JPS5980800A - Stripping method of plating - Google Patents

Stripping method of plating

Info

Publication number
JPS5980800A
JPS5980800A JP19023782A JP19023782A JPS5980800A JP S5980800 A JPS5980800 A JP S5980800A JP 19023782 A JP19023782 A JP 19023782A JP 19023782 A JP19023782 A JP 19023782A JP S5980800 A JPS5980800 A JP S5980800A
Authority
JP
Japan
Prior art keywords
plating
gold
aluminum
aluminum alloy
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19023782A
Other languages
Japanese (ja)
Inventor
Yasuhiro Okamura
康弘 岡村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP19023782A priority Critical patent/JPS5980800A/en
Publication of JPS5980800A publication Critical patent/JPS5980800A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To strip easily a plating layer of noble metal without damaging a base metal by subjecting the plating layer of noble metal formed on aluminum to an anodization treatment in the stage of stripping said layer. CONSTITUTION:An article 2 wherein gold 5 is plated via copper plating 7 on aluminum or an aluminum alloy 8 is used as an anode and is suspended between cathodes 3 in a bath cell 1 contg. about 15% sulfuric acid in the case of stripping the gold plating 8 having a pinhole 6 in the gold plating 5 from said article 2. When the voltage of a DC power source 4 is set at about 15-20 volts, the current increases gradually, and the copper plating 7 begins to dissolve through the pinhole 6 of the plating 5. When the dissolution of the plating 7 progresses and the aluminum alloy on the base metal 8 exposes, said surface is passivated by an anodization treatment, so that no more current flows and only the plating 7 is dissolved off. The gold plating 5 is dislodged and removed.

Description

【発明の詳細な説明】 この発明はアルミニウム又はその合金に、装飾。[Detailed description of the invention] This invention applies decoration to aluminum or its alloy.

防食、電気伝導性改善等の目的で、金めつき、ロジウム
めっき等の貴金属めっきが施しである部品の上記めっき
層をなんらかの理由で−いったんめっきを剥離し、再め
っきする必要が生じた場合、素地金属を損うことなく、
めっきを剥離する方法は未だ満足すべきものはない。化
学的方法(青化物溶液等に浸漬溶解する)9機械的方法
(エメリーペーパーで磨きとる)があるが、いずれも素
地金属を損なわないように剥離するのは、大変困難であ
る。
If, for some reason, it becomes necessary to remove the plating layer of a component that has been plated with a precious metal such as gold plating or rhodium plating for the purpose of corrosion protection or to improve electrical conductivity, and then re-plating it, Without damaging the base metal,
There is still no satisfactory method for removing plating. There are chemical methods (dipping and dissolving in a cyanide solution, etc.) and mechanical methods (polishing with emery paper), but it is very difficult to remove them without damaging the base metal.

この発明は、かかるめっき剥離において、めっきされた
部品に電気化学的に、陽極酸化処理を施こし、このとき
、めっきを間接的に剥離せんとするもので、素地金属は
、陽極酸化処理されるので溶解損失が数ミクロン以下の
微少量に抑えられることを特徴とする。
In such plating removal, the plated parts are electrochemically anodized, and at this time, the plating is indirectly removed, and the base metal is anodized. Therefore, the dissolution loss is suppressed to a very small amount of several microns or less.

以下、第1図、第2図を用いてこの発明を説明する。This invention will be explained below using FIG. 1 and FIG. 2.

一般的には、アルミニウム、又はその合金上に貴金属め
っきを施こす場合、直接に飾こ丁ことはなく、銅めっき
、ニッケルめっきに代表される重金属を中間に施こすも
のであり、実施例として。
Generally, when precious metal plating is applied to aluminum or its alloy, heavy metals such as copper plating and nickel plating are applied intermediately, rather than directly as decoration. .

アルミニウム合金上に、銅めっき10ミクロン。10 micron copper plating on aluminum alloy.

その上に金めつき1ミクロンを施こした部品を。On top of that are parts with 1 micron gold plating.

硫酸浴を用いて、剥離する場合について述べる。The case of peeling using a sulfuric acid bath will be described.

第1図は、めっき部品の断面模式図であり、第2図は、
陽極酸化処理方法を示す図である。
Figure 1 is a schematic cross-sectional view of a plated part, and Figure 2 is a schematic cross-sectional view of a plated part.
FIG. 3 is a diagram showing an anodizing treatment method.

硫酸渓度15%の浴槽(11に品物(2)を陽極にし。Use item (2) as the anode in a bathtub with a sulfuric acid concentration of 15% (No. 11).

陰極(31(310間に吊る丁。そして直流電源(4)
の電圧を15.−20ボルトに設定すると、を流は徐々
に増大しはじめる。
Cathode (31 (310) suspended between. And DC power supply (4)
The voltage of 15. When set to -20 volts, the current begins to gradually increase.

金めつき(5)自体は反応しないが、金めつきのピンホ
ール(6)を通して、銅めっき(7)が次ぎの反応によ
り溶解しはじめるからである− Cu−+Cu+20 めっきには、一般にピンホールがあり、その数は、被め
っき面の面粗度、めっき厚さ、めっきの種類によって変
化するがおおよそ、数個−数百側/cIIl程度に達す
る。面が粗い程、まためっきが薄い程ピンホール数が多
く9本原理による剥離のはやさは大となる。
Although the gold plating (5) itself does not react, the copper plating (7) begins to dissolve through the pinhole (6) in the gold plating due to the following reaction - Cu-+Cu+20 Plating generally has pinholes. The number varies depending on the surface roughness of the surface to be plated, the plating thickness, and the type of plating, but it reaches approximately several to several hundred sides/cIIl. The rougher the surface and the thinner the plating, the greater the number of pinholes and the faster the peeling based on the 9-pin principle.

銅めつき(7)の溶解が進み、素地金属(8)のアルミ
ニウム合金が露出すると、この面は、陽極酸化処理によ
り不働態化し、それと同時に、この面には電流は流れな
くなり、未だ残っている銅めっきの溶解が進み、遂には
、銅めっきが完全に溶解除去され、金めつきは、箔状に
脱落し、除去される。
As the copper plating (7) continues to melt and the aluminum alloy of the base metal (8) is exposed, this surface becomes passivated by anodizing, and at the same time, current no longer flows through this surface, leaving the remaining aluminum alloy exposed. The dissolution of the copper plating progresses, and eventually the copper plating is completely dissolved and removed, and the gold plating falls off in the form of a foil and is removed.

以上のようにこの発明によれば容易にアルミニウム、ま
たはアルミニウム合金上の貴金属めっき層を剥離するこ
とができる。
As described above, according to the present invention, a noble metal plating layer on aluminum or an aluminum alloy can be easily peeled off.

なお、ロジウムめっき、その他の貴金属めっきの場合も
同様に剥離が可能である。
Note that rhodium plating and other noble metal plating can be similarly peeled off.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、陽極酸化処理の方式を示す図、第2図はめつ
き部品の断面模式図であり、(1)は浴槽。 (2)は品物、(3)は陰極、(4)は直流電源、(5
)は金めつキ、(61はピンホール、(7)は銅めっき
、(8)は素地金属である。 なお図中同一あるいは相当部分には同一符号を付して示
しである。 代理人 葛野信−
Fig. 1 is a diagram showing the method of anodizing treatment, Fig. 2 is a schematic cross-sectional view of the plated parts, and (1) is a bathtub. (2) is the product, (3) is the cathode, (4) is the DC power supply, (5
) indicates gold plating, (61 indicates pinhole, (7) indicates copper plating, and (8) indicates base metal. Identical or equivalent parts in the drawings are indicated with the same reference numerals. Agent) Shin Kuzuno

Claims (1)

【特許請求の範囲】[Claims] アルミニウム、またはアルミニウム合金上に施されてい
る貴金属のめつき層を剥離させるとき陽極酸化処理によ
って行うようにしたことを特徴とするめつき剥離法。
1. A plating removal method characterized in that a plating layer of a precious metal applied to aluminum or an aluminum alloy is removed by anodizing treatment.
JP19023782A 1982-10-29 1982-10-29 Stripping method of plating Pending JPS5980800A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19023782A JPS5980800A (en) 1982-10-29 1982-10-29 Stripping method of plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19023782A JPS5980800A (en) 1982-10-29 1982-10-29 Stripping method of plating

Publications (1)

Publication Number Publication Date
JPS5980800A true JPS5980800A (en) 1984-05-10

Family

ID=16254772

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19023782A Pending JPS5980800A (en) 1982-10-29 1982-10-29 Stripping method of plating

Country Status (1)

Country Link
JP (1) JPS5980800A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0328400A (en) * 1989-04-10 1991-02-06 Union Carbide Corp Electrolysis for peeling off coating from aluminum base and bath
JP2015117416A (en) * 2013-12-19 2015-06-25 学校法人関東学院 Electrolytic etching method and electrolytic etching fluid

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0328400A (en) * 1989-04-10 1991-02-06 Union Carbide Corp Electrolysis for peeling off coating from aluminum base and bath
JP2015117416A (en) * 2013-12-19 2015-06-25 学校法人関東学院 Electrolytic etching method and electrolytic etching fluid

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