JPS5997840A - Polishing machine - Google Patents

Polishing machine

Info

Publication number
JPS5997840A
JPS5997840A JP57203612A JP20361282A JPS5997840A JP S5997840 A JPS5997840 A JP S5997840A JP 57203612 A JP57203612 A JP 57203612A JP 20361282 A JP20361282 A JP 20361282A JP S5997840 A JPS5997840 A JP S5997840A
Authority
JP
Japan
Prior art keywords
surface plate
workpiece
polishing
work
outer peripheral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57203612A
Other languages
Japanese (ja)
Inventor
Koji Nakazawa
中沢 宏治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57203612A priority Critical patent/JPS5997840A/en
Publication of JPS5997840A publication Critical patent/JPS5997840A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B19/00Single-purpose machines or devices for particular grinding operations not covered by any other main group
    • B24B19/02Single-purpose machines or devices for particular grinding operations not covered by any other main group for grinding grooves, e.g. on shafts, in casings, in tubes, homokinetic joint elements

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

PURPOSE:To permit the fine polishing work to obtain an arbitrary unflat or nonspherical surface from by forming grooves on the outer peripheral part of a surface plate along the direction of sliding of a work, thus permitting the finishing of the work within a prescribed accuracy in each flat and spherical degree. CONSTITUTION:Grooves 17 are formed on the outer peripheral surface of a surface plate 2 along the directions X and Y of sliding of a work. The width W of the groove 17 is increased gradually larger in the outer peripheral part of the surface plate. The larger polishing pressure can be applied onto the outer peripheral part of the work by forming the above-described groove 17, so the abrasion distance can be successively reduced on more outer peripheral part of the work, and the slack on the outer periphery of the work can be prevented, and the flatness can be improved.

Description

【発明の詳細な説明】 +5 〔発明の利用分野〕 本発明は、ラップ加工等の研磨加工においてワークの平
面度、非球面度等を向上させる研磨装置に関する。
Detailed Description of the Invention +5 [Field of Application of the Invention] The present invention relates to a polishing apparatus that improves the flatness, asphericity, etc. of a workpiece in polishing processes such as lapping.

〔従来技術〕[Prior art]

従来のX−Y摺動ラップ装置の例を第1図に。 An example of a conventional X-Y sliding wrap device is shown in Figure 1.

示す。ワーク1と定盤20間にリサージュ図形。show. Lissajous figure between workpiece 1 and surface plate 20.

3で表わされるような相対運動を与え、定盤面。Give relative motion as expressed by 3, surface plate surface.

に予め塗布されたラップ剤によりワークを研磨。The workpiece is polished using a pre-applied lapping agent.

加工するのであるが、定盤が平面であってもワ。Although it is processed, even if the surface plate is flat.

−り研磨面は平面とはならず、一般にワーク中。- The polished surface is not flat and is generally used during work.

6部が出張った中凸形状となる。すなわちワーク外周部
がだれた形状となるため、平面度0.1 pm。
It has a convex shape with 6 parts sticking out. In other words, the outer circumference of the workpiece has a sagging shape, so the flatness is 0.1 pm.

オーダを問題とする高精度研磨加工における間。During high-precision polishing processing where order is an issue.

題となっていた。             1゜〔発
明の目的〕 本発明の目的は上述した従来技術の欠点を解決し、定盤
面精度に対するワーク断面形状の転写性を向上し、ワー
ク平面度または非球面度を向上させる研磨装置を提供す
ることにある。
It was a topic. 1゜ [Object of the Invention] The object of the present invention is to solve the above-mentioned drawbacks of the prior art, and to provide a polishing device that improves the transferability of the cross-sectional shape of the workpiece to the precision of the surface plate, and improves the flatness or asphericity of the workpiece. It's about doing.

5 〔発明の概要〕 ワーク研磨面の単位面積当りの研磨量は、その点に作用
した研磨圧力と、その点の研磨距離の積に比例する。と
ころでワーク外周部では。
5 [Summary of the Invention] The amount of polishing per unit area of the polished surface of a workpiece is proportional to the product of the polishing pressure acting on that point and the polishing distance of that point. By the way, at the outer periphery of the workpiece.

研磨圧による応力集中が働きワーク中心から外局部にな
る程、研磨圧は漸次急増する分布を示・し、これを無く
することは物理的に不可能であ。
Stress concentration due to polishing pressure acts, and the polishing pressure shows a distribution that gradually increases rapidly from the center of the workpiece to the outer part, and it is physically impossible to eliminate this.

るため、ワーク外周部の研磨能率が必然的に高。Therefore, the polishing efficiency of the outer circumference of the workpiece is inevitably high.

くなりワーク周辺だれを生ずる。本発明では、。This will cause dripping around the workpiece. In the present invention:

これを改善するため、上記の研磨距離をワー久の中央部
と外周部で変えることを特徴とする。6〔発明の実施例
〕 本発明で対象とするXY摺動ラップ装置を第。
In order to improve this, the above-mentioned polishing distance is changed between the central part and the outer periphery of the workpiece. 6 [Embodiments of the Invention] The following describes an XY sliding wrap device to which the present invention is applied.

1図に、またリサージ瓜運動3を与えるための。1, and also to give the resurge melon motion 3.

運動機構を第3図に示す。ここでワーク1はホルダ4に
固定され、ホルダには球面軸受5を介。
The movement mechanism is shown in Figure 3. Here, the workpiece 1 is fixed to a holder 4 via a spherical bearing 5.

して棒6により研磨荷重POが加えられている。。A polishing load PO is applied by a rod 6. .

このためワークは定盤の面に常にならって研磨すること
ができる。また棒6は軸受7、アーム。
Therefore, the workpiece can always be polished following the surface of the surface plate. Also, the rod 6 is a bearing 7 and an arm.

8、軸受9を介して偏心軸10により駆動される。8. Driven by an eccentric shaft 10 via a bearing 9.

偏心軸10はモータ14により回転駆動される回転円板
11の中心軸よりeだけ偏心した状態で回転運動する。
The eccentric shaft 10 rotates while being eccentric from the center axis of the rotating disk 11 by an amount e relative to the central axis of the rotating disk 11 which is rotationally driven by the motor 14.

このようなリンク機構により、アーム80案内面(図示
せず)に沿ってワーク1は1軸上を往復運動する。これ
をX軸とすると、これと直交方向に同様な駆動機構を設
けることによ・す、ワークを定盤に対してXY往復運動
させり・サージ二図形を描かせることができる。勿論、
With such a link mechanism, the workpiece 1 reciprocates on one axis along the arm 80 guide surface (not shown). If this is taken as the X axis, by providing a similar drive mechanism in the direction orthogonal to this, the workpiece can be moved in an XY reciprocating manner with respect to the surface plate, and two surge figures can be drawn. Of course,
.

ワークを移動させず定盤の方をXY運動させて。Move the surface plate in XY motion without moving the workpiece.

も同様である。               。The same is true.             .

このようなXY摺動ラップ装置では、ワーク外周部に研
磨圧による応力集中が働き、第4図。
In such an XY sliding lapping device, stress concentration due to polishing pressure acts on the outer periphery of the workpiece, as shown in FIG.

(1)に示すように、ワーク断面形状は周辺部がだ。As shown in (1), the cross-sectional shape of the workpiece is narrow at the periphery.

れた中凸形状に加工される。しかるに、第2図。It is processed into a convex shape. However, Figure 2.

に示すように、ワークの端から端までの移動用。For moving the workpiece from one end to the other, as shown.

離12を定盤の長さtoより長くとり、ワークのは。Set the distance 12 longer than the length to of the surface plate, and measure the workpiece.

み出し量すを与えると、定盤外周部における応。Given the amount of protrusion, the response at the outer periphery of the surface plate.

力集中がワーク中央部にまで及び、またワーク。The concentration of force extends to the center of the workpiece, and the workpiece again.

周辺部では研磨にあずからない時間がふえ、研。In the peripheral area, the time that is not used for polishing increases.

磨距離が中央部より減少するため、ワーク周辺だれを改
善することができ、逆にワークは第4図(2)に示すよ
うな中門形状に加工される。
Since the grinding distance is reduced from the central part, it is possible to improve the sagging around the workpiece, and conversely, the workpiece is machined into a middle gate shape as shown in FIG. 4(2).

ワーク径α0に対する、定盤からのワークはみ出し量す
の比と、ワーク外周幅Cを除いたワーク断面形状の最大
うねり量(だれ量)ルとの関0 −3 ・ 係を示すと、例えば第5図のようになる。すな。
The relationship between the ratio of the amount of workpiece protrusion from the surface plate to the workpiece diameter α0 and the maximum waviness (sag amount) of the cross-sectional shape of the workpiece excluding the workpiece outer circumferential width C is shown as follows, for example: It will look like Figure 5. sand.

わち、はみ出し量すを適切に選べば平面度は改。In other words, if you choose the amount of protrusion appropriately, the flatness can be improved.

善されだれ量りを殆ど0にすることが理屈の上。In theory, it is best to reduce the amount of dripping to almost 0.

では可能となるが、はみ出し量すの変化に対す。However, this is possible due to changes in the amount of protrusion.

るだれ量りの変化が急峻であることや、図のバ。The change in sluggishness is steep, and the difference in the figure.

ッチングで示す領域内でのばらつきがあるため。This is because there are variations within the area shown by the scratches.

平面度を0にすることは非常に難しい。特に、。It is very difficult to reduce the flatness to 0. especially,.

荒研磨では硬度の比較的硬い材料である鋳鉄、。Cast iron, which is a relatively hard material with hardness in rough polishing.

545C等の定盤を用いるのに比べ、仕上研磨で。Finish polishing is better than using a surface plate such as 545C.

は錫等の軟い材料の定盤を用いるため、定盤円。The surface plate is circular because it uses a surface plate made of soft material such as tin.

辺部の摩耗が大きくなり、だれ量りのはみ出し。The wear on the edges has increased, causing a large amount of protrusion.

量すに対する変化はますます大きくなる。The changes to the measurements become increasingly large.

このように必ず仕上研磨により面粗さを良く。In this way, be sure to perform final polishing to improve the surface roughness.

する工程が入るので、荒研磨でいくら形状精度。Since there is a process of polishing, the shape accuracy can be improved by rough polishing.

が良くても、仕上研磨で形状精度が悪くなって5 しまう。Even if the shape is good, the shape accuracy deteriorates due to final polishing. Put it away.

本発明は、特にこの仕上研磨における、軟質定盤の周辺
部摩耗を改善することを目的として第6図に示すように
、ワーク摺動方向(X、 Y方向)に沿って定盤2の外
周部に溝17を付ける・ 4 ・ ことを特徴とし、かつワークの端から端までの・移動距
離J2を定盤長さlO以下(t!2≦1!0)とする・
ことを特徴とする。ここで溝17の幅Wは同図に。
The present invention aims to improve the wear of the peripheral part of the soft surface plate, especially in this final polishing, as shown in FIG. It is characterized by having a groove 17 in the part, and the moving distance J2 from one end of the workpiece to the other end is less than or equal to the surface plate length lO (t!2≦1!0).
It is characterized by Here, the width W of the groove 17 is shown in the same figure.

示すごとく定盤外周部はど漸次広くすることが。As shown, the outer periphery of the surface plate can be gradually widened.

できる。このような溝17を設けることにより、59−
クの外周部はど研磨圧が大きく作用するの。
can. By providing such a groove 17, 59-
The polishing pressure exerts a large effect on the outer periphery of the wheel.

に伴なって、研磨距離をワーク外周部はど短く。Accordingly, the polishing distance is shortened around the outer circumference of the workpiece.

することができ、ワークの外周だれ(第4図(1)〕を
防止し、平面度を改善することができる。し。
This makes it possible to prevent the outer periphery of the workpiece from sagging (Fig. 4 (1)) and improve the flatness.

かも、はみ出し量すを生じないため、定盤肩部。Also, the shoulder of the surface plate does not cause any protrusion.

の摩耗が防止でき、研磨によるワーク形状精度。Prevents wear and improves workpiece shape accuracy through polishing.

のばらつきを小さくおさえることが可能となる6゜本発
明による定盤の形状は四角形のみとは限。
The shape of the surface plate according to the present invention is not limited to only a rectangular shape.

らす、第7図に示すような円形形状にも適用で。It can also be applied to circular shapes as shown in Figure 7.

きる。この場合、ワーク1は定盤径方向である。5R方
向に往復運動し、かつθ方向にゆっくり回転する。また
定盤15は一方向に回転し、ワークとの間に相対速度を
生せしめる。この第7図の場合にも、定盤内周・外周部
に末広がり形状の溝18を設け、かつR方向の移動距離
を定盤幅r。
Wear. In this case, the workpiece 1 is in the radial direction of the surface plate. It reciprocates in the 5R direction and slowly rotates in the θ direction. Furthermore, the surface plate 15 rotates in one direction, creating a relative speed between it and the workpiece. In the case of FIG. 7 as well, grooves 18 that widen toward the end are provided on the inner and outer peripheries of the surface plate, and the moving distance in the R direction is set to the surface plate width r.

より小さくしはみ出し量すを防止している。 ・本発明
の適用例は平面定盤のみとは限らず第8図に示すような
球面形状定盤16に対しても同。
It is made smaller and prevents protrusion. - The present invention is applicable not only to a flat surface plate but also to a spherical surface plate 16 as shown in FIG.

様に適用でき、定盤外周部に末広がり形状の溝19を設
け、定盤断面形状に対する、ワーク断面1形状のだれ量
を同様に改善することができる。。
By providing a groove 19 that widens toward the end on the outer periphery of the surface plate, it is possible to similarly improve the amount of sagging of the cross-sectional shape of the workpiece with respect to the cross-sectional shape of the surface plate. .

このように1本発明は定盤形状に拘らず適用。In this way, the present invention can be applied regardless of the shape of the surface plate.

可能であり、また定盤の代りに砥石を用いた場。Possible, and where a grindstone is used instead of a surface plate.

合にも適用できる。また仕上研磨においては、。It can also be applied when Also, for final polishing.

硬質金属定盤2115.16の上て厚さの薄い軟質。A thin, soft material on top of a hard metal surface plate 2115.16.

定盤を密着固定させて、用いることもできる。。It can also be used by closely fixing the surface plate. .

また第6〜8図に示す、溝部の深さdは本発明。Further, the depth d of the groove shown in FIGS. 6 to 8 is according to the present invention.

ではワーク半径程度として考えたが、溝深さが、さらに
長くても本発明の効果を生じさせること。
Although the groove depth was considered to be approximately the radius of the workpiece, the effect of the present invention can be obtained even if the groove depth is longer.

が可能で、例えば該溝が定盤長さにわたって鳩。It is possible, for example, that the groove extends over the length of the surface plate.

続していてもよい。It may continue.

本発明の他の例を第9図に示す。第5図に示す駆動機構
によりワーク移動量の定盤長さからのはみ出し量すを与
えて研磨する際にby一定値に保っていたのでは、なか
なか精度よく所定2( のワーク断面形状が得られない場合がある。す。
Another example of the present invention is shown in FIG. If the drive mechanism shown in Fig. 5 were used to give the amount of workpiece movement beyond the length of the surface plate and keep it at a constant value during polishing, a workpiece cross-sectional shape of the predetermined 2( ) could be obtained with good accuracy. There may be cases where it is not possible.

なわち本発明でははみ出し量すを積極的に使っ。That is, in the present invention, the protruding scale is actively used.

て定盤断面形状とは異なった非平面、非球面形。A non-planar, aspherical shape that differs from the cross-sectional shape of the surface plate.

状のワークを作り出す方法に関する。はみ出し。This article relates to a method for producing a shaped workpiece. Protruding.

量b(一定値)の与え方によっては、定盤摩耗、とのか
ねあいにより第11図に示すように、ワー。
Depending on how the amount b (constant value) is given, the wear of the surface plate may be affected, as shown in FIG. 11.

り断面形状が第4図(2)のような中門形状とはな。The cross-sectional shape is different from the middle gate shape as shown in Figure 4 (2).

らす、ワーク中央部に中凸形状が残ってしまう。A convex shape remains in the center of the workpiece.

場合がある。これを改善する方法としてはみ出。There are cases. I'm not sure how to improve this.

し量すを第9図に示すように時間的に変化させ1.。1. Change the measured value over time as shown in FIG. .

例えばb = bosinWt  とすることによりワ
ーク断面形状を中心から周辺までなだらかに変化させ、
第4図(2)のような理想形状を、定盤の摩耗状態によ
らず作りだすことができ、また逆に第11図の如き中凸
−周辺凹形状を意図的に作り出丁こ5 とができる。
For example, by setting b = bosinWt, the cross-sectional shape of the workpiece is changed gently from the center to the periphery,
The ideal shape as shown in Fig. 4 (2) can be created regardless of the state of wear of the surface plate, and conversely, the central convex-periphery concave shape as shown in Fig. 11 can be created intentionally. I can do it.

第9図の動きを第3図で行なわせるには偏心軸10を駆
動する送りモータ13と、送りネジ12を設け、時間と
共に偏心量−を制御するように指令電圧を送りモータ1
3に与えてやればよい。
In order to perform the movement shown in FIG. 9 as shown in FIG. 3, a feed motor 13 for driving the eccentric shaft 10 and a feed screw 12 are provided, and a command voltage is applied to the motor 1 to control the amount of eccentricity over time.
You can give it to 3.

また第3図のようなリンク機構を用いずに、。Also, without using a link mechanism as shown in Fig. 3.

XY移動テーブルでX、Y軸モータを直結させ。Directly connect the X and Y axis motors with an XY moving table.

る駆動方式を用いても同様であり、さらに第10図のよ
うに正弦波的送り機構ではなく、一定速。
The same is true even if a driving system is used, and furthermore, as shown in FIG.

度の往復送り運動とすることもできる。It is also possible to perform a reciprocating movement of several degrees.

〔発明の効果〕    。〔Effect of the invention〕 .

本発明により、簡単な装置構成によりワー久の平面度1
球面度を所定値の精度内で仕上げる。
According to the present invention, the flatness of the work piece can be increased to 1 with a simple device configuration.
Finish the sphericity within a predetermined accuracy.

ことができ、また任意の非平面、非球面形状を。Can also have any non-planar, aspherical shape.

加工することも可能となる。        1゜It is also possible to process it.      1゜

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、従来のXY摺動ラップ装置を示す。 斜視図、第2図は、はみ出し量を有するラップ。 法を示す図、第6図は、XY摺動ラップ装置の。 運動機構を示す部分断面図、第4図(n 、 (2)は
、15ワークのだれ形状を示す図、第5図は、ワークは
み出し量と形状だれどの関係を示すグラフ。 第6.718図は、本発明による溝付き定盤を示す図、
第9.10図は、本発明によるはみ出し量制御法を説明
する説明図、第11図は、ワーク0 のだれ形状を示す図である。 1・・、ワーク、2・・・定盤、3・・・リサージュ図
形・、4・・・ホルダ、5・・・球面軸受、6・・・棒
、7.9・・・・軸受、8・・・アーム、10・・・偏
心軸、11・・・回転円板・。 12・・・送りネジ、13・・・送りモータ、14・・
・回転モー5り、15・・・円形定盤、16・・・球面
形定盤、17.18.、。 19・・・定盤外周部の末広がり形状の溝。 】0 才1図 Y 才2図 (1) 才3図 才4図 才5図 蚊 オフ閃
FIG. 1 shows a conventional XY sliding wrap device. The perspective view and FIG. 2 show a wrap having an amount of protrusion. Figure 6 shows the XY sliding wrap device. FIG. 4(n) is a partial cross-sectional view showing the movement mechanism, FIG. is a diagram showing a grooved surface plate according to the present invention,
FIGS. 9 and 10 are explanatory diagrams for explaining the protrusion amount control method according to the present invention, and FIG. 11 is a diagram showing the droop shape of workpiece 0. 1... Work, 2... Surface plate, 3... Lissajous figure, 4... Holder, 5... Spherical bearing, 6... Rod, 7.9... Bearing, 8 ...Arm, 10...Eccentric shaft, 11...Rotating disk. 12...Feed screw, 13...Feed motor, 14...
- Rotating motor 5, 15... circular surface plate, 16... spherical surface plate, 17.18. ,. 19... Groove with a widening shape on the outer periphery of the surface plate. 】0 Year 1 figure Y Year 2 figure (1) Year 3 figure Year 4 figure Year 5 figure Mosquito off flash

Claims (1)

【特許請求の範囲】 1 ラップ定盤の研磨面外周部に、ワーク摺動。 方向(x、y方向)に沿って溝を付け、定盤外、−1局
部での研磨能率を下げたことを特徴とする研。 磨装置。 2、 上記溝の幅を、定盤外周にいくほど漸次広。 くするようにしたことを特徴とする特許請求の。 範囲第1項記載の研磨装置。        166 
ラップ定盤長さに対して、ワーク摺動振動を長くとり、
定盤からのワークはみ出し量を与え、かつこのはみ出し
量を時間と共に漸次変化させることを特徴とした研磨装
置。
[Claims] 1. A workpiece is slid on the outer periphery of the polishing surface of the lapping surface plate. A grinder characterized by having grooves along the directions (x, y directions) to reduce the polishing efficiency in -1 local areas outside the surface plate. Polishing device. 2. Gradually increase the width of the above groove toward the outer periphery of the surface plate. The patent claim is characterized in that: The polishing device according to scope 1. 166
The sliding vibration of the workpiece is made longer than the length of the lap surface plate.
A polishing device characterized by giving an amount of protrusion of a workpiece from a surface plate and gradually changing the amount of protrusion over time.
JP57203612A 1982-11-22 1982-11-22 Polishing machine Pending JPS5997840A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57203612A JPS5997840A (en) 1982-11-22 1982-11-22 Polishing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57203612A JPS5997840A (en) 1982-11-22 1982-11-22 Polishing machine

Publications (1)

Publication Number Publication Date
JPS5997840A true JPS5997840A (en) 1984-06-05

Family

ID=16476922

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57203612A Pending JPS5997840A (en) 1982-11-22 1982-11-22 Polishing machine

Country Status (1)

Country Link
JP (1) JPS5997840A (en)

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