JPS599946A - Structure of cap for metal seal type semiconductor device - Google Patents

Structure of cap for metal seal type semiconductor device

Info

Publication number
JPS599946A
JPS599946A JP57118474A JP11847482A JPS599946A JP S599946 A JPS599946 A JP S599946A JP 57118474 A JP57118474 A JP 57118474A JP 11847482 A JP11847482 A JP 11847482A JP S599946 A JPS599946 A JP S599946A
Authority
JP
Japan
Prior art keywords
cap
stem
bead
semiconductor device
flange
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57118474A
Other languages
Japanese (ja)
Inventor
Osamu Kodan
小段 修
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP57118474A priority Critical patent/JPS599946A/en
Publication of JPS599946A publication Critical patent/JPS599946A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • H01L23/04Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Forging (AREA)

Abstract

PURPOSE:To prevent the generation of the leakage of an internally enclosed gas and the exfoliation, etc. of a welding section by forming an annular groove to the unbonded surface of a flange through press work while forming an annular projecting section to the unbonded surface with the formation of the annular groove. CONSTITUTION:With the cap 10, the high annular projecting section 10B is formed to the unbonded surface of the flange 10A for the cap while the annular groove 10C generated with the formation of the projecting section 10B is formed on the unbonded surface side of the flange 10A. Accordingly, even when an inner jig and an outer jig are worn away unequally and a stem is bent and molded, a clearance is not generated between the projecting section 10B and the stem, and a bead and the stem can be pressure-welded by adequate contact pressure at all times. The height of such a projecting section 10B can only be realized by molding the groove 10C through press work.

Description

【発明の詳細な説明】 〔発明の技術分野〕 この発明は金属封止型半導体装置のキャップ構造に関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a cap structure for a metal-sealed semiconductor device.

〔発明の技術的背景〕[Technical background of the invention]

パワートランジスタ等の個別半導体素子は一般に金属製
パッケージに封入されており、長期の使用に於ても高い
信頼性を維持しうる金属封止型半導体装置として構成さ
れている。この金属製パッケージはよく知られているよ
うに、半導体素子を搭載した平板状のステムと、該ステ
ムの上に抵抗溶接等によって固着された金属キャップと
から構成されており、該金属キャップ内にはN2等の不
活性ガスが充填されている。このような構成の金属封止
型半導体装置に於ては、キャップとステムとの溶接が確
実であって内部のガスが漏洩しない限り、長期にわたっ
て安定した動作が可、能であるが、実際の製造工程に於
ては、以下に記載する理由により、溶接不良に基〈不良
品の発生が少なからずあり、このような事態を改善する
必要があった。
Individual semiconductor elements such as power transistors are generally enclosed in metal packages, and are configured as metal-sealed semiconductor devices that can maintain high reliability even during long-term use. As is well known, this metal package consists of a flat stem on which a semiconductor element is mounted, and a metal cap fixed onto the stem by resistance welding. is filled with an inert gas such as N2. A metal-sealed semiconductor device with such a configuration can operate stably over a long period of time as long as the welding between the cap and stem is reliable and the internal gas does not leak. In the manufacturing process, for the reasons described below, there is a considerable number of defective products due to poor welding, and it is necessary to improve this situation.

〔背景技術の問題点〕[Problems with background technology]

以下に従来の金属封止型半導体装置の構造及びその封止
方法とを図を参照して説明するとともに溶接不良の発生
する理由について説明する。
Below, the structure of a conventional metal-sealed semiconductor device and its sealing method will be explained with reference to the drawings, and the reason why welding defects occur will be explained.

第1図及び第2図は公知の金属封止型半導体装置の概略
構造を示したものであり、同図に於て、1はステム、2
はキャップ、6はステム1の一部に嵌着した放熱板、4
は該放熱板6上にろう材5を斤I〜で固着さnだ半導体
素子、6は半導体素子4の電極Vこワイヤ(図示)を介
して接続された引出しリード、7は引出しり一部6を固
定しているろう材である。
1 and 2 show the schematic structure of a known metal-sealed semiconductor device, in which 1 is a stem and 2 is a stem.
is a cap, 6 is a heat dissipation plate fitted to a part of stem 1, 4
6 is a semiconductor element having a brazing material 5 fixed on the heat dissipation plate 6 with a wire (not shown), 6 is a lead-out lead connected to the electrode V of the semiconductor element 4 via a wire (shown), and 7 is a part of the lead-out part. This is the brazing material that fixes 6.

キャップ2は同図に見られるように、その端部外周縁に
沿ってフランジ2A ’(i−備えており、フランジ2
A =iステム1に対して抵抗溶接することにより、キ
ャップ2はステム1上に固定されている。
As seen in the figure, the cap 2 is provided with a flange 2A' (i-) along the outer peripheral edge of its end;
A = i The cap 2 is fixed on the stem 1 by resistance welding to the stem 1.

従来、キャップ2とステム1との溶着は第3図に示す治
具を用いて行われてきた。第3図に於て、8はキャップ
2を倒立状態に支持する銅製の内治具であり、この内治
具8は溶接時の電極を兼ねている。9はステム1を裏返
し状態で水平に支持する外治具であり、この外治具9は
テフロン等の合成樹脂製絶縁体で構成されている。これ
らの治具の上に二点鎖線で示すようにステム1とキャッ
プ2を乗せ、キャップ2のフランジ2への位置に対応し
てステム1の裏面に溶接電極(図示せず)を押しあてて
溶接を行うことによりキャップ2がステム1に固定され
る。キャップ2のフランジ2Aには第4図に示すように
高さの低い環状のビード2Bがプレス加工によって形成
されており、ビード2Bをステム1の面に圧接してそこ
に溶接電流を集中させることにより該ビード2B’を溶
融させて溶着部を形成させる。
Conventionally, the cap 2 and the stem 1 have been welded using a jig shown in FIG. In FIG. 3, reference numeral 8 denotes an inner jig made of copper that supports the cap 2 in an inverted state, and this inner jig 8 also serves as an electrode during welding. Reference numeral 9 denotes an outer jig that horizontally supports the stem 1 in an upside-down state, and this outer jig 9 is made of a synthetic resin insulator such as Teflon. Place stem 1 and cap 2 on these jigs as shown by the two-dot chain line, and press a welding electrode (not shown) against the back surface of stem 1 corresponding to the position of cap 2 on flange 2. The cap 2 is fixed to the stem 1 by welding. As shown in Fig. 4, a low-height annular bead 2B is formed on the flange 2A of the cap 2 by press working, and the bead 2B is pressed against the surface of the stem 1 to concentrate the welding current there. The bead 2B' is melted to form a welded portion.

このような治具を用いてキャップ2とステム1とを溶着
する場合、両者の溶着部分が完全なものとなるためには
キャップ2の全周にわたってビード2Bが完全に溶融し
ていることが必要であり、そのためには、ビード2Bが
常にその全周にわたってその端面の全面を均一な圧力で
ステム1の面に圧接されていることが必要となる。しか
しながら前記の治具に於ては以下の如き理由により、こ
のような条件を維持していくことができぬため、キャッ
プ2の溶着不良が生じやすぐ従って前記半導体装置のパ
ッケージ不良を生ずる原因となっている。
When welding the cap 2 and the stem 1 using such a jig, it is necessary that the bead 2B is completely melted around the entire circumference of the cap 2 in order for the welded portion of both to be complete. For this purpose, it is necessary that the entire end surface of the bead 2B is always pressed against the surface of the stem 1 with uniform pressure over its entire circumference. However, with the above-mentioned jig, it is not possible to maintain such conditions for the following reasons, and this may lead to defective welding of the cap 2, which immediately causes a defective package of the semiconductor device. It has become.

前記治具に於て常にビード2Bの全面がステム1に溶着
されるためKは、(i)内治具8のキャップ支持面8A
と外治具9のステム支持面9Aとが常に完全に平行であ
ると、及び(11)前記両面8A及び9Aのそれぞれの
摩耗量が等しく、シかも全周にわたって均一に摩耗する
こと、等の条件が必要であるが、両治具8及び9のそれ
ぞれの材質が異なる一部、内治具8のキャップ支持面8
Aid溶接電極をも兼ねているので外治具9のステム支
持面惑θにつれて両面の高さ位置の関係や両面の平行度
も変化し、その結果、ビード2Bの全面がステム1の面
に接触しなくなったり、ビード2Bとステム1との接触
圧が不均一になってくる。このため、ビード2Bとステ
ム1との接触圧が不足している部分に於ては溶は込み不
足により溶着力不足となったり、また、ビード2Bとス
テム1とが接触していない部分では溶接電流が流れず溶
着が全く生じないことになる。
Since the entire surface of the bead 2B is always welded to the stem 1 in the jig, K is (i) the cap support surface 8A of the inner jig 8;
and the stem support surface 9A of the outer jig 9 are always completely parallel, and (11) the amount of wear on each of the surfaces 8A and 9A is equal, and the shaft is worn uniformly over the entire circumference. Although certain conditions are required, parts of both jigs 8 and 9 that are made of different materials, and the cap support surface 8 of the inner jig 8
Since it also serves as an aid welding electrode, the relationship between the height positions of both sides and the parallelism of both sides change as the stem support surface of the external jig 9 changes θ, and as a result, the entire surface of the bead 2B comes into contact with the surface of the stem 1. Otherwise, the contact pressure between the bead 2B and the stem 1 becomes uneven. Therefore, in areas where the contact pressure between bead 2B and stem 1 is insufficient, welding strength may be insufficient due to insufficient penetration, and in areas where bead 2B and stem 1 are not in contact, welding No current flows and no welding occurs.

一方、このような治具の不等摩耗に基因する問題点とは
別にステム1の反り、すなわち湾曲もキャップ2とステ
ム1との溶着不良を生ずる原因となっていた。ステム1
は原則的に平坦になっていることか必要であるが、ステ
ム1はプレス加工によって製作されるためプレス加工時
に第5図に示すように底面側に湾曲することが多く、こ
のようにステム1が湾曲していると前記の如き治具の問
題がなかったとしても第5図に示すようにキイ2ツブ2
のビード2Bの面とステム1との面に隙間gが生じてビ
ード2Bの一部のみしか溶接されない結果となり、従っ
てキャップの溶接不良を生じる結果となっていた。
On the other hand, in addition to the problems caused by such uneven wear of the jig, warpage, that is, curvature, of the stem 1 has also been a cause of poor welding between the cap 2 and the stem 1. stem 1
In principle, it is necessary that the stem 1 be flat, but since the stem 1 is manufactured by press working, it is often curved to the bottom side during the press working as shown in Fig. 5. If the key 2 is curved, even if there is no problem with the jig as described above, the key 2 knob 2 will be bent as shown in Figure 5.
A gap g is created between the surface of the bead 2B and the surface of the stem 1, resulting in only a portion of the bead 2B being welded, resulting in defective welding of the cap.

このような溶接不良を生じさせぬためには、ビ灼 一ド高さを従来よりも高くして治具が今σ摩耗してもビ
ード2Bとステム1との間に間隙を生じないようにする
と同時に両者の接触圧が不足しないようにし、また、ビ
ード先端を細くすることによりステム1との接触部の電
流密度を太きくしてビード全体を確実に溶融しうるよう
にすることが必要である。しかしながらキャップ2(l
″llニブレス成形作されているだめ、ビード高さをあ
まり大きくすることができないので、従来はこのような
解決方法は考えられていなかった。
In order to prevent such welding defects, the height of the bead should be made higher than before so that even if the jig wears out now, no gap will be created between the bead 2B and the stem 1. At the same time, it is necessary to ensure that the contact pressure between the two is not insufficient, and by making the tip of the bead thinner, it is necessary to increase the current density at the point of contact with stem 1 so that the entire bead can be reliably melted. . However, cap 2 (l
Conventionally, such a solution has not been considered because the bead height cannot be made very large due to nibless molding.

〔発明の目的〕[Purpose of the invention]

この発明は前記の如き問題点を解決し、治具8゜9の不
均等摩耗及び偏摩耗が生じてもキャップの溶着不良を生
じることなく、また、ステム1に反りや湾曲があっても
キャップの溶着不良を生じることのない、改良されたキ
ャップ構造を提供することを目的とする。
This invention solves the above-mentioned problems, and even if the jig 8.9 is unevenly worn or unevenly worn, the cap will not be defective in welding, and even if the stem 1 is warped or curved, the cap can be fixed. An object of the present invention is to provide an improved cap structure that does not cause poor welding.

〔発明の実施例〕[Embodiments of the invention]

この発明は前記した着想に基いてなされたものであり、
ビード高さを従来よりも高くすることにより、内治具と
外治具とが不均等摩耗した場合でもステム1とキャップ
2のビード2Bとの間に間隙を生じさせぬようにすると
同時にステム1とキャップのビード2Bとの間に適当な
接触圧が保たれるようにキャップを構成したことを特徴
とするものである。この発明によるキャップは従来のキ
ャップよりも高いビードを備えるとともにこのビード全
成形する際tて同時にフランジの非接合面に形成された
環状溝を備えており、この環状溝の成形ニよってビード
の高さは従来のキャップのそれよりも大きくなっている
。また、この発明のキャップにおけるビルドは、その先
端が従来のビードよりも細くなっているため、ステムと
の接合面における電流密度が大きくなり、従ってビード
先端を確実に溶融させることができる。
This invention was made based on the idea mentioned above,
By making the bead height higher than before, even if the inner jig and the outer jig wear unevenly, a gap is not created between the stem 1 and the bead 2B of the cap 2, and at the same time, the stem 1 The cap is characterized in that the cap is constructed such that an appropriate contact pressure is maintained between the bead 2B of the cap and the bead 2B of the cap. The cap according to the present invention has a higher bead than the conventional cap, and also has an annular groove formed on the non-joining surface of the flange at the same time when this bead is completely formed, and by forming this annular groove, the height of the bead is increased. The size is larger than that of conventional caps. Further, since the tip of the build in the cap of the present invention is thinner than that of a conventional bead, the current density at the joint surface with the stem is increased, so that the bead tip can be reliably melted.

〔発明の実施例〕[Embodiments of the invention]

第6図に本発明により改良されたキャップ10の一部を
示す。同図に示すように本発明のキャップ10F/′i
そのフランジ10Aの接合面側に高さの高い環状突部す
なわちビード10B ’e有するとともにフランジ10
Aの非接合面側にはビード[1Bの形成に伴って生じた
環状溝10Cを有している。ビード10Bの高さHは従
来のキャップのそれよりも犬きく、かつ、その先端の幅
Wは従来のキャップの値の1/2である。従って内治具
8と外治具9とが不均等摩耗した場合やステム1が湾曲
して成形されている場合でもビード10Bとステム1と
の間に間隙を生ずることがなく、ビードとステムとを常
に適切な接触圧で圧接させることができ、確実にビード
を溶融してステムとキャップとを溶着させることができ
る。
FIG. 6 shows a portion of the cap 10 improved according to the present invention. As shown in the figure, the cap 10F/'i of the present invention
The flange 10A has a high annular protrusion, that is, a bead 10B'e on the joint surface side, and the flange 10
The non-bonded surface side of A has an annular groove 10C that is generated due to the formation of the bead [1B]. The height H of the bead 10B is greater than that of the conventional cap, and the width W of the tip thereof is 1/2 of the value of the conventional cap. Therefore, even if the inner jig 8 and the outer jig 9 wear unevenly or the stem 1 is curved, there will be no gap between the bead 10B and the stem 1, and the bead and stem The stem and cap can always be brought into contact with each other with an appropriate contact pressure, and the bead can be reliably melted and the stem and cap can be welded together.

このようなど−ド高さは、プレス加工によってキャップ
成形を行う力・ぎり環状溝10Cを成形することによっ
て初めて実現できるものであって、環状溝10Cを成形
しなければそのようなど一ド高さを実現することができ
ない。
Such a height can only be achieved by forming the annular groove 10C using force and force when forming the cap by press working. cannot be realized.

〔発明の効果〕〔Effect of the invention〕

前記の如き構造のキャップ10と湾曲したステムとを用
いて金属封止型半導体装置を製造し、これについて封入
ガスの漏洩テストと破壊テストヲ行ったところ、いずれ
のテストに於ても不良品は発生しなかった。
When a metal-sealed semiconductor device was manufactured using the cap 10 having the structure described above and a curved stem, and a leakage test of the sealed gas and a destructive test were performed on the device, no defective products were found in any of the tests. I didn't.

一方、従来構造のキャップ2と湾曲したステムとを用い
て製作した金属封止型半導体装置に対して前記と同条件
で漏洩テストと破壊テストを実施したところ、漏洩テス
トでは30%が不良品となり、破壊テストでは6チが不
良品となった。
On the other hand, when a leakage test and a destructive test were conducted under the same conditions as above for a metal-sealed semiconductor device manufactured using a cap 2 with a conventional structure and a curved stem, 30% of the products were defective in the leakage test. In the destructive test, 6 pieces were found to be defective.

このような結果力・ら、キャップの構造を本発明のよう
な構造にすることにより、内部封入ガスの漏洩や溶着部
の剥離などの発生を防(止できることが明らかになった
In view of these results, it has become clear that leakage of the internally sealed gas and peeling of the welded portion can be prevented by forming the cap structure as in the present invention.

従って、本発明によれば、従来の半導体装置製造設備の
大幅々改良を伴わずに前記の如き不良品の発生を防止す
ることのできる、改良されたキャップ構造を提供するこ
とができる。
Therefore, according to the present invention, it is possible to provide an improved cap structure that can prevent the occurrence of defective products as described above without making any major improvements to conventional semiconductor device manufacturing equipment.

なお、前記実施例では本発明が個別半導体装置に適用さ
れる場合を示しているが、本発明がLSIやIC等の集
積回路装置にも適用できることは当然であり、また、キ
ャップ形状を丸形のみならず、角形にした場合でも本発
明が適用されることは明らかである。
Note that although the above embodiments show the case where the present invention is applied to an individual semiconductor device, it goes without saying that the present invention can also be applied to integrated circuit devices such as LSIs and ICs. It is clear that the present invention is applicable not only to the case of a rectangular shape.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の半導体装置の平面図、第2図は第1図の
H−II矢視断面図、第6図は第1図の半導体装置の製
造装置の縦断面図、第4図は第3図の状態における半導
体装置のキャップのフランジ部分の拡大縦断面図、第5
図は第6図の装置におけるキャップと湾曲ステムとの接
触状態を示した拡大断面図、第6図は本発明によるキャ
ップのフランジ部分の拡大縦断面図である。 1・・ステム、2.10・・ギャップ、2A、IOA・
・・ノランジ、2B 、 10B・・・ビード、ioc
・・・環状溝、4・・・半導体素子。 第1図 第2図 第4図 つρ 第3図 第5図
FIG. 1 is a plan view of a conventional semiconductor device, FIG. 2 is a sectional view taken along the line H-II in FIG. 1, FIG. 6 is a longitudinal sectional view of the semiconductor device manufacturing apparatus shown in FIG. 5 is an enlarged vertical sectional view of the flange portion of the cap of the semiconductor device in the state shown in FIG. 3;
This figure is an enlarged sectional view showing the state of contact between the cap and the curved stem in the apparatus of FIG. 6, and FIG. 6 is an enlarged longitudinal sectional view of the flange portion of the cap according to the present invention. 1. Stem, 2.10. Gap, 2A, IOA.
... Nolanji, 2B, 10B... Bead, ioc
...Annular groove, 4...Semiconductor element. Figure 1 Figure 2 Figure 4 ρ Figure 3 Figure 5

Claims (1)

【特許請求の範囲】[Claims] 1 金属封止型半導体装置の金属キャップに於て、該金
属キャップは、そのフランジの非接合面にプレス加工に
よって形成された環状溝を有するとともに該環状溝の形
成に伴って生じた環状突部を該フランジの接合面に備え
ていることを特徴とする金属封止型半導体装置のキャッ
プ構造。
1. In a metal cap for a metal-sealed semiconductor device, the metal cap has an annular groove formed by press working on the non-bonding surface of the flange, and an annular protrusion formed due to the formation of the annular groove. 1. A cap structure for a metal-sealed semiconductor device, characterized in that the joint surface of the flange is provided with:
JP57118474A 1982-07-09 1982-07-09 Structure of cap for metal seal type semiconductor device Pending JPS599946A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57118474A JPS599946A (en) 1982-07-09 1982-07-09 Structure of cap for metal seal type semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57118474A JPS599946A (en) 1982-07-09 1982-07-09 Structure of cap for metal seal type semiconductor device

Publications (1)

Publication Number Publication Date
JPS599946A true JPS599946A (en) 1984-01-19

Family

ID=14737563

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57118474A Pending JPS599946A (en) 1982-07-09 1982-07-09 Structure of cap for metal seal type semiconductor device

Country Status (1)

Country Link
JP (1) JPS599946A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5988507A (en) * 1996-11-01 1999-11-23 Nec Corporation Bar code reader

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5988507A (en) * 1996-11-01 1999-11-23 Nec Corporation Bar code reader

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