JPS60171749A - Semiconductor memory device - Google Patents

Semiconductor memory device

Info

Publication number
JPS60171749A
JPS60171749A JP2700984A JP2700984A JPS60171749A JP S60171749 A JPS60171749 A JP S60171749A JP 2700984 A JP2700984 A JP 2700984A JP 2700984 A JP2700984 A JP 2700984A JP S60171749 A JPS60171749 A JP S60171749A
Authority
JP
Japan
Prior art keywords
resin
semiconductor element
semiconductor memory
ultraviolet
sealed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2700984A
Other languages
Japanese (ja)
Inventor
Keiji Miyamoto
宮本 圭二
Toru Kawanobe
川野辺 徹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2700984A priority Critical patent/JPS60171749A/en
Publication of JPS60171749A publication Critical patent/JPS60171749A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/18Circuits for erasing optically

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Non-Volatile Memory (AREA)

Abstract

PURPOSE:To enable to erase according to light stored informations even for a resin sealed semiconductor memory device by a method wherein the upper surface of a semiconductor element is covered with ultraviolet transmitting resin, and moreover the part not provided with the resin thereof is sealed with another resin. CONSTITUTION:A tab 2 mounting a semiconductor element 3 and a part of connector wires 4 are covered with ultraviolet transmittable resin 7, and after the resin is hardened, the whole is resin-molded using resin being different from the above-mentioned resin 7 and to be used for usual resin sealing, epoxy resin for example, leaving a part of leads 6. After then, the resin sealing body 8 on the upper surface of the semiconductor element 3 is cut to be removed up to expose the transparent resin 7 in a rectangular shape, for example, and an opening part 80 is formed to enable to project ultraviolet rays to the semiconductor element (semiconductor memory) 3 through the opening part 80 and the transparent resin 7. Informations are stored to a circuit element in the semiconductor element 3 from the outside leads 60, and the stored informations thereof can be erased by the irradiation of ultraviolet rays permeating the transparent resin 7.

Description

【発明の詳細な説明】 〔技術分野〕 本発明は゛半導体記憶装置に関し、特に封止性がよくか
つ紫外線透過可能な樹脂封止型の光消去型半導体記憶装
置に適用して有効な技術に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a semiconductor memory device, and particularly to a technique that is effective when applied to a resin-sealed photo-erasable semiconductor memory device that has good sealing properties and is transparent to ultraviolet light.

〔背景技術〕[Background technology]

従来の紫外腺消去形書きかえ可能半導体メモリ装置(E
FROM)にあっては、一般に紫外線透過を可能とする
ため、ハーメチックシールタイプのセラミックガラス封
止形ハッケージを用い、かつ、キャンプに開孔部を穿設
し、該開孔部にガラスを嵌め込むことで解決していた。
Conventional ultraviolet erase type rewritable semiconductor memory device (E
FROM) generally uses a hermetic seal type ceramic glass sealed hackage to allow ultraviolet light to pass through, and an opening is drilled in the camp and glass is fitted into the opening. It was resolved by that.

jIO常の一般的な半導体装置の樹脂封止に使用される
ような樹脂材料、例えばエポキシ樹脂を用いて樹脂封止
を行って成るEFROMが考えられるが、この場合は光
消去が、不可能であり、単に、メモリに情報の書き込み
が可能となるだけである。
jIO It is possible to consider an EFROM that is resin-sealed using a resin material such as epoxy resin that is normally used for resin-sealing of general semiconductor devices, but in this case, optical erasure is not possible. It simply allows information to be written to memory.

そこで、当該樹脂封止に使用される樹脂に紫外線透過性
の透明樹脂を全面的に用い、樹脂封止を行うことが考え
られる。
Therefore, it is conceivable to perform resin sealing by using an ultraviolet-transparent transparent resin over the entire surface of the resin used for the resin sealing.

しかし、本発明者の検討によれば、このように樹脂封止
体の全体が透明樹脂より成る半導体メモリ装置にあって
レモ全体が透明なので、あらゆる角度から光が入射し、
不必要にメモリの記憶内容が紫外線消去されるという欠
点があり、さらに、この場合、紫外線透過を可能とする
ために使用される透明性樹脂組成物から紫外線透過性や
透明性を阻害するようなフィラーやカーボンなどを除去
する必要があり、これによりノ・ノケージの耐湿性(:
J’J止性)にも問題を生ずるという欠点がある。
However, according to the study of the present inventor, in a semiconductor memory device in which the entire resin sealing body is made of transparent resin, since the entire memory is transparent, light enters from all angles.
There is a drawback that the stored contents of the memory are unnecessarily erased by ultraviolet rays.In addition, in this case, the transparent resin composition used to enable ultraviolet rays to transmit does not contain any substances that may impede ultraviolet rays transmittance or transparency. It is necessary to remove fillers, carbon, etc., and this reduces the moisture resistance of the no-no-cage (:
J'J retention) also has the drawback of causing problems.

〔発明の目的〕[Purpose of the invention]

本発明は制止性がよくかつ紫外性透過可能な樹脂封止り
光消去型半導体記憶装置を提供することを目自りとした
ものである。
An object of the present invention is to provide a resin-sealed, light-erasable semiconductor memory device that has good blocking properties and is capable of transmitting ultraviolet light.

本発明の前記ならびにそのほかの目的と新規なll:「
徴は、本明細書の記述および添付図面からあきらかにな
るであろう。
The above and other objects and novel objects of the present invention:
The characteristics will become clear from the description of this specification and the accompanying drawings.

〔発明の概覇〕[Summary of invention]

本願において開示される発明のうち代表的なものの概要
を簡単に説明すれば、下記のとおりである。
A brief overview of typical inventions disclosed in this application is as follows.

すなわち、本発明では紫外線透過可能な透明樹脂を、あ
らかじめ半導体メモリ上にポツテングにより被覆し、硬
化後、通常のレジンモールドを行い、その後、当該モー
ルドレジンを前記透明樹脂に致るまで一部(半導体メモ
リ上面上)けずり取るようにしたので、半導体メモリ上
には透明樹脂が被嬉されているので紫外線透過を可能と
するものである。
That is, in the present invention, a transparent resin that can transmit ultraviolet rays is coated on a semiconductor memory in advance by potting, and after curing, ordinary resin molding is performed, and then the mold resin is partially coated (semiconductor Since the top surface of the memory is scratched off, there is transparent resin on the semiconductor memory, which allows ultraviolet rays to pass through.

〔実施例〕〔Example〕

次に、本発明の実施例を本発明装置製造プロセスの一例
に従い説明する。
Next, an embodiment of the present invention will be described according to an example of a process for manufacturing the device of the present invention.

先ず第1図および第2図に示すように、リードフレーム
1のタブ2に半導体素子3を搭載する。
First, as shown in FIGS. 1 and 2, the semiconductor element 3 is mounted on the tab 2 of the lead frame 1.

第2図は、第1図1.1mに沿う拡大断面図である。FIG. 2 is an enlarged sectional view taken along line 1.1m in FIG. 1.

リードフレーム1は、例えばコーパル合金により構成さ
れる。半導体素子3は、例えばシリコン単結晶基板から
成り、周知の技術によって、このチップ内には多数の回
路素子が形成され、1つの回路機能が与えられている。
The lead frame 1 is made of copal alloy, for example. The semiconductor element 3 is made of, for example, a silicon single crystal substrate, and a large number of circuit elements are formed within this chip using a well-known technique to provide one circuit function.

回路素子の具体例はMOS)ランジスタから成り、この
回路素子によって、例えばメモリの回路機能が形成され
ている。
A specific example of the circuit element is a MOS transistor, and this circuit element forms the circuit function of, for example, a memory.

この半導体メモリにはEFROMが例示される。An example of this semiconductor memory is an EFROM.

この半導体索子3の搭載(マウント)は、A u −8
i共晶合金法など周知の組込み技術によればよい。
This semiconductor cable 3 is mounted (mounted) by A u-8
A well-known incorporation technique such as the i-eutectic alloy method may be used.

次いで、かかるペレット付後、第1図、および第2図に
示すように、コネクタワイヤ4によりワイヤボンディン
グを行う。すなわち、コネクタワイヤ4の一端部を半導
体素子3のポンディングパッド(電極)5にボンディン
グし、該ワイヤ4の他端部をリードフレーム1のり−ド
6のパッド(図示せず)にボンディングする。コネクタ
ワイヤ4には例えばアルミニウム細線が使用され、ワイ
ヤボンディングは周知の超音波ボンディング法などによ
り行われ、かかるボンディングにより半導体素子3とリ
ードフレーム1のり−ド6とが電気的に接続される。
After attaching the pellets, wire bonding is then performed using the connector wire 4, as shown in FIGS. 1 and 2. That is, one end of the connector wire 4 is bonded to a bonding pad (electrode) 5 of the semiconductor element 3, and the other end of the wire 4 is bonded to a pad (not shown) of the board 6 of the lead frame 1. For example, a thin aluminum wire is used for the connector wire 4, and wire bonding is performed by a well-known ultrasonic bonding method, etc., and the semiconductor element 3 and the lead frame 1 glue 6 are electrically connected by such bonding.

次に、半導体素子3を搭載したタブ2およびコネクタワ
イヤ4の一部を、第3図に示すように、紫外線透過可能
性(財脂7で被覆する。この樹脂7の被覆は、例えば液
状の当該樹脂の適量を、徐々に半導体素子3上に滴下し
、樹脂の表面張力によって、第3図に示すような半円形
状に硬化させる周知の樹脂封止の方法に使用されるポツ
テング法(Patting Method ) により
行うことができる。
Next, as shown in FIG. 3, the tab 2 on which the semiconductor element 3 is mounted and a part of the connector wire 4 are coated with UV-transmissible resin 7. The resin 7 is coated with, for example, a liquid resin. A suitable amount of the resin is gradually dropped onto the semiconductor element 3 and cured into a semicircular shape as shown in FIG. 3 by the surface tension of the resin. Method).

この紫外I%!逍過性樹脂には、半導体メモリの記憶情
報を所定の波長領域の光の照射によって消去できる樹脂
が使用され、光の透過が可能な透明性の樹脂が好ましい
(以下透明樹脂という)。
This ultraviolet I%! As the transferable resin, a resin that can erase the information stored in the semiconductor memory by irradiation with light in a predetermined wavelength range is used, and a transparent resin that can transmit light is preferably used (hereinafter referred to as transparent resin).

透明樹脂のポツテング、硬化後に、第4図に示すように
、リード6の一部を残して、前記透明樹脂とは異なる通
常の樹脂封止に使用されるような例えばエポキ7樹脂を
使用して全体を例えば周知のトランファーモールド法(
Transfer Molding )によりレジンモ
ールドする。第4図に示すように、透明樹脂7などを包
み込んだ構造の樹脂封止体8を有する樹脂封止体の半導
体装置が得られる。
After the transparent resin is potted and cured, as shown in FIG. 4, a part of the lead 6 is left and an epoxy 7 resin, for example, which is used for ordinary resin sealing different from the transparent resin, is used. For example, the whole can be molded using the well-known transfer molding method (
Transfer molding). As shown in FIG. 4, a resin-sealed semiconductor device having a resin-sealed body 8 having a structure in which a transparent resin 7 and the like are wrapped is obtained.

次に、半導体素子3上面上の前記樹脂封止体8を、例え
ば、第5図に示すように、長方形に、透明樹脂7が露出
するまで、切削除去し、開口部80を形成する。得られ
た半導体装着は、開口部80および透明樹脂7を介して
、紫外線が半導体素子(半導体メモリ)3に照射される
ようになりており、透明樹脂7の露出した部分を除いて
他の樹脂(モールドレジン)81により封止されている
。半導体素子3内回路素子には、リード6を折曲げ成形
してなる外部リード60から情報が記憶され、当該記憶
情報は透明樹脂7を透過した紫外線の照射により消去す
ることができる。開化部80には、例えばセラミック製
のキャンプを嵌挿して不用意に情報を消去することを避
けることもできる。
Next, as shown in FIG. 5, the resin sealing body 8 on the upper surface of the semiconductor element 3 is cut away, for example, in a rectangular shape until the transparent resin 7 is exposed, thereby forming an opening 80. In the obtained semiconductor mounting, the semiconductor element (semiconductor memory) 3 is irradiated with ultraviolet rays through the opening 80 and the transparent resin 7, and other resins are removed except for the exposed portion of the transparent resin 7. It is sealed with (mold resin) 81. Information is stored in the circuit element within the semiconductor element 3 from an external lead 60 formed by bending the lead 6, and the stored information can be erased by irradiation with ultraviolet light that has passed through the transparent resin 7. For example, a ceramic camp may be inserted into the opening section 80 to prevent information from being accidentally erased.

〔効41L] (1)全体をモールドレジンにより封止する場合には光
消去が不可能であったのを、一部に開孔部を設け、開孔
部に露出した透明樹脂を通して紫外線が、か過できるよ
うにしたので、樹脂制止の半導体記憶装置であっても記
憶情報の光消去可能な半導体記憶袋pとすることができ
る。
[Effect 41L] (1) When the entire body was sealed with molded resin, it was impossible to erase it with light. Since it is made to be able to pass through the bag, even if the semiconductor storage device is made of resin, it can be made into a semiconductor storage bag p in which stored information can be erased by light.

12+ 全体を紫外線透過可能な透明レジンで封止する
場合の欠点である、不用意な光消去によるメモリの機能
不良や制止性の劣化を解消することができる。すなわち
、透明4■脂は一部露出しているだけであり、かつ、こ
の霧出部分を除いて全体が通常のモールドレジンにより
封止されているので、不用意に光消去をすることが低減
され、かつ封止には耐湿性がよく、ワイヤやリードフレ
ームとの接着性のよいエポキシ樹脂などの通常モールド
レジンを使用できるので封止性も確保でき、信頼性の高
い樹脂封止の光消去型半導体記憶装置とすることができ
る。
12+ It is possible to eliminate the malfunction of the memory and the deterioration of the blocking performance due to careless light erasure, which are disadvantages when the entire 12+ is sealed with a transparent resin that can transmit ultraviolet rays. In other words, only a part of the transparent 4■ fat is exposed, and the entire part is sealed with normal mold resin except for this mist part, so it is less likely to be accidentally erased by light. In addition, regular mold resin such as epoxy resin, which has good moisture resistance and good adhesion to wires and lead frames, can be used for sealing, ensuring sealing performance and highly reliable optical erasure of resin sealing. type semiconductor memory device.

(3) 本発明によれば、樹脂封止の光消去型半導体記
憶装置が可能となったので、従来の気密封止の半導体記
憶装置に比してコストを低減できる。
(3) According to the present invention, a resin-sealed photo-erasable semiconductor memory device has become possible, so costs can be reduced compared to conventional hermetically sealed semiconductor memory devices.

以上本発明者によってなされた発明を実施例にもとづき
1体的に説明したが、本発明は上記実施例に限定される
ものではなく、その要旨を逸脱しない範囲で種々変更可
能であることはいうまでもない。
Although the invention made by the present inventor has been comprehensively explained based on the examples above, the present invention is not limited to the above-mentioned examples, and it should be noted that various changes can be made without departing from the gist of the invention. Not even.

〔利用分野〕[Application field]

以上の説明では主として本発明者によってなされた発明
をその背景となった利用分野であるデュアルインライン
パンケージ(DILP)タイプのプラスチックパンケー
ジに適用した場合について説明したが、それに限定され
るものではなく、例えば、フラントバソクパッケージ(
PPP)タイプのパッケージなど樹脂制止の光消去型半
導体記憶装置全般に適用できる。
In the above explanation, the invention made by the present inventor was mainly applied to a dual in-line panpage (DILP) type plastic pancake, which is the field of application in which the invention was made, but the invention is not limited thereto. , for example, the Franto Basok package (
The present invention can be applied to all resin-blocked photo-erasable semiconductor memory devices such as PPP) type packages.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本発明の実施例を示し、第1図はリードフレーム
に半導体素子を搭載し、ワイヤボンディングする様子を
説明する平面図、 $2図は第1図I−I線断面図、 第3図は紫外線透過性樹脂を半導体素子に被覆する様子
を説明する断面図、 第4図は他の樹脂をモールドして成る装置の断面図、 第5図は本発明半導体記憶装置の断面図である。 1・・・リードフレーム、2・・・タブ、3・・・半導
体素子、4・・・コ、ン、ククワイヤ、5・・・ポンデ
ィングパッド、6・・リード、7・・・紫外線透過性樹
脂、8・・・樹脂封止体、60・・・外部リード、80
・・・開口部、81・・・他の樹脂(モールドレジン)
2゜第 1 図 1−+ 第 2 図
The drawings show embodiments of the present invention, and FIG. 1 is a plan view illustrating how a semiconductor element is mounted on a lead frame and wire bonded, FIG. 2 is a sectional view taken along line I-I in FIG. 4 is a sectional view of a device formed by molding another resin, and FIG. 5 is a sectional view of a semiconductor memory device of the present invention. DESCRIPTION OF SYMBOLS 1...Lead frame, 2...Tab, 3...Semiconductor element, 4...Con, Kuku wire, 5...Ponding pad, 6...Lead, 7...UV transmittance Resin, 8... Resin sealing body, 60... External lead, 80
...opening, 81...other resin (mold resin)
2゜1st Figure 1-+ Figure 2

Claims (1)

【特許請求の範囲】 1、情報を記憶し、当該記憶情報が所定の波長領域の光
の照射によって消去される半導体素子を内蔵した樹脂封
止型半導体記憶装置であって、少なくとも半導体素子の
上面を、紫外線透過性樹脂で被覆し、さらに、該樹脂の
設けられていない部分を他の樹脂で樹脂封止して成るこ
とを特徴とする半導体記憶装置。 2 半導体素子を覆う紫外線透過性樹脂上の他の樹脂を
、紫外線透過性樹脂面まで除去して成る、特許請求の範
囲第1項記載の記憶装置。
[Scope of Claims] 1. A resin-sealed semiconductor memory device incorporating a semiconductor element that stores information and in which the stored information is erased by irradiation with light in a predetermined wavelength range, wherein at least the upper surface of the semiconductor element is What is claimed is: 1. A semiconductor memory device characterized in that the semiconductor memory device is coated with an ultraviolet-transparent resin, and further, the portions where the resin is not provided are sealed with another resin. 2. The storage device according to claim 1, wherein the other resin on the ultraviolet-transparent resin covering the semiconductor element is removed down to the ultraviolet-transparent resin surface.
JP2700984A 1984-02-17 1984-02-17 Semiconductor memory device Pending JPS60171749A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2700984A JPS60171749A (en) 1984-02-17 1984-02-17 Semiconductor memory device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2700984A JPS60171749A (en) 1984-02-17 1984-02-17 Semiconductor memory device

Publications (1)

Publication Number Publication Date
JPS60171749A true JPS60171749A (en) 1985-09-05

Family

ID=12209109

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2700984A Pending JPS60171749A (en) 1984-02-17 1984-02-17 Semiconductor memory device

Country Status (1)

Country Link
JP (1) JPS60171749A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5107325A (en) * 1989-04-17 1992-04-21 Seiko Epson Corporation Structure and method of packaging a semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5107325A (en) * 1989-04-17 1992-04-21 Seiko Epson Corporation Structure and method of packaging a semiconductor device

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