JPS60114739A - Grinding and corrosion of ti - Google Patents

Grinding and corrosion of ti

Info

Publication number
JPS60114739A
JPS60114739A JP22221683A JP22221683A JPS60114739A JP S60114739 A JPS60114739 A JP S60114739A JP 22221683 A JP22221683 A JP 22221683A JP 22221683 A JP22221683 A JP 22221683A JP S60114739 A JPS60114739 A JP S60114739A
Authority
JP
Japan
Prior art keywords
polishing
corrosion
fine
specimen
test piece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22221683A
Other languages
Japanese (ja)
Inventor
Hidetaka Hagiwara
萩原 英隆
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daido Steel Co Ltd
Original Assignee
Daido Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daido Steel Co Ltd filed Critical Daido Steel Co Ltd
Priority to JP22221683A priority Critical patent/JPS60114739A/en
Publication of JPS60114739A publication Critical patent/JPS60114739A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To enable the observation of structure with a microscope by a method wherein after ground, a titanium test piece undergoes a finish grinding emmersed into an aqueous solution of hydrogen fluoride and then, corroded in an aqueous solution of hydrogen fluoride and nitric acid. CONSTITUTION:Pure titanium is used as test piece and ground with an abrasive paper, then with a paste containing fine diamond grits (6mum) and finally with a fine grit grinding agent containing fine grits of alumina (0.06mum). Then, the test piece is emmersed into a liquid of 1cc of 47% hydrogen fluoride +10-20cc of water for several sec and then, undergoes a finish grinding with an alumina fine grit grinding agent. Then, the ground surface of the test piece is corroded in a liquid of 1cc of 47% hydrogen fluoride +12cc of 69% nitric acid +50-60cc of water. This makes the grain boundary look clear noticeably eliminating uneven corrosion.

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は、Ti(チタン)の顕微鏡組織を観察する際
の前処理として行われる研磨・腐食作業に適用されるT
iの研磨・腐食方法に関するものである。
Detailed Description of the Invention (Industrial Application Field) This invention is applied to polishing and corrosion work performed as a pretreatment when observing the microscopic structure of Ti (titanium).
This relates to the polishing and corrosion method of i.

(従来技術) 近年、軽量でかつ高強度Φ高耐食性の材料として、Ti
およびTi合金(以下、単にrTrJとする。)が注目
されており、特に宇宙航空機器分野あるいは化学装置分
野等においてTiの採用が増加している。
(Prior art) In recent years, Ti has been used as a lightweight, high-strength, high-corrosion-resistant material.
and Ti alloys (hereinafter simply referred to as rTrJ) are attracting attention, and the adoption of Ti is increasing particularly in the fields of aerospace equipment and chemical equipment.

このTiを採用するにあたっては、そのWJ微鏡組織を
観察する必要がしばしばあるが、この際、Tiの研磨・
腐食を行ったのち結晶粒界等の組織観察を行うことが多
い。
When using Ti, it is often necessary to observe the WJ microstructure, but at this time, polishing and
After corrosion is performed, microstructures such as grain boundaries are often observed.

従来、Tiの研磨・腐食に際しては、例えば、研磨工程
において、まず、Ti試片を粗い研磨紙(9120程度
)により研磨したのち順次細かい研磨紙(# 240→
400我度)により研磨し、次いでダイヤモンドペース
トで研磨したのち微粒研磨剤により研磨し、次に腐食工
程において[11F (IOC) +HNO3(12C
C) +H20(87cc)]液からなる腐食液を用い
て腐食を行い、その後組織観察に供するようにしていた
Conventionally, when polishing and corroding Ti, for example, in the polishing process, the Ti specimen was first polished with coarse abrasive paper (approximately 9120) and then sequentially polished with fine abrasive paper (#240 →
400 degrees), then polished with diamond paste, then polished with fine abrasive, and then in the corrosion process [11F (IOC) +HNO3 (12C
C) +H20 (87 cc)] Corrosion was performed using a corrosive solution, and the structure was then subjected to observation.

しかしながら、従来のTiの研磨φ腐食方法にあっては
、ωr磨後において研磨面に疵が多く発生したり、歪模
様が形成されたりしやすく、試験片として適さないもの
となることがあるという問題を有し、また、従来の腐食
方法では腐食面に皮膜が発生しやすく、検鏡面に腐食む
らを生じ′やすいため、その後の組織観察に多くの時間
がかかったり腐食組織が不鮮明であって組織観察が良好
に行えなかったりすることがあるという問題を有してい
た。
However, in the conventional polishing φ corrosion method for Ti, after ωr polishing, the polished surface tends to have many scratches and distortion patterns, which may make it unsuitable as a test piece. In addition, conventional corrosion methods tend to form a film on the corroded surface and cause uneven corrosion on the speculum surface, so it takes a lot of time to observe the structure afterwards and the corroded structure is unclear. There was a problem in that tissue observation could not be performed well in some cases.

(発明の目的) この発明は、上述した従来の間顕点に着目してなされた
もので、Ti試片の研磨後において研磨面に疵や歪模様
の発生がほとんどなく、また腐食後において腐食面に皮
膜や腐食むらの発生が少なく、Tiの組織a察を著しく
良好に行うことができるTiの研磨・腐食方法を提供す
ることを目的としている。
(Purpose of the Invention) This invention was made by focusing on the above-mentioned conventional spotting point, and there are almost no scratches or distortion patterns on the polished surface after polishing a Ti specimen, and there is no corrosion after corrosion. It is an object of the present invention to provide a method for polishing and corroding Ti, which reduces the occurrence of coatings and corrosion unevenness on the surface and allows for extremely good observation of the structure of Ti.

(発明の構成) この発明によるTiの研磨・腐食方法は、Ti試片を研
磨・腐食して組織観察に供するに際し。
(Structure of the Invention) The method for polishing and corroding Ti according to the present invention is for polishing and corroding a Ti specimen and providing it for microstructural observation.

前記Ti試片を微粒研磨剤により研磨した後、当該試片
な[HF + H20]液中に浸漬し次いで微粒研磨剤
により仕上研磨するか、もしくは[HF+Il、01液
を供給して洗浄しながら微粒研磨剤により仕上研磨し、
その後[HF−lHNO3+H,0]液中で腐食するよ
うにしたことを特徴としている。
After polishing the Ti specimen with a fine-grained abrasive, the specimen is immersed in a [HF + H20] solution and then finished polished with a fine-grained abrasive, or while being washed by supplying a [HF + Il, 01 solution] Finish polishing with fine abrasive,
It is characterized in that it is then corroded in a [HF-1HNO3+H,0] solution.

この発明におけるTiの研磨・腐食方法は、純Tiのみ
に限定されるものではなく、Ti合金も含まれることは
いうまでもない。
It goes without saying that the method for polishing and corroding Ti in this invention is not limited to pure Ti, but also includes Ti alloys.

そして、t)1j記Tiを所定の試片形状に形成したの
ち、得られたTi試片を適宜段階に分けて順次粗い研l
ff紙から細かい研磨紙に変えて研磨する。
t) After forming the Ti described in 1j into a predetermined specimen shape, the obtained Ti specimen is divided into appropriate stages and sequentially coarsely polished.
Change from ff paper to fine abrasive paper and polish.

次いで、ダイヤモンド粒(例えば4〜8pLm程度)’
:<Sの硬質粒子を含むベースト等からなる研Irt′
剤にJ:り研磨したのち、アルミナ(例えば、0.05
〜0.1ILm程度)微粒等の微粒子を含む微粒/ll
F磨剤により研磨し、次いで当該試片を口I F 4−
 E1201液中に浸漬したのち微粒研磨剤にJ:り仕
−に研磨するか、あるいは前記[HF+11.0]液を
供給しながら微粒研磨剤により仕]二研磨することによ
って研磨面を洗浄仕上研磨する。この[HF+H20J
液としては、 [(47%) HF (lcc) +H
20(10〜20cc) ]の成成分台のものを使用す
ることがより望ましい。
Next, diamond grains (for example, about 4 to 8 pLm)'
: <Irt' consisting of base material containing hard particles of S
After polishing with J: polishing agent, alumina (for example, 0.05
~0.1 ILm) fine particles/ll including fine particles such as fine particles
Polished with F abrasive, then the sample was polished with IF 4-
Clean and finish polish the polished surface by immersing it in E1201 liquid and then polishing with a fine abrasive, or by polishing with a fine abrasive while supplying the [HF+11.0] liquid. do. This [HF+H20J
As a liquid, [(47%) HF (lcc) +H
It is more desirable to use one with a component base of 20 (10 to 20 cc)].

すなわち、H2O量が多すぎる場合にはHF濃度が低下
して研磨面の浄化が行われがたくなり、H2O量か少な
すぎる場合はHF濃度が高くなりすぎて結晶粒界を不鮮
明にするおそれがあるためである。
That is, if the amount of H2O is too large, the HF concentration will decrease and it will be difficult to clean the polished surface, and if the amount of H2O is too small, the HF concentration will become too high and may make the grain boundaries unclear. This is because there is.

このようにして、Ti試片を[HF+H20]液中に浸
漬して当該Ti試片の研磨面における汚れを除去し、ま
た研磨面に形成された皮膜を取り除き、その後微粒アル
ミナ(例えば0.05〜0.171m程度)等を含む微
粒研磨剤により仕上研磨を行う。あるいは、前記Ti試
片に[HF+H20]液を滴下または流して供給しなが
ら当該Ti試片を微粒研磨剤により仕]二研磨し、研磨
面における汚れおよび皮膜の除去と同時に仕上研磨を行
う。
In this way, the Ti specimen is immersed in the [HF+H20] solution to remove dirt on the polished surface of the Ti specimen, remove the film formed on the polished surface, and then remove fine alumina (e.g. 0.05 Finish polishing is performed using a fine-grain abrasive containing abrasives such as Alternatively, the Ti specimen is polished with a fine abrasive while the [HF+H20] solution is dripped or flowing onto the Ti specimen, and the final polishing is performed simultaneously with the removal of dirt and film on the polished surface.

次に、腐食工程では、[HF+HNO3+H20]液を
用いて腐食するが、より望ましくは従来のものよりも若
干製電が高い[(47%)11F (Ice) + (
69%)HNO3(12cc)+11.0(50〜60
cc)]液を用いることかより望ましい。
Next, in the corrosion process, corrosion is carried out using a [HF+HNO3+H20] solution, but more preferably, the electric power production is slightly higher than that of the conventional one [(47%) 11F (Ice) + (
69%) HNO3 (12cc) + 11.0 (50~60
cc)] It is more desirable to use a liquid.

すなわち、H2O量が多すぎて腐食液の濃度か低い場合
には腐食面に腐食むらが発生しやすくなり、反対にH2
O量が少なすぎて腐食液の濃度が高い場合には腐食が過
剰となって粒界が不鮮明となるおそれがあるた、めであ
る。
In other words, if the amount of H2O is too large and the concentration of the corrosive solution is low, uneven corrosion tends to occur on the corroded surface;
This is because if the amount of O is too small and the concentration of the corrosive solution is high, corrosion may become excessive and the grain boundaries may become unclear.

(実施例) 純Tiを試片として前記Ti試片を#120ペーパー→
#240ペーパー→#400ペーノく−の11M1で研
磨紙を用いた研磨を行い、次いで微粒ダイヤモンド(6
IL)を含むベーストによるrt+t 磨を行ったのち
アルミナ(0,06#L)微粒を含む微粒研磨剤による
研磨を行った。次いで、Ti試片を[(47%) HF
 (ICC) +H70(10〜20cc)]液中に数
秒間浸漬したのち、アルミナ微粒研磨剤により仕上研磨
を行った。
(Example) Using pure Ti as a specimen, the Ti specimen was #120 paper →
#240 paper→#400 paper polishing with 11M1 abrasive paper, then fine grain diamond (6
After performing rt+t polishing with baset containing IL), polishing was performed with a fine abrasive containing fine particles of alumina (0.06 #L). Next, the Ti specimen was heated to [(47%) HF
(ICC) +H70 (10 to 20 cc)] After being immersed in a liquid for several seconds, final polishing was performed using a fine alumina abrasive.

次に、 [(47%)HF (lcc)+ (69%)
HNO3(12CC)、 +H20(50〜60cc)
 ]液により前記研磨面を腐食した。ここで得られた腐
食面の金属組織を第1図に示す。第1図に示すように、
得られた腐食面は腐食むらがなく、結晶粒界が著しく鮮
明に表われている。
Then, [(47%) HF (lcc) + (69%)
HNO3 (12CC), +H20 (50~60cc)
] The polished surface was corroded by the liquid. The metal structure of the corroded surface obtained here is shown in FIG. As shown in Figure 1,
The resulting corroded surface has no uneven corrosion, and grain boundaries are clearly visible.

(比較例1) 純Tiを試片として前記試片を9120ペーパー→#2
40ペーパー→#400ペーパーの順で研磨紙を用いた
研磨を行い、次いで微粒ダイヤモンド(6ル)を含むペ
ーストによる研磨を行ったのちアルミナ(o、oeIL
)微粒研磨剤による研磨を行った。ここで得られた研磨
面を第2図に示す。第2図に示すように、研磨過程にお
いて[HF+H2O1液による洗浄を行わなかった場合
には、研磨面には疵が発生していると共に歪模様が見ら
れた。
(Comparative Example 1) Using pure Ti as a specimen, the specimen was 9120 paper → #2
Polishing was performed using abrasive paper in the order of #40 paper → #400 paper, then polishing was performed using a paste containing fine diamond particles (6L), and then alumina (o, oeIL) was used.
) Polishing was performed using a fine abrasive. The polished surface obtained here is shown in FIG. As shown in FIG. 2, when cleaning with HF+H2O1 liquid was not performed during the polishing process, scratches and distorted patterns were observed on the polished surface.

(比較例2) 純Tiを試片として前記Ti試片を#120ペーパー→
#240ペーパー→#400ペーパーの順で研磨紙を用
いた研磨を行い、次いで微粒ダイヤモンド(6ル)を含
むペーストによる研磨を行ったのちアルミナ(0,06
g)微粒を含む微粒研磨剤による研磨を行った。次いで
、Ti試片を[(47%) H,F (Icc) +H
20(l O〜20cc)]液中に数秒間浸漬したのち
、アルミナ微粒研磨剤により仕上M府を行った。
(Comparative Example 2) Using pure Ti as a specimen, the Ti specimen was #120 paper →
Polishing was performed using abrasive paper in the order of #240 paper → #400 paper, then polishing was performed using a paste containing fine diamond particles (6L), and then alumina (0.06L) was used.
g) Polishing was performed using a fine abrasive containing fine particles. Next, the Ti specimen was heated to [(47%) H,F (Icc) +H
20 (1 O ~ 20 cc)] After being immersed in the solution for several seconds, finishing was performed using a fine alumina abrasive.

次に、 [(47%)HF (lcc)+ (69%)
HNO3’ (12CC) +H20(87CC) ]
液により前記研磨面を腐食した。。ここで得られた腐食
面を第3図に示す。第3図に示すように、得られた腐食
面は腐食むらが大きくなっており、あまり好ましくない
結果であった。
Then, [(47%) HF (lcc) + (69%)
HNO3' (12CC) +H20 (87CC)]
The polishing surface was corroded by the liquid. . The corroded surface obtained here is shown in Figure 3. As shown in FIG. 3, the corrosion surface obtained had large corrosion unevenness, which was not a very desirable result.

(発すノの効果) 以1−説明してきたように、この発明のTiの研磨・腐
食方法によれば、Ti試片を研磨・腐食して組織観察に
供するに際し、前記Ti試片を微粒研磨剤により研磨し
た後、当該試片を[HF+H20]液中に浸漬し次いで
微粒研磨剤により仕上研1fイし、もしくは[HF+H
,O]液を供給しながら微粒研磨剤により仕上研磨し、
その後[HF + HN O3+ H20]液中で腐食
するようにしたから、Ti試片の研磨後において当該研
磨面に疵や歪模様を生ずることがなく、また腐食後にお
いて当該腐食面に皮膜や腐食むらを発生することもほと
んどなく、検鏡面において結晶粒界が箸しく鮮明に表わ
れたものとなり、TiおよびTi合金の組織観察を容易
にかつ正確にしかも短時間のうちに行うことが可能であ
るという著しく優れた効果を有している。
(Effect of emission) As described above, according to the Ti polishing and corrosion method of the present invention, when a Ti specimen is polished and corroded and subjected to microstructure observation, the Ti specimen is subjected to fine-grain polishing. After polishing with a polishing agent, the specimen is immersed in a [HF+H20] solution and then finished polished for 1f with a fine abrasive, or
, O] Finish polishing is performed using a fine abrasive while supplying a liquid,
After that, the corrosion is carried out in the [HF + HN O3 + H20] solution, so that after polishing the Ti specimen, no scratches or distortion patterns are produced on the polished surface, and no film or corrosion is formed on the corroded surface after corrosion. There is almost no unevenness, and the grain boundaries are clearly visible on the microscopic surface, making it possible to observe the structure of Ti and Ti alloys easily, accurately, and in a short time. It has an extremely excellent effect.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明の実施例において得られた研磨面の金
属組織顕微鏡写真、第2図はこの発明の比較例1におい
て得られた研磨面の金属組織顕微鏡写真、第3図はこの
発明の比較例2において得られた腐食面の金属組織顕微
鏡写真である。 特許出願人 大同特殊鋼株式会社 代理人弁理士 小 塩 豊
Fig. 1 is a metallographic micrograph of a polished surface obtained in an example of this invention, Fig. 2 is a metallographic micrograph of a polished surface obtained in Comparative Example 1 of this invention, and Fig. 3 is a metallographic micrograph of a polished surface obtained in Comparative Example 1 of this invention. 3 is a metallographic micrograph of a corroded surface obtained in Comparative Example 2. Patent applicant: Daido Steel Co., Ltd. Representative patent attorney: Yutaka Oshio

Claims (1)

【特許請求の範囲】[Claims] (1)Ti試片を研磨・腐食して組織観察に供するに際
し、前記Ti試片を微粒研磨剤により研磨した後、当該
試片を[HF+H20]液中に浸漬し次いで微粒研磨剤
により仕上研磨し、もしくは[HF+H20]液を供給
しながら微粒研磨剤により仕」−研磨し、その後[HF
+HNO3+H20]液中で腐食することを特徴とする
Tiの研磨・腐食方法。
(1) When polishing and corroding a Ti specimen for microstructural observation, the Ti specimen is polished with a fine abrasive, then immersed in [HF+H20] solution, and then finished polished with a fine abrasive. Or polish with fine abrasive while supplying [HF+H20] solution, and then polish with [HF+H20] solution.
+HNO3+H20] A method for polishing and corroding Ti, which is characterized by corroding in a liquid.
JP22221683A 1983-11-28 1983-11-28 Grinding and corrosion of ti Pending JPS60114739A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22221683A JPS60114739A (en) 1983-11-28 1983-11-28 Grinding and corrosion of ti

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22221683A JPS60114739A (en) 1983-11-28 1983-11-28 Grinding and corrosion of ti

Publications (1)

Publication Number Publication Date
JPS60114739A true JPS60114739A (en) 1985-06-21

Family

ID=16778943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22221683A Pending JPS60114739A (en) 1983-11-28 1983-11-28 Grinding and corrosion of ti

Country Status (1)

Country Link
JP (1) JPS60114739A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03281291A (en) * 1990-03-30 1991-12-11 Fujitsu Ltd Titanium etching solution
CN100390322C (en) * 2005-09-21 2008-05-28 中国海洋大学 Chemical etching solution for titanium and titanium alloy
CN102102208A (en) * 2009-12-21 2011-06-22 北大方正集团有限公司 Display liquid for layered display of titanium layer and titanium nitride layer of semiconductor chip and preparation and application thereof
CN102808179A (en) * 2011-05-31 2012-12-05 西安赛特金属材料开发有限公司 Metallographic etchant and metallographic etching method for pure titanium and beta titanium alloy
CN104677716A (en) * 2015-02-11 2015-06-03 西安建筑科技大学 Pretreatment method for observing titanium fiber metallographic structure sintering neck
CN109211645A (en) * 2017-07-06 2019-01-15 宁波江丰电子材料股份有限公司 The metallographic etching agent of chromium tantalum-titanium alloy and its display methods of metallographic structure

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03281291A (en) * 1990-03-30 1991-12-11 Fujitsu Ltd Titanium etching solution
CN100390322C (en) * 2005-09-21 2008-05-28 中国海洋大学 Chemical etching solution for titanium and titanium alloy
CN102102208A (en) * 2009-12-21 2011-06-22 北大方正集团有限公司 Display liquid for layered display of titanium layer and titanium nitride layer of semiconductor chip and preparation and application thereof
CN102808179A (en) * 2011-05-31 2012-12-05 西安赛特金属材料开发有限公司 Metallographic etchant and metallographic etching method for pure titanium and beta titanium alloy
CN104677716A (en) * 2015-02-11 2015-06-03 西安建筑科技大学 Pretreatment method for observing titanium fiber metallographic structure sintering neck
CN109211645A (en) * 2017-07-06 2019-01-15 宁波江丰电子材料股份有限公司 The metallographic etching agent of chromium tantalum-titanium alloy and its display methods of metallographic structure

Similar Documents

Publication Publication Date Title
CN110823667B (en) Metallographic corrosive agent for high-strength titanium alloy and preparation method of metallographic sample of high-strength titanium alloy
US6309556B1 (en) Method of manufacturing enhanced finish sputtering targets
JPH0741754A (en) Abrasive composition and method of polishing therewith
CN109269867B (en) Tungsten-nickel-iron alloy polishing solution and alloy surface polishing and metallographic phase preparation method
CN101701886A (en) Metallographical corrosive, method for eroding copper and method for displaying metallographical organization of copper
CN109211645A (en) The metallographic etching agent of chromium tantalum-titanium alloy and its display methods of metallographic structure
CN106908302A (en) A kind of Surface Roughness of Pure Titanium Castings and titanium alloy metallographic specimen mechanical polishing method for making sample
CN113358449A (en) 5 xxx-series Al-Mg alloy grain boundary corrosion solution and corrosion method
US4305779A (en) Method of polishing nickel-base alloys and stainless steels
JPS60114739A (en) Grinding and corrosion of ti
CN114318341A (en) Aluminum alloy metallographic corrosion method and metallographic corrosion agent thereof
CN113201738A (en) Electrochemical surface treatment method for selectively laser melting AlSi10Mg formed workpiece
CN112362437A (en) Metallographic etchant and metallographic structure display method
CN105699137B (en) The structure display methods of crome metal
CN110954388A (en) Metallographic corrosive agent for laser cladding layer of titanium alloy containing rare earth and tissue display method
CN106769354B (en) Polishing method for aluminium alloy metallographic specimen
US4383857A (en) Attack polish for nickel-base alloys and stainless steels
CN111074279A (en) Target corrosive agent and application method thereof
JP4895440B2 (en) Method and apparatus for improving surface function of workpiece
Cain Jr A Simplified Procedure for the Metallography of Zirconium and Hafnium and their Alloys
JPS6134188A (en) Barrel polishing method making combination use of chemical polishing
CN113279045B (en) Corrosive agent and corrosion method for displaying tin alloy metallographic phase
JPS63114866A (en) Method of processing glass
PIOTROWSKI et al. Metallography of the precious metals
CN113514311A (en) Display method of pure tin metallographic phase