JPS60143772U - Thin film manufacturing equipment - Google Patents

Thin film manufacturing equipment

Info

Publication number
JPS60143772U
JPS60143772U JP3214584U JP3214584U JPS60143772U JP S60143772 U JPS60143772 U JP S60143772U JP 3214584 U JP3214584 U JP 3214584U JP 3214584 U JP3214584 U JP 3214584U JP S60143772 U JPS60143772 U JP S60143772U
Authority
JP
Japan
Prior art keywords
thin film
film manufacturing
manufacturing equipment
laser light
reflective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3214584U
Other languages
Japanese (ja)
Inventor
真司 前川
Original Assignee
シャープ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by シャープ株式会社 filed Critical シャープ株式会社
Priority to JP3214584U priority Critical patent/JPS60143772U/en
Publication of JPS60143772U publication Critical patent/JPS60143772U/en
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案による一実施例を示す模型図、第2図は
レーザ光の強度分布図、第3図は同実施例の要部拡大図
、第4図は第3図に示す要部のレニザ光強度分布の模式
図、第5図は同実施例の動作説明図である。
Fig. 1 is a model diagram showing an embodiment of the present invention, Fig. 2 is a laser beam intensity distribution diagram, Fig. 3 is an enlarged view of the main part of the same embodiment, and Fig. 4 is the main part shown in Fig. 3. FIG. 5 is a schematic diagram of the lens laser light intensity distribution, and FIG. 5 is an explanatory diagram of the operation of the same embodiment.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 非単結晶薄膜にレーザ光を照射して再結晶化するための
装置において、レーザ光の光路上にレーザ光を非単結晶
薄膜に方向付けるミラを配置し、該ミラは背面側に反射
面が形成され、入射面側に透明領域を残して一部にのる
反射膜が形成されてなり、透明領域と反射膜との境界番
、こ跨ってレーザ光を照射して双峰型レーザ光を形成す
ることを特徴とする薄膜製造装置。
In an apparatus for recrystallizing a non-single-crystal thin film by irradiating it with laser light, a mirror is placed on the optical path of the laser light to direct the laser light toward the non-single-crystal thin film, and the mirror has a reflective surface on the back side. A reflective film is formed, leaving a transparent area on the incident surface side, and a reflective film is formed on a part of the surface, and the laser beam is irradiated across the boundary between the transparent area and the reflective film to generate a bimodal laser beam. A thin film manufacturing device characterized by forming a thin film.
JP3214584U 1984-03-05 1984-03-05 Thin film manufacturing equipment Pending JPS60143772U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3214584U JPS60143772U (en) 1984-03-05 1984-03-05 Thin film manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3214584U JPS60143772U (en) 1984-03-05 1984-03-05 Thin film manufacturing equipment

Publications (1)

Publication Number Publication Date
JPS60143772U true JPS60143772U (en) 1985-09-24

Family

ID=30533386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3214584U Pending JPS60143772U (en) 1984-03-05 1984-03-05 Thin film manufacturing equipment

Country Status (1)

Country Link
JP (1) JPS60143772U (en)

Similar Documents

Publication Publication Date Title
JPS60143772U (en) Thin film manufacturing equipment
JPS5810404U (en) Laser irradiation device
JPS60143773U (en) Thin film manufacturing equipment
JPS63157737U (en)
JPS5999434U (en) Laser heat treatment equipment
JPS6040034U (en) Optical information recording or reproducing device
JPS6052083U (en) Laser device
JPH0231277Y2 (en)
JPS5828854U (en) Slit exposure type copying machine exposure device
JPS5920986U (en) Laser processing optical system
JPS6054105U (en) optical fiber array
JPS5836716U (en) Optical path adjustment device
JPH0377901U (en)
JPS59116916U (en) Laser light transmission equipment
JPH01165185U (en)
JPS58127648U (en) lighting equipment
JPS5864306U (en) Optical field display device for X-ray flux intersection device
JPS59189637U (en) reflective projector
JPS5989431U (en) optical recording medium
JPS5893064U (en) Structure of reading illumination section of image information reading device
JPS61185567U (en)
JPS6038687U (en) Laser processing equipment
JPS6030458U (en) hologram exposure equipment
JPS5847827U (en) data imprint device
JPS6074872U (en) Laser processing optical device