JPS60152650U - Pasting base material - Google Patents

Pasting base material

Info

Publication number
JPS60152650U
JPS60152650U JP3780584U JP3780584U JPS60152650U JP S60152650 U JPS60152650 U JP S60152650U JP 3780584 U JP3780584 U JP 3780584U JP 3780584 U JP3780584 U JP 3780584U JP S60152650 U JPS60152650 U JP S60152650U
Authority
JP
Japan
Prior art keywords
base material
pasting base
seal
view
pasting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3780584U
Other languages
Japanese (ja)
Inventor
新川 安男
Original Assignee
大松化学工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大松化学工業株式会社 filed Critical 大松化学工業株式会社
Priority to JP3780584U priority Critical patent/JPS60152650U/en
Publication of JPS60152650U publication Critical patent/JPS60152650U/en
Pending legal-status Critical Current

Links

Landscapes

  • Adhesive Tapes (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

−第1図は従来の貼着用基材を用いたシールが湾曲した
例を示す斜視図である。第2図はシールの変形の他の例
を示す斜視図である。第3図は切取用のミシン目を介し
て多数配列されたシールが湾曲した状態を示す斜視図で
ある。第4図はこの考案の一実施例としてのシールの斜
視図である。第5図は第4図の線■−■における断面図
である。 第6図は第4図のシールの裏面図である。第7図は切目
の他の例を示すシールの裏面図である。第8図は第4図
ないし第6図に示したシールを製造するためのシール製
造装置の概略正面図である。 図において、1,101はシール、2.102    
゛は基材、3,103は着剤層、4.4a、  104
は切目、5,105は印刷層、6,106は切取用のミ
シン目である。
- FIG. 1 is a perspective view showing an example of a curved seal using a conventional adhesive base material. FIG. 2 is a perspective view showing another example of deformation of the seal. FIG. 3 is a perspective view showing a state in which a large number of seals arranged through perforations for cutting are curved. FIG. 4 is a perspective view of a seal as an embodiment of this invention. FIG. 5 is a sectional view taken along line 1--2 in FIG. 4. FIG. 6 is a back view of the seal of FIG. 4. FIG. 7 is a back view of the seal showing another example of the cuts. FIG. 8 is a schematic front view of a seal manufacturing apparatus for manufacturing the seals shown in FIGS. 4 to 6. FIG. In the figure, 1,101 is a seal, 2.102
゛ is the base material, 3,103 is the adhesive layer, 4.4a, 104
5, 105 is a printing layer, and 6, 106 is a perforation for cutting.

Claims (1)

【実用新案登録請求の範囲】 基材の主面に接着剤層が形成された貼着用基材において
、 前記接着剤層に切目を形成したことを特徴とする、貼着
用基材。
[Claims for Utility Model Registration] A pasting base material having an adhesive layer formed on the main surface of the base material, characterized in that cuts are formed in the adhesive layer.
JP3780584U 1984-03-15 1984-03-15 Pasting base material Pending JPS60152650U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3780584U JPS60152650U (en) 1984-03-15 1984-03-15 Pasting base material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3780584U JPS60152650U (en) 1984-03-15 1984-03-15 Pasting base material

Publications (1)

Publication Number Publication Date
JPS60152650U true JPS60152650U (en) 1985-10-11

Family

ID=30544227

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3780584U Pending JPS60152650U (en) 1984-03-15 1984-03-15 Pasting base material

Country Status (1)

Country Link
JP (1) JPS60152650U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5211323A (en) * 1975-07-16 1977-01-28 Nippon Denso Co Ltd Change valve of secondary air

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5211323A (en) * 1975-07-16 1977-01-28 Nippon Denso Co Ltd Change valve of secondary air

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