JPS5996257A - Composition for electroless silver plating by friction and plating method - Google Patents
Composition for electroless silver plating by friction and plating methodInfo
- Publication number
- JPS5996257A JPS5996257A JP20610782A JP20610782A JPS5996257A JP S5996257 A JPS5996257 A JP S5996257A JP 20610782 A JP20610782 A JP 20610782A JP 20610782 A JP20610782 A JP 20610782A JP S5996257 A JPS5996257 A JP S5996257A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- silver
- composition
- component
- compsn
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
Abstract
Description
【発明の詳細な説明】
(発明の対象)
本発明は摩擦により、かつ無電解的に被めっき(従来技
術)
大型品へのめつきや据付けられた被めつき1勿品をその
現場でめっきを行なう場合、めっき浴槽を用いたらh予
めつきあるいは無電解めっき方法では、大型のめつき浴
槽や多紘のめつき液を妥すること、据付けられた被めっ
き物品を取外さなければならないことなどから、作条性
、作業能率あるいは経済性の点で大変不都合である。[Detailed Description of the Invention] (Subject of the Invention) The present invention applies frictional and electroless plating (prior art). Plating of large items and plating of installed items on-site. When using a plating bath, if you use a plating bath or electroless plating method, you will have to use a large plating bath or Tahiro plating solution, and you will have to remove the installed object to be plated. Therefore, it is very inconvenient in terms of cropping efficiency, work efficiency, and economy.
このため、めっき浴槽全必要とせず、しかも無i S的
にめっきすることのできるめっき組成物が極く一部で市
販されている。この組成物は少量の水分全県〃口し、こ
れ?:被めっき物品表面に付着せしめ、かつ、布やスポ
ンジなどで摩擦することにより金属全析出させることが
できる。しかし、このめっき組成物の欠点は厚付けめっ
きができず、めっき操作を続けてもせいぜい1μm程度
が限度であった。For this reason, only a few plating compositions are commercially available that do not require a full plating bath and can be plated without using iS. This composition contains a small amount of water. : By attaching it to the surface of the article to be plated and rubbing it with a cloth or sponge, it is possible to completely deposit the metal. However, the drawback of this plating composition is that thick plating cannot be achieved, and even if the plating operation is continued, the thickness is limited to about 1 μm at most.
(発明の要点)
本発明の目的はめつき浴槽全必要とせず、かつ無電解的
に、しかも厚付は可能す摩擦による銀めっき用組成物お
よび該組成物を用いためつき方法を提供することにある
。(Summary of the Invention) An object of the present invention is to provide a friction-based silver plating composition that does not require a full plating bath, can be applied electrolessly and thickly, and a method for plating using the composition. be.
本発明のめっき用組成物は、次の(a)〜(C)成分、
(a) 銀塩、
(b) Li、Ba、Ca、Mg、At、λ4n。The plating composition of the present invention comprises the following components (a) to (C):
(a) Silver salt, (b) Li, Ba, Ca, Mg, At, λ4n.
Zn、Co、 Ni、 SnおよびCuから選ばれる金
属の塩類、
を含み、かつ非水溶液型であることを特徴とする。It is characterized by containing salts of metals selected from Zn, Co, Ni, Sn and Cu, and being non-aqueous solution type.
本発明の組成物を構成する各成分について説明する。Each component constituting the composition of the present invention will be explained.
(a)成分である銀供給源としての銀塩としては例えば
酢酸銀、硝酸銀、塩化銀、硫酸銀および鹸化銀などが用
いられる。特に酢酸銀、硫酸銀および硝酸銀が好ましい
。Examples of silver salts used as a silver supply source, which is component (a), include silver acetate, silver nitrate, silver chloride, silver sulfate, and silver saponide. Particularly preferred are silver acetate, silver sulfate and silver nitrate.
(b)成分である水素化ホウ素化合物は水垢全放出し還
元剤として1′「用するものと推測される。水素化ホウ
素ナトリウム、水素化ホウ素カリウム、水素化ホウ素リ
チウム、水素化ホウ素トリエチルリチウムおよびジメチ
ルアミンボラン((CH3)2 HNBHslなどが用
いられる。特に有用なのは水素化ホウ素ナトリウムであ
る。It is presumed that the borohydride compound, which is the component (b), releases all lime scale and is used as a reducing agent. Sodium borohydride, potassium borohydride, lithium borohydride, triethyllithium borohydride, Dimethylamine borane ((CH3)2HNBHsl, etc.) may be used. Particularly useful is sodium borohydride.
(C)成分であるLit 13a、Ca、Mg、kt。(C) Components Lit 13a, Ca, Mg, kt.
Mn、Zn、X”e、Co、Nl、SnおよびCuの塩
類としては伏畝塩、硝赦塩、ハロゲン化物、炭j2塩、
故化曲などイオン化しうるものであれば使用可能である
。具体的には、例えばLi5o、。Salts of Mn, Zn,
Any material that can be ionized, such as aged music, can be used. Specifically, for example, Li5o.
Li Ct、 LiNO2、LIBr、 Li2C
O5t ま。LiCt, LiNO2, LIBr, Li2C
O5t Ma.
BaSO4、BaCO3,BaCt2 、caso、、
Ca(NO3)2゜Mg C1,2,Mg SO4、A
tC4、A72 (804)3 、Mn3O4。BaSO4, BaCO3, BaCt2, caso,,
Ca(NO3)2゜Mg C1,2,Mg SO4,A
tC4, A72 (804)3, Mn3O4.
MnCt2.ZnSO4,ZnCl2.C080,、C
0Ct2゜N15o、 、 (CH3C00)2 Ni
、 5nso4.5nct2゜CuSO4,(CH3C
OO)2Cu、CLIO,cu、oなどがある。本発明
者らはこれらすべてについて実験を行つた結果、特に、
めっき膜の平滑性や光沢などの点で、リチウムおよびマ
グネシウム金属塩がすぐれておυ、なかでも、L %S
04 、 L ’ NO3、L I C1゜MgSO
4,DJgCt、がすぐれていることを確認した。MnCt2. ZnSO4, ZnCl2. C080,,C
0Ct2゜N15o, , (CH3C00)2 Ni
, 5nso4.5nct2゜CuSO4,(CH3C
OO)2Cu, CLIO, cu, o, etc. The inventors conducted experiments on all of these, and found that, in particular,
Lithium and magnesium metal salts are excellent in terms of the smoothness and gloss of the plating film, especially L%S.
04, L' NO3, L I C1゜MgSO
4. DJgCt was confirmed to be excellent.
本発明において、前述の(a)〜(C)成分はいずれも
II!riもしくは2種以上用いることができる。In the present invention, all of the above-mentioned components (a) to (C) are II! ri or two or more types can be used.
本発明においては上記成分の他に、杯電解めっきに用い
られている公知の炭酸水素ナトリウムなどの緩待剤や光
沢向上剤例えばサッカリンナトリウム、めっき膜の伸び
全向上させるためのステアリン酸や低級アルコールなど
を添加することもできる。In addition to the above-mentioned components, the present invention also uses known slowing agents such as sodium bicarbonate used in cup electrolytic plating, gloss improvers such as saccharin sodium, stearic acid and lower alcohols to improve the elongation of the plated film, etc. can also be added.
各成分の一般的な配合割合についていえば、銀塩100
重量部に対し、還元剤5〜100重量部、銀よりも標準
電極電位の卑なる金属の塩類10〜200重量部、また
、緩衝剤はO〜300点量部、光沢向上剤は0〜50重
量部、伸び向上剤は0〜30重量部の範囲が適当である
。Regarding the general blending ratio of each ingredient, silver salt 100
Based on parts by weight, 5 to 100 parts by weight of reducing agent, 10 to 200 parts by weight of salts of metals having a less standard electrode potential than silver, 0 to 300 parts by weight of buffering agent, and 0 to 50 parts by weight of gloss improver. The appropriate amount of the elongation improver is in the range of 0 to 30 parts by weight.
本発明のめっき用組成物は、湿気をしゃ断して保管する
か、水素化ホウ素ナトリウムもしくは銀垣企別個に保管
しておくのが望ましい。It is desirable to store the plating composition of the present invention in a manner that excludes moisture, or to store it separately in sodium borohydride or silver fence.
不発り]のめつき用力)組成物を用いためつき方法のう
ち、最も効果的な方法は、粉末混合物からなる該めっき
用組成*全金属からなる被めっき体上に適轟二F役のせ
、その−ヒから少量の水を含んだ繊維質材料例えば木綿
布やポリエステル繊維布などの繊維質材料やスポンジな
どで摩擦する方法および被めっき体上にめっき用組成物
をのせ、これに少量の水會加えて湿潤状態とし、その上
から繊維材料やスポンジなどでノ1擦する方法である。Among the plating methods using a composition (non-explosion), the most effective method is to apply the plating composition consisting of a powder mixture on an object to be plated consisting of all metals, - A method of rubbing with a fibrous material containing a small amount of water, such as a fibrous material such as cotton cloth or polyester fiber cloth, or a sponge, and a method of placing the plating composition on the object to be plated and adding a small amount of water to it. In this method, the material is soaked in water to make it wet, and then rubbed with a fiber material, sponge, etc.
別の方法としては、予め、めっき用組成物に少量を水を
加えて湿層状態ないしスラリー状態とし、これを被めっ
き体上にのせ、その上全繊維質材料やスポンジなどでr
!f”j遠する方法もある。Another method is to add a small amount of water to the plating composition in advance to form a wet layer or slurry state, place this on the object to be plated, and then rip it with a fully fibrous material, sponge, etc.
! There is also a way to distance f”j.
めつき作粟は所望のめつき膜厚となるまでめっき用組成
1勿を破めっき体上に少量ずつ補給しながら行うのが最
も効果的である。勿論、水分も補給し外から行なわれる
。It is most effective to carry out plating by adding a small amount of the plating composition onto the broken plated body until the desired plating film thickness is achieved. Of course, it is done from outside with hydration provided.
本発明のめっき用組成物はとりわけ、銅系あるいは鉄系
物品表面のめつきに有用である。The plating composition of the present invention is particularly useful for plating the surfaces of copper-based or iron-based articles.
実施例1
(H浄にした銅板上に、欠の(2i)〜(f)の+t′
ll成からなるめっき用組成物(粉米混会物)を置き、
水分金含ませた布を用いてその上から、20〜50儒/
秒の速度で摩瑯することによシ銀めっき膜を析出させた
。この場合、銅板1cr/12当υの上記組成物の便用
量(銀量として)とめつき膜厚との131」係を図の:
aE 線Aで示す。曲線Bは硫酸リチウム無添加の場合
の結果を示すものである。析出しためつき膜は平滑で光
沢に富んだものであった。Example 1 (On a H-purified copper plate, +t' of the missing parts (2i) to (f)
Place a plating composition (powdered rice mixture) consisting of
Using a cloth moistened with water and gold, apply 20 to 50 yen/
A silver plating film was deposited by polishing at a speed of seconds. In this case, the relationship between the fecal amount (in terms of silver amount) and the plating film thickness of the above composition for 1 cr/12 equivalents of copper plate is shown in the figure:
aE Shown by line A. Curve B shows the results without the addition of lithium sulfate. The deposited film was smooth and glossy.
(a) 酢酸銀(C)I、COOAg )、 1
00重量部(b) 水素化ホウ素ナトリウム(NaB
H,)25重量部
(C) サッカリンナトリウム(CaH+C08O2
NNa)25重重f)1 部
(d) 硫酸リチウム(Li2SO4) 50
車量部(e) ステアリンt9 (CH3(CH2)
16 C00H)25重量部
(f) 炭酸水拭ナトリウム(N a14cOa )
225 fii量七部
実施例2
前記実施例1の組成中、(d)成分として硫酸リチウム
の代りに、次表に示すZ Q a頑の金属塩50重名(
:部を、それぞれ別][・コに用い、即ち、20種類の
組成物金用いてめっきを行った。(a) Silver acetate (C)I, COOAg), 1
00 parts by weight (b) Sodium borohydride (NaB
H,) 25 parts by weight (C) Sodium saccharin (CaH+C08O2
NNa) 25 parts f) 1 part (d) Lithium sulfate (Li2SO4) 50
Vehicle weight section (e) Steering wheel t9 (CH3 (CH2)
16 C00H) 25 parts by weight (f) Sodium carbonate (Na14cOa)
225 fii amount: 7 parts Example 2 In the composition of Example 1, instead of lithium sulfate as component (d), 50 heavy metal salts of Z
plating was carried out using 20 different compositions of gold.
めっき作業は組成物を#ifi給しながら所望膜厚とな
るまで義続して行った。この結果、10μm厚の銀めつ
8 JMが容易に行われた。丑た、上記20イ重煩のう
ち、LiN0.、t;−よびRJ’gSO,は前記Li
5O,と並んで膜の平滑性および光沢の魚で極めてすぐ
れていた。The plating operation was continuously carried out while supplying the composition #ifi until the desired film thickness was achieved. As a result, silver 8 JM with a thickness of 10 μm was easily formed. Of the 20 serious problems mentioned above, LiN0. , t;- and RJ'gSO, are the Li
Along with 5O, the film had excellent smoothness and gloss.
(発明の効果)
本発明においては、特に前記(C)成分である金属の塩
yAの作用によシ、即ち、上記金属が還元剤により析出
し、これが媒介し、電気化学的作用によって銀の析出が
昭和することなく進行するものと部側される。これによ
り、厚付けめっきが可能となった。勿論、めっき浴槽な
どの設備も不要であり、現地での(’iiiイi’sめ
っきや大型品のめつきに当シ、大変有オUで必る。(Effects of the Invention) In the present invention, the metal salt yA, which is the component (C), precipitates through the action of the metal salt yA, which is the component (C). It is assumed that the precipitation progresses without reaching the Showa era. This made thick plating possible. Of course, equipment such as a plating bath is not required, and is very necessary for on-site plating and plating of large items.
図は本発明の一実施例になる銀めっき用組成物を用いて
めっき全行つ几楊合のめつき膜厚とそれに要した該組成
物の量(銀量に換算した値ンとの関係を示すグラフであ
る。The figure shows the relationship between the plating film thickness when all plating is performed using a silver plating composition according to an embodiment of the present invention and the amount of the composition required (value converted to silver amount). This is a graph showing.
Claims (1)
5梢の塩類、 全含み、かつ非水溶液型であること全特徴とする摩擦に
よる無電解銀めっき用組成物。 2、 次の(a)〜(C)成分、 (a) 銀塩、 (b) 水素化ホウ素化合物1 (C)Li、Ba、Ca、Mg、A4.Mn。 zn、co、 Nt、 SnおよびCuから選ばれる金
属の塩類、 を・言む非水溶液状態の組成物を被めっき体上に付滑せ
しめ、かつ湿IM状態において該組成物ととも[Claims] 1. The following components (a) to (C): (a) silver salt, (b) hydrogenated borosilicate compound, (c) Li, Ba, Ca, Mg, A-1 , Mn. 1. A composition for electroless silver plating by friction, which contains all gold-based salts selected from Zn, Co, Ni, Sn and Cu, and is of a non-aqueous solution type. 2. The following components (a) to (C): (a) Silver salt; (b) Boron hydride compound 1; (C) Li, Ba, Ca, Mg, A4. Mn. A composition in the form of a non-aqueous solution containing metal salts selected from Zn, Co, Nt, Sn and Cu is applied onto the object to be plated, and the composition is mixed with the composition in a wet IM state.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20610782A JPS5940903B2 (en) | 1982-11-26 | 1982-11-26 | Composition and plating method for electroless silver plating using friction |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20610782A JPS5940903B2 (en) | 1982-11-26 | 1982-11-26 | Composition and plating method for electroless silver plating using friction |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5996257A true JPS5996257A (en) | 1984-06-02 |
JPS5940903B2 JPS5940903B2 (en) | 1984-10-03 |
Family
ID=16517913
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20610782A Expired JPS5940903B2 (en) | 1982-11-26 | 1982-11-26 | Composition and plating method for electroless silver plating using friction |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5940903B2 (en) |
-
1982
- 1982-11-26 JP JP20610782A patent/JPS5940903B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5940903B2 (en) | 1984-10-03 |
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