(jr O%抱
水ヒドラジンio、oyをメタノール/ 20 mlに
加え、30分間加熱還流させた。冷却後、反応液に水酸
化ナトリウムざVを水100g1に溶解させた溶液を加
え、≠−(p−メトキンスチリル)安息香酸ヒドラジド
を得た。
'I-(p-methoxystyryl)benzoin [p-nitrophenyl ester 2! , 0? Oyo (jr O% hydrazine hydrate io, oy was added to methanol/20 ml and heated to reflux for 30 minutes. After cooling, a solution of sodium hydroxide solution dissolved in 100 g of water was added to the reaction solution, and ≠- (p-methkinstyryl)benzoic acid hydrazide was obtained.

グー(p−メトキシスチリA/)安息香酸ヒドラジド1
0.39とへキサクロロアセトン10.2Vをアセトニ
トリル100耐に加え、1時間加熱還流した。反応液を
冷却し、沈澱物を戸果して、N−(p−(p−メトキシ
スチリル)ベンゾイル)−N/ )リクロロアセチVヒ
ドラジドを得た。
Gu (p-methoxystyl A/)benzoic acid hydrazide 1
0.39 and 10.2 V of hexachloroacetone were added to 100 V of acetonitrile, and the mixture was heated under reflux for 1 hour. The reaction solution was cooled and the precipitate was removed to obtain N-(p-(p-methoxystyryl)benzoyl)-N/)lichloroacetyl V hydrazide.

N −(p −(p−メトキシスチリル)ベンゾイル)
−N′−トリクロロアセチルヒドラジド/3゜oyとオ
キシ塩化リンフ011を2時間加熱還流の後、氷水5o
oyに反応液を投入した。得られる沈澱をア七ト二トリ
ルより再結晶して、ツートリクロロメチル−5−(p−
(p−メトキシスチリル)フェニル)−/、!、II−
オキサジアゾールを得た。得られた化合物の融点、λm
ax及びεを測定し第1表に示す。
N-(p-(p-methoxystyryl)benzoyl)
-N'-Trichloroacetyl hydrazide/3゜oy and oxychloride phosphorus 011 were heated under reflux for 2 hours, and then heated to 5゜ice of ice water.
The reaction solution was poured into the oy. The resulting precipitate was recrystallized from a7tonitrile to obtain two-trichloromethyl-5-(p-
(p-methoxystyryl)phenyl)-/,! , II-
Oxadiazole was obtained. The melting point of the obtained compound, λm
ax and ε were measured and shown in Table 1.

参考例 ナイロンブラシで砂目室て後シリケート処理したアルミ
ニウム板に回転塗布機を用いてF記感光液を塗布し、7
000613分間乾燥し、感光層を形成させ感光板を作
製した。
Reference Example: Apply the photosensitive liquid F using a rotary coater to a silicate-treated aluminum plate after sanding with a nylon brush.
It was dried for 13 minutes to form a photosensitive layer, thereby producing a photosensitive plate.

ペンタエリスリトールテトラ アクリレート IIQグ 一般式CI)の化合物(例示 化合物A/) 2y メタクリル酸ベンジル−メタ クリに酸(モル比73/27 ) 共重合体 toy メチルエチルケトン ≠00Hl メチルセロソルブアセテート 300g1この感光性印
刷版をジェット・プリンター(,2kW超高圧水銀灯、
オーク製作所製)にて像露光した後、下記組成の現像液
にて現像すると未露光1 部が除去され鮮明な画像が得
られた。
Pentaerythritol tetraacrylate IIQ Compound of general formula CI) (Exemplary compound A/) 2y Benzyl methacrylate-methacrylic acid (molar ratio 73/27) copolymer toy Methyl ethyl ketone ≠00Hl Methyl cellosolve acetate 300g1This photosensitive printing plate Jet printer (2kW ultra-high pressure mercury lamp,
After imagewise exposure with a (manufactured by Oak Manufacturing Co., Ltd.), the image was developed with a developer having the following composition, and the unexposed portion was removed and a clear image was obtained.

無水炭酸ナトリウム 10f ブチルセロソルブ jf 水 11 また、未露光の印刷版を強制経時試験(≠j0C7jチ
R0H1j日間)した後に露光、現像しても塗布直後の
印刷版と全く同様に鮮明な画像が得られた。
Anhydrous sodium carbonate 10f Butyl cellosolve jf Water 11 Also, even if an unexposed printing plate was subjected to a forced aging test (≠j0C7jchiR0H1j days) and then exposed and developed, a clear image was obtained that was exactly the same as the printing plate immediately after coating. .

Claims (1)

【特許請求の範囲】 下記一般式CI)で示されるコートリハロメチルー!−
フェニル−/、3.II−オキサジアゾール化合物。 式中、Rは、水素原子、塩素原子、臭素原子、炭素数l
−参個のアルコキシ基または炭素数l〜グ個のアルキル
基を表わし、 Xは、塩素原子または臭素原子を表わす。
[Claims] Coatlyhalomethyl represented by the following general formula CI)! −
Phenyl-/, 3. II-Oxadiazole compound. In the formula, R is a hydrogen atom, a chlorine atom, a bromine atom, and a carbon number l
- represents an alkoxy group or an alkyl group having from l to g carbon atoms, and X represents a chlorine atom or a bromine atom.
JP59097010A 1984-05-15 1984-05-15 2-trihalomethyl-5-penyl-1,3,4-oxadiazole compound Pending JPS60239473A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59097010A JPS60239473A (en) 1984-05-15 1984-05-15 2-trihalomethyl-5-penyl-1,3,4-oxadiazole compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59097010A JPS60239473A (en) 1984-05-15 1984-05-15 2-trihalomethyl-5-penyl-1,3,4-oxadiazole compound

Publications (1)

Publication Number Publication Date
JPS60239473A true JPS60239473A (en) 1985-11-28

Family

ID=14180336

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59097010A Pending JPS60239473A (en) 1984-05-15 1984-05-15 2-trihalomethyl-5-penyl-1,3,4-oxadiazole compound

Country Status (1)

Country Link
JP (1) JPS60239473A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0700909A1 (en) * 1994-09-06 1996-03-13 Fuji Photo Film Co., Ltd. Photosensitive bis(halomethyloxadiazole) compound and photosensitive transfer sheet using the same
JP2014205687A (en) * 2008-05-30 2014-10-30 株式会社アールテック・ウエノ Benzene or thiophen derivative and its use as vap-1 inhibitor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0700909A1 (en) * 1994-09-06 1996-03-13 Fuji Photo Film Co., Ltd. Photosensitive bis(halomethyloxadiazole) compound and photosensitive transfer sheet using the same
JP2014205687A (en) * 2008-05-30 2014-10-30 株式会社アールテック・ウエノ Benzene or thiophen derivative and its use as vap-1 inhibitor
US9603833B2 (en) 2008-05-30 2017-03-28 R-Tech Ueno, Ltd. Benzene or thiophene derivative and use thereof as VAP-1 inhibitor

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