JPS60150605A - Thin film permanent magnet - Google Patents

Thin film permanent magnet

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Publication number
JPS60150605A
JPS60150605A JP558884A JP558884A JPS60150605A JP S60150605 A JPS60150605 A JP S60150605A JP 558884 A JP558884 A JP 558884A JP 558884 A JP558884 A JP 558884A JP S60150605 A JPS60150605 A JP S60150605A
Authority
JP
Japan
Prior art keywords
thin film
permanent magnet
added
desirable
film permanent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP558884A
Other languages
Japanese (ja)
Inventor
Masahiro Kitada
北田 正弘
Hideo Tanabe
英男 田辺
Hiroshi Tsuchiya
洋 土屋
Masahide Suenaga
末永 雅英
Noboru Shimizu
昇 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP558884A priority Critical patent/JPS60150605A/en
Publication of JPS60150605A publication Critical patent/JPS60150605A/en
Pending legal-status Critical Current

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  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To obtain the Co-Pt thin film permanent magnet of excellent corrosion- resisting property by a method wherein the ratio of components and composition of Pt, Rh and Co is specifically provided. CONSTITUTION:Rh of 2-10% (0.3-8% is more desirable, and 0.3-65 is much more desirable) is added to the Co-Pt alloy thin film containing 5-35atom% of Pt and consisting of Co for the remainder. The corrosion-resisting property of the permanent magnet is remarkably improved with the quantity of added Rh of 0.2atom%, and when the quantity of added Rh is increased to 10% or above, the saturated magnetic flux density coersive force of the alloy thin film is lowered remarkably. Besides, when the permanent magnet is formed by performing a sputtering method, the degree of vacuum before sputtering is to be set at 5X10<-7>-10<-4>Torr in order to obtain a thin film permanent magnet having a high coersive force. Also, the thin film permanent magnet equal to the above can be obtained by performing a vacuum evaporating method. Also, it is desirable that the thin film permanent magnet having the above-mentioned composition will have the film thickness of 100-2,500Angstrom , and the film thicker or thinner than the above is undesirable because the coersive force thereof will be lowered.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は薄膜永久磁石に係り、特に磁気ディスク、磁気
抵抗素子に最適な耐食性の高いに#永久磁石に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a thin film permanent magnet, and particularly to a highly corrosion-resistant permanent magnet suitable for magnetic disks and magnetoresistive elements.

〔発明の背氷〕[Background of invention]

バルク状のCo−Pt糸磁石では原子チで50−のPt
2含み(以下、饅は原子%’に示すものとする)、残余
Coからなる磁石が知られている。
In a bulk Co-Pt thread magnet, 50-Pt atoms are
Magnets containing Co (hereinafter referred to as atomic %) with a residual Co content are known.

(金編データブック、P−199,日本金槁学会編、丸
善発行)。これは、通常1000〜1200Cで均質化
焼鈍した後、600〜850Cで焼き戻して規則相紫形
成し、保磁カケ増大させる。しかし、バルク状では磁気
ディスク等には使用できない。上記Co−50%Pt曾
釡を蒸着等の方法で適当な基板上に形成すれは薄膜が得
られるが、上述のように高温での熱処理が必要であり、
基板の耐熱性、基板と当該薄膜との反応などの問題があ
り、実際には使用できない。
(Kinhen Data Book, P-199, edited by Japan Kinkei Society, published by Maruzen). This is usually done by homogenizing annealing at 1000-1200C and then tempering at 600-850C to form a regular phase purple and increase coercive chipping. However, in bulk form, it cannot be used for magnetic disks, etc. A thin film can be obtained by forming the above Co-50% Pt pot on a suitable substrate by a method such as vapor deposition, but as mentioned above, heat treatment at high temperature is required.
It cannot be used in practice because of problems such as the heat resistance of the substrate and the reaction between the substrate and the thin film.

〔発明の目的〕[Purpose of the invention]

バルク状のCo−50%ptに代るCo−Pt薄膜とし
てめっきあるいはスパッタしたC0−Pi博膜が知られ
ており、この場合には、バルク組成とは異なり5〜35
原子チのPt2含む台金薄膜で保磁力が最大値?示す。
A plated or sputtered CO-Pi thin film is known as a Co-Pt thin film to replace bulk Co-50% pt.
Is the coercive force at its maximum value in a base metal thin film containing atomic Pt2? show.

しかし、この組成のCo−Pt薄膜は耐食性が他の磁性
薄膜、例えばパーマロイなどより劣り、磁性デバイスに
応用する場合には耐食性の向上が必要である。本発明の
目的は耐食性の良好なco−Pt系薄膜永久磁石?提供
することにある。
However, the corrosion resistance of a Co--Pt thin film with this composition is inferior to that of other magnetic thin films such as permalloy, and it is necessary to improve the corrosion resistance when applied to magnetic devices. Is the purpose of the present invention a co-Pt thin film permanent magnet with good corrosion resistance? It is about providing.

〔発明の概要〕[Summary of the invention]

本発明においては、スパッタ、蒸着等の方法で形成する
Pt15〜35a子係含み、残余CoからなるCo−P
t合金薄)換に、第3元素としてRh ?50.2−1
0%z、1好しくは0.3〜8%、もつとも好1しくは
0.3〜6%添加することにより、Co−P12元糸薄
膜の耐良性k −足の耐賞性試嵌の未トド下で評価して
、劇食性寿命時間を約1桁以上増大させたものである。
In the present invention, Co--P consisting of Pt15 to 35a particles formed by sputtering, vapor deposition, etc., and the remaining Co
t alloy thin), Rh? 50.2-1
By adding 0%z, preferably 0.3 to 8%, most preferably 0.3 to 6%, the good resistance of the Co-P12 yarn thin film. When evaluated under non-steller conditions, the lifespan of phagocytosis was increased by about one order of magnitude or more.

Rbの添加蓋は0.2& 原子チで顧者VCなる。豫り添加量がlυ%以上医なる
と自販合金薄膜の飽和磁束密度保磁力の低下が著しくな
るので、Rhの添加量は0.2〜10%が象牙しい。さ
らに、スパッタ法で形成する場合、スバンタ前の真空度
を5XIO−’〜l O−’Torrとすることにより
高保磁力の薄膜永久磁石が得られる。更にJ4空蒸庸法
によっても同等の薄膜永久磁石ケ得ることができる。ま
た、上記組#、奮有する薄膜永久磁石は100〜250
0人(より好ましくは100〜2000人)の膜厚とす
ることが望1しく、膜厚か上記範囲より厚くても薄くて
も1専膜の保磁力が低下し好ましくない。
The Rb addition cap is 0.2 & atomic chi and customer VC. If the amount of Rh added exceeds lυ%, the saturation magnetic flux density coercive force of the commercially available alloy thin film will drop significantly, so it is recommended that the amount of Rh added be 0.2 to 10%. Furthermore, when forming by sputtering, a thin film permanent magnet with a high coercive force can be obtained by setting the degree of vacuum before the svanter to 5XIO-' to lO-'Torr. Furthermore, an equivalent thin film permanent magnet can also be obtained by the J4 air evaporation method. In addition, the above set # has a thin film permanent magnet of 100 to 250
It is desirable to have a film thickness of 0 (more preferably 100 to 2000).If the film thickness is thicker or thinner than the above range, the coercive force of the single film will decrease, which is not preferable.

以下、本発明を実施例を参照して評細に説明する。Hereinafter, the present invention will be described in detail with reference to Examples.

〔発明の実施例〕[Embodiments of the invention]

実施例 l 第1図にPt15〜35%含むCo −P を合金ケベ
ースにしてRh2添加した薄膜(スパッタ法により製作
、厚さ800A)の表面鵜食が生ずるまでの時間會示す
。このときの腐艮試験条件は湿度90%、謳匿80Cの
雰囲気である。第1図から明らかなように、何れの組成
の合金でもRh(zo、2%姫加すると表面腐食発生時
間が着しく長くなり、耐食性の向上効果が顕著に表われ
る。几すの冷加皺iio%までとしたC o −P t
 −Rh糸付金薄膜について腐艮試峡を実施したが、約
0.2%Rhで急激に耐食性が改善され、0.3%ルh
以後は、10チRh捷で耐食性はほとんど変化ない。
Example 1 Figure 1 shows the time required for surface erosion to occur in a thin film (manufactured by sputtering, thickness 800A) in which Rh2 was added using Co--P containing 15 to 35% Pt as an alloy base. The corrosion test conditions at this time were an atmosphere of 90% humidity and 80C. As is clear from Fig. 1, when 2% Rh(zo) is added to the alloy of any composition, the time for surface corrosion to occur becomes significantly longer, and the effect of improving corrosion resistance becomes noticeable. Co-Pt up to iio%
- Corrosion test was carried out on the gold thin film with Rh thread, and the corrosion resistance was rapidly improved at about 0.2% Rh, and at 0.3% Rh.
Thereafter, the corrosion resistance hardly changed after 10 inches of Rh cutting.

以上の実施例から明らかなように、Rhの耐食性向上の
効果は極めて著しい。第2図はR,b+7)N’を加に
よるCo−Pt合金薄膜の保磁力とRb曜加量との関係
で、co−20%Piベースの例葡示す。
As is clear from the above examples, the effect of Rh on improving corrosion resistance is extremely significant. FIG. 2 shows the relationship between the coercive force of a Co-Pt alloy thin film and the Rb coercivity due to the addition of R,b+7)N' for a co-20% Pi based example.

第2図から明らかaLうに、R,h65加鼠がlOチ以
上になると保磁力の劣化が顕渚となる。したがって、R
hの添加量は10%が上限であり、よシ好ましくは8%
以下、もつとも好ましくは6チ以下でめる。上述のCo
−Pt−4th系薄膜磁石は、Rhi添加しないGo−
Pt糸縛膜磁石と同様に保磁力が膜厚依存性を示し、第
3図で示すように100〜2500人の間では膜厚の増
加とともに保磁力は徐々に低下するが、2500A以上
になると低下蓋が非常に大きくなる。したがって、CO
−P t −Rh ;f、&全4%においても2500
Å以下の膜厚が望ましく、2000A以下であればさら
に望筐しい。また、100Å以下になると膜が不連続に
なシ保修力の低下が着しい。したがって、j膜厚が10
0〜2500人であることが望ブしいが、5i02薄膜
などの非晶質膜?介して多層に4x層すれば、保磁力の
低下ケ防ぐことができる。
As is clear from FIG. 2, when R, h65 addition exceeds 10, the deterioration of coercive force becomes obvious. Therefore, R
The upper limit of the amount of h added is 10%, preferably 8%.
Below, it is preferably 6 inches or less. The above Co
-Pt-4th based thin film magnet is Go-
Like the Pt thread-bound film magnet, the coercive force shows film thickness dependence, and as shown in Figure 3, the coercive force gradually decreases as the film thickness increases between 100 and 2,500 people, but when it exceeds 2,500 A, the coercive force shows film thickness dependence. The lowered lid becomes very large. Therefore, CO
-P t -Rh ; f, & 2500 even at 4% of total
A film thickness of Å or less is desirable, and a film thickness of 2000A or less is even more desirable. Furthermore, if the thickness is less than 100 Å, the film becomes discontinuous and the maintenance ability deteriorates. Therefore, if j film thickness is 10
It is desirable that the number is 0 to 2500, but is it possible to use an amorphous film such as 5i02 thin film? If 4x layers are formed with a layer in between, a decrease in coercive force can be prevented.

〔発明の効果〕〔Effect of the invention〕

5〜35%のptならびに0.2〜10%の几りを含有
するC0合金からなる薄膜永久磁石は、保磁力が大で且
つ耐食性もすぐれている。
A thin film permanent magnet made of a C0 alloy containing 5 to 35% PT and 0.2 to 10% slag has a large coercive force and excellent corrosion resistance.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はCo−Pt−Rh博換磁石の耐食性に及はすF
Lh添加添加効果盆示すグラフ、第2図はCo −P 
t −Rh薄膜磁石の保磁力とR,h量との関係を示す
グラフ、第3図はCo −P t −Rh薄膜磁石の保
磁力と膜厚との関係會示すグラフである。 第1図 ■ 2 図 Rkネη01源謬り 第 3 図 万莫ノの1 (A)
Figure 1 shows the corrosion resistance of Co-Pt-Rh exchanging magnets.
Graph showing the effect of Lh addition, Figure 2 is Co-P
FIG. 3 is a graph showing the relationship between the coercive force and the amount of R and h of a t-Rh thin film magnet. FIG. 3 is a graph showing the relationship between the coercive force and film thickness of a Co-P t -Rh thin film magnet. Figure 1■ 2 Figure Rkneη01 source falsification Figure 3 1 of 10,000 (A)

Claims (1)

【特許請求の範囲】 tPtを原子チで5〜35%、Rhを原子チで0.2〜
lO%宮与、残余coからなる薄膜永久磁石。 2.100〜2500人の膜厚葡有すること葡特徴とす
る特許請求の範囲第1項記載の薄膜永久磁石。
[Claims] tPt is 5 to 35% in terms of atoms, Rh is 0.2 to 35% in terms of atoms.
A thin film permanent magnet consisting of 10% Miyayo and the remainder co. 2. The thin film permanent magnet according to claim 1, having a film thickness of 100 to 2,500 people.
JP558884A 1984-01-18 1984-01-18 Thin film permanent magnet Pending JPS60150605A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP558884A JPS60150605A (en) 1984-01-18 1984-01-18 Thin film permanent magnet

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP558884A JPS60150605A (en) 1984-01-18 1984-01-18 Thin film permanent magnet

Publications (1)

Publication Number Publication Date
JPS60150605A true JPS60150605A (en) 1985-08-08

Family

ID=11615398

Family Applications (1)

Application Number Title Priority Date Filing Date
JP558884A Pending JPS60150605A (en) 1984-01-18 1984-01-18 Thin film permanent magnet

Country Status (1)

Country Link
JP (1) JPS60150605A (en)

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