JPS59231430A - Pattern formation parts for load cell or the like - Google Patents
Pattern formation parts for load cell or the likeInfo
- Publication number
- JPS59231430A JPS59231430A JP58106434A JP10643483A JPS59231430A JP S59231430 A JPS59231430 A JP S59231430A JP 58106434 A JP58106434 A JP 58106434A JP 10643483 A JP10643483 A JP 10643483A JP S59231430 A JPS59231430 A JP S59231430A
- Authority
- JP
- Japan
- Prior art keywords
- protective film
- metal
- pattern
- resin
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
- G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
Abstract
Description
【発明の詳細な説明】
発明の技術分野
本発明は、基体の表面に薄膜技術によって金員層による
パターンを形成したロードセル等のパターン形成部品に
関するものである。DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to a pattern-formed component such as a load cell in which a metal layer pattern is formed on the surface of a substrate by thin film technology.
技術的背景およびその問題点
従来、薄膜式のロードセルにおいて、ストレンゲージ抵
抗体や補償用抵抗体の膜厚がきわめて薄いために湿度や
温度の外界の影響が大きい。たとえば、高温の環境下に
おいては酸化し易く、湿度が高くなると樹脂による絶縁
層の膨潤等によシ抵抗変化が発生し、ブリッジバランス
がくずれたシ、出力電圧が変化したシするものである。Technical Background and Problems Conventionally, in thin film type load cells, the film thickness of the strain gauge resistor and compensation resistor is extremely thin, so that the influence of the external environment such as humidity and temperature is large. For example, they are susceptible to oxidation in high-temperature environments, and when humidity increases, resistance changes occur due to swelling of the insulating layer caused by the resin, leading to loss of bridge balance and changes in output voltage.
発明の目的
本発明は、耐湿性がきわめて高いロードセル等のパター
ン形成部品金得ることを目的とする。OBJECTS OF THE INVENTION The object of the present invention is to obtain pattern-forming parts such as load cells that have extremely high moisture resistance.
発明の概要
本発明は、基体の表面に形成された金属層の上に樹脂に
よる保護膜を形成し、この保護膜上に金属被膜層形成し
たので、外気の湿度が高くても金属被膜が存するために
樹脂による保護層に湿度が影響することがなく、これに
より、保護膜の膨潤が生じることがなく、その内部の金
属層によるパターンは確実に保護されるように構成した
ものである。Summary of the Invention The present invention forms a resin protective film on a metal layer formed on the surface of a substrate, and forms a metal film layer on this protective film, so that the metal film remains even when the humidity of the outside air is high. Therefore, humidity does not affect the protective layer made of resin, so that the protective film does not swell, and the pattern made of the metal layer inside the protective layer is reliably protected.
発明の実施例
まず、基体としての角柱状のビーム体（１）が設けられ
、このビーム体（１）はたとえばステンレス材や高力ア
ルミニウム材などの金属弾性体よシなるものであシ、た
がいに連通ずる二つの孔（２）によシ薄肉変形部（３）
が形成されている。そして、一端にはベース等の固定部
に結合される二個の取付孔（４）が形成され、他端には
荷重を受けるだめの受皿等が連結される受孔（５）が形
成されている。Embodiments of the Invention First, a prismatic beam body (1) as a base is provided, and this beam body (1) is made of a metal elastic material such as stainless steel or high-strength aluminum, and is The thin-walled deformed part (3) is connected to the two holes (2) that communicate with the
is formed. Two mounting holes (4) are formed at one end to be connected to a fixed part such as a base, and a receiving hole (5) is formed at the other end to which a receiving plate for receiving a load is connected. There is.
このようなビーム体（１）のパターン形成面（６）には
ポリイミド系樹脂等よｐなる渇い絶縁層（７）が形成さ
れている。この絶経層（７）の上にはＮｊＣｒＳｓ等の
電気抵抗の大きい第一の金属層（８）とＡＩ！等の電導
性のよい材料による第二の金属層（９）とが蒸着やスパ
ンクリング等により積層形成されている。このような金
属層（８） （９）はフォトエツチング等の選択エツチ
ングによ’） Ｒ１、Ｒ２、Ｒ３、Ｒ４と表示したスト
レンゲージ抵抗体叫、ｒ２、ｒ３と表示したブリッジバ
ランス補正抵抗α刀、ｒ ２ （Ｔｌ、ｒ ｓ （Ｔ）
と表示したブリッジバランス温度補正抵抗（６）、Ｒｓ
（Ｔ）と表示した出力電圧の温度補正抵抗αＪ、各部を
結線するリード部α重よ）なるパターンへ１を形成して
いる。また、このリード部α檜の端部には、Ｖｅ＋、
Ｖｅ−、Ｖｏ＋、 Ｖｏ−と表示した端子部αＧが形成
されている。A dry insulating layer (7) made of polyimide resin or the like is formed on the pattern forming surface (6) of such a beam body (1). On top of this dead layer (7) is a first metal layer (8) of high electrical resistance such as NjCrSs and AI! A second metal layer (9) made of a material with good conductivity such as the like is laminated by vapor deposition, spankling, or the like. Such metal layers (8) and (9) are formed by selective etching such as photoetching.) Strain gauge resistors labeled R1, R2, R3, and R4, bridge balance correction resistors labeled r2, and r3. , r 2 (Tl, r s (T)
Bridge balance temperature compensation resistor (6) indicated as Rs.
A pattern 1 is formed with a temperature correction resistor αJ for the output voltage indicated as (T), and a lead portion α layered for connecting each part. In addition, at the end of this lead α cypress, Ve+,
Terminal portions αG labeled Ve-, Vo+, and Vo- are formed.
このようなビーム体（１）のパターン形成面（６）の表
面には、前記端子部αＧを除いて樹脂による保護膜α７
）が全面に形成されている。この保護膜αηはポリイミ
ド系樹脂よりなるもので、このポリイミド系樹脂は絶縁
性が優れておシ、吸水性があシ透水性が悪い。そのため
、湿度によって膨潤することからストレンゲージ抵抗体
α０）等に歪の影響を与えて抵抗変化をおこさせる欠点
ヲ壱する。その反面、透水性が悪いためにストレンケー
ジ抵抗体叫を酸化腐蝕させるような影響全防ぐことが可
能である。A protective film α7 made of resin is formed on the surface of the pattern forming surface (6) of such a beam body (1), except for the terminal portion αG.
) are formed on the entire surface. This protective film αη is made of a polyimide resin, which has excellent insulation properties, has good water absorption properties, and has poor water permeability. Therefore, it has the disadvantage that it swells due to humidity, which causes strain on the strain gauge resistor α0), causing a change in resistance. On the other hand, due to poor water permeability, it is possible to completely prevent oxidative corrosion of the strain cage resistor.
ついで、前記保護膜α７）の表面に、蒸着やスパッタリ
ングによシ金属被膜θ印を形成する。この金属被膜α→
の材料は、Ａｕ、 ＮｉＣｒ、Ｔｉ等の耐蝕性の大きい
金属を用いる必要がある。Next, a metal coating θ mark is formed on the surface of the protective film α7) by vapor deposition or sputtering. This metal coating α→
As the material, it is necessary to use a metal with high corrosion resistance such as Au, NiCr, or Ti.
このような構成において、受孔（５）に連結された受皿
等に荷重を印加すると、Ｒｌｓ Ｒ２のストレンゲージ
抵抗体αＯに引張応力が作用し、Ｒ３、Ｒ４のストレン
ゲージ抵抗体００に圧縮応力が作用する。これによシ、
荷重に対応した電気的出力が発生し、重量測定がなされ
る。In such a configuration, when a load is applied to the saucer connected to the receiving hole (5), tensile stress acts on the strain gauge resistor αO of Rls R2, and compressive stress is applied to the strain gauge resistor 00 of R3 and R4. acts. For this,
An electrical output corresponding to the load is generated and the weight is measured.
しかして、ストレンゲージ抵抗体αＱ等は保護膜αηに
より覆われているので、前述のように酸化腐蝕に対して
は充分に保護されている。また、この保護層αηは金属
被膜（ｌυによシ覆われているので、保護膜α力に湿度
が作用することがなく、保護膜α７）が湿度によシ膨潤
することはない。そのため、保護膜（ロ）の膨潤に基づ
くストレンゲージ抵抗体αＱへの影響はない。Since the strain gauge resistor αQ and the like are covered with the protective film αη, they are sufficiently protected from oxidative corrosion as described above. Further, since this protective layer αη is covered with a metal film (lυ), humidity does not act on the protective film α, and the protective film α7 does not swell due to humidity. Therefore, there is no influence on the strain gauge resistor αQ due to the swelling of the protective film (b).
つぎに、最外層に形成されている金属被膜０杓はヤング
率の低い金属であることが望ましい。とくに、低容量タ
イプのロードセルに対してはクリーブ等の影響がないこ
とが要望される。そのためには、金属被膜α約の材料と
してＡｒの使用が望ましい。Next, it is desirable that the metal coating formed on the outermost layer be a metal with a low Young's modulus. In particular, it is desired that low capacity type load cells be free from the effects of cleave and the like. For this purpose, it is desirable to use Ar as the material for the metal coating α.
この場合には、Ａｆ層の酸化腐蝕を防止するために、Ｎ
４ＣγやＴｉ等の耐蝕性の高い金属によるもう一層の金
属被膜を保護層として形成する。この保護層としての金
属被膜は０゜０１μ程度のきわめて薄いものとする。In this case, in order to prevent oxidative corrosion of the Af layer, N
Another layer of metal film made of a highly corrosion-resistant metal such as 4Cγ or Ti is formed as a protective layer. The metal film serving as the protective layer is extremely thin with a thickness of about 0.01 μm.
発明の効果
本発明は、基体の表面に形成された絶縁層の上に一層ま
たは複数層の金属層によるパターンを形成したものにお
いて、このパターン上に樹脂による保護膜と金属被膜と
を順次積層形成したので、樹脂による保護層は絶縁性だ
けあればよく、金属被膜が保護層に対しては防湿性を示
し、これによシ、湿度による急影響を全くなくすことが
できるものである。Effects of the Invention The present invention provides a method in which a pattern of one or more metal layers is formed on an insulating layer formed on the surface of a substrate, and a protective film made of resin and a metal coating are sequentially laminated on this pattern. Therefore, the resin protective layer only needs to be insulating, and the metal coating exhibits moisture-proofing properties for the protective layer, thereby completely eliminating the sudden effects of humidity.
図面は本発明の一実施例を示すもので、第１図は斜視図
、第２図は回路図、第３図は各層を拡大して示した側面
図である。
１・・・ビーム体（基体）、７・・・絶縁層、８〜９・
・・金属層、１７・・・保護膜、１８・・・金属被脱出
願 人 東京電気株式会社
迩」 図
、１６図
１ 」 乙ｊｊｊｂThe drawings show one embodiment of the present invention; FIG. 1 is a perspective view, FIG. 2 is a circuit diagram, and FIG. 3 is a side view showing each layer enlarged. DESCRIPTION OF SYMBOLS 1... Beam body (substrate), 7... Insulating layer, 8-9.
...Metal layer, 17...Protective film, 18...Metal escape Applicant: Tokyo Electric Co., Ltd. Figure 16 Figure 1
Claims (1)
薄膜の金属層によるパターンを一層または複数層形成し
たものにおいて、前記パターン上に樹脂による保護膜を
形成し、この保護膜上に金属被膜を形成したことｆ：％
徴とするロードセル等のパターン形成部品。 ２、 金属被膜はＡｕ、 ＮｉＣｒ、 Ｔ＃等による耐
蝕金属としたことを特徴とする特許請求の範囲第１項記
載のロードセル等のパターン形成部品。 ３、基体の表面に絶縁層を形成し、この絶縁層の上に薄
膜の金属層によるパターンを一層または複数層形成した
ものにおいて、前記パターン上に樹脂による保護膜を形
成し、この保護膜上にＡＪによる金属被膜を形成し、こ
の金属被膜上にＡｕ、ＮｉＣｒ、 Ｔｉ痔による耐蝕金
属による金属保護層全形成したことを特徴とするロード
セル等のパターン形成部品。[Claims] 1. An insulating layer is formed on the surface of a substrate, and one or more patterns of thin metal layers are formed on the insulating layer, and a protective film of resin is formed on the pattern. and that a metal film was formed on this protective film f:%
Pattern-forming parts such as load cells, etc. 2. A pattern forming component such as a load cell according to claim 1, wherein the metal coating is made of a corrosion-resistant metal such as Au, NiCr, or T#. 3. In the case where an insulating layer is formed on the surface of the substrate, and one or more patterns of thin metal layers are formed on the insulating layer, a protective film of resin is formed on the pattern, and a protective film is formed on the protective film. A pattern-formed component such as a load cell, characterized in that a metal coating is formed by AJ, and a metal protective layer made of a corrosion-resistant metal such as Au, NiCr, or Ti is entirely formed on the metal coating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58106434A JPS59231430A (en) | 1983-06-14 | 1983-06-14 | Pattern formation parts for load cell or the like |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58106434A JPS59231430A (en) | 1983-06-14 | 1983-06-14 | Pattern formation parts for load cell or the like |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59231430A true JPS59231430A (en) | 1984-12-26 |
Family
ID=14433540
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58106434A Pending JPS59231430A (en) | 1983-06-14 | 1983-06-14 | Pattern formation parts for load cell or the like |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59231430A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60227129A (en) * | 1984-04-25 | 1985-11-12 | Yamato Scale Co Ltd | Strain gage |
| JPH01283801A (en) * | 1988-03-25 | 1989-11-15 | Richard E Caddock | Film type cylindrical resistor and its manufacture |
| EP0667514A2 (en) * | 1994-02-15 | 1995-08-16 | Hottinger Baldwin Messtechnik Gmbh | Method for manufacturing strain-gauges |
| EP0801150A2 (en) * | 1996-04-12 | 1997-10-15 | Grundfos A/S | Electronic component |
| US6085596A (en) * | 1996-04-12 | 2000-07-11 | Grundfos A/S | Pressure sensor having an insulating layer and fluid tight amorphous metal layer |
| JP2005214970A (en) * | 2004-01-27 | 2005-08-11 | Mettler Toledo Gmbh | Moisture protection technique for electromechanical transducer |
| JP2008064569A (en) * | 2006-09-06 | 2008-03-21 | Kyowa Electron Instr Co Ltd | Mechanical characteristic testing device, and strain gage for hydrogen atmosphere used therefor |
| JP2009519444A (en) * | 2005-12-16 | 2009-05-14 | ザトーリウス アクチエン ゲゼルシャフト | Precision force transducer with strain gauge elements |
| US8161811B2 (en) | 2009-12-18 | 2012-04-24 | Honeywell International Inc. | Flow sensors having nanoscale coating for corrosion resistance |
-
1983
- 1983-06-14 JP JP58106434A patent/JPS59231430A/en active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60227129A (en) * | 1984-04-25 | 1985-11-12 | Yamato Scale Co Ltd | Strain gage |
| JPH01283801A (en) * | 1988-03-25 | 1989-11-15 | Richard E Caddock | Film type cylindrical resistor and its manufacture |
| EP0667514A2 (en) * | 1994-02-15 | 1995-08-16 | Hottinger Baldwin Messtechnik Gmbh | Method for manufacturing strain-gauges |
| EP0667514A3 (en) * | 1994-02-15 | 1996-09-04 | Hottinger Messtechnik Baldwin | Method for manufacturing strain-gauges. |
| EP0801150A2 (en) * | 1996-04-12 | 1997-10-15 | Grundfos A/S | Electronic component |
| EP0801150A3 (en) * | 1996-04-12 | 1999-03-10 | Grundfos A/S | Electronic component |
| US6085596A (en) * | 1996-04-12 | 2000-07-11 | Grundfos A/S | Pressure sensor having an insulating layer and fluid tight amorphous metal layer |
| JP2005214970A (en) * | 2004-01-27 | 2005-08-11 | Mettler Toledo Gmbh | Moisture protection technique for electromechanical transducer |
| JP2009519444A (en) * | 2005-12-16 | 2009-05-14 | ザトーリウス アクチエン ゲゼルシャフト | Precision force transducer with strain gauge elements |
| JP2008064569A (en) * | 2006-09-06 | 2008-03-21 | Kyowa Electron Instr Co Ltd | Mechanical characteristic testing device, and strain gage for hydrogen atmosphere used therefor |
| US8161811B2 (en) | 2009-12-18 | 2012-04-24 | Honeywell International Inc. | Flow sensors having nanoscale coating for corrosion resistance |
| US8424380B2 (en) | 2009-12-18 | 2013-04-23 | Honeywell International Inc. | Flow sensors having nanoscale coating for corrosion resistance |
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