JPS60140758U - 真空作業装置 - Google Patents

真空作業装置

Info

Publication number
JPS60140758U
JPS60140758U JP2817184U JP2817184U JPS60140758U JP S60140758 U JPS60140758 U JP S60140758U JP 2817184 U JP2817184 U JP 2817184U JP 2817184 U JP2817184 U JP 2817184U JP S60140758 U JPS60140758 U JP S60140758U
Authority
JP
Japan
Prior art keywords
work equipment
vacuum work
vacuum
vacuum working
cryopump
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2817184U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6328203Y2 (enrdf_load_stackoverflow
Inventor
那須　友之進
Original Assignee
関西日本電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 関西日本電気株式会社 filed Critical 関西日本電気株式会社
Priority to JP2817184U priority Critical patent/JPS60140758U/ja
Publication of JPS60140758U publication Critical patent/JPS60140758U/ja
Application granted granted Critical
Publication of JPS6328203Y2 publication Critical patent/JPS6328203Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP2817184U 1984-02-27 1984-02-27 真空作業装置 Granted JPS60140758U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2817184U JPS60140758U (ja) 1984-02-27 1984-02-27 真空作業装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2817184U JPS60140758U (ja) 1984-02-27 1984-02-27 真空作業装置

Publications (2)

Publication Number Publication Date
JPS60140758U true JPS60140758U (ja) 1985-09-18
JPS6328203Y2 JPS6328203Y2 (enrdf_load_stackoverflow) 1988-07-29

Family

ID=30525807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2817184U Granted JPS60140758U (ja) 1984-02-27 1984-02-27 真空作業装置

Country Status (1)

Country Link
JP (1) JPS60140758U (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002015998A (ja) * 2000-02-24 2002-01-18 Applied Materials Inc 半導体ウェーハ処理チャンバーから装置をシールドするための方法及び装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002015998A (ja) * 2000-02-24 2002-01-18 Applied Materials Inc 半導体ウェーハ処理チャンバーから装置をシールドするための方法及び装置

Also Published As

Publication number Publication date
JPS6328203Y2 (enrdf_load_stackoverflow) 1988-07-29

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