JPS60156004A - Exposure device of diffraction grating - Google Patents

Exposure device of diffraction grating

Info

Publication number
JPS60156004A
JPS60156004A JP415984A JP415984A JPS60156004A JP S60156004 A JPS60156004 A JP S60156004A JP 415984 A JP415984 A JP 415984A JP 415984 A JP415984 A JP 415984A JP S60156004 A JPS60156004 A JP S60156004A
Authority
JP
Japan
Prior art keywords
light
photosensitive film
mirror
exposure head
diffraction grating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP415984A
Other languages
Japanese (ja)
Inventor
Kazuhiko Onuma
一彦 大沼
Fujiro Iwata
岩田　藤郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP415984A priority Critical patent/JPS60156004A/en
Publication of JPS60156004A publication Critical patent/JPS60156004A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/0482—Interference based printer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0493—Special holograms not otherwise provided for, e.g. conoscopic, referenceless holography
    • G03H2001/0497—Dot matrix holograms

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PURPOSE:To produce a grating while changing freely the pitch or the like by using a movable original mount, to which a photosensitive film is set, and a movable exposure head which exposes interference fringes due to interference between two luminous fluxes to light. CONSTITUTION:A drum 2 of the original mount which has a photosensitive film 10 stuck and is rotated is rotated by a pulse motor 3, and this rotation is detected by a rotary encoder 1. The photosensitive film 10 is exposed to light by an exposure head 5 and is scanned in the transverse direction by a guide 6, a ball screw 8, a pulse motor 9, and a rotary encoder 7. The light from a laser beam oscillator is led into the exposure head 5 to generate interference fringes due to inteference between two luminous fluxes. These interference fringes are exposed onto the photosensitive film 10 to produce the diffraction grating.

Description

【発明の詳細な説明】 この発明は、三光束干渉による微少な干渉縞をそのピッ
チ、方向、および光強度を変化させて。DETAILED DESCRIPTION OF THE INVENTION The present invention produces minute interference fringes by three-beam interference by changing their pitch, direction, and light intensity.

感光性フィルムに次々に露光する装置に関するものであ
り、露光後、フィルムを現像処理することにより、回折
格子によるパターンが得られるものである。This relates to an apparatus that sequentially exposes a photosensitive film to light, and after exposure, the film is developed to obtain a pattern of diffraction gratings.

従来、回折格子によるパターンを得るためには写真フー
イルムや紙によるマスクが用いられていた。Conventionally, photo film or paper masks have been used to obtain patterns using diffraction gratings.

又、多くの回折格子によるパターンを得るためには、多
くのマスクが必要であり、その回折格子のピッチ、方向
１回折効率ヲ湾えることは膨大な手間と時間を必要とす
るものであって、現在、多くの回折格子を用いたパター
ンは得られていない。In addition, in order to obtain patterns with many diffraction gratings, many masks are required, and changing the pitch of the diffraction gratings and the diffraction efficiency in one direction requires a huge amount of effort and time. Currently, many patterns using diffraction gratings have not been obtained.

本発明はこの欠点？除き、自由にしかも連続的に回折格
子のピッチ、方向、回折効率が変化する回折パターンを
得ることを可能にした装置で、今までにない新しい回折
格子の画像が得られるものである。Does this invention have this drawback? This device makes it possible to obtain a diffraction pattern in which the pitch, direction, and diffraction efficiency of the diffraction grating can be freely and continuously changed.

すなわち、本発明は感光性フィルムをセットする移動可
能なドラムよりなる原稿架と、該感光性フィルム上に、
二元束干渉によって生じる干渉縞を露光するための移動
可能な露光ヘッドを少なくとも具備する装置であり、該
露光ヘッドは、これ。That is, the present invention provides an original document rack consisting of a movable drum on which a photosensitive film is set, and on the photosensitive film,
The apparatus includes at least a movable exposure head for exposing interference fringes caused by binary flux interference, and the exposure head is a movable exposure head.

に入射する光を必要に応じて遮断するためシャッターと
、シャッターを通過した光を二つの光束に分割するだめ
の７・−フミラーと、該ノ１−ごミラーによって分割さ
れた二つの光束のそれぞれを回転ミラーを介して同一構
成の一対のレンズ系のそれぞれに導くようにすると共に
、該それぞれのレンズ系を通過したそれぞれの光束が一
点で集光するように前記ハーフミラ−１回転ミラー及び
レンズ系のそれぞれをブロック内に配置して成り、この
ブロック全体が回転できることを特徴とする回折格子露
光装置である。A shutter to block the light incident on the shutter as necessary, a mirror to split the light passing through the shutter into two beams, and each of the two beams split by the mirror. The half mirror-one rotating mirror and the lens system are arranged so that the light beams are guided to each of a pair of lens systems having the same configuration through a rotating mirror, and the respective light beams passing through the respective lens systems are condensed at one point. This is a diffraction grating exposure apparatus characterized in that each of the above is arranged in a block, and the entire block can be rotated.

以下、第１図、第２図に示す装置の概要図を参照しなが
ら、本発明の詳細な説明する。第１図はこあ装置の主要
部を示すもので、感光性フィルム（１０）ヲ張り付けて
回転する原稿架たるドラム（２）、これを回転するパル
スモータ−（３）１回転を検出するロータリーエンコー
ダー（ＩＬｇ元性フイ化ムに露光する露光ヘッド（５１
，これを安定に保持し移動するためのガイド（６）、ボ
ールネジ（８）、パルスモータ−（９）、ロータリーエ
ンコーダー（７）、レーザービーム発振器（図示せず）
等により、この装置は構成されている。露光のためのレ
ーザー光（４）は、露光ヘッドに入り小窓（１１１より
出て、感光性フィルム（１０）に達する。Hereinafter, the present invention will be described in detail with reference to the schematic diagrams of the apparatus shown in FIGS. 1 and 2. Figure 1 shows the main parts of the machine, including a drum (2) that holds a rotating document with a photosensitive film (10) pasted on it, a pulse motor (3) that rotates the drum, and a rotary that detects one revolution. Encoder (exposure head (51) that exposes the ILg-based fluoride film
, a guide (6) for stably holding and moving it, a ball screw (8), a pulse motor (9), a rotary encoder (7), a laser beam oscillator (not shown)
This device is configured as follows. Laser light (4) for exposure enters the exposure head, exits through a small window (111), and reaches the photosensitive film (10).

第２図には、露光ヘッド（５）の内部を示す。露光ヘッ
ド（５）はレンズ（１８１（ｌ’ｉ　（２０＋　＋２１
１、ミラー（１２１（１５１（１６１（Ｉη、ノーーフ
ミラーα４．シャッター（２２１，そしてこれらを支持
するブロック（２η、さらに、このブロック全体を回転
するための軸受け＋２３１（ハ）、パルスモータ−（２
つ。FIG. 2 shows the inside of the exposure head (5). The exposure head (5) has a lens (181(l'i (20+ +21
1. Mirror (121 (151 (161 (Iη), Nouf mirror α4. Shutter (221, and the block that supports them (2η), furthermore, a bearing for rotating this entire block +231 (c), a pulse motor (2
Two.

歯車ｃ！ｅ、外枠（社）より構成される。レーザー光（
４）はシャッター０２．ミラー（１２１１に通りハーフ
ミラ−（１４１に１°１′光束′分けられ・一方０元束
°１回転４′　（７（１６）　、レンズαｕ！Ｊ’ｔ−
通って小窓（１１１に達し、他方の光束は、ミラー＋１
５）、回転ミラー０７）、レンズｅＯＩ圓を通って小窓
０υに達し％２つの光束による干渉縞が小窓圓の位置に
結像する。Gear c! e. It is composed of an outer frame (sha). Laser light (
4) is shutter 02. The mirror (1211 passes through the half mirror (141) and the 0-element beam is divided into 1 degree 1'beam' and rotated 4' (7 (16), lens αu!J't-
passes through the small window (111), and the other light beam passes through the mirror +1
5), through the rotating mirror 07) and the lens eOI circle, it reaches the small window 0υ, and the interference fringes of the two light beams are imaged at the position of the small window circle.

この光学系においては１回転ミラーα６１（１７１は、
レンズα８１　、（２０１の焦点距離ｆ１のところにお
かれていてこれらの回転ミラー（１６１（ｌηによって
反射した光は、レンズα樽およびレンズ（２０＋　ｉ通
過後、元軸に平行な元になる。この平行光束がレンズα
ω　（２１１に入射すると、それぞれのレンズα９）（
２１１の焦点距離ｆ２のところに集まる。このため回転
ミラー（１６１（Ｌｎ　ｋ回転することによって元は、
その方向を変えるが、２つの光束は、常に同じ所、すな
わち小窓圓の位置で交わることになる。この時にできる
干渉縞のピッチｄは、次の式で与えられる。In this optical system, the one-rotation mirror α61 (171 is
The light reflected by the rotating mirror (161(lη) placed at the focal length f1 of the lenses α81 and (201) becomes the source parallel to the original axis after passing through the lens α barrel and the lens (20+i). This parallel light flux is the lens α
ω (When incident on 211, each lens α9) (
211 at focal length f2. Therefore, by rotating the rotating mirror (161 (Ln k), the original
Although their directions change, the two beams of light always intersect at the same place, that is, at the small window circle. The pitch d of the interference fringes created at this time is given by the following equation.

λ ここで、λはレーザーの波長、θ１θ２は２つの光束が
、小窓圓の法線方向となす角度である。λ Here, λ is the wavelength of the laser, and θ1θ2 is the angle that the two light beams make with the normal direction of the small window circle.

第１図においては、θ２は負の値である。In FIG. 1, θ2 is a negative value.

コノ装置によるパターンの感光性フィルムα０）への露
光は、例えば外部のスキャナーからの電気信号に基づい
て、前記２つの光束の角度（θ１＋０２）及びシャッタ
ー（２２１の開閉時間、またブロック（２）の回転によ
って行なわれる。この場合、まず回折格子に変換する原
画をスキャナーにセットし、走査ヘッドや光電変換素子
等を介して得られる赤、緑。The exposure of the pattern onto the photosensitive film α0) by the Kono device is based on, for example, an electric signal from an external scanner, the angle (θ1+02) of the two light beams, the opening/closing time of the shutter (221), and the opening/closing time of the block (2). In this case, the original image to be converted into a diffraction grating is first set in a scanner, and the red and green colors are obtained through a scanning head, photoelectric conversion element, etc.

青の色信号によって干渉縞のピッチを任意に決定する。The pitch of the interference fringe is arbitrarily determined by the blue color signal.

次に、決定されたピッチが感光性フィルム（１０）上で
設定できるように１回転ミラー（１６１（１７）　？回
転し、小窓（ＩＩＩに入る２光束の角度（θ１＋θ２）
を変化させる。また、干渉縞の方向をブロック（２７１
全体ヲハルスモーター（２５）によって回転させる。次
にスキャナーにセットした原画から得られる光学濃度に
対応してシーヤッター（２２１の開閉時間を決定し、露
光を行う。この露光時間の大小により１回折格子の回折
効率を変化させることができる。この一連の操作を一画
素毎に、繰り返すことにより、原画より回折格子による
画像を作製することができる。Next, the mirror (161 (17)) is rotated once so that the determined pitch can be set on the photosensitive film (10), and the angle (θ1 + θ2) of the two light fluxes entering the small window (III) is
change. Also, block the direction of interference fringes (271
The entire body is rotated by a HALS motor (25). Next, the opening/closing time of the sheather (221) is determined in accordance with the optical density obtained from the original image set in the scanner, and exposure is performed.The diffraction efficiency of one diffraction grating can be changed by changing the length of this exposure time. By repeating this series of operations for each pixel, it is possible to create an image using a diffraction grating from the original image.

このようにして作製された回折格子によるパターンに、
太陽のような白色光全入射させると、パターンの各部の
回折格子のピッチ、方向１回折効率の違いによる。明る
さの異なった色が見られ。In the pattern of the diffraction grating created in this way,
When all white light such as that from the sun is incident, this is due to differences in the pitch of the diffraction grating in each part of the pattern and the diffraction efficiency in one direction. You can see colors with different brightness.

全体的には、紅のように上包に輝くパターンが見えるこ
とになる。Overall, you will see a pattern that shines on the upper bag like red.

本装置の発明により、マスクを用いることなく、しかも
回折格子のピッチ、方向や回折効率を自由に変えながら
、回折格子による絵を迅速かつ簡便に描くことが可能と
なり、ディスプレーの分野で利用でき、産業上有効なも
のである。The invention of this device makes it possible to quickly and easily draw pictures using a diffraction grating while freely changing the pitch, direction, and diffraction efficiency of the diffraction grating without using a mask, and can be used in the field of displays. It is industrially effective.

なお、ドラム状の原稿架を採用した例で本発明を説明し
たが、本発明はこれに限定されず原稿架を平板状とし、
この上にフィルムを置き、露光ヘッドを前後左右に移動
するようにした構成の装置であってもよい。Although the present invention has been described using an example in which a drum-shaped document shelf is used, the present invention is not limited to this.
The apparatus may have a structure in which a film is placed on this and the exposure head is moved back and forth and left and right.

さらに、露光ヘッドが動くように説明したが。Furthermore, I explained that the exposure head moves.

ヘッドを固定し、原稿架を前後左右および回転できるよ
うにした構成の装置であってもよい。The apparatus may have a structure in which the head is fixed and the document shelf can be rotated back and forth, left and right, and rotated.

また、本発明に係る装置を使用しスキャナーによる信号
に基づいて回折格子によるパターンを作製するかわりに
、計算機によって作製した原画を直接プリンターに出力
することにより、回折格子のパターンを作製することも
可能である。Furthermore, instead of using the apparatus according to the present invention to create a diffraction grating pattern based on signals from a scanner, it is also possible to create a diffraction grating pattern by directly outputting an original image created by a computer to a printer. It is.

【図面の簡単な説明】[Brief explanation of drawings]

１面は本発明の一実施例を示すも°、ので、第１図はこ
の装置の要部概略斜視説明図であり、第２図は露光ヘッ
ドの内部を示した説明図である。 ［３１（７１・・・ロータリーエンコーダー　［２＋・
・・ドラム（３１［９１・・・パルスモータ−（４）−
レーザー元　（５）・・・露光ヘットｆ８）・・・ボー
ルネジ００）・・・フィルム　（１１１・・・小窓　（
１２１・・・ミラー　α３）・・・溝　（１４］・・・
ハーフミラ−（１５）−ミラー　（ｔ６１Ｑ７）−・・
回転ミラー　α８＋　（１９）　（２０１（２１１−Ｌ
／　７ズ　（２２＋・・・シャッター　（２３１（２４
１・・・軸受１ｔｊ　（２５）・・・パルスモータ−（
２０・・・歯車　（２η・・・ブロック　（２８）・・
・外枠特許出願人 凸版印刷株式会社 代表者鈴木和夫The first side shows one embodiment of the present invention, so FIG. 1 is a schematic perspective view of the main parts of this apparatus, and FIG. 2 is an explanatory view showing the inside of the exposure head. [31 (71...Rotary encoder [2+]
... Drum (31 [91... Pulse motor (4) -
Laser source (5)...Exposure head f8)...Ball screw 00)...Film (111...Small window (
121...Mirror α3)...Groove (14)...
Half mirror (15) - Mirror (t61Q7) -...
Rotating mirror α8+ (19) (201 (211-L)
/ 7's (22+...shutter (231(24)
1...Bearing 1tj (25)...Pulse motor (
20...Gear (2η...Block (28)...
・Outline patent applicant Kazuo Suzuki, Representative of Toppan Printing Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] １）感光性フィルムをセットする移動可能な原稿架と、
該感光性フィルム上に、三光束干渉によって生じる干渉
縞を露光するための移動可能な露光ヘッドを少なくとも
具備する装置℃あり、該露光ヘッドは、これに入射する
光を必要に応じて遮断するためのシャッターと、シャッ
ターを通過した光を二つの光束に分割するためのノーー
フミラーと、該ハーフミラ−によって分割された二つの
光束のそれぞれ全回転ミラーを介■、て同一構成の一対
のレンズ系のそれぞれに導く回転ミラーと、それぞれの
レンズ系を通過した光束カー一点で集光するようにした
レンズ系と、前記ハーフミラ−１回転ミラー及びレンズ
系が収納配置されたブロックと、このブロック全体が回
転可能であることを特徴とする回折格子露光装置。1) A movable document rack for setting photosensitive film,
There is an apparatus comprising at least a movable exposure head for exposing interference fringes generated by three-beam interference on the photosensitive film, and the exposure head is for blocking light incident thereon as necessary. A shutter, a nouf mirror for splitting the light that has passed through the shutter into two beams, and a pair of lens systems of the same construction each passing through a fully rotating mirror for each of the two beams divided by the half mirror. A rotating mirror that guides the light, a lens system that focuses the light flux passing through each lens system at one point, a block in which the half mirror 1 rotating mirror and lens system are housed, and this block as a whole is rotatable. A diffraction grating exposure device characterized by:
JP415984A 1984-01-12 1984-01-12 Exposure device of diffraction grating Pending JPS60156004A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP415984A JPS60156004A (en) 1984-01-12 1984-01-12 Exposure device of diffraction grating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP415984A JPS60156004A (en) 1984-01-12 1984-01-12 Exposure device of diffraction grating

Publications (1)

Publication Number Publication Date
JPS60156004A true JPS60156004A (en) 1985-08-16

Family

ID=11576961

Family Applications (1)

Application Number Title Priority Date Filing Date
JP415984A Pending JPS60156004A (en) 1984-01-12 1984-01-12 Exposure device of diffraction grating

Country Status (1)

Country Link
JP (1) JPS60156004A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0272319A (en) * 1988-09-07 1990-03-12 Toppan Printing Co Ltd Display with diffraction grating pattern and its manufacture
EP0423680A2 (en) * 1989-10-16 1991-04-24 Toppan Printing Co., Ltd. Method of manufacturing display having diffraction grating patterns
JPH03164789A (en) * 1989-11-24 1991-07-16 Toppan Printing Co Ltd Formation of display having diffraction grating pattern
US5058992A (en) * 1988-09-07 1991-10-22 Toppan Printing Co., Ltd. Method for producing a display with a diffraction grating pattern and a display produced by the method
EP0467601A2 (en) * 1990-07-12 1992-01-22 Applied Holographics Corporation Holographic diffraction grating patterns and methods for creating the same
WO2005036216A3 (en) * 2003-09-11 2005-07-28 Bright View Technologies Inc Systems and methods for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam
US7192692B2 (en) 2003-09-11 2007-03-20 Bright View Technologies, Inc. Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers
DE102007047663A1 (en) * 2007-06-12 2008-12-24 Industrial Technology Research Institute Method and apparatus for producing periodic patterns by interference lithography by stepwise alignment
JP2009015216A (en) * 2007-07-09 2009-01-22 Konica Minolta Holdings Inc Method and device for forming interference fringe pattern
US7867695B2 (en) 2003-09-11 2011-01-11 Bright View Technologies Corporation Methods for mastering microstructures through a substrate using negative photoresist
JP2013064956A (en) * 2011-09-20 2013-04-11 Toshiba Corp Hologram production method and production apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49130241A (en) * 1973-04-13 1974-12-13
JPS51114142A (en) * 1975-03-31 1976-10-07 Toshiba Corp Method of manufacturing diffraction grid

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49130241A (en) * 1973-04-13 1974-12-13
JPS51114142A (en) * 1975-03-31 1976-10-07 Toshiba Corp Method of manufacturing diffraction grid

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0272319A (en) * 1988-09-07 1990-03-12 Toppan Printing Co Ltd Display with diffraction grating pattern and its manufacture
US5058992A (en) * 1988-09-07 1991-10-22 Toppan Printing Co., Ltd. Method for producing a display with a diffraction grating pattern and a display produced by the method
EP0423680A2 (en) * 1989-10-16 1991-04-24 Toppan Printing Co., Ltd. Method of manufacturing display having diffraction grating patterns
JPH03164789A (en) * 1989-11-24 1991-07-16 Toppan Printing Co Ltd Formation of display having diffraction grating pattern
EP0467601A2 (en) * 1990-07-12 1992-01-22 Applied Holographics Corporation Holographic diffraction grating patterns and methods for creating the same
EP0467601B1 (en) * 1990-07-12 1996-02-28 Applied Holographics Corporation Holographic diffraction grating patterns and methods for creating the same
US7192692B2 (en) 2003-09-11 2007-03-20 Bright View Technologies, Inc. Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers
US7190387B2 (en) 2003-09-11 2007-03-13 Bright View Technologies, Inc. Systems for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam
WO2005036216A3 (en) * 2003-09-11 2005-07-28 Bright View Technologies Inc Systems and methods for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam
JP2007507725A (en) * 2003-09-11 2007-03-29 ブライト・ヴュー・テクノロジーズ，インコーポレイテッド System and method for forming optical microstructures using a cylindrical platform and a raster scanned radiation beam
US7425407B1 (en) 2003-09-11 2008-09-16 Bright View Technologies, Inc. Methods for fabricating optical microstructures by imaging a radiation sensitive layer sandwiched between outer layers
US7763417B2 (en) 2003-09-11 2010-07-27 Tredegar Newco, Inc. Methods for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam
US7867695B2 (en) 2003-09-11 2011-01-11 Bright View Technologies Corporation Methods for mastering microstructures through a substrate using negative photoresist
US8263318B2 (en) 2003-09-11 2012-09-11 Bright View Technologies Corporation Methods for mastering microstructures through a substrate using negative photoresist
DE102007047663A1 (en) * 2007-06-12 2008-12-24 Industrial Technology Research Institute Method and apparatus for producing periodic patterns by interference lithography by stepwise alignment
US8233136B2 (en) 2007-06-12 2012-07-31 Industrial Technology Research Institute Method and apparatus for generating periodic patterns by step-and-align interference lithography
US8420305B2 (en) 2007-06-12 2013-04-16 Industrial Technology Research Institute Method and apparatus for generating periodic patterns by step-and-align interference lithography
JP2009015216A (en) * 2007-07-09 2009-01-22 Konica Minolta Holdings Inc Method and device for forming interference fringe pattern
JP2013064956A (en) * 2011-09-20 2013-04-11 Toshiba Corp Hologram production method and production apparatus

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