【発明の詳細な説明】
従来、斜め蒸着法や斜め入射イオンブレーティング法に
より作成した磁気記録用金属薄膜は、高い飽和磁化と大
きい保磁力のため高密度記録可能な磁気記録体として期
待され、研究が進められているが、従来市販されている
塗布型磁気記録体と異なり金属薄膜が直接ヘッドに接触
し使用される式であるが、斜め入射蒸着金属薄膜のため
、ヘッドとの接触が悪く、その結果、出力変動が大きく
なることが欠点となつている。[Detailed Description of the Invention] Conventionally, magnetic recording metal thin films prepared by oblique evaporation method or oblique incidence ion blating method are expected to be a magnetic recording medium capable of high-density recording due to their high saturation magnetization and large coercive force. Research is underway, but unlike conventional commercially available coating-type magnetic recording media, the metal thin film is used in direct contact with the head, but since the metal thin film is deposited at an oblique incidence, contact with the head is poor. As a result, the disadvantage is that the output fluctuation becomes large.
その蒸着膜を詳細に検討すると、その表面には、比較的
多数のゴミ等の異物の付着や突出が認められ、ミクロ的
には、斜め蒸着特有の結晶が入射方向に斜めに配列し、
表面は階段状の粗面となつていることが観察される。本
発明者等は特に、かゝる表面が、上記欠点をもたらす原
因の１つではないかと想像し、その表面処理を、蒸着金
属薄膜に損傷を与えることなし５ に、ヘッドとの接触
性を良好にする手段を種々試みた結果、極めて簡単な方
法で、上記の欠点をその表面の酸化を容易に防止しなが
ら除去する方法を見出した。When the deposited film was examined in detail, it was found that a relatively large number of foreign substances such as dust adhered to and protruded from the surface, and microscopically, crystals peculiar to oblique evaporation were arranged obliquely in the direction of incidence.
It is observed that the surface has a step-like roughness. The present inventors particularly imagined that such a surface may be one of the causes of the above-mentioned drawbacks, and treated the surface to improve contact with the head without damaging the deposited metal thin film5. As a result of trying various methods to improve the quality, we have found a very simple method to eliminate the above-mentioned defects while easily preventing oxidation of the surface.
即ちその方法は、基材面に、その斜め入射蒸着磁気記録
用金属薄膜を生成後、特にそ１０の表面を有機溶剤中で
パラ研磨することを特徴とする。他の研磨方法では、ご
み等が除去されるが、蒸着膜結晶面に損傷を与え却つて
磁気特性を劣化せしめることとなり不適であつた。この
ようにして本法処理を行なつた磁気記録体は、そのパラ
研１５摩処理中表面の酸化なしに充分に所要のパラ研摩
を行なうことができると共に下記のように、出力変動が
減少したと共に、更に好ましいことには、再生出力の増
大効果をもたらした。即ち、本発明の実施例を説明する
に、常法によ２０り２５μ厚のポリエステルテープ上に
斜め蒸着法により磁性膜を作成した後、パラによりその
テープの蒸着金属薄膜面をそのテープの長さ方向に５〜
６回往復研磨する。That is, the method is characterized in that after forming the obliquely incident vapor-deposited magnetic recording metal thin film on the substrate surface, the surface of the substrate 10 is para-polished in an organic solvent. Other polishing methods remove dust and the like, but are unsuitable because they damage the crystal planes of the deposited film and deteriorate the magnetic properties. In this way, the magnetic recording material treated with this method can be sufficiently polished without oxidizing the surface during the para-polishing process, and the output fluctuations are reduced as shown below. In addition, more preferably, the reproduction output was increased. That is, to explain the embodiment of the present invention, a magnetic film is formed by diagonal vapor deposition on a polyester tape having a thickness of 20 to 25 μm by a conventional method, and then the vapor-deposited metal thin film surface of the tape is 5~ in the horizontal direction
Polish back and forth 6 times.
テープは、駆動ロールと巻取りロールとの間を往復走行
させ、その走行面に２５沿い、パラを当てれば作業が簡
単であると共にその走行方向に対し直角に研摩する場合
のようにノズルの原因となることがなく有利である。尚
、このパラ作業中、磁性金属粒子の酸化を防止するべく
、子−プをアルコール液中を通し、該アルコ−３０ル液
中でパラ研磨を行なうことが好ましい。このようにパラ
研磨処理した磁気記録テープをオーディオカセットに巻
き込み、測定した。測定値は市販ｃｒｏ２テープを基準
にした。The tape is made to run back and forth between the drive roll and the take-up roll, and the work is simple if the tape is applied along 25 along the running surface, and the work is easy, as is the case when polishing at right angles to the running direction. This is advantageous because it does not cause In order to prevent oxidation of the magnetic metal particles during this para-polishing process, it is preferable to pass the particles through an alcohol solution and perform para-polishing in the alcohol solution. The magnetic recording tape subjected to the para-polishing process was wound into an audio cassette and measured. The measured values were based on commercially available cro2 tape.
その測定結果を下表に示す。対比のためパラ研磨しな３
５い通常の子−プについても測定した。ハブ研磨処理し
た蒸着金属薄膜の表面は、空気による酸化なく光択を帯
びており、又光学顕微鏡で観察すると、ゴミや蒸着中の
突起物が除去され比較的平担面をなしていた。このよう
に、本発明によるときは、非磁性基材面に斜め入射蒸着
金属薄膜面を生成した後その表面に有機溶剤中でハブ研
磨処理を施したので、出力変動の小さい而も再生出力の
改善された而もハブ研摩中の磁性膜表面の酸化が防止さ
れ且つ清浄な磁気記録体を得ることが出来る効果を有す
る。The measurement results are shown in the table below. Para-polished for comparison 3
Measurements were also made on five normal offspring. The surface of the vapor-deposited metal thin film subjected to hub polishing had a photoresistance without being oxidized by air, and when observed with an optical microscope, dust and protrusions during vapor deposition were removed and the surface was relatively flat. In this way, according to the present invention, a thin metal film surface deposited at an oblique incidence is formed on the surface of a non-magnetic base material, and then the surface is subjected to hub polishing treatment in an organic solvent. This improvement also has the effect that oxidation of the magnetic film surface during hub polishing can be prevented and a clean magnetic recording medium can be obtained.