JPS5969917A - Discriminating method for semiconductor wafer - Google Patents

Discriminating method for semiconductor wafer

Info

Publication number
JPS5969917A
JPS5969917A JP18027282A JP18027282A JPS5969917A JP S5969917 A JPS5969917 A JP S5969917A JP 18027282 A JP18027282 A JP 18027282A JP 18027282 A JP18027282 A JP 18027282A JP S5969917 A JPS5969917 A JP S5969917A
Authority
JP
Japan
Prior art keywords
wafer
mark
reading
semiconductor
semiconductor wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18027282A
Other languages
Japanese (ja)
Inventor
Yasuhisa Yoshida
康久 吉田
Hiroshi Matsuzawa
松沢 浩
Hiroshi Kinoshita
博 木下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP18027282A priority Critical patent/JPS5969917A/en
Publication of JPS5969917A publication Critical patent/JPS5969917A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To simplify a process required for discriminating a wafer information, to shorten time required for discrimination and to miniaturize related devices by writing a ring-shaped bar code mark on the semiconductor wafer in an approximately concentrical shape to the wafer. CONSTITUTION:The ring-shaped bar code mark 4 is written on the back (the surface) of the semiconductor wafer 1 through photoetching or laser marking or the like in the approximately concentrical shape to the wafer 1 as the wafer informations. The contents of the wafer informations are represented according to the number of rings, width of the rings or combination of each ring width, mutual spaces of the rings or combination of each space, etc. of the bar code mark 4. The wafer 1 is passed in the arbitrary direction so that the mark 4 crosses in the radial direction and the mark 4 is read at the position of reading of a reading device. The mark 4 of the same pattern is read regardless of the directions of the wafer 1.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、半導体装置の製造工程における半導体ウェハ
のウェハ情報(pット情報など]の識別方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a method for identifying wafer information (such as put information) of a semiconductor wafer in a semiconductor device manufacturing process.

〔発明の技術的背景〕[Technical background of the invention]

半導体製造工程の自動化に際して、半導体ウェハのロッ
ト番号などのウェハ情報を自動的に識別し、この識別結
果に基いてプロセス条件の設定およびプロセスQC(品
質管理)データの登録等を行なうことが望ましい。
When automating semiconductor manufacturing processes, it is desirable to automatically identify wafer information such as semiconductor wafer lot numbers, and to set process conditions and register process QC (quality control) data based on the identification results.

ところで、従来は上記ウェハ情報として第1図に示すよ
うに半導体ウェハ1のオリエ寸−ションフラット部2に
フォトエツチングあるいはレーザマーキング等の方法に
より数字、記号、アルファベット文字などのマーク3が
刻ff’している。そして、このような数字などのマー
ク3を読み取るためにウェハマーク斬、取p装置の読取
シ部を半導体ウェハ1のマーク3部に所定の向き(マー
ク3の読取p方向に合致する向き)で対向させている。
By the way, conventionally, as shown in FIG. 1, marks 3 such as numbers, symbols, alphabetic characters, etc. are engraved on the orientation flat portion 2 of the semiconductor wafer 1 by a method such as photo-etching or laser marking as the wafer information. are doing. In order to read the mark 3 such as a number, the reading part of the wafer mark cutting and picking device is placed on the mark 3 part of the semiconductor wafer 1 in a predetermined direction (direction that matches the reading direction of the mark 3). They are facing each other.

〔背景技術の問題点〕[Problems with background technology]

しかし、上記したような従来の半導体ウェハ識別方法に
おいては、マーク3の1込みおよび読取りに際してそれ
ぞn半導体ウエノ・1の位置を精密に合わせると共にそ
の向きをマーク3の向きに合わせるための位置合わせ装
置および位置合わせ工程が必要となるので、ウェハ情報
の畏込み、読取や装置が大型化し、書込み、読取シの所
要時間が長くかかる欠点があった。また、半導体装置プ
ロセスの複数の段階でそれぞ九つニf情報會読取るため
に複数台の読取シ装#全使用する場合、各読取シ装置毎
の位置合わせの互換性を持たせようとすると各装置構成
が複雑になり、各装置の保守が面倒であった。
However, in the conventional semiconductor wafer identification method as described above, when including and reading mark 3, positioning is required to precisely align the position of n semiconductor wafer 1 and to match its orientation to the orientation of mark 3. Since a device and an alignment process are required, there are disadvantages in that the wafer information needs to be read, the device becomes large, and the time required for writing and reading is long. In addition, when multiple reading systems are used to read nine information at each stage of the semiconductor device process, it is necessary to maintain compatibility in alignment for each reading system. The configuration of each device became complicated, and maintenance of each device was troublesome.

〔発明の目的〕[Purpose of the invention]

本発明は上記の欠点を除去すべくなさルたもので、ウェ
ハ情報の害込みおよび読取シに際してウェハの向き全整
える必要がなく、ウエノ・情報の識別に要する工程が単
純になシ、識別のための所要時間の短縮化および関連装
置の小型化を図9得る半導体ウェハ識別方法を提供する
ものである。
The present invention has been made to eliminate the above-mentioned drawbacks; it is not necessary to completely adjust the orientation of the wafer when corrupting or reading wafer information, and the process required for identifying wafers and information is simplified; The present invention provides a semiconductor wafer identification method that reduces the time required for the process and reduces the size of related equipment.

〔発明の概要〕[Summary of the invention]

すなわち、本発明の半導体ウニ/・識別方法は、半導体
ウェハ上にウェハとほぼ同心円状にリング状バーコード
マークヲ書込み、このウェハに対する半導体装置製造過
程で上記ウェハ上のバーコードマーク全読取り、この胱
取り結果に基いてウェハ情報を識別することを特徴とす
るものである。
That is, the semiconductor urchin identification method of the present invention involves writing a ring-shaped barcode mark on a semiconductor wafer approximately concentrically with the wafer, reading all the barcode marks on the wafer during the semiconductor device manufacturing process for this wafer, and reading this barcode mark on the wafer. This method is characterized in that wafer information is identified based on the cystectomy results.

したがって、ウェハと11は同心円状のバーゴー5ドマ
ークを利用するので、その書込みおよび  −読取シに
際してウェハの向きを整える必要がなくなp1識別のた
めの工程が単純になシ、識別〔発明の実施例〕 以下、図面葡参照して本発明の一実施例を詳細に説明す
る。
Therefore, since the wafer and the wafer 11 use concentric barcode marks, there is no need to adjust the orientation of the wafer when writing and reading the wafer, and the process for identifying p1 is simple. Example] Hereinafter, an embodiment of the present invention will be described in detail with reference to the drawings.

本発明では、先ず、たとえば第2図に示すように半導体
ウエノ・lの裏面(表面でもよい)にウェハ情報として
ウェハ1とほぼ同心円状にリング状のバーコードマーク
4?既知のフォトエツチングあるいはレーザマーキング
等の方法により書込む。この場合、書込み装置による書
込み中心に半導体ウェハlの中心をほぼ合致させる程度
の位置合わせを行なうが、ウェハlの向きつまシフラッ
ト部2の向きは任意でよい。また、上記リング状のバー
コードマーク4におけるリングの本数(1本あるいは複
数本)、リングの幅あるいは各リング幅の組合わせ、リ
ングの相互間隔あるいは各間隔の組合わせ等によつ1て
ウェハ情報の内容を表わすように定めておく。
In the present invention, first, as shown in FIG. 2, for example, a ring-shaped barcode mark 4 is placed approximately concentrically with the wafer 1 as wafer information on the back surface (or the front surface) of the semiconductor wafer 1. Writing is performed by a known method such as photo etching or laser marking. In this case, alignment is performed to the extent that the center of the semiconductor wafer 1 approximately coincides with the writing center of the writing device, but the orientation of the wafer 1 and the orientation of the flat portion 2 may be arbitrary. Also, depending on the number of rings (one or more) in the ring-shaped barcode mark 4, the width of the rings or a combination of widths of each ring, the mutual spacing of the rings or the combination of the spacings, etc. It is defined to represent the content of the information.

次に1上記ウエハ情報を読取る必要があるとき(たとえ
ば上記ウェハに対する半導体装置製造過程におけるプロ
セス条件の設定時)には、バーコードマーク読取り装置
の読取り部による読取フ位m: iウェハ1のバーコー
ドマーク4がその半径方向に横切るように、ウエノ・1
全任意の向きで通過させることによってマーク4を読取
らせる。この場合、ウェハlの向きに関係なく同一パタ
ーンのバーコードマーク4”f:H取るようになシ、バ
ーコードマーク4がたとえはレーザマーキングによシウ
エハl上に溝として刻み込まれていた場合には、レーザ
光センサにより上記溝とウェハ面との段差によるレーザ
光往復距離の違いを利用してマーク検出全行なう。
Next, when it is necessary to read the wafer information 1 (for example, when setting process conditions in the semiconductor device manufacturing process for the wafer), the reading position m by the reading unit of the barcode mark reading device is: Ueno 1 so that the code mark 4 crosses in the radial direction.
The mark 4 is read by passing it in any direction. In this case, the same pattern of barcode mark 4"f:H should be taken regardless of the orientation of the wafer l. For example, if the barcode mark 4 is carved as a groove on the wafer l by laser marking, All mark detection is performed by a laser light sensor by utilizing the difference in the round trip distance of the laser light due to the difference in level between the groove and the wafer surface.

また、読取9位#全ウェハ1のたとえば1つの直径線部
が通るようにしてマーク4を2回読取らせるようにし、
又はウェハ1の1つの半径線部が中心部から外縁部へ向
かっであるいはその逆方向に通るようにして ヌーク4
を1回読取らせるようにしても、マーク読取シ信号全バ
ーコード解読処理装置に導いてマーク内容の識別7行な
わせることは可能である。この場合にウェハlのほぼ中
心全読取り装置の読取シ中心位置に合わせる必要がある
が、通常の半導体プロセスではウェハ中心の位置合わせ
工程を有するので、この工程を利用することができる。
In addition, the mark 4 is read twice so that, for example, one diameter line part of the reading #9 all wafers 1 passes through it,
Or, one radius line of the wafer 1 passes from the center to the outer edge or vice versa.
Even if the mark reading signal is read once, it is possible to guide the mark reading signal to the entire barcode decoding processing device to identify the mark contents. In this case, it is necessary to align almost the entire center of the wafer I with the reading center position of the reading device, but since a normal semiconductor process includes a step of aligning the center of the wafer, this step can be used.

また、@取シ装置による読取シ位青を走査させるように
すnば、読取り装置上にウェハl′に置くだけでマーク
4の読取シが可能である。
Furthermore, if the reading device is configured to scan the blue light, the mark 4 can be read simply by placing the wafer l' on the reading device.

なお第3図はウェハ情報全読取ってプロセス条件の設定
を行なうためのシステムの一例を示している。10は半
導体製造装置であり、入カスチージョンに載置さnたキ
ャリア11には複数枚の半導体ウェハ1が収納さnてい
る。このウェハ1の搬送路に対向してウエノS情報読取
り装置12が設置され、この装置12によるバーコード
マーク読取りデータは読取シ装置コントローラ13に導
かれ、ここでウニ/飄番号が解読さ扛る。このウェハ番
号データはホストコンピュータ14に読込まnここでプ
ロセス処理条件が決定され、この決定さn、た条件にし
たがって製造装置コントローラ15が前記製造装置1θ
の条件設定全行なう。なお、16は外部メモリ、17は
上記製造装置10の出カスチージョン上のキャリアであ
る。また、読取り装置12の位置はウェハ1の搬送路上
であれば、ローダ等のキャリアステーション上でも搬送
ベルト上でもかまわない。
Note that FIG. 3 shows an example of a system for reading all wafer information and setting process conditions. Reference numeral 10 denotes a semiconductor manufacturing apparatus, in which a plurality of semiconductor wafers 1 are housed in a carrier 11 placed on an input chamber. A Ueno S information reading device 12 is installed opposite to the conveyance path of the wafer 1, and the barcode mark reading data by this device 12 is guided to the reading device controller 13, where the uni/strip number is decoded. . This wafer number data is read into the host computer 14, where the process conditions are determined, and the manufacturing equipment controller 15 controls the manufacturing equipment 1θ according to the determined conditions.
Perform all condition settings. Note that 16 is an external memory, and 17 is a carrier on the output stage of the manufacturing apparatus 10. Further, the reading device 12 may be located on a carrier station such as a loader or on a conveyor belt as long as it is on the conveyance path of the wafer 1.

上述したような半導体ウエノ・識別方法によnば、ウェ
ハ情報としてウニ/・とtlは同心円状のリング状バー
コードマークを曹込んでおき、マーク読取りに際して読
取シ装置とウニI・とをウェハの向きに関係なく相対向
させることによりしかも上記マークの曹込みおよび読取
りに際して通常のプロセスにおけるウェハ中心位置を定
める工程を利用チルは特別にウェハの位置合わせ金貨な
わなくてもよく、前述したように従来必要であったマー
ク識別のための位置合わせの工程および装置が不要であ
る。したがって、ウェハ情報の識別に要する工程、装置
が単純化さn%識別の所要時間も短かくなり、書込みお
よび祈1取シ装置の小型化およびプロセス処理条件設定
システムの自動−化にも適している。寸た、複数台の読
取り装置を使用する場合にも、そnぞれの位置合わせ装
置は不要であシ、位置合わせ装置の面倒な保守は不要と
なる。
According to the semiconductor wafer identification method described above, a concentric ring-shaped barcode mark is inserted into the wafer information as wafer information, and when reading the mark, the reading device and the wafer are connected to each other. By making the wafers face each other regardless of their orientation, and by using the process of determining the center position of the wafer in the normal process when shaving and reading the above marks, there is no need for special wafer alignment gold coins, as mentioned above. There is no need for alignment steps and devices for mark identification, which were conventionally necessary. Therefore, the process and equipment required to identify wafer information are simplified, and the time required for n% identification is shortened, making it suitable for miniaturizing writing and reading equipment and automating the process processing condition setting system. There is. Furthermore, even when a plurality of reading devices are used, there is no need for each positioning device, and troublesome maintenance of the positioning devices becomes unnecessary.

〔発明の効果〕〔Effect of the invention〕

上述したように本発明のウェハ識別方法によれは、ウェ
ハ情報の有込みおよび読取pに際してウェハの向きを整
える必要がなく、ウェハ情報の識別に要する工程が単純
になり、識別のための所要時間の短縮化および関連装置
の小型化を図ることができ、プロセス処理条件設定シス
テムの自動化に好適である。
As described above, according to the wafer identification method of the present invention, there is no need to adjust the orientation of the wafer when inserting and reading wafer information, simplifying the steps required to identify wafer information, and reducing the time required for identification. It is possible to shorten the time and downsize the related equipment, and it is suitable for automating a process treatment condition setting system.

【図面の簡単な説明】[Brief explanation of drawings]

第11図は従来の半導体ウェハ上のマークを説明するた
めに示す平面図、第2図および第3図は本発明に係るウ
ェハ識別方法の一実施例?説明するために示すもので、
第2図は半導体ウェハ上にバーコードマークを書込んだ
状態を示す平面図、第3図は第2図のバーコードマーク
を読取って半導体装置製造装置のプロセス条件を設定す
るシステムを示す構成費、切回である。 1・・・半導体ウニ/1.4・・・リング状ノ(−コー
ドマーク。 出願人代理人  弁理士 鈴 江 武 彦57
FIG. 11 is a plan view shown to explain conventional marks on a semiconductor wafer, and FIGS. 2 and 3 are an embodiment of the wafer identification method according to the present invention. This is shown for the purpose of explanation.
Figure 2 is a plan view showing a state in which barcode marks have been written on a semiconductor wafer, and Figure 3 is a configuration diagram showing a system for reading the barcode marks in Figure 2 and setting process conditions for semiconductor device manufacturing equipment. , is a cut. 1... Semiconductor sea urchin / 1.4... Ring-shaped (- code mark. Applicant's representative Patent attorney Takehiko Suzue 57

Claims (1)

【特許請求の範囲】[Claims] 半導体ウェハ上にウェハとほぼ同心円状にリング状バー
コードマークをマーク書込み装置により書込み、このバ
ーコードマークが書込まn友つェハに対する半導体装置
製造過程でバーコードマーク読取り装置により上記ウェ
ハ上のバーコードマークを読取り、この読取ら牡たバー
コードマークに基いて前記ウェハのウェハ情報を識別す
ることを%徴とする半導体ウェハ識別方法。
A ring-shaped barcode mark is written on a semiconductor wafer almost concentrically with the wafer by a mark writing device, and this barcode mark is written on the wafer by a barcode mark reading device during the semiconductor device manufacturing process for the wafer. A semiconductor wafer identification method comprising reading a barcode mark and identifying wafer information of the wafer based on the read barcode mark.
JP18027282A 1982-10-14 1982-10-14 Discriminating method for semiconductor wafer Pending JPS5969917A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18027282A JPS5969917A (en) 1982-10-14 1982-10-14 Discriminating method for semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18027282A JPS5969917A (en) 1982-10-14 1982-10-14 Discriminating method for semiconductor wafer

Publications (1)

Publication Number Publication Date
JPS5969917A true JPS5969917A (en) 1984-04-20

Family

ID=16080322

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18027282A Pending JPS5969917A (en) 1982-10-14 1982-10-14 Discriminating method for semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS5969917A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62500960A (en) * 1984-11-27 1987-04-16 カツプナ−,ヘルム−ト ア− Method and apparatus for identifying and recognizing objects
JPS63110744A (en) * 1986-10-29 1988-05-16 Tokyo Electron Ltd Probing apparatus
US5445271A (en) * 1992-11-17 1995-08-29 Kabushiki Kaisha Kakizaki Seisakusho Resin-made basket for thin sheets
JPH08227925A (en) * 1995-12-27 1996-09-03 Tokyo Electron Ltd Probing method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62500960A (en) * 1984-11-27 1987-04-16 カツプナ−,ヘルム−ト ア− Method and apparatus for identifying and recognizing objects
JPS63110744A (en) * 1986-10-29 1988-05-16 Tokyo Electron Ltd Probing apparatus
JPH077791B2 (en) * 1986-10-29 1995-01-30 東京エレクトロン株式会社 Probe device
US5445271A (en) * 1992-11-17 1995-08-29 Kabushiki Kaisha Kakizaki Seisakusho Resin-made basket for thin sheets
JPH08227925A (en) * 1995-12-27 1996-09-03 Tokyo Electron Ltd Probing method

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