JPS5947477B2 - 半導体装置およびその製造方法 - Google Patents
半導体装置およびその製造方法Info
- Publication number
- JPS5947477B2 JPS5947477B2 JP49061030A JP6103074A JPS5947477B2 JP S5947477 B2 JPS5947477 B2 JP S5947477B2 JP 49061030 A JP49061030 A JP 49061030A JP 6103074 A JP6103074 A JP 6103074A JP S5947477 B2 JPS5947477 B2 JP S5947477B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- charge
- semiconductor
- wafer
- insulating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
- H01J29/36—Photoelectric screens; Charge-storage screens
- H01J29/39—Charge-storage screens
- H01J29/45—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen
- H01J29/451—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen with photosensitive junctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
- H01J29/36—Photoelectric screens; Charge-storage screens
- H01J29/39—Charge-storage screens
- H01J29/45—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen
- H01J29/451—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen with photosensitive junctions
- H01J29/453—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen with photosensitive junctions provided with diode arrays
- H01J29/455—Charge-storage screens exhibiting internal electric effects caused by electromagnetic radiation, e.g. photoconductive screen, photodielectric screen, photovoltaic screen with photosensitive junctions provided with diode arrays formed on a silicon substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
- H01J9/233—Manufacture of photoelectric screens or charge-storage screens
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
- H10D62/103—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F99/00—Subject matter not provided for in other groups of this subclass
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Light Receiving Elements (AREA)
- Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US36592773A | 1973-06-01 | 1973-06-01 | |
US365927 | 1973-06-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5023186A JPS5023186A (enrdf_load_stackoverflow) | 1975-03-12 |
JPS5947477B2 true JPS5947477B2 (ja) | 1984-11-19 |
Family
ID=23440967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP49061030A Expired JPS5947477B2 (ja) | 1973-06-01 | 1974-05-31 | 半導体装置およびその製造方法 |
Country Status (10)
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20220127933A (ko) * | 2021-01-27 | 2022-09-20 | 히다치 겡키 가부시키 가이샤 | 유압 셔블 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4704635A (en) * | 1984-12-18 | 1987-11-03 | Sol Nudelman | Large capacity, large area video imaging sensor |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE636317A (enrdf_load_stackoverflow) * | 1962-08-23 | 1900-01-01 | ||
FR1449089A (fr) * | 1964-07-09 | 1966-08-12 | Rca Corp | Dispositifs semi-conducteurs |
US3523208A (en) * | 1968-05-27 | 1970-08-04 | Bell Telephone Labor Inc | Image converter |
FR2024513A1 (enrdf_load_stackoverflow) * | 1968-11-29 | 1970-08-28 | Rca Corp | |
US3670198A (en) * | 1969-09-30 | 1972-06-13 | Sprague Electric Co | Solid-state vidicon structure |
-
1974
- 1974-05-06 CA CA199,013A patent/CA1025034A/en not_active Expired
- 1974-05-15 NL NL7406513A patent/NL7406513A/xx not_active Application Discontinuation
- 1974-05-22 SE SE7406830A patent/SE7406830L/xx unknown
- 1974-05-22 DE DE19742424908 patent/DE2424908A1/de active Granted
- 1974-05-27 FR FR7418268A patent/FR2232090B1/fr not_active Expired
- 1974-05-27 IT IT7451231A patent/IT1013259B/it active
- 1974-05-29 CH CH877876A patent/CH581905A5/xx not_active IP Right Cessation
- 1974-05-29 BE BE144891A patent/BE815700A/xx not_active IP Right Cessation
- 1974-05-29 CH CH736174A patent/CH581391A5/xx not_active IP Right Cessation
- 1974-05-31 JP JP49061030A patent/JPS5947477B2/ja not_active Expired
- 1974-05-31 GB GB5055376A patent/GB1477362A/en not_active Expired
- 1974-05-31 GB GB2429774A patent/GB1477361A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20220127933A (ko) * | 2021-01-27 | 2022-09-20 | 히다치 겡키 가부시키 가이샤 | 유압 셔블 |
Also Published As
Publication number | Publication date |
---|---|
AU6835574A (en) | 1975-10-30 |
FR2232090B1 (enrdf_load_stackoverflow) | 1979-02-16 |
GB1477362A (en) | 1977-06-22 |
CH581905A5 (enrdf_load_stackoverflow) | 1976-11-15 |
BE815700A (fr) | 1974-09-16 |
NL7406513A (enrdf_load_stackoverflow) | 1974-12-03 |
FR2232090A1 (enrdf_load_stackoverflow) | 1974-12-27 |
GB1477361A (en) | 1977-06-22 |
SE7406830L (enrdf_load_stackoverflow) | 1974-12-02 |
CH581391A5 (enrdf_load_stackoverflow) | 1976-10-29 |
IT1013259B (it) | 1977-03-30 |
DE2424908A1 (de) | 1974-12-19 |
JPS5023186A (enrdf_load_stackoverflow) | 1975-03-12 |
CA1025034A (en) | 1978-01-24 |
DE2424908C2 (enrdf_load_stackoverflow) | 1988-10-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4411732A (en) | Method of manufacturing a detector device | |
US3496029A (en) | Process of doping semiconductor with analyzing magnet | |
US3507709A (en) | Method of irradiating dielectriccoated semiconductor bodies with low energy electrons | |
US4801994A (en) | Semiconductor electron-current generating device having improved cathode efficiency | |
US3737701A (en) | Camera tube having a semiconductor target with pn mosaic regions covered by a continuous perforated conductive layer | |
GB2109156A (en) | Cathode-ray device and semiconductor cathodes | |
US3983574A (en) | Semiconductor devices having surface state control | |
US4151011A (en) | Process of producing semiconductor thermally sensitive switching element by selective implantation of inert ions in thyristor structure | |
US3956025A (en) | Semiconductor devices having surface state control and method of manufacture | |
US4474623A (en) | Method of passivating a semiconductor body | |
US5900654A (en) | Radiation hardened charge coupled device | |
JPS5947477B2 (ja) | 半導体装置およびその製造方法 | |
US3805126A (en) | Charge storage target and method of manufacture having a plurality of isolated charge storage sites | |
US20240387765A1 (en) | Avalanche photodiode using a silicon cap layer | |
Wotherspoon | Methods of manufacturing a detector device | |
US3830717A (en) | Semiconductor camera tube target | |
US3979629A (en) | Semiconductor with surface insulator having immobile charges | |
US4853754A (en) | Semiconductor device having cold cathode | |
US4916082A (en) | Method of preventing dielectric degradation or rupture | |
Wolf et al. | Electron beam and ion beam fabricated microwave switch | |
US4547957A (en) | Imaging device having improved high temperature performance | |
JP2703883B2 (ja) | Misトランジスタ及びその製造方法 | |
US6225178B1 (en) | Radiation hardened field oxide for VLSI sub-micron MOS device | |
US3883769A (en) | Vidicon camera tube and target | |
Miyauchi et al. | Maskless ion implantation technology for III–V compound semiconductors |