JPS60227281A - Hologram recording photosensitive material and preparation of hologram - Google Patents
Hologram recording photosensitive material and preparation of hologramInfo
- Publication number
- JPS60227281A JPS60227281A JP8451284A JP8451284A JPS60227281A JP S60227281 A JPS60227281 A JP S60227281A JP 8451284 A JP8451284 A JP 8451284A JP 8451284 A JP8451284 A JP 8451284A JP S60227281 A JPS60227281 A JP S60227281A
- Authority
- JP
- Japan
- Prior art keywords
- hologram
- vinylcarbazole
- hologram recording
- poly
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Holo Graphy (AREA)
Abstract
Description
【発明の詳細な説明】
(a)9発明の技術分野
本発明はホログラム記録用の感光材料に係り、特に重合
体における光化学的架橋反応を利用してホログラムを記
録する方式で用いられる、短波長に高感度な感光材料に
関する。Detailed Description of the Invention (a) 9 Technical Field of the Invention The present invention relates to a photosensitive material for hologram recording, and in particular to a short-wavelength photosensitive material used in a method of recording holograms using a photochemical crosslinking reaction in a polymer. Regarding highly sensitive photosensitive materials.
(b)、技術の背景
ホログラムはレーザ等の可干渉性光の干渉波面を、写真
フィルム等に記録したものであって、近年光学像の記録
のみならず、情報処理の分野においても情報の記録ある
いはその回折現象を利用した光ビームの走査、例えばP
OS (Paint−of−5ale)システムにお
けるバーコード読み取り装置、あるいはレーザプリンタ
等に用いられている。(b), Technical Background A hologram is a recording of the interference wavefront of coherent light such as a laser on a photographic film, etc. In recent years, it has been used not only for recording optical images but also for recording information in the field of information processing. Or scanning a light beam using the diffraction phenomenon, for example, P
It is used in barcode reading devices in OS (Paint-of-5ale) systems, laser printers, and the like.
図はホログラム作製用三光束干渉装置のブロック図であ
る。The figure is a block diagram of a three-beam interference device for producing holograms.
図において、1はヘリウム−カドミウム(He−Cd)
レーザ、2はシャッタ、3,5.6はミラー、4はハー
フミラ−57,8はコリメータ、9は感光板を示す。In the figure, 1 is helium-cadmium (He-Cd)
2 is a shutter, 3, 5.6 are mirrors, 4 is a half mirror 57, 8 is a collimator, and 9 is a photosensitive plate.
レーザlから発したレーザ光はシャッタ2を通過後ミラ
ー3により反射され、その反射光はハーフミラ−4を通
過してミラー6で反射され、その反射光はコリメータフ
により平行光束になり感光板9に入射される。この際ハ
ーフミラ−4により1部反射された光はミラー5により
反射されコリメータ8を経由して、前記ミラー6よりの
反射光の入射角と、符合が反対で絶対値が等しい入射角
で感光板9に入射され、2つの光束による干渉波面が感
光板9に記録される。ここで両方の入射光のなす角度を
θとする。ホログラム作製において、ホログラムの解像
度を表す記録密度、即ち空間周波数fは次式で表される
。The laser beam emitted from the laser 1 passes through the shutter 2 and is reflected by the mirror 3.The reflected light passes through the half mirror 4 and is reflected by the mirror 6.The reflected light is turned into a parallel beam by the collimator and is applied to the photosensitive plate 9. is incident on the At this time, the light partially reflected by the half mirror 4 is reflected by the mirror 5, passes through the collimator 8, and passes through the photosensitive plate at an incident angle with the opposite sign and the same absolute value as the incident angle of the reflected light from the mirror 6. 9 , and the interference wavefront of the two light beams is recorded on the photosensitive plate 9 . Here, the angle formed by both incident lights is assumed to be θ. In producing a hologram, the recording density representing the resolution of the hologram, ie, the spatial frequency f, is expressed by the following equation.
f=2(sin(θ/2))/λ ここで、λはレーザの波長。f=2(sin(θ/2))/λ Here, λ is the laser wavelength.
レーザとして波長の長い、例えばヘリウム−ネオン(H
e−Ne)レーザ(632,8nm)を用いて、高い空
間周波数、例えば2500本/mmを得ようとすると、
θ=105’とθは極めて大きくなり、光学系が煩雑か
つ露光処理が不安定になってしまう。A laser with a long wavelength, such as helium-neon (H
When trying to obtain a high spatial frequency, for example 2500 lines/mm, using an e-Ne) laser (632.8 nm),
As θ=105', θ becomes extremely large, and the optical system becomes complicated and the exposure process becomes unstable.
一方、波長の短いレーザ、例えばHe−Cdレーザ(3
25,0nm)を用いると、おなし空間周波数を得るた
めのθは48°と約半分になり光学系は簡素化ならびに
安定化される。On the other hand, lasers with short wavelengths, such as He-Cd lasers (3
25.0 nm), the angle θ for obtaining a quiet spatial frequency is 48°, which is about half, and the optical system is simplified and stabilized.
従ってこのような短い波長の光に高感度で、解像度、回
折効率(回折光と入射光の強度比)および耐湿性の高い
ホログラム材料の出現が望まれている。Therefore, it is desired to develop a hologram material that is highly sensitive to such short wavelength light, has high resolution, diffraction efficiency (intensity ratio of diffracted light to incident light), and moisture resistance.
(C)、従来技術と問題点
従来、ホログラム記録材料としては、写真に用いられる
銀塩乳剤、重クロム酸−ゼラチン系の感光材、表面の微
少凹凸縞として干渉縞を記録するサーモプラスチックあ
るいはフォトポリマ等が実用化されている。(C), Prior Art and Problems Conventionally, hologram recording materials include silver salt emulsions used in photography, dichromate-gelatin photosensitive materials, thermoplastics or photosensitive materials that record interference fringes as minute irregularities on the surface. Polymers etc. have been put into practical use.
しかし、現状では前述のような短い波長の例えばHe−
Cdレーザ(325,0nm)に高感度で、解像度、回
折効率および耐湿性の高いホログラム材料はまだ開発さ
れていない。However, at present, short-wavelength He-
Hologram materials that are highly sensitive to Cd lasers (325,0 nm), have high resolution, diffraction efficiency, and moisture resistance have not yet been developed.
(d)9発明の目的
本発明の目的は、波長が450nm以下のレーザ光に対
し、高感度で、かつ化学的に安定で、高い解像度、耐湿
性、耐熱性、耐光性を有するホログラム感光材料を得る
ことにある。(d) 9 Purpose of the Invention The purpose of the present invention is to provide a hologram photosensitive material that is highly sensitive to laser light having a wavelength of 450 nm or less, is chemically stable, and has high resolution, moisture resistance, heat resistance, and light resistance. It's about getting.
(e)9発明の構成
上記の目的は、ポリ−N−ビニルカルバゾールと、光化
学的架橋剤としてフリルを含む本発明によるホログラム
記録材料、およびポリ−N−ビニルカルバゾールと、光
化学的架橋剤としてフリルを含むホログラム記録材料に
、450nm以下の波長をもつレーザの干渉パターンを
露光する工程を有する本発明によるホログラム製造方法
により達成される。(e) 9 Structure of the invention The above object is to provide a holographic recording material according to the invention comprising poly-N-vinylcarbazole and Furyl as a photochemical cross-linking agent; This is achieved by the hologram manufacturing method according to the present invention, which includes the step of exposing a hologram recording material containing a laser with an interference pattern of a laser having a wavelength of 450 nm or less.
本発明によれば、ホログラム記録用感光材料としてポリ
−N−ビニルカルバゾールと、光化学的架橋剤としての
フリルを主体とすることにより、耐湿性に優れ、かつH
e−Cdレーザ等の短波長光に高感度のものが得られる
。According to the present invention, since the photosensitive material for hologram recording mainly contains poly-N-vinylcarbazole and Frill as a photochemical crosslinking agent, it has excellent moisture resistance and H
High sensitivity to short wavelength light such as e-Cd laser can be obtained.
なお、フリルはつぎの化学式を有する。Note that the frill has the following chemical formula.
(f)9発明の実施例 以下に本発明の一実施例を説明する。(f) 9 Examples of the invention An embodiment of the present invention will be described below.
ポリ−N−ビニルカルバゾール 10g(西南香料産業
、ツビコールT−210)フリル(関東化学) 2g
クロロホルム(関東化学) 240g
上記組成の感光液を7(lnmX 70mmX 1mm
のガラス基板上に、乾燥後の膜厚が2μmになるように
スピンコード法により暗所で塗布した後、60℃で30
分間加熱乾燥し、ホログラム記録用感光板を作製した。Poly-N-vinylcarbazole 10g (Seinan Perfume Sangyo, Tubicol T-210) Frill (Kanto Kagaku) 2g Chloroform (Kanto Kagaku) 240g A photosensitive solution with the above composition was added to 7 (lnm x 70mm x 1mm)
It was coated on a glass substrate using a spin code method in the dark so that the film thickness after drying was 2 μm, and then it was heated at 60°C for 30 minutes.
It was dried by heating for a minute to produce a photosensitive plate for hologram recording.
なお、クロロホルムは溶剤として用いた。Note that chloroform was used as a solvent.
この感光板を71.1図に示すHe−Cd レーザ(3
25nm、θ−48°)を用いたホログラム作製光学系
でホログラム記録を行い、つぎにトルエン蒸気で現像し
た後、n−ペンタン中に浸漬してホログラムを得た。解
像度2500本/mm、回折効率70%の高品質のホロ
グラムが作製できた。なお、このときの露光エネルギは
300mJ/cn+”であった。This photosensitive plate was heated using the He-Cd laser (3) shown in Figure 71.1.
A hologram was recorded using a hologram production optical system using a 25 nm, θ-48°), and then developed with toluene vapor, and then immersed in n-pentane to obtain a hologram. A high quality hologram with a resolution of 2500 lines/mm and a diffraction efficiency of 70% was produced. Note that the exposure energy at this time was 300 mJ/cn+''.
実施例においては、感光材料として2成分のみを用いた
が、さらに光化学的架橋反応を促進させるために、増感
剤として色素等を含めても本発明の要旨は変わらない。In the examples, only two components were used as the photosensitive material, but the gist of the present invention does not change even if a dye or the like is included as a sensitizer to further promote the photochemical crosslinking reaction.
(gl、発明の効果
以上詳細に説明したように本発明によれば、波長が45
0nm以下のレーザ光に対し、高感度で、かつ化学的に
安定で、高い解像度、耐湿性、耐熱性、耐光性を有する
ホログラム感光材料を得ることができる。(gl, Effects of the Invention As explained in detail above, according to the present invention, the wavelength is 45
It is possible to obtain a hologram photosensitive material that is highly sensitive to laser light of 0 nm or less, is chemically stable, and has high resolution, moisture resistance, heat resistance, and light resistance.
図はホログラム作製用三光束干渉装置のブロック図であ
る。
図において、■はヘリウム−カドミウム(He−Cd)
レーザ、2はシャッタ、3,5.6はミラー、4はハー
フミラ−17,8はコリメータ、9は感光板を示す。The figure is a block diagram of a three-beam interference device for producing holograms. In the figure, ■ is helium-cadmium (He-Cd)
2 is a shutter, 3, 5.6 are mirrors, 4 is a half mirror 17, 8 is a collimator, and 9 is a photosensitive plate.
Claims (1)
−N−ビニルカルバゾールと、光化学的架橋剤としてフ
リルを含むホログラム記録材料に、450nm以下の波
長をもつレーザの干渉パターンを露光する工程を有する
ことを特徴とするホログラム製造方法。1. Poly-N-vinylcarbazole and photochemistry 2. A step of exposing a hologram recording material containing poly-N-vinylcarbazole and Frill as a photochemical crosslinking agent to an interference pattern of a laser having a wavelength of 450 nm or less. A hologram manufacturing method characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8451284A JPS60227281A (en) | 1984-04-26 | 1984-04-26 | Hologram recording photosensitive material and preparation of hologram |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8451284A JPS60227281A (en) | 1984-04-26 | 1984-04-26 | Hologram recording photosensitive material and preparation of hologram |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60227281A true JPS60227281A (en) | 1985-11-12 |
Family
ID=13832692
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8451284A Pending JPS60227281A (en) | 1984-04-26 | 1984-04-26 | Hologram recording photosensitive material and preparation of hologram |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60227281A (en) |
-
1984
- 1984-04-26 JP JP8451284A patent/JPS60227281A/en active Pending
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