JPS599034Y2 - Beam liquid processing equipment - Google Patents

Beam liquid processing equipment

Info

Publication number
JPS599034Y2
JPS599034Y2 JP14578680U JP14578680U JPS599034Y2 JP S599034 Y2 JPS599034 Y2 JP S599034Y2 JP 14578680 U JP14578680 U JP 14578680U JP 14578680 U JP14578680 U JP 14578680U JP S599034 Y2 JPS599034 Y2 JP S599034Y2
Authority
JP
Japan
Prior art keywords
liquid
processing
liquid supply
tank
processing equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14578680U
Other languages
Japanese (ja)
Other versions
JPS5769889U (en
Inventor
昭夫 袋井
Original Assignee
ワイケイケイ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ワイケイケイ株式会社 filed Critical ワイケイケイ株式会社
Priority to JP14578680U priority Critical patent/JPS599034Y2/en
Publication of JPS5769889U publication Critical patent/JPS5769889U/ja
Application granted granted Critical
Publication of JPS599034Y2 publication Critical patent/JPS599034Y2/en
Expired legal-status Critical Current

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Description

【考案の詳細な説明】 多孔中空ビーム軸上に、織物、テープ、スライドファス
ナーチェーンなどの長尺物を多層に巻着して円筒状被処
理物とし、その被処理物層を通して、処理液を加圧流通
せしめて処理すること、このさい中空ビーム軸内部に扇
形区分を設けて加圧処理液を供給し、扇形区分以外の部
分を吸引通液部とし、ビーム軸と前記区分とを相対的に
回転移動せしめて均一処理を行うことは例えば特公昭5
0−40188号公報、西独特許第2061348号明
細書に記載され、公知である。
[Detailed description of the invention] Long objects such as textiles, tapes, and slide fastener chains are wound in multiple layers on the shaft of a porous hollow beam to form a cylindrical object, and the processing liquid is passed through the layers of the object to be processed. Processing is carried out through pressurized flow. At this time, a fan-shaped section is provided inside the hollow beam shaft to supply the pressurized processing liquid, and the part other than the fan-shaped section is used as a suction liquid passage section, and the beam axis and the section are made relative to each other. For example, the technique of rotating and moving the
It is described in Japanese Patent No. 0-40188 and West German Patent No. 2061348, and is well known.

本考案は上記公知のビーム液処理装置における加圧処理
液の供給、吸引処理液の排出経路をビーム軸に対し複数
対称的に配設することによって、被処理物層の変形、み
だれを防止し、しかも均一迅速な液処理を行い得るよう
に改良した装置を提供するものである。
The present invention prevents deformation and sagging of the object layer by arranging a plurality of paths for supplying the pressurized processing liquid and discharging the suction processing liquid symmetrically with respect to the beam axis in the above-mentioned known beam liquid processing apparatus. Moreover, the present invention provides an improved apparatus that can perform uniform and rapid liquid processing.

すなわち、従来公知の前記のごときビーム液処理装置に
おいては、中空ビーム軸内から供給される加圧処理液は
被処理物巻層の小区分範囲を通して流動するため、その
流動抵抗により巻層はその一方向に押出され、他部分の
吸液と相俟って、大きなたるみを生じつつその位置が回
転方向に移動する結果、巻層のゆるみ、みだれを生じ易
く、特に細巾のテープ、ファスナーチェーンのようなス
パイラル巻層の場合にはテープ自体の変形を生ずる欠陥
があった。
In other words, in the conventionally known beam liquid processing apparatus as described above, the pressurized processing liquid supplied from the inside of the hollow beam shaft flows through the subdivision range of the wound layer of the object to be treated, and due to the flow resistance, the wound layer is As a result of being extruded in one direction and moving in the direction of rotation while creating a large amount of slack when combined with liquid absorption from other parts, the winding layer tends to loosen and sag, especially on narrow tapes and zipper chains. In the case of spirally wound layers such as the above, there was a defect that caused deformation of the tape itself.

この点に鑑み、本考案は上記のごとき巻層のたるみを可
及的に減少し、しかもより迅速均一な液処理を可能にす
べき手段につき研究した結果、巻層に対する加圧処理液
の流通位置を複数とするとともに、巻層全周に対して、
処理液流通により生ずる巻層内の応力をバランスせしめ
るよう該流動位置を軸心に対して対称的に配置せしめる
ことが極めて効果的であることを知り、本考案を完或し
たものである。
In view of this, the present invention was developed as a result of research into means to reduce the sagging of the wound layer as much as possible and to enable faster and more uniform liquid treatment. In addition to multiple positions, for the entire circumference of the winding layer,
The present invention was completed based on the finding that it is extremely effective to arrange the flow position symmetrically with respect to the axis in order to balance the stress within the wound layer caused by the flow of the processing liquid.

以下、図面に示す実施例により、本考案を詳しく説明す
る。
Hereinafter, the present invention will be explained in detail with reference to embodiments shown in the drawings.

第1図は、要部を断面とした本装置の側面図であり、第
2図は第1図A−A線における要部の断面正面図であり
、第1図の断面は第2図のB−B線におけるものを示し
たものである。
FIG. 1 is a side view of the device with the main part taken in section, and FIG. 2 is a cross-sectional front view of the main part taken along line A-A in FIG. 1. The figure is shown along the line B-B.

図において1は処理槽、2は槽蓋、3は槽後壁であり、
4は槽後壁3から槽内に突出した処理液供給管、5は処
理液供給管4の先端に固着した整流筒である。
In the figure, 1 is the treatment tank, 2 is the tank lid, and 3 is the rear wall of the tank.
4 is a processing liquid supply pipe protruding into the tank from the rear wall 3 of the tank, and 5 is a rectifying tube fixed to the tip of the processing liquid supply pipe 4.

6は被処理物巻層Sを有するビームである。6 is a beam having a wound layer S of the object to be processed.

7は槽蓋2に設けた排液管8は槽後壁3に設けた排液管
であり、それぞれバルブ9,10を介して、吸液管11
に接続され、熱交換器H、ポンプPを経て、給液管12
、処理液供給管4に連通される。
Reference numeral 7 indicates a liquid drain pipe 8 provided on the tank lid 2, which is a liquid drain pipe provided on the rear wall 3 of the tank, and is connected to a liquid suction pipe 11 through valves 9 and 10, respectively.
is connected to the liquid supply pipe 12 via the heat exchanger H and the pump P.
, are communicated with the processing liquid supply pipe 4.

整流筒5は、その中心に多孔整流管51を有し、その前
端に、槽蓋2の押杆21の先端が嵌人保持される凹部5
2を有する前壁53、多孔整流管51の半径方向に延び
る圧液供給室Eを形或する4枚の湾曲弧状仕切板54が
設けられ、該圧液供給室Eの前後端面ば封板55 ,5
6により封止され、湾曲弧状仕切板54の外側は、前記
排液管7,8に連通する吸液室■となるように構威され
る。
The rectifier tube 5 has a porous rectifier tube 51 at its center, and a recess 5 at its front end into which the tip of the push rod 21 of the tank lid 2 is held.
2, four curved arc-shaped partition plates 54 forming a pressure liquid supply chamber E extending in the radial direction of the porous rectifier tube 51 are provided, and sealing plates 55 are provided on the front and rear end surfaces of the pressure liquid supply chamber E. ,5
6, and the outside of the curved arc-shaped partition plate 54 is configured to form a liquid suction chamber (3) communicating with the liquid drain pipes 7, 8.

湾曲弧状仕切板54 .54の外端には、ビーム6の多
孔巻胴61の内面に摺接するパッキング57が適宜の巾
を有するように固着され、また多孔板58により圧液供
給室Eの外面を形戊する。
Curved arc-shaped partition plate 54. A packing 57 having an appropriate width is fixed to the outer end of the member 54 so as to be in sliding contact with the inner surface of the perforated drum 61 of the beam 6, and the outer surface of the pressure liquid supply chamber E is shaped by the perforated plate 58.

被処理物の巻層Sを有するビーム6は、処理槽1の底部
のレール13上を車輪31により移動し得る架台32に
設けたローラー33により、ビーム6の前後の鍔62の
外周面で回転し得るよう支持され、前記整流筒5の外面
に多孔巻胴61内面が摺接して嵌着され、ビーム6の後
端は槽後壁3内部に設けられた回転筒14端に嵌着し、
ピン15により係止され、ビーム6の前端は、槽蓋2の
押杆21に回転し得るよう支持された保持板22の外周
面に嵌着保持される。
The beam 6 having the rolled layer S of the material to be processed is rotated on the outer peripheral surface of the front and rear flanges 62 of the beam 6 by rollers 33 provided on a pedestal 32 that can be moved by wheels 31 on the rails 13 at the bottom of the processing tank 1. The inner surface of the porous winding drum 61 is fitted in sliding contact with the outer surface of the straightening tube 5, and the rear end of the beam 6 is fitted into the end of the rotating tube 14 provided inside the tank rear wall 3.
The front end of the beam 6 is held by a pin 15 and is fitted and held on the outer peripheral surface of a holding plate 22 rotatably supported by a push rod 21 of the tank lid 2 .

前記回転筒14は、処理液供給管4に被嵌されて、その
後端にウオーム歯輪16が固設され、外部動力により回
転されるウオーム17により回転駆動される。
The rotary cylinder 14 is fitted onto the processing liquid supply pipe 4, has a worm gear 16 fixedly installed at its rear end, and is rotationally driven by a worm 17 rotated by external power.

18は上部給液管で、給液管12から分岐しバルブ19
を介して、処理槽1の略中央上部に連通し、分配室20
を経てビーム6上面に処理液を流下供給するものである
18 is an upper liquid supply pipe, which branches from the liquid supply pipe 12 and is connected to a valve 19.
The distribution chamber 20 communicates with the approximately central upper part of the processing tank 1 through the
The processing liquid is supplied to the upper surface of the beam 6 through the flow.

25は処理槽1の上部に設けた処理液のオーバーフロー
兼減圧、または加圧用気体用の配管であり、26は槽蓋
2と処理槽1とを密着固定する締着具、27は排液管7
と吸液管11とを連続固定する締着具、28は染液、洗
滌水その他の処理液の供給、排出用の配管である。
25 is a pipe provided at the top of the processing tank 1 for overflow and depressurization of the processing liquid, or for pressurizing gas, 26 is a fastener for tightly fixing the tank lid 2 and the processing tank 1, and 27 is a drain pipe. 7
A fastener 28 is a pipe for supplying and discharging dyeing liquid, washing water, and other processing liquids.

以上の構戊の下に、処理槽1内に密封装着された被処理
物の巻層Sを有するビーム6は、配管28から所望の処
理液を第2図に示すレベル30まで給液された状態で下
記のように液処理される。
Under the above structure, the beam 6 having the rolled layer S of the material to be processed is sealed and installed in the processing tank 1, and the desired processing liquid is supplied from the pipe 28 to the level 30 shown in FIG. In this state, the liquid is treated as follows.

処理液はポンプPにより加圧されて給液管12、処理液
供給管4を経て、整流筒5内部の多孔整流管51からそ
の半径方向の90゜位相差に配置された圧液供給室Eに
供給され、巻層Sを透過し、さらに巻層Sの外面から、
整流筒5内部の吸流室Vに巻層Sに透過して吸引され、
前後の吸流管11.12を経て熱交換器Hを通してポン
プPの吸引側に至る処理液循環が大矢印のように行われ
るとともに、ビーム6はウオーム17,ウオーム歯輪1
6により回転筒14の回転とともに前記整流筒5に接し
つつ小矢印方向に回転される。
The processing liquid is pressurized by the pump P, passes through the liquid supply pipe 12 and the processing liquid supply pipe 4, and flows from the porous rectification pipe 51 inside the rectification tube 5 to the pressure liquid supply chamber E arranged at a 90° phase difference in the radial direction. is supplied to the winding layer S, passes through the winding layer S, and further from the outer surface of the winding layer S,
It passes through the winding layer S and is sucked into the suction chamber V inside the rectifier cylinder 5,
The treatment liquid is circulated through the front and rear suction pipes 11 and 12, through the heat exchanger H, and to the suction side of the pump P as shown by the large arrow.
6, it is rotated in the direction of the small arrow while being in contact with the rectifying cylinder 5 along with the rotation of the rotary cylinder 14.

したがつと、ビーム上の巻層Sは、ビーム6の1回転毎
に4回の液流通方向の変換が行われて、急速均一な液処
理が行われ、各加圧透過、吸引透過流はビーム6の巻層
を4等分した状態で進行するので、巻層の弛緩、圧縮分
布が分散され、過度のふくれ、変形が防止されるのであ
る。
Therefore, the liquid flow direction of the wound layer S on the beam is changed four times for each rotation of the beam 6, and rapid and uniform liquid treatment is performed, and each pressurized permeation flow and suction permeation flow are Since the beam 6 advances with the winding layer divided into four equal parts, the relaxation and compression distribution of the winding layer is dispersed, and excessive swelling and deformation are prevented.

このさい、処理液レベル30上面に露出した吸液室面か
ら、ガスの吸引が行われると気泡が巻層S内に生じ、処
理斑となる倶があるので、バルブ19を調節して、所要
量の処理液を上部給液管18を経て、処理槽1の上部分
配室20に供給し、ビーム6の上面に分布流下して、上
部の吸液室■に向って処理液が吸引透過する液量以上を
給液する。
At this time, if gas is sucked from the liquid suction chamber surface exposed on the upper surface of the processing liquid level 30, bubbles may be generated in the wound layer S, resulting in processing spots, so adjust the valve 19 to A certain amount of processing liquid is supplied to the upper distribution chamber 20 of the processing tank 1 through the upper liquid supply pipe 18, distributed and distributed over the upper surface of the beam 6, and the processing liquid is sucked and permeated toward the upper liquid absorption chamber (2). Supply more than the amount of liquid.

このようにすることにより、低浴比処理が能率的にかつ
安定して行うことができる。
By doing so, the low bath ratio treatment can be carried out efficiently and stably.

処理槽1内の処理液レベル30が、ビーム6の巻層Sを
充分に浸漬するまで処理液量を多くすれば、前記のバル
ブ19を閉じて、上部給液管18からの給液を止めるが
、このような場合は、処理液温度の上昇などにともない
液面が上昇し、過度の内圧が生ずる倶があるので、その
過剰液量は配管25からオーバーフローせしめて、処理
の安全性を保持し、処理条件によっては、減圧または加
圧雰囲気を処理槽1上部に形或するようそれぞれの圧力
源に連通ずるよう配管25のバルブを調節する。
When the amount of processing liquid is increased until the processing liquid level 30 in the processing tank 1 sufficiently immerses the wound layer S of the beam 6, the valve 19 is closed and the liquid supply from the upper liquid supply pipe 18 is stopped. However, in such a case, as the temperature of the processing liquid increases, the liquid level may rise and excessive internal pressure may occur, so the excess liquid is allowed to overflow from the piping 25 to maintain the safety of the processing. However, depending on the processing conditions, the valves of the piping 25 are adjusted to communicate with the respective pressure sources so that a reduced or pressurized atmosphere is formed above the processing tank 1.

上記の実施例は、整流筒5を90゜位相差の圧液供給室
E、吸液室Vをそれぞれ4組設けた場合を示したが、4
組以上としたり、第3図のように120゜位相差の3組
、第4図のように180゜位相差の2組にして、ビーム
の設計、巻層Sの被処理物量、液処理条件などに適応す
るようにすることも可能である。
In the above embodiment, four sets of pressure liquid supply chambers E and four sets of liquid suction chambers V each having a phase difference of 90° are provided in the rectifier cylinder 5.
The number of sets or more may be set, or three sets with a 120° phase difference as shown in Fig. 3, or two sets with a 180° phase difference as shown in Fig. 4, depending on the beam design, the amount of material to be processed in the wound layer S, and the liquid processing conditions. It is also possible to adapt it to the following.

さらに、前記実施例におけるビーム6に回転を与えるに
代えて、整流筒5に回転を与え、ビーム6は停止状態に
するようにしても全く同様の作用効果が得られるもので
ある。
Furthermore, in place of rotating the beam 6 in the embodiment described above, the same effect can be obtained by rotating the rectifying cylinder 5 and keeping the beam 6 in a stopped state.

以上説明したように、本考案のビーム液処理装置によれ
ば、ビーム巻層とした被処理物に対して加圧および吸引
透液が、それぞれバランスを維持しつつ巻層の複数個所
で行われ被処理物巻層に好ましくないたるみ、変形を生
ずることなく、迅速良好な液処理効果が得られる点にお
いて優れた工業的効果が得られるものである。
As explained above, according to the beam liquid processing apparatus of the present invention, pressurization and suction permeation of the workpiece, which is formed into a beam winding layer, are performed at multiple locations on the winding layer while maintaining the respective balance. An excellent industrial effect can be obtained in that a quick and good liquid processing effect can be obtained without causing undesirable sagging or deformation of the wound layer of the object to be processed.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本考案の実施例を示すものであって、第1図は、
第2図B−B線における要部を断面とした側面図、第2
図は第1図A−A線における要部断面正面図、第3図,
第4図はそれぞれ他の実施例における要部断面正面図で
ある。 1・・・・・・処理槽、2・・・・・・槽蓋、3・・・
・・・槽後壁、4・・・・・・処理液供給管、5・・・
・・・整流筒、6・・・・・・ビーム、7,8・・・・
・・排液管、9,10.19・・・・・・バルブ、11
・・・・・・吸液管、12・・・・・・給液管、14・
・・・・・回転筒、18・・・・・・上部給液管、20
・・・・・・分配室、51・・・・・・多孔整流管、5
4・・・・・・湾曲弧状仕切板、57・・・・・・パッ
キング、58・・・・・・多孔板、61・・・・・・多
孔巻胴、62・・・・・・鍔、S・・・・・・巻層、H
・・・・・・熱交換器、P・・・・・・ポンプ、E・・
・・・・圧液供給室、■・・・・・・吸液室。
The drawings show an embodiment of the present invention, and FIG.
Figure 2: A side view of the main part taken along the line B-B.
The figure is a cross-sectional front view of the main part taken along line A-A in Figure 1, Figure 3,
FIG. 4 is a sectional front view of a main part in each of the other embodiments. 1... Processing tank, 2... Tank lid, 3...
... Tank rear wall, 4 ... Processing liquid supply pipe, 5 ...
... Rectifier tube, 6... Beam, 7, 8...
...Drain pipe, 9,10.19...Valve, 11
...Liquid suction pipe, 12...Liquid supply pipe, 14.
... Rotating tube, 18 ... Upper liquid supply pipe, 20
・・・・・・Distribution chamber, 51 ・・・Porous rectifier tube, 5
4... Curved arc-shaped partition plate, 57... Packing, 58... Porous plate, 61... Porous winding drum, 62... Tsuba. , S... winding layer, H
...Heat exchanger, P...Pump, E...
...Pressure liquid supply chamber, ■...Liquid suction chamber.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 織物等の被処理長尺物を円筒状に巻着保持する多孔中空
ビーム軸内に、ビーム中心軸を含む平面に対して対称的
に配置した複数の圧液供給室と、該圧液供給室外面を中
空ビーム軸内面に摺接して、圧液供給室間を吸液室とし
た整流筒を設け、中空ビーム軸と整流筒とを相対的に回
転せしめるようにしたことを特徴とするビーム液処理装
置。
A plurality of pressurized liquid supply chambers arranged symmetrically with respect to a plane including the beam center axis within a multi-hole hollow beam shaft that wraps and holds a long object to be processed, such as a textile, in a cylindrical shape, and the pressurized liquid supply chamber. A beam liquid characterized in that a rectifying cylinder is provided whose outer surface is in sliding contact with the inner surface of the hollow beam shaft and a liquid suction chamber is formed between the pressure liquid supply chambers, so that the hollow beam shaft and the rectifying cylinder are relatively rotated. Processing equipment.
JP14578680U 1980-10-15 1980-10-15 Beam liquid processing equipment Expired JPS599034Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14578680U JPS599034Y2 (en) 1980-10-15 1980-10-15 Beam liquid processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14578680U JPS599034Y2 (en) 1980-10-15 1980-10-15 Beam liquid processing equipment

Publications (2)

Publication Number Publication Date
JPS5769889U JPS5769889U (en) 1982-04-27
JPS599034Y2 true JPS599034Y2 (en) 1984-03-21

Family

ID=29505394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14578680U Expired JPS599034Y2 (en) 1980-10-15 1980-10-15 Beam liquid processing equipment

Country Status (1)

Country Link
JP (1) JPS599034Y2 (en)

Also Published As

Publication number Publication date
JPS5769889U (en) 1982-04-27

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