JPS5980768A - Apparatus for automatically filtering electroless plating solution - Google Patents

Apparatus for automatically filtering electroless plating solution

Info

Publication number
JPS5980768A
JPS5980768A JP57191188A JP19118882A JPS5980768A JP S5980768 A JPS5980768 A JP S5980768A JP 57191188 A JP57191188 A JP 57191188A JP 19118882 A JP19118882 A JP 19118882A JP S5980768 A JPS5980768 A JP S5980768A
Authority
JP
Japan
Prior art keywords
plating solution
tank
filtrate
plating
filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57191188A
Other languages
Japanese (ja)
Other versions
JPS5934785B2 (en
Inventor
Toshio Kiyota
清田 利夫
Goro Takashima
高島 伍郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hino Motors Ltd
Original Assignee
Hino Motors Ltd
Hino Jidosha Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hino Motors Ltd, Hino Jidosha Kogyo KK filed Critical Hino Motors Ltd
Priority to JP57191188A priority Critical patent/JPS5934785B2/en
Publication of JPS5980768A publication Critical patent/JPS5980768A/en
Publication of JPS5934785B2 publication Critical patent/JPS5934785B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1617Purification and regeneration of coating baths

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Filtration Of Liquid (AREA)

Abstract

PURPOSE:To improve the filtering capacity and to stabilize the on-line analysis of the components in a plating soln. by installing ultrafiltration units in a path for the plating soln. and a means of analyzing a filtrate freed of fine particles and of returning a plating soln. prepared by adding a replenisher to the filtrate to the plating vessel. CONSTITUTION:A plating soln. fed from a regenerating vessel 2b to a holdup tank 3 is passed through a cooling vessel 3a, freed of coarse matter by filtration with a filter 20, and fed to a prefilter 4. Most of the filtered plating soln. is returned to the tank 3, and part of the filtrate is fed to ultrafiltration units 5. Most of the plating soln. contg. fine-grained additives is returned to the tank 3, and the filtrate is fed to a relay tank 30. The filtrate is circulated through a component analyzer 6, and the analytic signal is fed to an automatic supplier to supply the required amount of a replenisher to the vessel 2b.

Description

【発明の詳細な説明】 本発明は、無電解めっき液の自動濾過装置に係シ、籍に
限外濾過装置の濾過能力を向上させると共に耐久性を向
上させ、無電解めっき作業中におけるめっき液の成分分
析のオンライン化を長時間にわたって継続できるように
し、作業性を向上させるようにした無電解め−)き液の
自動濾過装置に関する◇ 無電解めっきは、電解め−)きと異なシ、めっき液に含
まれている還元剤によってめっき材を析出させて、金塊
の表面にめりき層を形成するめっき法であシ、特に自動
車のトランスZツシ苫ン、クラッチ用部品等の擦過腐食
を生じ易い摺動を伴なう高速重荷重を受ける機構部品の
表面処理に応用され、その自己潤滑性と耐摩耗性、耐食
性を著しく向上させることができるものである。このよ
うな大きな特徴を示すのは、めっき材の中に酸化物、炭
化物、蟹化物、硼化物等のセラミックス又は金属等の微
粒子添加物が分散析出しているためである。この微粒子
添加物は、直径1μ程度の丸形微粒子であって、高い自
己潤滑性と耐摩耗性を余積めりき層に与えている。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an automatic filtration device for electroless plating solution, and specifically improves the filtration capacity and durability of an ultrafiltration device, and improves the filtration ability of an ultrafiltration device, and improves the durability of the plating solution during electroless plating work. Regarding an automatic filtration device for electroless plating solution that enables online component analysis to be continued for a long period of time and improves workability ◇ Electroless plating is different from electrolytic plating. This is a plating method in which a plating material is precipitated by a reducing agent contained in a plating solution to form a plating layer on the surface of a gold ingot.It is particularly effective in preventing scratch corrosion of automobile transformer Z-shaped parts, clutch parts, etc. It is applied to the surface treatment of mechanical parts that are subjected to high-speed heavy loads that are prone to sliding, and can significantly improve their self-lubricating properties, wear resistance, and corrosion resistance. The reason why such a large characteristic is exhibited is that particulate additives such as ceramics or metals such as oxides, carbides, carbides, and borides are dispersed and precipitated in the plating material. This fine particle additive is a round fine particle with a diameter of about 1 μm, and provides high self-lubricating properties and wear resistance to the overlaid plating layer.

このような無電解めっきを長時間にわたって安定した状
態で行なわせるためには、めっき液の各種成分を一定の
濃度に維持しておく必要がある。
In order to perform such electroless plating in a stable state over a long period of time, it is necessary to maintain the various components of the plating solution at constant concentrations.

そこで従来では、一定時間ごとにめっき液をビー力等に
採取して滴定法或いは重量法による化学分析で成分を分
析し、pHメータでpi(値を測定し、この分析結果に
応じて補給液を補給してめっき液を再生していた。即ち
透過法を応用した通常の比色分析装置では微粒子が邪魔
となって分析不可能になるため、従来ではめっき液槽か
らサンプルを成分を分析して補給液の補給景を決定する
ようにしていた。このため分析データにタイムラグが出
てめっき液の性状を必ずしも高精度かつ迅速に把握でき
ないという欠点があった。
Therefore, in the past, the plating solution was sampled at regular intervals using a beaker, etc., the components were analyzed by chemical analysis using a titration method or gravimetric method, and the pi (pi) value was measured using a pH meter. The plating solution was regenerated by replenishing the plating solution.In other words, with normal colorimetric analyzers that apply the transmission method, fine particles get in the way and analysis is impossible, so in the past, the components of the sample were analyzed from the plating solution tank. Therefore, there was a time lag in the analytical data, and the properties of the plating solution could not always be grasped with high precision and quickly.

本発明は、上記した従来技術の欠点を除くためになされ
たものであって、その目的とするところは、酸化物、炭
化物、輩化物、硼化物、金縞等の微粒子添加物を含むめ
っき液によって被めっき物に無電解めっきを施すように
した無1を解めっき装置において、めっき液槽から成分
分析装置にめっき液を送シ込むめっき液通路に限外濾過
装置を配置することによって、めっき液に含まれた微粒
子を取シ除いて濾液のみを成分分析装置に送シ込むよう
にすると共に、核成分分析装置によって分析された濾液
と限外濾過装置で取シ除かれた微粒子を含むめっき液と
をめっき液槽に戻すようにし、め−)さ液の成分分析を
オンライン化し、分析データのタイムラグを解消してメ
ッキ液の管理維持鞘度と無電解めっき作業の作業性を向
上させることでるる。壕だ他の目的は、めっき液槽から
限外濾過装置にめっき液を送シ込むめっき液通路に自己
浄化式プレフィルタを配置することによって、めっき液
が限外濾過装置に送シ込まれる前に、めらかじめめっき
液にtまれた粗大化した微粒子や混入異物等を取シ除き
限外濾過装置のモジュール膜に微粒子等が付層堆積する
のを防止し、限外濾過装置の濾過能力を向上させ、安定
しためつき液の成分分析のオンライン化を図ることでめ
υ、またプレフィルタをめっき液で洗浄しながら該めっ
き液ケ濾過させるようにし、同時にプレフィルタの濾過
能力を自己浄化で回復させることができるようにするこ
とである。更に他の目的は、めっき液槽からプレフィル
タにめっき液を送シ込むめっきン没通路にめっき液の冷
却機能を有する2チャンバ式ウォータジャケット付ホー
ルドアツプタンクを設けることによって、めっき液槽か
ら送シ込まれためっき液を冷却して限外濾過装置に送る
ようにし、該限外濾過装置の耐久性を向上させると共に
成分分析装置で分析済の濾過を速かにめっき液槽に戻す
ようKして作業性を向上させることである。
The present invention has been made to eliminate the drawbacks of the prior art described above, and its purpose is to provide a plating solution containing particulate additives such as oxides, carbides, supports, borides, gold stripes, etc. In a deplating device that performs electroless plating on objects to be plated, an ultrafiltration device is placed in the plating solution passageway that sends the plating solution from the plating solution tank to the component analyzer. The fine particles contained in the liquid are removed and only the filtrate is sent to the component analyzer, and the plating containing the filtrate analyzed by the nuclear component analyzer and the fine particles removed by the ultrafiltration device is To improve the efficiency of plating solution management and electroless plating work by returning the plating solution to the plating solution tank and performing online component analysis of the plating solution to eliminate the time lag of analysis data. Out. Another purpose of the trench is to place a self-purifying pre-filter in the plating solution passage that sends the plating solution from the plating solution tank to the ultrafiltration device. In addition, it removes coarse particles and foreign substances from the smooth plating solution, prevents particles from accumulating on the module membrane of the ultrafiltration device, and improves the filtration of the ultrafiltration device. By improving the capacity and making stable component analysis of the plating solution online, we also made it possible to filter the plating solution while washing the pre-filter with the plating solution, and at the same time, we were able to improve the filtration capacity of the pre-filter by itself. The goal is to make it possible to recover through purification. Another objective is to provide a two-chamber water-jacketed hold-up tank with a plating solution cooling function in the submerged plating passage that sends plating solution from the plating solution tank to the pre-filter. The pumped plating solution is cooled and sent to the ultrafiltration device to improve the durability of the ultrafiltration device, and the filtrate that has been analyzed by the component analyzer is quickly returned to the plating solution tank. The objective is to improve work efficiency.

要するに本発明(%定発明)は、酸化物、膨化物、窒化
物、硼化物、金属等の微粒子添加物を含むめっき液によ
って被めっき物に無電解めっきを施すようにした無電解
めっき装置において、前記めっき液を収容しためっき液
槽と、該めっき液槽内の前記めっき液が循環供給される
成分分析装置と、該成分分析装置と前記めっき液槽との
間のめつき液通路に配置された限外濾過装置と、該限外
濾過装置と前記めっき液槽との間のめりき液通路に配置
された自己浄化式プレフィルタとを備え、該自己浄化式
プレフィルタで前自己めっき液槽から送シ込まれた前記
めっき槽をあらかじめ濾過し、更に前記限外濾過装置で
微粒子添加物を含んだめっき液と濾液とに分離し、該濾
液を前記成分分析装置に供給し該濾液の成分を分析し補
給液の自動補給装置に作動指示し、前記微粒子添加物を
含んだめっき液と共に前記めっき液槽内に戻すようにし
、前記めっき液の成分分析をオンライン化するように構
成したことを特徴とするものである。また本発明(第2
発明)は、酸化物、炭化物、窒化物、硼化物、金属等の
微粒子添加物を含むめっき液によって被めっき物に無電
解めっきを施すようにした無電解めっき装置において、
前記めりき液を収容しためっき液槽と、該めっき液槽内
の前記めっき液が循環供給される成分分析装置と、該成
分分析装置と前記めっき液槽との間のめっき液通路に配
置された限外濾過装置と、該限外濾過装置と前記めっき
液槽との間のめっき液通路に配置された自己浄化式プレ
フィルタとを備え、かつ該自己浄化式プレフィルタと前
記めっき液槽との間のめっき液通路に前記めっき液の冷
却機能を有する2チャンバ式ウォータジャケット付のホ
ールドアツプタンクを配設し、該ホールドアツプタンク
で前記めっき液槽から送られてくるめっき液を冷却し、
該めっき液を前記自己浄化式プレフィルタであらかじめ
濾過し、更に前記限外濾過装置で微粒子添加物を含んだ
めっき液と濾液とに分離し、該濾液を前記成分分析装置
に供給し該濾液の成分を分析し補給液の自動補給装置に
作動指示し、前記微粒子添加物を含んだめっき液と共に
前記ホールドアツプタンクに送シ込み、再びめっき液槽
に戻すようにし、前記めっき液の成分分析をオンライン
化するように構成したことを特徴とするものである。
In short, the present invention (% invention) provides an electroless plating apparatus that performs electroless plating on an object to be plated using a plating solution containing particulate additives such as oxides, expanded substances, nitrides, borides, and metals. , a plating solution tank containing the plating solution, a component analyzer to which the plating solution in the plating solution tank is circulated and supplied, and a plating solution passageway between the component analyzer and the plating solution tank. a self-purifying pre-filter disposed in a plating solution passage between the ultrafiltration device and the plating solution tank; The plating tank sent from the tank is filtered in advance, and further separated into a plating solution containing particulate additives and a filtrate in the ultrafiltration device, and the filtrate is supplied to the component analyzer to analyze the components of the filtrate. The plating solution is analyzed and an automatic replenishment device is instructed to return the plating solution to the plating solution tank together with the plating solution containing the particulate additive, and the component analysis of the plating solution is performed online. This is a characteristic feature. In addition, the present invention (second
The present invention is an electroless plating apparatus that performs electroless plating on an object to be plated using a plating solution containing particulate additives such as oxides, carbides, nitrides, borides, and metals.
A plating solution tank containing the plating solution, a component analyzer to which the plating solution in the plating solution tank is circulated, and a plating solution passageway between the component analyzer and the plating solution tank. a self-purifying prefilter disposed in a plating solution passage between the ultrafiltration device and the plating solution tank; A two-chamber water jacketed hold-up tank having a cooling function for the plating solution is disposed in the plating solution passageway between the plating solution passages, and the plating solution sent from the plating solution tank is cooled by the hold-up tank.
The plating solution is filtered in advance using the self-purifying prefilter, further separated into a plating solution containing particulate additives and a filtrate using the ultrafiltration device, and the filtrate is supplied to the component analyzer to analyze the filtrate. Analyze the components, instruct the automatic replenishment solution replenishment device to operate, send it to the hold-up tank together with the plating solution containing the particulate additive, and return it to the plating solution tank, and analyze the components of the plating solution. It is characterized by being configured to be online.

以下本発明を図面に示す実施例に基いて説明する。本発
明に係る無電解メッキ液の自動濾過装置1は、めっき液
41Ii12と、2チャンバ式ウォータジャケット付の
ホールドアツプタンク3と、自己浄化式プレイフィルタ
4と、限外濾過装置5と、メッキ液補給用定量ポンプ制
御装置を含む成分分析装置6とを備えている。
The present invention will be explained below based on embodiments shown in the drawings. The automatic filtration device 1 for electroless plating solution according to the present invention includes a plating solution 41Ii12, a hold-up tank 3 with a two-chamber water jacket, a self-purifying play filter 4, an ultrafiltration device 5, and a plating solution 41Ii12. and a component analyzer 6 including a replenishment metering pump control device.

めっき液M2は無電解めりき用のめつき液を収容してお
シ、被めっき物に無電解め0きを施すためのめ−)t!
!桶2aと、めっき液を再生するための丹生惰2bとか
らなっておシ、両楢の底部はポンプ10及びバルブ11
を介して接続されている。
The plating solution M2 contains a plating solution for electroless plating, and is used for applying electroless plating to the object to be plated.
! It consists of a tub 2a and a Niyuyu 2b for regenerating the plating solution, and the bottom of both tubs is equipped with a pump 10 and a valve 11.
connected via.

まためり1!偕2aの側壁の上部には再生槽2bへのオ
ーバーフロー通IN!(図示せず)が設けられておシ、
両槽間で常時めっき液が循環するようになっている。ま
た再生槽2bの底部は、パルプ12.13を介してホー
ルドアツプタンク3に接続されている。
Matameri 1! There is an overflow connection to the regeneration tank 2b at the top of the side wall of 2a! (not shown) is provided,
The plating solution is constantly circulated between both tanks. Further, the bottom of the regeneration tank 2b is connected to the hold-up tank 3 via the pulp 12.13.

ホールドアツプタンク3は、再生槽2bから送シ込まれ
ためっき液を冷却するための冷却槽3aと、成分分析装
置6で分析終了後の濾液及びホールドアツプタンク3か
らのオーバフロー液を収容するオーバフロー檜3bとを
備えておシ、冷却槽3aには冷却管15が配置されてい
る。そして冷却イWaaは加圧循環ポンプ16及びバル
ブ17を介してプレフィルタ4に接続されている。この
めり@液供給経路において、沈澱物はパルプ18を介し
てドレン19に排出され、まためっき液中に含まれた粗
大物は、網目状のフィルタを内蔵した粗大物フィルタ2
0によりて濾過されるようになりている0また冷却槽3
aの側壁の上部には外部ヘのオーバーフロー通路(図示
せず)が設けられており、余分の冷却水か溢水するよう
になっている。
The hold-up tank 3 includes a cooling tank 3a for cooling the plating solution sent from the regeneration tank 2b, and an overflow tank for storing the filtrate after analysis in the component analyzer 6 and overflow liquid from the hold-up tank 3. A cooling pipe 15 is arranged in the cooling tank 3a. The cooling water Waa is connected to the prefilter 4 via a pressurized circulation pump 16 and a valve 17. In this plating@liquid supply path, the precipitate is discharged to the drain 19 via the pulp 18, and the coarse matter contained in the plating solution is removed by the coarse matter filter 2, which has a built-in mesh filter.
0 and cooling tank 3 adapted to be filtered by 0
An overflow passage (not shown) to the outside is provided at the upper part of the side wall of a, through which excess cooling water can overflow.

プレフィルタ4には、波形に形成され耐食性の材料、例
えばステンレス製の1組の支え枠21によって挾持され
たステンレス製(100メソシ8+L)又はサラン製の
濾布22が内蔵されておシ、また必要に応じて4過効率
を向上させる手段としてプレフィルタ4の底面には小型
超音波振動子23(28kHz 100W以下)が装着
されている。プレフィルタ4に送シ込”まれためつき液
の大部分は、バルブ24を介してホールドアツプタンク
3に戻されるようになっている。またプレフィルタ4で
濾過されためっき液は、限外モジュール圧力制御弁25
を介して限外濾過装置5に送り込まれるようになってい
る0またプレフィルタ4に堆積した沈澱物は、パルプ2
6を介してドレン27に排出されるようになっている。
The pre-filter 4 has a built-in filter cloth 22 made of stainless steel (100 psi 8+L) or Saran, which is formed into a corrugated shape and held between a pair of support frames 21 made of a corrosion-resistant material, such as stainless steel. A small ultrasonic transducer 23 (28 kHz, 100 W or less) is attached to the bottom surface of the pre-filter 4 as a means to improve the ultrasonic efficiency as required. Most of the plating solution pumped into the pre-filter 4 is returned to the hold-up tank 3 via the valve 24.The plating solution filtered through the pre-filter 4 is also transferred to the ultra module. Pressure control valve 25
The precipitates accumulated on the prefilter 4 are sent to the ultrafiltration device 5 through the pulp 2.
6 and is discharged to a drain 27.

限外濾過装[5に送シ込まれためつき液のうち、微粒子
添加物を含んだ大部分のめつき液は、限外モジー−ル圧
力制御弁28を介してボールドアップタンク3に戻され
、濾過された濾液のみが成分分析装置60手前に配置さ
れ7c濾液中継タンク30に送シ込まれるようになって
bる。第1図において、31,32は圧力計、33は流
箪計である。
Of the plating liquid sent to the ultrafiltration device [5], most of the plating liquid containing particulate additives is returned to the bold-up tank 3 via the ultramodule pressure control valve 28. Only the filtered filtrate is placed in front of the component analyzer 60 and sent to the filtrate relay tank 30 (7c). In FIG. 1, 31 and 32 are pressure gauges, and 33 is a flow meter.

成分分析装置6は、濾液中継タンク3oから循環供給さ
れる濾液の成分を比色計(図示せず)で分析し、この分
析結果の48号を自動補給液補給装置(図示せず)に送
って、補給液の必要量を再生槽2bに送シ込むようにな
っている。濾液中継タンク30とホールドアツプタンク
3との間のめっき液通路には切替コック35が配置され
ておシ、該切替コックを介して濾液を必要に応じて貯溜
槽36に一時貯溜するよう釦なっている。
The component analyzer 6 analyzes the components of the filtrate that is circulated and supplied from the filtrate relay tank 3o using a colorimeter (not shown), and sends No. 48 of this analysis result to an automatic replenishing liquid replenishing device (not shown). Then, the required amount of replenishment liquid is pumped into the regeneration tank 2b. A switching cock 35 is disposed in the plating solution passage between the filtrate relay tank 30 and the hold-up tank 3, and a button can be pressed to temporarily store the filtrate in the storage tank 36 as needed via the switching cock. ing.

そして再生槽2bからホールドアツプタンク3に送り込
まれためっき液は、冷頗倦3aで冷却され、次いでプレ
フィルタ4であらかじめ濾過され、更に限外濾過装置5
で微粒子添加物を含んだめっき液と濾液とに分離され、
該濾液が成分分析装置6に供給され、該濾液の成分が分
析され補給液の自IJJJJ@給装置に作動指示し1、
微粒子添加物を含んだめ−)@液と共にホールドアツプ
タンク3に戻され、更にめっき液槽2の再生槽2b内に
戻され、めっ@液の成分分析をオンライン化するように
構成されている。
The plating solution sent from the regeneration tank 2b to the hold-up tank 3 is cooled by a cold box 3a, then filtered in advance by a pre-filter 4, and further filtered by an ultrafiltration device 5.
It is separated into a plating solution containing particulate additives and a filtrate.
The filtrate is supplied to a component analyzer 6, the components of the filtrate are analyzed, and an operation instruction is given to the replenishment liquid supply device 1.
Since it contains particulate additives, it is returned to the hold-up tank 3 together with the plating solution, and is further returned to the regeneration tank 2b of the plating solution tank 2, so that component analysis of the plating solution can be carried out online. .

本発明は、上記のように構成されておシ、以下その作用
について説明する。再生槽2bからホールドアツプタン
ク3に送シ込まれるめっき?1&の温度は約85℃であ
るが、該めっき液は冷却槽3aの冷却管15を通過する
ことによって、該めっき液の温度は約40℃に下がる0
仄いてめっき液は、粗大物フィルタ20によって粗大物
が濾過され、加圧循環ポンプ16によってプレフィルタ
4に送シ込まi″LL濾過る。このときめつき液の大部
分は、バルブ24を介してホールドアツプタンク3に戻
される。濾布22によって濾過されためつき液は、限外
モジュール圧力制御弁25を介して限外濾過装置5に送
υ込まれる@この場会、d布22は、波形に形成された
支え枠21にめりき液が衝突して発生する乱流によって
自動的に洗浄される。また振動子23の超音波照射によ
シ濾布22の自階効果が高まる0またプレフィルタ4内
を特に洗浄したいときは、パルプ40を開いてめっき液
(貯溜槽36に貯溜した濾液)又は純水を濾布22の上
方から流し込むことによって逆況が行なわれる。
The present invention is constructed as described above, and its operation will be explained below. Plating sent from the regeneration tank 2b to the hold-up tank 3? The temperature of the plating solution 1& is about 85°C, but as the plating solution passes through the cooling pipe 15 of the cooling tank 3a, the temperature of the plating solution decreases to about 40°C.
The coarse particles of the plating solution are filtered by the coarse filter 20, and the pressurized circulation pump 16 sends the plating solution to the pre-filter 4 where it is filtered. and is returned to the hold-up tank 3.The mulch liquid filtered by the filter cloth 22 is sent to the ultrafiltration device 5 via the ultramodule pressure control valve 25. It is automatically cleaned by the turbulent flow generated when the cutting liquid collides with the support frame 21 formed in a corrugated shape.In addition, the self-cleaning effect of the filter cloth 22 is enhanced by the ultrasonic irradiation of the vibrator 23. When it is particularly desired to clean the inside of the prefilter 4, the reverse situation is performed by opening the pulp 40 and pouring the plating solution (the filtrate stored in the storage tank 36) or pure water from above the filter cloth 22.

限外濾過表置5に送シ込゛まれためつぎ液のうち、微粒
子添加物を含んだ大部分のめつき液は、限外モジュール
圧力制御弁28を介してホールドアツプタンク3に戻さ
れ、濾過された濾液のみが読液中継タンク30に送り込
まれる。
Of the plating solution pumped into the ultrafiltration table 5, most of the plating solution containing particulate additives is returned to the hold-up tank 3 via the ultramodule pressure control valve 28. Only the filtered filtrate is sent to the liquid reading relay tank 30.

このように限外濾過装置5に送り込まれるめっemu、
ボールドアップタンク3の冷却槽3aで冷却されている
ので、限外na過装置5は特に耐熱性の高い両側な材料
を使用する必要はなく廉価な材料でも十分耐えられる。
The emu sent to the ultrafiltration device 5 in this way,
Since it is cooled by the cooling tank 3a of the bold-up tank 3, the ultra-Na filtration device 5 does not need to use materials with particularly high heat resistance on both sides, and even inexpensive materials can be used.

まためらかしめプレフィルタ4で微粒子添加物を含んだ
めっき液が濾過されているので、限外濾過fc置5のモ
ジ、i−ル膜に微粒子が竹屑堆積するようなことはなく
、限外濾過装置5の濾過能力が向上する。即ち従来は3
時間ごとに限外濾過装置5を洗浄していたが、本発明に
係る限外濾過装f5は100時間以上連続使用しても濾
過能力は低下せず濾液を安定して濾液中継タンク30に
供給できる。
In addition, since the plating solution containing particulate additives is filtered by the smooth pre-filter 4, there is no possibility that particulates will accumulate on the modifier and i-le membranes of the ultrafiltration fc station 5, and the The filtration capacity of the outer filtration device 5 is improved. That is, conventionally 3
Although the ultrafiltration device 5 was cleaned every hour, the ultrafiltration device f5 according to the present invention does not lose its filtration ability even after being used continuously for more than 100 hours, and the filtrate is stably supplied to the filtrate relay tank 30. can.

なお限外濾過装[5は実施例では、4本設けられている
が、これは運転中に万一4本のうちの1本のモジュール
膜に微粒子が付着堆積して濾過能力不能になった場合で
も、直ちにその1本を取υ外し残りの3本で操作させる
ようにして、成分分析装置6に供給する濾液の量を常に
安定させるためであυ、必ずしも4本に限定されるもの
ではないO 濾液中継タンク30に送シ込まれた濾液は、成分分析装
置6に循環供給され比色計によって濾液の成分が分析さ
れる。この分析結果の信号が自動補給装置に送られ、補
給液の必要量が再生Pa2bに送シ込まれる。
In addition, although four ultrafiltration devices [5] are provided in the example, in the unlikely event that particulates were deposited on one of the four module membranes during operation, the filtration performance became impossible. This is to ensure that the amount of filtrate supplied to the component analyzer 6 is always stabilized by immediately removing one of the tubes and operating the remaining three tubes, and the number of tubes is not necessarily limited to four. The filtrate sent to the filtrate relay tank 30 is circulated and supplied to the component analyzer 6, and the components of the filtrate are analyzed by a colorimeter. A signal of this analysis result is sent to the automatic replenishment device, and the required amount of replenishment liquid is sent to the regeneration Pa2b.

このようにして、めっき液に含まれた微粒子を取シ除い
た濾液のみが成分分析装置ii6に送られ、めっき液の
成分分析をオンライン化することができるので、従来の
ような分析データのタイムラグは解消されメッキ液の管
理維持精度と作業性が大幅に向上する。
In this way, only the filtrate from which the fine particles contained in the plating solution have been removed is sent to the component analyzer II6, and the component analysis of the plating solution can be performed online, eliminating the time lag of analysis data as in the past. This eliminates this problem and greatly improves the accuracy of plating solution management and workability.

本発明は、上記のように構成され、作用するものである
から、酸化物、炭化物、窒化物、硼化物、金属等の微粒
子添加物を含むめっき液によって被めっき物に無電解め
っきを施すようにした無電解めっき装置において、めっ
き液槽から成分分析装置にめっき液を送p込むめっき液
通路に限外濾過装置が配置されているので、めっき液に
含まれた微粒子を取シ除いて濾液のみが成分分析装置に
送シ込まれると共に、該成分分析装置によって分析され
た濾液と限外濾過装置で取シ除かれた微粒子を含むめっ
き額とがめつき液槽に戻り、めっき液の成分分析がオン
ライン化され、分析データのタイムラグが解消され、め
っき液の管理維持精度と作業性が大幅に向上するという
効果が得られる。
Since the present invention is configured and operates as described above, it is possible to perform electroless plating on an object to be plated using a plating solution containing particulate additives such as oxides, carbides, nitrides, borides, and metals. In the electroless plating equipment designed for this purpose, an ultrafiltration device is placed in the plating solution passage that sends the plating solution from the plating solution tank to the component analyzer. At the same time, the filtrate analyzed by the component analyzer and the plating solution containing particulates removed by the ultrafiltration device return to the plating solution tank, where the component analysis of the plating solution is carried out. By going online, the time lag in analysis data is eliminated, and the accuracy of plating solution management and maintenance and workability are greatly improved.

まためっき液槽から限外源−A装置にめりき液を送シ込
むめ−)@液通路に自己鹸化式プレフィルタが配設され
ているので、めっき液が限外濾過装置に送り込まれる前
に、あらかじめめっき液に含まれた微粒子が堰シ除かれ
限外濾過装置のモジュール膜に微粒子が付着堆積するこ
とがなく、限外濾過装置の濾過能力が向上し、安定した
めっき液の成分分析のオンライン化ができ、また自己浄
化式プレフィルタはめつき液で洗浄されながら該めっき
液を濾過するようになっているので、該プレフィルタの
濾過能力が良好に保たれるという効果がある@まためっ
き液槽からプレフィルタにめりき液を送り込むめっき液
通路に2チャンバ式ウォータジャケット付ホールドアツ
プタンクが設けられているので、めっき液槽から送シ込
まれためっき液が冷却されて限外濾過装置に送られ該限
外濾過装置の耐久性が大幅に向上すると共に成分分析装
置で分析績の濾液を速かにめっき液槽に戻すことができ
作業性が大幅に向上するという効果がある。
In addition, a self-saponifying pre-filter is installed in the liquid passageway to send the plating solution from the plating solution tank to the ultrafiltration device, so before the plating solution is sent to the ultrafiltration device. In addition, the fine particles previously contained in the plating solution are removed by the weir, preventing the fine particles from adhering and accumulating on the module membrane of the ultrafiltration device, improving the filtration capacity of the ultrafiltration device, and allowing for stable component analysis of the plating solution. The self-purifying pre-filter filters the plating solution while being washed with the plating solution, which has the effect of maintaining good filtration ability of the pre-filter. A two-chamber water jacketed hold-up tank is installed in the plating solution passage that sends the plating solution from the plating solution tank to the pre-filter, so the plating solution sent from the plating solution tank is cooled and ultrafiltrated. The durability of the ultrafiltration device sent to the device is greatly improved, and the filtrate analyzed by the component analyzer can be quickly returned to the plating solution tank, which has the effect of greatly improving work efficiency.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本@明の実施例に係り、第1図は無電解メッキ液
の自動濾過装置のブロック図、第2図は自己浮化式プレ
フィルタの正面図、第3図は自己浄化式プレフィルタの
平面図、第4図は第2図のA部拡大縦断面図である。 lは無電解めっき液の自動濾過装置、2はめっき液槽、
3は2チャンバ式ウォータジャケット付のホールドアツ
プタンク、4は自己浄化式プレフィルタ、5は限外&過
装置、6は成分分析装置でめる0 特許出願人 日野自動車工業株式会社 代理人 弁理士  内 1)和 男
The drawings relate to the embodiment of this @ Ming. Figure 1 is a block diagram of an automatic filtration device for electroless plating solution, Figure 2 is a front view of a self-floating pre-filter, and Figure 3 is a self-purifying pre-filter. FIG. 4 is an enlarged vertical sectional view of section A in FIG. 2. 1 is an automatic filtration device for electroless plating solution, 2 is a plating solution tank,
3 is a hold-up tank with a two-chamber water jacket, 4 is a self-purifying pre-filter, 5 is an ultraviolet & filtration device, and 6 is a component analyzer.0 Patent applicant: Hino Motors Co., Ltd. Agent, Patent attorney 1) Kazuo

Claims (1)

【特許請求の範囲】 1 酸化物、炭化物、窒化物、硼化物、金属等の微粒子
添加物を首むめっき液によりて被めっき物に無電解めっ
きを施すようにした無電解めっき装置において、前記め
っき液を収容しためっ@数種と、該めりき液槽内の前記
めりさ赦が循環供給される成分分析装置と、該成分分析
装置とかj記めっき液槽との間のめつき液通路に配置式
れた限外濾過装置と、該限外濾過装置と前dピめりき液
槽との間のめつき液通路に配置された自己浄化式プレフ
ィルタとを備え、該自己浄化式プレフィルタで前記めっ
き液槽から送シ込まれた前記めっき液をあらかじめ濾過
し、史に前記限外濾過装置で微粒子添加物を言んだめり
き液と濾液とに分離し、該濾液を前記成分分析装置に供
給し該濾液の成分を分析し、補給液の自動補給装置に作
動指示し、前記微粒子添加物を宮んだめりき敢と共に前
記めっき液槽内に戻すようにし、前記めっき液の成分分
析をオンライン化するように構成したことを特徴とする
無電解めっ@液の自動濾過装置。 2 酸化物、炭化物、窒化物、硼化物、金属等の微粒子
添加物を含むめっき液によって被めっき物に無電解めっ
きを施すようにした無電解めっき装置において、前記め
っき液を収容しためづき液槽と、該めっき液槽内の前記
めっき液が循環供給される成分分析装置と、該成分分析
装置と前記めっき液槽との間のめっき液通路に配置され
た限外濾過装置と、該限外濾過装置と前記め−)@液葡
との間のめっき液通路に配置された自己浄化式プレフィ
ルタとを備え、かつ該自己浄化式プレフィルタと前記め
っき液槽との間のめっき液通路に前記め−)′f!液の
冷却機能をMする2チャンバ式ウォータジャケット付の
ホールドアツプタンクを配設し、該ホールドアツプタン
クで前記めっき液槽から送られてくるめっき液を冷却し
、該めっき液を前記自己浄化式プレフィルタであらかじ
め濾過し、更に前記限外濾過装置で微粒子添加物を含ん
だめっき液と濾液とに分離し、該濾液を前記成分分析装
置に供給し該濾液の成分を分析し補給液の自動補給装置
に作動指示し、前記微粒子添加物を含んだめっき液と共
に前記ホールドアツプタンクに送シ込み、再びめっき液
槽に戻すようにし、前記めっき液の成分分析をオンライ
ン化するように構成したことを特徴とする無電解めっき
液の自動濾過装置。
[Scope of Claims] 1. In an electroless plating apparatus for electroless plating of a particulate additive such as oxide, carbide, nitride, boride, metal, etc. onto an object to be plated using a neck plating solution, plating solution between several types of plates containing plating solution, a component analyzer to which the plating solution in the plating solution tank is circulated, and the component analyzer or the plating solution tank described in j. The self-purifying type includes an ultrafiltration device disposed in the passage, and a self-purifying prefilter disposed in the plating liquid passage between the ultrafiltration device and the front d-pinning liquid tank. The plating solution sent from the plating solution tank is filtered in advance using a pre-filter, and the ultrafiltration device separates the plating solution containing particulate additives into a plating solution and a filtrate, and the filtrate is separated from the components described above. The filtrate is supplied to an analyzer, the components of the filtrate are analyzed, the automatic replenishment fluid replenishment device is instructed to operate, and the particulate additive is returned to the plating solution tank along with the filtrate, and the components of the plating solution are An automatic filtration device for electroless plating solution, characterized in that it is configured to conduct analysis online. 2. In an electroless plating apparatus that performs electroless plating on an object to be plated using a plating solution containing particulate additives such as oxides, carbides, nitrides, borides, metals, etc., a plating solution containing the plating solution is used. a component analyzer to which the plating solution in the plating solution tank is circulated and supplied; an ultrafiltration device disposed in a plating solution passage between the component analyzer and the plating solution tank; a self-purifying pre-filter disposed in a plating solution passage between the outer filtration device and the plating solution tank, and a plating solution passage between the self-purifying pre-filter and the plating solution tank; ni-)'f! A two-chamber water jacketed hold-up tank with a liquid cooling function is provided, and the hold-up tank cools the plating solution sent from the plating solution tank, and the plating solution is transferred to the self-purifying type. The filtrate is pre-filtered using a pre-filter, and further separated into a plating solution containing particulate additives and a filtrate using the ultrafiltration device, and the filtrate is supplied to the component analyzer to analyze the components of the filtrate and automatically replenish the replenishment solution. The system is configured to instruct a replenishment device to operate, send the plating solution containing the particulate additive to the hold-up tank, and return it to the plating solution tank, and perform online component analysis of the plating solution. An automatic filtration device for electroless plating solution featuring:
JP57191188A 1982-10-30 1982-10-30 Automatic filtration device for electroless plating solution Expired JPS5934785B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57191188A JPS5934785B2 (en) 1982-10-30 1982-10-30 Automatic filtration device for electroless plating solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57191188A JPS5934785B2 (en) 1982-10-30 1982-10-30 Automatic filtration device for electroless plating solution

Publications (2)

Publication Number Publication Date
JPS5980768A true JPS5980768A (en) 1984-05-10
JPS5934785B2 JPS5934785B2 (en) 1984-08-24

Family

ID=16270359

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57191188A Expired JPS5934785B2 (en) 1982-10-30 1982-10-30 Automatic filtration device for electroless plating solution

Country Status (1)

Country Link
JP (1) JPS5934785B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6161979U (en) * 1984-09-28 1986-04-25

Also Published As

Publication number Publication date
JPS5934785B2 (en) 1984-08-24

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