JPS60141296U - Polishing patterning device - Google Patents
Polishing patterning deviceInfo
- Publication number
- JPS60141296U JPS60141296U JP518285U JP518285U JPS60141296U JP S60141296 U JPS60141296 U JP S60141296U JP 518285 U JP518285 U JP 518285U JP 518285 U JP518285 U JP 518285U JP S60141296 U JPS60141296 U JP S60141296U
- Authority
- JP
- Japan
- Prior art keywords
- polished
- substrate
- base material
- rotating shaft
- abrasive cloth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は本考案装置の正面図、第2図は本考案、装置の
一部切欠き平面図、第3図は本考案装置の一部破断側面
図、第4図は、本考案装置の第°3図におけるA−A’
側断面図を示す。Figure 1 is a front view of the device of the present invention, Figure 2 is a partially cutaway plan view of the device of the present invention, Figure 3 is a partially cutaway side view of the device of the present invention, and Figure 4 is a diagram of the device of the present invention. A-A' in Figure 3
A side sectional view is shown.
Claims (1)
基材の移送通路上へ各々が独立して回転する回転軸21
を所定間隔に一列に配備し、下端に各々研摩布22を有
する模様付は機構と、該模様付は機構の各回転軸21を
一本のチェーン35により一斉に回転せしめるようにし
た駆動機構と、前記模様付は機構の各研摩布22を被研
摩基材の通路上へ出没せしめうる昇降機構と、前記模様
付は機構が下降する際に、研摩布22と被研摩基材が衝
撃的に接触しないようにダンパー52を設けた緩衝機構
と、基台に固定された駆動装置62とこれにより前記間
欠送り機構の作動毎に被研摩基材を横方向に一定距離だ
け往復移行せしめられる被研摩基材保持枠65を備えた
横振り機構とから成る研摩模様付は装置。 。An intermittent feeding mechanism that intermittently transports the base material to be polished, and a rotating shaft 21 that rotates independently onto the transport path for the base material to be polished.
are arranged in a line at predetermined intervals, each having an abrasive cloth 22 at its lower end, and a drive mechanism in which each rotating shaft 21 of the patterned mechanism is rotated at the same time by a single chain 35. , the patterned structure includes an elevating mechanism that allows each abrasive cloth 22 of the mechanism to emerge and retract onto the path of the substrate to be polished; A buffer mechanism provided with a damper 52 to prevent contact, a drive device 62 fixed to a base, and a substrate to be polished that reciprocates the substrate to be polished by a fixed distance in the lateral direction each time the intermittent feed mechanism is operated. A device with an abrasive pattern consisting of a horizontal swinging mechanism equipped with a base material holding frame 65. .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP518285U JPS60141296U (en) | 1985-01-17 | 1985-01-17 | Polishing patterning device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP518285U JPS60141296U (en) | 1985-01-17 | 1985-01-17 | Polishing patterning device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60141296U true JPS60141296U (en) | 1985-09-19 |
JPS6237760Y2 JPS6237760Y2 (en) | 1987-09-26 |
Family
ID=30481452
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP518285U Granted JPS60141296U (en) | 1985-01-17 | 1985-01-17 | Polishing patterning device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60141296U (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111421988B (en) * | 2020-04-28 | 2020-11-17 | 中电建成都铁塔有限公司 | Integrated tubular part character pressing and polishing machine and method |
-
1985
- 1985-01-17 JP JP518285U patent/JPS60141296U/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6237760Y2 (en) | 1987-09-26 |
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