JPS60143771U - Substrate holder for sputtering - Google Patents
Substrate holder for sputteringInfo
- Publication number
- JPS60143771U JPS60143771U JP3115584U JP3115584U JPS60143771U JP S60143771 U JPS60143771 U JP S60143771U JP 3115584 U JP3115584 U JP 3115584U JP 3115584 U JP3115584 U JP 3115584U JP S60143771 U JPS60143771 U JP S60143771U
- Authority
- JP
- Japan
- Prior art keywords
- sputtering
- substrate holder
- target
- sputtered
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来のスパッタ用基板ホルダの平面図、第２図
はスパッタ膜の形成工程の説明図、第３図は本考案に係
るスパッタ用基板ホルダの断面図、第４図はスパッタ粒
子の膜の剥離の説明図である。 ・
１で・スパッタ用基板ホルダ、１ａ・・・窓、２・・・
基板、３・・・ターゲット、４・・・膜、５・・・金属
膜。Fig. 1 is a plan view of a conventional sputtering substrate holder, Fig. 2 is an explanatory diagram of the sputtering film forming process, Fig. 3 is a cross-sectional view of the sputtering substrate holder according to the present invention, and Fig. 4 is a diagram of sputtered particles. FIG. 3 is an explanatory diagram of peeling of a film.・In 1・Substrate holder for sputtering, 1a...Window, 2...
Substrate, 3...Target, 4...Membrane, 5...Metal film.
Claims (1)
なくともスパッタ膜形成面がスパッタ粒子が飛び出すタ
ーゲットに対して開口しているスパッタ用基板ホルダに
おいて、上記ターゲットに対向する側の面に酸もしくは
アルカリでエツチングされる金属膜が積層されているこ
とを特徴とするスパッタ用基板ホルダ。In a sputtering substrate holder loaded with a substrate on which a sputtered film is to be formed, at least the surface on which the sputtered film is formed is open to the target from which the sputtered particles fly out, the surface facing the target is coated with acid or alkali. A substrate holder for sputtering, characterized in that a metal film that is etched is laminated thereon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3115584U JPS60143771U (en) | 1984-03-03 | 1984-03-03 | Substrate holder for sputtering |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3115584U JPS60143771U (en) | 1984-03-03 | 1984-03-03 | Substrate holder for sputtering |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS60143771U true JPS60143771U (en) | 1985-09-24 |
Family
ID=30531502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3115584U Pending JPS60143771U (en) | 1984-03-03 | 1984-03-03 | Substrate holder for sputtering |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60143771U (en) |
-
1984
- 1984-03-03 JP JP3115584U patent/JPS60143771U/en active Pending
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