JPS5921668U - Shaking prevention mechanism for holding material to be processed in electroplating processing equipment - Google Patents
Shaking prevention mechanism for holding material to be processed in electroplating processing equipmentInfo
- Publication number
- JPS5921668U JPS5921668U JP11556982U JP11556982U JPS5921668U JP S5921668 U JPS5921668 U JP S5921668U JP 11556982 U JP11556982 U JP 11556982U JP 11556982 U JP11556982 U JP 11556982U JP S5921668 U JPS5921668 U JP S5921668U
- Authority
- JP
- Japan
- Prior art keywords
- processed
- electroplating processing
- holding material
- processing equipment
- prevention mechanism
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は本装置の概略全体平面図、第2図は本装置の概
略縦断側面図、第3図は同じく概略縦断正面図を示した
ものである。
1・・・・・・メッキ処理槽、2・・・・・・前処理槽
、3・・・・・・後処理槽、4・・・・・・被処理物、
5・・・・・・被処理物保持材、6・・・・・・摺動レ
ール、7・・・・・・陽極、8・・・・・・摺動ガイド
部材、9・・・・・・基部、10・・・・・・掛合部、
11・・・・・・摺動移動部材。FIG. 1 is a schematic overall plan view of the device, FIG. 2 is a schematic vertical side view of the device, and FIG. 3 is a schematic vertical front view of the device. 1...Plating treatment tank, 2...Pre-treatment tank, 3...Post-treatment tank, 4...Product to be treated,
5... Workpiece holding material, 6... Sliding rail, 7... Anode, 8... Sliding guide member, 9... ... Base, 10... Engagement part,
11...Sliding movement member.
Claims (1)
漬されながら順次次工程に移送される被処理物保持材と
を備えた電気メツキ処理装置において、前記メッキ処理
槽の内壁に移送方向に沿った係合部を有する摺動ガイド
部材を設けると共は、該摺動ガイド部材の係合部に係合
されながら摺動される保合部を有する摺動移動部材を前
記被処理物保持材に取り付けたことを特徴とする電気メ
ツキ処理装置における被処理物保持材の揺れ防止機構。In an electroplating processing apparatus equipped with a series of plating tanks and a workpiece holding material that is immersed in the plating tank and transferred to the process sequentially, a plate is attached to the inner wall of the plating tank in the transfer direction. Providing a sliding guide member having an engaging portion along the same direction means that a sliding member having a retaining portion that is slid while being engaged with the engaging portion of the sliding guide member is used to hold the object to be processed. A mechanism for preventing shaking of a material holding a processed object in an electroplating processing apparatus, characterized in that it is attached to a material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11556982U JPS5921668U (en) | 1982-07-29 | 1982-07-29 | Shaking prevention mechanism for holding material to be processed in electroplating processing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11556982U JPS5921668U (en) | 1982-07-29 | 1982-07-29 | Shaking prevention mechanism for holding material to be processed in electroplating processing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5921668U true JPS5921668U (en) | 1984-02-09 |
JPS6145168Y2 JPS6145168Y2 (en) | 1986-12-19 |
Family
ID=30266730
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11556982U Granted JPS5921668U (en) | 1982-07-29 | 1982-07-29 | Shaking prevention mechanism for holding material to be processed in electroplating processing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5921668U (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998032901A1 (en) * | 1997-01-22 | 1998-07-30 | Hideyuki Kobayashi | Product conveyance mechanism of electroplating apparatus |
JP2009191303A (en) * | 2008-02-13 | 2009-08-27 | Hitachi Aic Inc | Fixing jig for plating printed circuit board |
KR101140936B1 (en) | 2009-09-14 | 2012-05-03 | 삼성전기주식회사 | Plating apparatus and method for substrate |
JP2013011004A (en) * | 2011-06-30 | 2013-01-17 | C Uyemura & Co Ltd | Surface treatment apparatus and plating tank |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS586998A (en) * | 1981-06-25 | 1983-01-14 | ナプコ・インコ−ポレ−テツド | High speed plating apparatus of flat processed article |
-
1982
- 1982-07-29 JP JP11556982U patent/JPS5921668U/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS586998A (en) * | 1981-06-25 | 1983-01-14 | ナプコ・インコ−ポレ−テツド | High speed plating apparatus of flat processed article |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998032901A1 (en) * | 1997-01-22 | 1998-07-30 | Hideyuki Kobayashi | Product conveyance mechanism of electroplating apparatus |
JP2009191303A (en) * | 2008-02-13 | 2009-08-27 | Hitachi Aic Inc | Fixing jig for plating printed circuit board |
KR101140936B1 (en) | 2009-09-14 | 2012-05-03 | 삼성전기주식회사 | Plating apparatus and method for substrate |
JP2013011004A (en) * | 2011-06-30 | 2013-01-17 | C Uyemura & Co Ltd | Surface treatment apparatus and plating tank |
Also Published As
Publication number | Publication date |
---|---|
JPS6145168Y2 (en) | 1986-12-19 |
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