JPS60232503A - Method for vapor-depositing retroreflecting material with silk screen mask - Google Patents
Method for vapor-depositing retroreflecting material with silk screen maskInfo
- Publication number
- JPS60232503A JPS60232503A JP3798683A JP3798683A JPS60232503A JP S60232503 A JPS60232503 A JP S60232503A JP 3798683 A JP3798683 A JP 3798683A JP 3798683 A JP3798683 A JP 3798683A JP S60232503 A JPS60232503 A JP S60232503A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- vapor
- letters
- pattern
- silk screen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【発明の詳細な説明】
本発明は、再帰反射材の焦点樹脂面上にポリビニールア
ルコール（水溶性ビニール）によるシルク印刷を施すこ
とによりシルクスクリーンマスクな形成し前記再帰反射
材上に金属膜を蒸着する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention involves forming a silk screen mask by performing silk printing with polyvinyl alcohol (water-soluble vinyl) on the focal resin surface of a retroreflective material, and depositing a metal film on the retroreflective material. It relates to a method of vapor deposition.
従来より前記の場合において用いるマスクは、ステンレ
ス又は真鍮をエツチングする方法が一般的である。しか
し前記金属マスクは例えば第６図に示すローマ字のＯの
様に線で囲まれた文字は線を一部切って周囲とつなぐ必
要があり、正確な文字に対するマスクを作ることが困難
であった。また前記金桟マスクは凹凸面の再帰反射材と
完全に密着しない為蒸着の文字及びパターンをシャープ
にすることが出来ない。Conventionally, masks used in the above cases have generally been made by etching stainless steel or brass. However, with the metal mask, for example, for letters surrounded by lines, such as the Roman letter O shown in Figure 6, it is necessary to cut part of the line and connect it to the surrounding area, making it difficult to make masks for accurate letters. . Further, since the metal frame mask does not come into complete contact with the retroreflective material on the uneven surface, it is not possible to sharpen the characters and patterns of vapor deposition.
本発明は上記の点に鑑みなされたものであり、その目的
とする所は、知立正確な金属膜等による文字及びパター
ンを形成するため用いるシルク印刷による水溶性ビニー
ルのマスクを用いる蒸着力法を得ろことにある。The present invention has been made in view of the above points, and its purpose is to improve the vapor deposition method using a silk-printed water-soluble vinyl mask, which is used to form characters and patterns using accurate metal films. There is something to be gained.
以下図面を参照しながら、一実施例を詳細に説明する。An embodiment will be described in detail below with reference to the drawings.
第１図に示す本出願人に係る実願昭第５７−１７２９８
５号（昭和５７年１１月１６日出願）に示した偽造防止
シートは、その断面を示す第２図に示す様なガラスピー
ズ（１１、ビーズ結合樹脂層（２１゜ビーズ焦点樹脂層
（３）、剥離フィルム（４）、剥離紙（５）。Utility Application No. 57-17298 filed by the applicant shown in Figure 1
The anti-counterfeiting sheet shown in No. 5 (filed on November 16, 1982) consists of glass beads (11, bead bonding resin layer (21°), bead focus resin layer (3), as shown in Figure 2, which shows the cross section). , release film (4), release paper (5).
接着層（６）、透明金属膜（７）よりなる。偽造防止用
身分証明書として上記シートを使用する場合、剥離紙（
５）をはがし、所定事項Ｑｌが記入された身分証明書（
８）を第４図に示す如（接着させることにより。It consists of an adhesive layer (6) and a transparent metal film (7). When using the above sheet as an identification card to prevent counterfeiting, use release paper (
5) Peel off the ID card (
8) as shown in Fig. 4 (by gluing it).
偽造防止用身分証明書（９）が完成するものである。This completes the forgery prevention identification card (9).
この様な身分証明書をハーフミラ−を通した光で見るこ
とにより、第３図に示す如（透明金属膜による星印ｔｔ
Ｕが見えるようになる。By viewing such an identification card with light passing through a half-mirror, it can be seen as shown in Figure 3 (star mark tt made of transparent metal film).
U becomes visible.
この様なシートの製造において本発明による透明金属膜
（７）を蒸着する場合のシルクスクリーンマスク方法に
ついて述べる。５因に示される様にビーズ焦点樹脂層（
７）上に偽造防止用の星印の金属膜（７）を設けるため
のマスクとして、シルク印刷用の印刷適性を附与した水
溶性ビニール（ポリビニールアルコール）をシルク印刷
により直接密着させる。この様なマスクを通して透明金
属（ＴｉＯ２など）を〈蒸着させ、次に水溶性ビニール
によるマスクは水洗させることにより容易に除去するこ
とが出来る。なおシルクスクリーンは５００１ｉｎｅ／
１ｎｃｈ位のものを用いるのがよい。A silk screen mask method for vapor depositing the transparent metal film (7) according to the present invention in the production of such sheets will be described. As shown in factor 5, the bead focus resin layer (
7) Water-soluble vinyl (polyvinyl alcohol) that has been given printability for silk-screen printing is directly adhered to it by silk-screen printing as a mask for providing the metal film (7) with the asterisk for counterfeit prevention. A transparent metal (such as TiO2) is vapor-deposited through such a mask, and then the water-soluble vinyl mask can be easily removed by washing with water. The silk screen is 5001ine/
It is preferable to use one with about 1 nch.
本発明は、以上の如きであるので以下の様な効果を生じ
る。As described above, the present invention produces the following effects.
蒸着部分の文字及びパターンの画線を切る必要が全（な
いので要望に応じたものが出来ると共に金属マスクの場
合より微細な文字及びパターンの再現が可能となる。ま
た再帰反射材の焦点樹脂層に直接水溶性ビニールを印刷
するので完全に密着し、文字及びパターンのぼけがなく
シャープに出来る。また蒸着後マスクは水洗して容易に
洗い落すことが出来る。Since there is no need to cut the lines of characters and patterns on the vapor-deposited part, it is possible to create a mask that meets your needs, and it is also possible to reproduce finer characters and patterns than with a metal mask.Also, it is possible to reproduce finer characters and patterns than with a metal mask. Since the water-soluble vinyl is printed directly on the mask, it adheres perfectly and the letters and patterns are sharp without blurring.Furthermore, the mask can be easily washed off with water after vapor deposition.
第１図は偽造防止身分証明書の表面を示す説明図、第２
白は偽造防止シートの断面を示す説明図。
第３図はビ・了 な光で見た場合の偽造防止カードの表
面を示す説明図、第４図は印刷シートを設けて完成した
偽造防止カード、第５図は焦点樹脂層にシルクスクリー
ンマスクを設けた所の説明図、第６図はローマ字のＯと
、０を金属マスクにエツチングした場合の説明図。
ｆｉ＋・・・ガラスピーズ
（２）・・・ビーズ結合樹脂層
（３）・・・ビーズ焦点樹脂層
（４）・・・剥離フィルム
（５）・・・剥離紙
（６）・・・接着層
（７）・・・透明金属膜
（８）・・・身分証明書
（９）・・偽造防止用身分証明書
０１・・・所定事項
Ｕ・・・透明金属膜マーク
（１２１・・・シルクスクリーンマスクａ３・・・金属
マスク
特許出願人
凸版印刷株式会社
第４図
手続補正型（方式）
１、事件の表示
昭和５８年特許願第３７９８６号
２、発明の名称
シルクスクリーン・マスクによる再帰反Ｉｌｌの蒸着方
法
３、補正をする者
事件との関係 特許出願人
住所 東京都台東区台東−丁目５番１号イ）明細書の発
明の名称の欄
口）明細書の図面の簡単な説明の欄
８ 鋪正箇由会 ツク；）＼
イ）・明細書の発明の名称の欄を下記の如く訂正する。Figure 1 is an explanatory diagram showing the front surface of an anti-counterfeit identification card, Figure 2
White is an explanatory diagram showing a cross section of the anti-counterfeiting sheet. Figure 3 is an explanatory diagram showing the surface of the anti-counterfeiting card when viewed under bright light, Figure 4 is the completed anti-counterfeiting card with a printed sheet, and Figure 5 is a silk screen mask on the focal resin layer. FIG. 6 is an explanatory diagram of the case where the Roman letters O and 0 are etched into the metal mask. fi+...Glass beads (2)...Bead binding resin layer (3)...Bead focal resin layer (4)...Release film (5)...Release paper (6)...Adhesive layer (7)...Transparent metal film (8)...Identification card (9)...Identification card for counterfeit prevention 01...Specified matters U...Transparent metal film mark (121...Silk screen) Mask a3...Metal mask Patent applicant Toppan Printing Co., Ltd. Figure 4 Procedural amendment type (method) 1. Indication of the case Patent Application No. 37986, filed in 1982. 2. Name of the invention Recursion Ill by silk screen mask Vapor deposition method 3, relationship with the case of the person making the amendment Patent applicant address: 5-1 Taito-chome, Taito-ku, Tokyo a) Column for title of the invention in the specification) Column 8 for a brief explanation of the drawings in the specification骪正かゆう会 TSuku ;)＼ B)・Correct the column for the title of the invention in the description as follows.
Claims (1)
する方法において、ポリビニールアルコールをシルク印
刷することによりなる再帰反射材蒸着用シルクスクリー
ンマスクを用いて蒸着することを特徴としたシルクスク
リーンマスクにょる再帰反射材への蒸着方法。A method of vapor depositing a transparent metal in a pattern on a focal resin surface of a retroreflective material, a silk screen mask characterized in that the vapor deposition is performed using a silk screen mask for vapor deposition of a retroreflective material by silk printing polyvinyl alcohol. Vapor deposition method for retroreflective material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3798683A JPS60232503A (en) | 1983-03-08 | 1983-03-08 | Method for vapor-depositing retroreflecting material with silk screen mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3798683A JPS60232503A (en) | 1983-03-08 | 1983-03-08 | Method for vapor-depositing retroreflecting material with silk screen mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60232503A true JPS60232503A (en) | 1985-11-19 |
Family
ID=12512889
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3798683A Pending JPS60232503A (en) | 1983-03-08 | 1983-03-08 | Method for vapor-depositing retroreflecting material with silk screen mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60232503A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002004221A1 (en) * | 2000-07-10 | 2002-01-17 | Shiseido Co., Ltd. | Forgery/alteration protective material |
| WO2004086106A1 (en) * | 2003-03-26 | 2004-10-07 | Shiseido Co., Ltd. | Transparent retroreflection material |
| US20140008545A1 (en) * | 2012-07-06 | 2014-01-09 | Stephen George Opuszynski | Methods, apparatus and compositions for diffusing and mitigating laser energy, infrared energy and electron beams |
-
1983
- 1983-03-08 JP JP3798683A patent/JPS60232503A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002004221A1 (en) * | 2000-07-10 | 2002-01-17 | Shiseido Co., Ltd. | Forgery/alteration protective material |
| US6846547B2 (en) | 2000-07-10 | 2005-01-25 | Shiseido Co., Ltd. | Forgery/alteration protective material |
| KR100805487B1 (en) * | 2000-07-10 | 2008-02-20 | 가부시키가이샤 시세이도 | Forgery/alteration protective material |
| WO2004086106A1 (en) * | 2003-03-26 | 2004-10-07 | Shiseido Co., Ltd. | Transparent retroreflection material |
| US20140008545A1 (en) * | 2012-07-06 | 2014-01-09 | Stephen George Opuszynski | Methods, apparatus and compositions for diffusing and mitigating laser energy, infrared energy and electron beams |
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