JPS60112798U - Low-temperature liquefied gas quantitative flow device - Google Patents

Low-temperature liquefied gas quantitative flow device

Info

Publication number
JPS60112798U
JPS60112798U JP20458483U JP20458483U JPS60112798U JP S60112798 U JPS60112798 U JP S60112798U JP 20458483 U JP20458483 U JP 20458483U JP 20458483 U JP20458483 U JP 20458483U JP S60112798 U JPS60112798 U JP S60112798U
Authority
JP
Japan
Prior art keywords
liquefied gas
temperature liquefied
low
nozzle chip
nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20458483U
Other languages
Japanese (ja)
Other versions
JPS6335933Y2 (en
Inventor
吉田 衛市
伸宜 青木
俊光 鈴木
坂口 日志雄
Original Assignee
大和製罐株式会社
テイサン株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大和製罐株式会社, テイサン株式会社 filed Critical 大和製罐株式会社
Priority to JP20458483U priority Critical patent/JPS60112798U/en
Publication of JPS60112798U publication Critical patent/JPS60112798U/en
Application granted granted Critical
Publication of JPS6335933Y2 publication Critical patent/JPS6335933Y2/ja
Granted legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、従来の低温液化ガス定量流下装置の部分破断
正面図、第2図は、第1図図示の装置の要部拡大図、第
3図は、本考案の低温液化ガス定量流下装置の要部拡大
図である。− 1・・・低温液化ガスの貯留タンク、4・・・蓋体、5
・・・供給管、6・・・電磁弁、7,37・・・ノズル
チップ、8・・・吐出孔、9,39・・・弁座、10,
40・・・弁体、13,13’・・・気化ガス排出管、
14・・・液面制御センサー、20.50・・・ノズル
チップ保持具、21.51・・・ノズルチップ押え、2
4・・・気化ガス導入室外壁。   − 左1m (77乙乙り 茸2図 29      q’83ン7  zt  zn  3
o27〃
Fig. 1 is a partially cutaway front view of a conventional low-temperature liquefied gas quantitative flow device, Fig. 2 is an enlarged view of the main part of the device shown in Fig. 1, and Fig. 3 is a low-temperature liquefied gas quantitative flow device of the present invention. It is an enlarged view of the main part. - 1... Storage tank for low-temperature liquefied gas, 4... Lid, 5
... Supply pipe, 6 ... Solenoid valve, 7, 37 ... Nozzle tip, 8 ... Discharge hole, 9, 39 ... Valve seat, 10,
40... Valve body, 13, 13'... Vaporized gas exhaust pipe,
14...Liquid level control sensor, 20.50...Nozzle tip holder, 21.51...Nozzle tip holder, 2
4...Outer wall of the vaporized gas introduction room. - 1m to the left (77 Otsutori Mushroom 2 Figure 29 q'83n7 zt zn 3
o27〃

Claims (1)

【実用新案登録請求の範囲】 上部開口を有する断熱壁により形成された低温液化ガス
の貯留タンク;該貯留タンクの上部開口を塞ぐ蓋体;該
貯留タンクの下端部に設けられ、低温液化ガスの流下量
を制限する為の1又は2以上の吐出孔を備えているノズ
ルチップ;該ノズルチップの上方の貯留タンク下端部に
固着され、中央部分が開口しているノズルチップ保持具
;該ノズルチップ保持具に着脱可能に係合し、該ノズル
チップ保持具との間で該ノズルチップを挟持して貯留タ
ンク下端部に該ノズルチップを着脱可能に固着する為の
中央部分が開口していをノズルチップ押え;該ノズルチ
ップ保持具と該ノズルチップ及び該ノズルチップ押えの
外周部及び下面部の一部分を囲繞し、下面中央部に低温
液化ガスを通過させ得る開口部を有する気化ガス導入室
外壁τ前記ノズルチップの吐出孔からの低温液化ガスの
流下又は流下停止を制御する為の弁体と弁座とを備えた
弁機構;前記蓋体を貫通している低温液化ガスの供給管
と液面制御センサー及び下端で前記弁体と連結してそる
ピストンロッド;前記蓋体に設けた気化ガス排出管;及
び前記低温液化ガスの液面側制御センサーからの信号で
低温液化ガスの供給管を開閉する開閉弁を備えた低温液
化ガスの定量流下装置に於て、 前記ノズルチップ保持具が、低温液化ガスの吐出孔から
の流下又は流下停止を制御する為の弁機構の弁座を備え
ている ことを特徴とする低温液化ガスの定量流下装置。
[Claims for Utility Model Registration] A storage tank for low-temperature liquefied gas formed by a heat insulating wall having an upper opening; a lid for closing the upper opening of the storage tank; A nozzle chip that is equipped with one or more discharge holes for limiting the flow rate; A nozzle chip holder that is fixed to the lower end of the storage tank above the nozzle chip and is open in the center; The nozzle chip A nozzle having an open center portion that removably engages with the holder and clamps the nozzle chip with the nozzle chip holder to removably fix the nozzle chip to the lower end of the storage tank. Chip holder: an outer wall τ of the vaporized gas introduction chamber that surrounds the nozzle chip holder, the nozzle chip, and part of the outer periphery and lower surface of the nozzle chip holder, and has an opening in the center of the lower surface through which low-temperature liquefied gas can pass. A valve mechanism including a valve body and a valve seat for controlling the flow down or stopping of the low temperature liquefied gas from the discharge hole of the nozzle chip; a supply pipe for the low temperature liquefied gas passing through the lid body and the liquid level; A control sensor and a piston rod that is connected to the valve body at its lower end and deflects; a vaporized gas discharge pipe provided on the lid body; and a low temperature liquefied gas supply pipe that opens and closes based on signals from the low temperature liquefied gas liquid surface side control sensor. In the low-temperature liquefied gas quantitative flow device equipped with an on-off valve, the nozzle tip holder is provided with a valve seat of a valve mechanism for controlling the flow of the low-temperature liquefied gas from the discharge hole or the stoppage of the flow. A quantitative flow device for low-temperature liquefied gas, which is characterized by:
JP20458483U 1983-12-29 1983-12-29 Low-temperature liquefied gas quantitative flow device Granted JPS60112798U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20458483U JPS60112798U (en) 1983-12-29 1983-12-29 Low-temperature liquefied gas quantitative flow device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20458483U JPS60112798U (en) 1983-12-29 1983-12-29 Low-temperature liquefied gas quantitative flow device

Publications (2)

Publication Number Publication Date
JPS60112798U true JPS60112798U (en) 1985-07-30
JPS6335933Y2 JPS6335933Y2 (en) 1988-09-22

Family

ID=30766977

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20458483U Granted JPS60112798U (en) 1983-12-29 1983-12-29 Low-temperature liquefied gas quantitative flow device

Country Status (1)

Country Link
JP (1) JPS60112798U (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3797659B2 (en) * 2001-10-30 2006-07-19 大和製罐株式会社 Nozzle for adding liquefied gas

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58161298U (en) * 1982-04-22 1983-10-27 大和製罐株式会社 Low-temperature liquefied gas quantitative flow or dripping device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58161298U (en) * 1982-04-22 1983-10-27 大和製罐株式会社 Low-temperature liquefied gas quantitative flow or dripping device

Also Published As

Publication number Publication date
JPS6335933Y2 (en) 1988-09-22

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