JPS6012950B2 - plotting film - Google Patents
plotting filmInfo
- Publication number
- JPS6012950B2 JPS6012950B2 JP51064302A JP6430276A JPS6012950B2 JP S6012950 B2 JPS6012950 B2 JP S6012950B2 JP 51064302 A JP51064302 A JP 51064302A JP 6430276 A JP6430276 A JP 6430276A JP S6012950 B2 JPS6012950 B2 JP S6012950B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- plotting
- absorber
- film
- tin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Duplication Or Marking (AREA)
- Illuminated Signs And Luminous Advertising (AREA)
- Traffic Control Systems (AREA)
Description
【発明の詳細な説明】
本発明はプロッティング・フィルムに用いられる薄膜に
関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to thin films used in plotting films.
近年、宇宙開発費制システム、航空機連行管制システム
、又は地上交通管制システム等にプロッティング・プロ
ジェクション・システムが広く用いられるようになって
きた。In recent years, plotting projection systems have come to be widely used in space development expense control systems, aircraft entrainment control systems, ground traffic control systems, and the like.
このプロツテイング・プロジェクション・システムの概
略図を第１図に示す。・第１図において１は光源、２は
光源からの光東をコリメートするレンズ、３はプロツテ
イング・フィルムを用いたプロッテイング・スライド、
４は投影光学系、５はスクリーン、６はコンピューター
等の情報処理装置、７はプロツティング針駆動装置、８
はダイヤモンド等のプロッティング針である。A schematic diagram of this projecting projection system is shown in FIG.・In Figure 1, 1 is a light source, 2 is a lens that collimates the light emitted from the light source, 3 is a plotting slide using a plotting film,
4 is a projection optical system, 5 is a screen, 6 is an information processing device such as a computer, 7 is a plotting needle drive device, 8
is a plotting needle for diamonds, etc.
プロツテイング・スライド３は、ガラス等の透明基体９
上に薄膜１０が設けられたもので、光源１からの光東は
この薄膜１０‘こより投影光学系４に入射するのをさま
たげられている。この薄膜１０１こ上記プロッティング
針が接触していて、情報処理装置６からの信号で作動す
るプロッティング針駆動装置７で駆動されるプロッティ
ング針８の軌跡通りに上記薄膜１０はけずり取られてい
く。このけずり取これた部分は光源１からの光東が伝わ
ることができるので、スクリーン上には、このプロツテ
イング針の軌跡が投影される。プロッティング・スライ
ドの薄膜１川ま、光源１からの熱線波長の光東に対して
反射が高くプロッティング・スライド自体を熱から防護
できるこひと、又プロッティング針８の軽い針圧で完全
に線を記入できる事が必要である。この条件を備えた薄
膜としては光吸収性物質則ち吸収体を蒸着した膜が適し
ている。本明細書に於いては諸々の条件を考慮し、吸収
体とはその消衰係数が０．３以上の夕ものを指すもので
ある。ところが、薄膜１０に吸収体を用いた場合には、
その表面の反射率は高くなる傾向があり、薄膜１０‘こ
切欠き部を通過した光東で、投影光学系４のレンズ表面
で反射された後に薄膜１０の表面０で再度反射され、投
影光学系４に通過しスクリーン５上に到達する光東はゴ
ーストとなって現われる。The plotting slide 3 is made of a transparent substrate 9 such as glass.
A thin film 10 is provided thereon, and the light emitted from the light source 1 is prevented from entering the projection optical system 4 through this thin film 10'. The plotting needle is in contact with this thin film 101, and the thin film 10 is scraped off along the trajectory of the plotting needle 8 driven by the plotting needle drive device 7 which is activated by a signal from the information processing device 6. go. Since the light emitted from the light source 1 can be transmitted through this scraped portion, the locus of this plotting needle is projected onto the screen. The thin film of the plotting slide has a high reflection of the heat ray wavelength from the light source 1 and can protect the plotting slide itself from heat, and the light needle pressure of the plotting needle 8 completely protects the plotting slide from heat. It is necessary to be able to draw lines. A film in which a light-absorbing substance, ie, an absorber, is vapor-deposited is suitable as a thin film meeting this condition. In this specification, considering various conditions, an absorber refers to an absorber whose extinction coefficient is 0.3 or more. However, when an absorber is used for the thin film 10,
The reflectance of the surface tends to be high, and the light that passes through the notch of the thin film 10' is reflected by the lens surface of the projection optical system 4 and then reflected again by the surface 0 of the thin film 10, and the projection optical system Koto, who passes through system 4 and reaches screen 5, appears as a ghost.
このゴーストを除去する方法としては、投影光学系４の
レンズ面に反射防止膜を施こす以外に薄膜１０上に反射
防止膜を設ける必要がある。タ この吸収体蒸着膜又は
スパッタ膜の表面反射を減少させる方法としては、従来
から塗料を吸収体表面に塗布する方法がある。しかし一
般に自然乾操型塗料は熱に弱く、光源からの熱線により
変色し、反射防止の効果を失ってしまう。更に、この方
法に於いては、吸収体の薄膜を蒸着又はスパッタ後、槽
からスライドを取り出し塗布する工程を追加しなければ
ならなく煩雑である。In order to remove this ghost, it is necessary to provide an anti-reflection film on the thin film 10 in addition to applying an anti-reflection film on the lens surface of the projection optical system 4. A conventional method for reducing the surface reflection of the absorber vapor-deposited film or sputtered film is to apply paint to the absorber surface. However, air-drying paints are generally sensitive to heat, change color due to heat rays from light sources, and lose their anti-reflection effect. Furthermore, this method is complicated because it requires an additional step of removing the slide from the tank and applying the absorber after depositing or sputtering the thin film of the absorber.
本発明は上記欠点を改良し、光源からの熱線に対しても
充分耐え、製造過程も容易な反射防止効果を有するプロ
ッティング・フィルムを提供するものである。The present invention improves the above-mentioned drawbacks and provides a plotting film having an antireflection effect that is sufficiently resistant to heat rays from a light source and is easy to manufacture.
Ｚ本発明に於いては書込み
効果の優れたブロツティング・フィルムを提供する為に
第２図に示す如くガラス等の透明基板９上に黍着する基
盤の吸収性物質として錫と銅の合金層１１を用いるもの
である。この錫と銅の合金はその重量比が銅１に対Ｚし
て錫が０．５から４の範囲にあたる場合特に書込み性に
優れるものである。上記錫と銅の合金である吸収体薄膜
１１の表面反射を防止する為に、本発明では該薄膜面を
吸収体の薄膜１２でコーティングしたものである。In the present invention, in order to provide a blotting film with excellent writing effect, as shown in FIG. 2, a tin-copper alloy layer 11 is used as a base absorbent material to be deposited on a transparent substrate 9 such as glass. is used. This alloy of tin and copper has particularly excellent writability when the weight ratio of tin is in the range of 0.5 to 4 to 1 Z of copper. In order to prevent surface reflection of the absorber thin film 11, which is an alloy of tin and copper, in the present invention, the thin film surface is coated with an absorber thin film 12.
このコーティング薄膜用に用いられる吸収体の薄膜とし
ては、クロムＣて、ゲルマニウムＣｅ、一酸化チタンＴ
ｉ○及び硫化ゲルマＱＳが書込み特性等を考慮すれば、
特に優れているものである。第１実施例
蒸着槽内を２×１０５Ｔｏｍまで排気し、錫と銅をその
重量比がＳｎ：Ｃｕ＝１：１の合金をモリブデンボート
で１５００Ａ〜３０００Ａの厚さに透明基板上に蒸着す
る。The absorber thin film used for this coating thin film includes chromium C, germanium Ce, and titanium monoxide T.
Considering the writing characteristics of i○ and germanium sulfide QS,
It is particularly excellent. FIRST EXAMPLE The interior of the vapor deposition tank was evacuated to 2×10 5 Tom, and an alloy of tin and copper having a weight ratio of Sn:Cu=1:1 was vapor-deposited on a transparent substrate to a thickness of 1500 to 3000 A using a molybdenum boat.
更に同一槽内で前記錫と銅の合金層上に電子銃又はタイ
ミングのコニカルバスケット３でクロムＣｒを３００Ａ
〜４００Ａの厚さに葵着した。第３図は波長４０印のか
ら７０仇肌の間の分光反射率を示す図で、縦軸に反射率
、機軸に波長が取られている。曲線３１は上記錫と銅の
合金薄膜の表面反射を示している。曲線３２は上記クロ
ムＣｒの薄膜をコーティングした場合の表面反射を示す
もので４０仇のから７０仇仇にかけて反射率を２０％以
下に押える事ができる。第２実施例
漆着構内を２×１０‐５Ｔｏｎまで排気し、錫と銅をそ
の重量比がＳｎ：Ｃｕ＝１：１の合金をモリブデンボー
トで１５００Ａ〜３０００Ａの厚さに透明基板上に蒸着
する。Furthermore, in the same tank, 300A of chromium Cr was applied onto the tin and copper alloy layer using an electron gun or a timing conical basket 3.
Aoi was deposited to a thickness of ~400A. Figure 3 is a diagram showing the spectral reflectance between the wavelength 40 mark and the 70 mark, with the reflectance plotted on the vertical axis and the wavelength plotted on the axis. A curve 31 shows the surface reflection of the tin-copper alloy thin film. Curve 32 shows the surface reflection when the thin film of chromium Cr is coated, and the reflectance can be suppressed to 20% or less from 40 to 70 degrees. Second Example: The lacquering chamber was evacuated to 2×10-5 tons, and an alloy of tin and copper with a weight ratio of Sn:Cu=1:1 was evaporated onto a transparent substrate to a thickness of 1500A to 3000A using a molybdenum boat. do.
更に同一槽内で前記錫と銅の合金層上にタングステンボ
ートでゲルマニウムＧｅを２００Ａ〜３００Ａの厚さに
蒸着した。第３図の曲線３３は錫と銅の合金薄膜をゲル
マニウムで被覆した場合の表面反射を示すもので、波長
４０血のから６０仇机にかけては反射率をほぼ１５％以
下に押える事ができる。第３実施例
蒸着槽内を２×１０‐５Ｔｏｍまで排気し、錫と銅をそ
の重量比がＳｎ：Ｃｕ＝１：１の合金をモリブデンボー
トで１５００Ａ〜３０００Ａの厚さ‘こ透明基体上に蒸
着する。Further, in the same tank, germanium Ge was evaporated to a thickness of 200A to 300A on the tin-copper alloy layer using a tungsten boat. Curve 33 in FIG. 3 shows the surface reflection when a tin-copper alloy thin film is coated with germanium, and the reflectance can be kept to approximately 15% or less at wavelengths from 40 to 60. Third Example The inside of the vapor deposition tank was evacuated to 2×10-5 Tom, and an alloy of tin and copper with a weight ratio of Sn:Cu=1:1 was deposited on a transparent substrate with a thickness of 1500 to 3000 A using a molybdenum boat. Deposit.
更に同一槽内で前記錫と銅の合金届上にタングステンボ
ートで一酸化チタンＴｉ０を４００Ａ〜６００Ａの厚さ
に蒸着した。第３図の曲線３４は錫と銅の合金薄膜を一
酸化チタンで被覆した場合の表面反射を示すもので、波
長４０血のから６０仇のにかけては反射率を１０％以下
に押える事ができる。以上、本発明のプロッティングフ
ィルムに於いては、錫と銅の合金の如き吸収体物質を透
明基板上に蒸着し、該吸収体薄膜の表面をこの吸収体物
質とは異なる吸収体物質で被覆することにより表面反射
率を減少させるものであり、反射防止効果を有し、書き
込み性且つ耐久性にも優れた特性を有するものである。Further, in the same tank, titanium monoxide Ti0 was vapor-deposited to a thickness of 400A to 600A on the tin-copper alloy using a tungsten boat. Curve 34 in Figure 3 shows the surface reflection when a tin-copper alloy thin film is coated with titanium monoxide, and the reflectance can be kept below 10% at wavelengths from 40 to 60. . As described above, in the plotting film of the present invention, an absorber material such as an alloy of tin and copper is deposited on a transparent substrate, and the surface of the absorber thin film is coated with an absorber material different from the absorber material. By doing so, it reduces the surface reflectance, has an antireflection effect, and has excellent writing properties and durability.
第１図はプロッテイングプロジェクションシステムの概
略を示す図、第２図は本発明に係るプロッティングフィ
ルムの構成を示す図、第３図は本発明に係るプロツティ
ングフィルムの分光反射率を示す図。
３……プロッティングスラィド、９・・・・・・透明基
板、１１，１２・・・・・・吸収性物質より成る薄膜。
秦’図第２図
菱５図FIG. 1 is a diagram showing the outline of a plotting projection system, FIG. 2 is a diagram showing the structure of a plotting film according to the present invention, and FIG. 3 is a diagram showing the spectral reflectance of the plotting film according to the present invention. . 3... Plotting slide, 9... Transparent substrate, 11, 12... Thin film made of absorbent material. Qin' Diagram 2 Diamond Diagram 5
Claims (1)
吸収体薄膜と、クロム、ゲルマニウム、一酸化チタンお
よび硫化ゲルマニウムのいずれかより成り、前記第１の
吸収体薄膜の表面反射を防止する第２の吸収体薄膜とか
ら構成される事を特徴とするプロツテイング・フイルム
。1. In order from the transparent substrate side, a first absorber thin film made of an alloy of tin and copper, and one of chromium, germanium, titanium monoxide, and germanium sulfide to prevent surface reflection of the first absorber thin film. 1. A plotting film comprising a second absorbent thin film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP51064302A JPS6012950B2 (en) | 1976-06-02 | 1976-06-02 | plotting film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP51064302A JPS6012950B2 (en) | 1976-06-02 | 1976-06-02 | plotting film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52147422A JPS52147422A (en) | 1977-12-07 |
| JPS6012950B2 true JPS6012950B2 (en) | 1985-04-04 |
Family
ID=13254309
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP51064302A Expired JPS6012950B2 (en) | 1976-06-02 | 1976-06-02 | plotting film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6012950B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60136650U (en) * | 1984-02-20 | 1985-09-10 | 有働 侑 | Roll bale shredding machine blade fixing pipe |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5660941U (en) * | 1979-10-18 | 1981-05-23 |
-
1976
- 1976-06-02 JP JP51064302A patent/JPS6012950B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60136650U (en) * | 1984-02-20 | 1985-09-10 | 有働 侑 | Roll bale shredding machine blade fixing pipe |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52147422A (en) | 1977-12-07 |
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