JPS59209892A - Thermal recording head - Google Patents

Thermal recording head

Info

Publication number
JPS59209892A
JPS59209892A JP58084169A JP8416983A JPS59209892A JP S59209892 A JPS59209892 A JP S59209892A JP 58084169 A JP58084169 A JP 58084169A JP 8416983 A JP8416983 A JP 8416983A JP S59209892 A JPS59209892 A JP S59209892A
Authority
JP
Japan
Prior art keywords
protective layer
recording head
heat
heating resistors
thermal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58084169A
Other languages
Japanese (ja)
Inventor
Ryozo Takeuchi
良三 武内
Tatsuo Honda
本田 龍夫
Makoto Tsumura
誠 津村
Moriaki Fuyama
盛明 府山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58084169A priority Critical patent/JPS59209892A/en
Publication of JPS59209892A publication Critical patent/JPS59209892A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00Electric solid-state thin-film or thick-film devices, not otherwise provided for

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electronic Switches (AREA)

Abstract

PURPOSE:To obtain a thermal recording head which is high in thermal efficiency and does not lower the quality of recorded images, by a method wherein the thickness of a protective layer covering the outside surfaces of a plurality of minute heating resistors is reduced at parts between the heating resistors. CONSTITUTION:A glass glaze layer 12 constituting a heat-insulating layer is provided on a substrate 11, a plurality of thin film minute heating resistors 13 arranged with spacing therebetween and lead electrodes 16a, 16b led out to both sides of the arranging direction of the heating resistors 13 are provided thereon, and the protective layer 14 is provided thereon in a covering manner. When an electric current is passed to the heating resistors 13 to generate heat, the heat is rapidly conducted to the surface through the protective layer 14 having a high thermal conductivity. Simultaneously, the head tends to diffuse to the surroundings through the protective layer 14, but the diffusion of heat is restricted or interrupted by grooves 15, so that image quality is not lowered.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、感熱転写記録あるいは感熱発色記録などの感
熱記録装置に用いる、感熱記録ヘッドに関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a thermal recording head used in a thermal recording device such as thermal transfer recording or thermal color recording.

〔発明の背景〕[Background of the invention]

以下感熱転写記録を例にとって説明する。 A description will be given below by taking thermal transfer recording as an example.

感熱転写記録は、基材シートの片面に顔料を含むワック
スを塗布した転写フィルムを他面から感熱記録ヘッドで
加熱し、顔料を含むワックスを溶融して記録紙に転写す
るものである。感熱記録ヘッドは、転写フィルムとの接
触面に微小発熱抵抗体が配列され、各微小発熱抵抗体は
記録すべき画像情報に従って通電制御でれる。このよう
な感熱転写記録は、ワイヤドツト記録に比較して動作音
が少ない、記録紙に市販の普通紙を使用できるなどの特
徴を有している。しかし、従来の感熱記録ヘッドは熱効
率(ワックスを溶融する熱量/発熱量)が悪い、あるい
は熱効率を良くすると記録画質が低下するという欠点を
もっている。
In thermal transfer recording, a transfer film coated with wax containing a pigment on one side of a base sheet is heated from the other side by a thermal recording head to melt the wax containing the pigment and transfer it to recording paper. In the thermal recording head, minute heating resistors are arranged on the contact surface with the transfer film, and each minute heating resistor is energized and controlled according to the image information to be recorded. Such thermal transfer recording has features such as less operating noise than wire dot recording and the ability to use commercially available plain paper as the recording paper. However, conventional thermal recording heads have the disadvantage that thermal efficiency (amount of heat for melting wax/amount of heat generated) is poor, or that improving thermal efficiency results in a decrease in recorded image quality.

第1図シよび第2図は従来の感熱記録ヘッドの要部を示
したもので、第1図は表面の保護層を一部除去した状態
での平面図、第2図は第1図の■−■断面図である。基
板1上には断熱層となるガラスグレーズ層2が形成され
、その上に間隔をもって配列さfl複数の薄膜微小発熱
抵抗体32よびこの薄膜微小発熱抵抗体3の配列方向側
@lに接続さ−nたリード電極6a、6bがある。保護
層4は耐摩耗性に優れた材料で形成され、薄膜機/JS
発熱抵抗1体3およびリード電極6a、6b:AE摩耗
1六は断線しないようにこれらの外表面を被っている。
Figures 1 and 2 show the main parts of a conventional thermal recording head. Figure 1 is a plan view with the protective layer on the surface partially removed, and Figure 2 is the same as in Figure 1. ■-■ It is a sectional view. A glass glaze layer 2 serving as a heat insulating layer is formed on the substrate 1, and a plurality of thin film micro heating resistors 32 are arranged on the glass glaze layer 2 at intervals and connected to the side in the arrangement direction of the thin film micro heating resistors 3. -n lead electrodes 6a, 6b are provided. The protective layer 4 is made of a material with excellent wear resistance, and is made using a thin film machine/JS
Heat generating resistor 3 and lead electrodes 6a, 6b: AE wear 16 covers the outer surfaces of these to prevent disconnection.

従来の保護層4の材料としては、五酸化タンタル、窒化
シリコン、二酸化シリコンがどのように層形成が容易で
且つ十分な硬度をもつものが使用さハている。しかしこ
れらの材料は、断熱層としてのガラスグレーズ層2に比
して熱伝導率が10倍にも満たず、従って、薄膜微小発
熱抵抗体3で発生した熱を有効に転写シートに伝達する
こと力;できない。因みに、このような従来の感熱記録
ヘッドの熱効率は30チ程度である。一方、熱効率を高
めるために、前記保護層4の材料として熱伝導率のよい
ものを使用する提案がなさnている。前記材料に比して
10〜100倍の熱伝導率をもつアルミナ(A1203
)や炭化珪素(S i C)を使用すると熱効率は向上
するが、この保護層4は熱を周囲に拡散して転写記録面
積を拡大し自記録画質’e(ff下させる欠点があった
Conventional materials used for the protective layer 4 include tantalum pentoxide, silicon nitride, and silicon dioxide, which are easy to form and have sufficient hardness. However, these materials have a thermal conductivity less than 10 times that of the glass glaze layer 2 as a heat insulating layer, and therefore cannot effectively transfer the heat generated by the thin film micro-heating resistor 3 to the transfer sheet. Power: cannot. Incidentally, the thermal efficiency of such a conventional thermal recording head is about 30 inches. On the other hand, in order to increase thermal efficiency, there have been proposals to use a material with good thermal conductivity as the material for the protective layer 4. Alumina (A1203) has a thermal conductivity 10 to 100 times higher than that of the above materials.
) or silicon carbide (S i C) improves thermal efficiency, but this protective layer 4 has the disadvantage of diffusing heat to the surroundings, expanding the transfer recording area, and lowering the self-recorded image quality 'e(ff).

〔発明の目的〕[Purpose of the invention]

従って、本発明の目的は、熱効率がよく、しかも記録画
質を低下させない感熱記録ヘッドを提供することにある
Therefore, an object of the present invention is to provide a thermal recording head that has good thermal efficiency and does not deteriorate the quality of recorded images.

〔発明の概要〕[Summary of the invention]

この目的を達成するため、本発明は、基板上に形成され
た断熱層と、この断熱層上に間隔をもって配列さ711
複数の微小発熱抵抗体およびこの微小発熱抵抗体の配列
方向両側に導出されたリード電極と、これらの外表面を
被う保護層とを備えた感熱記録−ラドに2いて、尚記各
微小発熱抵抗体の間の前記保護層を他の部分よシ薄肉に
し、この薄肉部による熱抵抗で熱拡散を防止するように
したことを特徴とする。
To achieve this objective, the present invention includes a heat insulating layer formed on a substrate and a heat insulating layer 711 arranged at intervals on the heat insulating layer.
A heat-sensitive recording device comprising a plurality of micro-heating resistors, lead electrodes led out on both sides in the arrangement direction of the micro-heating resistors, and a protective layer covering the outer surface of these resistors. It is characterized in that the protective layer between the resistors is made thinner than other parts, and the thermal resistance of this thin part prevents heat diffusion.

な幹本発明でいう「薄肉にする」、「薄肉部」とは、そ
の極限状態では「保護層をなくてる」、「保護層がない
部分」を意味している。
In the present invention, "making the wall thinner" and "thin wall portion" mean, in its extreme state, "elimination of the protective layer" and "portion without the protective layer."

〔発明の実施例〕[Embodiments of the invention]

以下本発明の実施例と第3図〜第7図を参照して説明す
る。第3図と第4図は感熱記録ヘッドの要部を示したも
ので、第3図は表面の保護層を一部除去した状態での平
面図、第4図は第3図の■−■断面図である。
Embodiments of the present invention will be described below with reference to embodiments and FIGS. 3 to 7. Figures 3 and 4 show the main parts of the thermal recording head. Figure 3 is a plan view with the protective layer on the surface partially removed, and Figure 4 is the part shown in Figure 3. FIG.

基板11上には断熱層となるガラスグレーズ層12が形
成さn、その上に間隔をもって配列さiた複数の薄膜微
小発熱抵抗体13およびこの薄膜微小発熱抵抗体13の
配列方向両側に導出されたリード電極16a、16bが
あシ、更にその上にこれらを被うように保護層14が形
成されている。
A glass glaze layer 12 serving as a heat insulating layer is formed on the substrate 11, and a plurality of thin film heat generating resistors 13 are arranged at intervals on the glass glaze layer 12, and a plurality of thin film heat generating resistors 13 are led out on both sides in the arrangement direction of the thin film heat generating resistors 13. A protective layer 14 is formed on the lead electrodes 16a and 16b to cover them.

薄膜微小発熱抵抗体13の厚さは1000人、保護層1
4は6μmの肉厚のアルミナ層で各薄膜微小発熱抵抗体
13間にはエツチングによって除去さnた溝15が形成
さnている。
The thickness of the thin film micro-heating resistor 13 is 1000, and the protective layer 1
Reference numeral 4 denotes an alumina layer having a thickness of 6 μm, and grooves 15 are formed between each of the thin-film minute heating resistors 13 by etching.

このような感熱記録ヘッドによれば、薄膜微小発熱抵抗
体13に通電して発熱させると、その熱は高熱伝導率の
保護層14を伝って速や751に表面に達する。同時に
この保護層14を伝って周囲に拡散しようとするが、隣
接する薄膜微小発熱抵抗体13との間で溝15によって
遮断されるのでこの拡散が抑制される。従って、転写記
録面積を拡大して画質全低下させることがなく、発熱し
た薄膜微小発熱抵抗体13上の保護層14の表面を有効
に昇温できる0 上記感熱記録ヘッドによれば、従来の感熱記録ヘッドの
熱効率の1.2倍以上の38チの熱効率を得ることがで
きた。このため1つの薄膜微小発熱抵抗体13の発熱量
を従来の約75%にまで減少させても十分な転写記録を
行なうことができ、従来の入力電力が0.7Wであった
の’に0.53Wまで減少できた。このように入力電力
が減少1−ることによシ、電源装置の小杉化、薄膜微小
発熱抵抗体13への通電を制御するスイッチング回路の
小ル化、ifc同一人力電力とすハばより高速な転写記
録が可能となる。また薄膜微小発熱抵抗体13の発熱量
が減少すれば、発熱抵抗体自身の温度上昇も低下し、発
熱に伴う熱応力や高温酸化反応を抑制できるので、薄膜
微小発熱抵抗体13の寿命が伸びる。従来の感熱記録ヘ
ッドでは薄膜微小発熱抵抗体が寿命(抵抗値が初期値の
90%〜110%の範囲外になる)に至るまでの発熱回
数が約5千万回であったが、上記感熱記録ヘッドでは1
億回の発熱回数でも寿命に達せず、2倍以上の寿命が得
らむると予想される。
According to such a thermal recording head, when the thin film minute heating resistor 13 is energized to generate heat, the heat is transmitted through the high thermal conductivity protective layer 14 and quickly reaches the surface 751. At the same time, it tries to diffuse to the surrounding area through this protective layer 14, but this diffusion is suppressed because it is blocked by the groove 15 between the adjacent thin film microheating resistor 13. Therefore, the temperature of the surface of the protective layer 14 on the thin-film minute heating resistor 13 that generates heat can be effectively raised without enlarging the transfer recording area and reducing the overall image quality. It was possible to obtain a thermal efficiency of 38 inches, which is 1.2 times or more the thermal efficiency of the recording head. Therefore, sufficient transfer recording can be performed even if the heat generation amount of one thin film microheating resistor 13 is reduced to about 75% of the conventional one, and the conventional input power is 0.7W. I was able to reduce it to .53W. As a result of this reduction in input power, the power supply device is made smaller, the switching circuit that controls the energization to the thin film minute heat generating resistor 13 is made smaller, and the IFC becomes faster with the same human power. This enables accurate transcription recording. Furthermore, if the amount of heat generated by the thin-film micro-heating resistor 13 is reduced, the temperature rise of the heat-generating resistor itself is also reduced, and thermal stress and high-temperature oxidation reactions accompanying heat generation can be suppressed, so the life of the thin-film micro-heating resistor 13 is extended. . In conventional thermal recording heads, the thin film micro-heating resistor generates heat approximately 50 million times before reaching the end of its life (the resistance value falls outside the range of 90% to 110% of the initial value). 1 in the recording head
It is expected that the lifespan will not be reached even after 100 million heat generation cycles, and that the lifespan will be more than twice as long.

前記の実施例と同様な構造の感熱記録ヘッドのし、発熱
量を約63%、入力電力を0.44 Wまで減少で@た
。寿命は前記実施例と同様である。
Using a thermosensitive recording head having a structure similar to that of the above embodiment, the heat generation amount was reduced by about 63% and the input power was reduced to 0.44 W. The lifespan is the same as in the previous example.

第5図は、1mm当り8ドツトを転写記録できるように
構成し大従来の感熱記録ヘッドと本発明になる感熱記録
ヘッドの特性図で、記録ドツト幅は125μm付近で安
定していることが望塘しい。従来の感熱記録ヘッドの特
性は曲線■に示すように、入力電力の増加に伴って記録
ドツト幅も変化してしまうが、本発明になる感熱記録ヘ
ッドによむばる。曲線■は保護層14にアルミナを用い
た場合、曲線■は炭化珪素を用いた場合である。この安
定領域は薄膜微小発熱抵抗体13の間の保護層14に溝
15を形成し、熱拡散全防止したことにより得られる。
FIG. 5 is a characteristic diagram of a conventional thermal recording head configured to transfer and record 8 dots per 1 mm and a thermal recording head of the present invention, in which the recording dot width is preferably stable around 125 μm. It's good. The characteristic of the conventional thermal recording head is that the recording dot width also changes as the input power increases, as shown by curve (2), but this is the case with the thermal recording head of the present invention. Curve (2) is the case where alumina is used for the protective layer 14, and curve (2) is the case where silicon carbide is used. This stable region is obtained by forming grooves 15 in the protective layer 14 between the thin film minute heating resistors 13 to completely prevent heat diffusion.

ところでこのような溝15は、保護層14を一様に形成
した後にホトエツチングで除去して71?成する。以下
に、溝15の寸法寂よび溝15の底部に残留する保護層
14の肉厚と、その影響について説明する。
By the way, such grooves 15 are removed by photo-etching after uniformly forming the protective layer 14 (71). to be accomplished. Below, the dimensions of the groove 15, the thickness of the protective layer 14 remaining at the bottom of the groove 15, and their effects will be explained.

第6図は溝15の底部に保護層14を残留させない場合
の、溝幅l(第4図)の寸法と隣接1−る薄膜微小発熱
抵抗体13上の保護層の表面温度との関係を示す。一般
に、転写フィルムのワックスの溶融温度は65°C〜7
0°Cであシ、この温度を転写限界温度TLとして示す
。保護層14が6μm  ゛の肉厚の炭化珪素層である
場合、溝幅lが1μm以上であれば隣接する抵抗体領域
の保護層140表面温度が転写限界温度を超えることは
ない。アルミナで形成した保護層14の場合には、炭化
珪素の場合より熱伝導率が小ざいので隣接する抵抗体領
域への影響はよシ少なくなる。
FIG. 6 shows the relationship between the groove width l (FIG. 4) and the surface temperature of the protective layer on the adjacent thin film microheating resistor 13 when the protective layer 14 is not left at the bottom of the groove 15. show. Generally, the melting temperature of wax for transfer film is 65°C to 7.
The temperature is 0° C., and this temperature is indicated as the transfer limit temperature TL. When the protective layer 14 is a silicon carbide layer with a thickness of 6 μm, the surface temperature of the protective layer 140 in the adjacent resistor region will not exceed the transfer limit temperature if the groove width l is 1 μm or more. In the case of the protective layer 14 formed of alumina, the thermal conductivity is lower than that of silicon carbide, so that the influence on the adjacent resistor region is much less.

このことから溝幅を1μm とした場合に、保護層14
の肉厚比(溝15の底部に残留する保護層の厚さ/溝1
5の領域以外の保護層の厚さ)を変えることに・よって
、隣接する薄膜微小発熱抵抗体上の保護層表面温度がど
のように変化するかを実験した結果を第7図に示す。保
護層14にアルミナを用いた場合の特性が曲線■、炭化
珪素を用いた場合の特性が曲線■である。この結果から
明らかなように、何乙の場合であっても肉厚比が0.4
以下であれば、隣接する抵抗体領域の保護層14の表面
温度が転写限界温度を超えることがない。
From this, when the groove width is 1 μm, the protective layer 14
Thickness ratio (thickness of protective layer remaining at the bottom of groove 15/groove 1)
FIG. 7 shows the results of an experiment to see how the surface temperature of the protective layer on the adjacent thin-film micro-heating resistor changes by changing the thickness of the protective layer in areas other than the area 5. Curve (2) shows the characteristics when alumina is used for the protective layer 14, and curve (2) shows the characteristics when silicon carbide is used. As is clear from this result, the wall thickness ratio is 0.4 in any case.
If it is below, the surface temperature of the protective layer 14 in the adjacent resistor region will not exceed the transfer limit temperature.

従ってホトエツチングによって除去する保護層14の厚
さは全体の3,15以上であハばよぐ、保護層14を6
μmの肉厚に形成し穴場合は溝15の底部に2.4μm
の肉厚寸で残留することが許される。
Therefore, the total thickness of the protective layer 14 to be removed by photoetching may vary by 3.15 mm or more;
If the hole is formed with a thickness of 2.4 μm at the bottom of the groove 15.
It is allowed to remain at the wall thickness of .

′−また、この溝15は薄膜微小発熱抵抗体14を露出
させないように形成した方がよい。
'-Also, it is better to form this groove 15 so as not to expose the thin film minute heating resistor 14.

更にまた、保護層14は前記実施例で用いた材料に限定
されることなく、同様な性質をもつ他の材料全使用して
も同様力効果が得られ、また微小発熱抵抗体を厚膜で形
成した場合にも同様のことがいえる。
Furthermore, the protective layer 14 is not limited to the material used in the above embodiment, and the same force effect can be obtained by using any other material with similar properties, and the minute heating resistor can be made of a thick film. The same thing can be said when it is formed.

〔発明の効果〕〔Effect of the invention〕

以上のように本発明によむば、複数個配列された微小発
熱抵抗体の外表面を被った保護層を、微小発熱抵抗体の
間で薄肉とし、この薄肉部によって熱拡散を抑制し六の
で、熱効率がよく、しかも記録画質を低下させない感熱
記録ヘッドを得ることができる。
As described above, according to the present invention, the protective layer covering the outer surface of a plurality of arranged micro-heating resistors is made thin between the micro-heating resistors, and this thin part suppresses heat diffusion. Therefore, it is possible to obtain a thermal recording head that has good thermal efficiency and does not deteriorate the recorded image quality.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図および第2図は従来の感熱記録ヘッドの要部を示
したもので、第1図は表面の保護層を一部除去した状態
での平面図、第2図は第1図の■−■断面図、第3図お
よび第4図は本発明になる感熱記録ヘッドの要部を示し
たもので、第3図は表面の保護層を一部除去した状態で
の平面図、第4図は第3図のIV−ff断面図、第5図
〜第7図は特性図である。 11・・・・・・基板、12・・・・・・ガラスグレー
ズ層、13・・・・・・薄膜微小発熱抵抗体、14・・
・・・・保護層、15・・・・・・溝、16a、16b
・・・・・・リード電極。 $ 1 口 b 第Z 固 茅3 図 /61゜ v 4 固 2θθ1 入力電力 <W) 第 6 固 護″“L 層 寥 −1 溝幅 (hす
Figures 1 and 2 show the main parts of a conventional thermal recording head. Figure 1 is a plan view with the protective layer on the surface partially removed, and Figure 2 is the same as in Figure 1. -■ Cross-sectional view, FIGS. 3 and 4 show the main parts of the thermal recording head according to the present invention, FIG. 3 is a plan view with the protective layer on the surface partially removed, and FIG. The figure is a sectional view taken along the line IV-ff in FIG. 3, and FIGS. 5 to 7 are characteristic diagrams. 11...Substrate, 12...Glass glaze layer, 13...Thin film micro heating resistor, 14...
...Protective layer, 15...Groove, 16a, 16b
...Lead electrode. $ 1 Mouth b No. Z Hard 3 Fig./61゜v 4 Hard 2θθ1 Input power <W) 6th Hard” “L Layer thickness -1 Groove width (h

Claims (1)

【特許請求の範囲】 1、基板上に形成ざわた断熱層と、この断熱層上に間隔
をもって配列はれた複数の微小発熱抵抗体およびこの微
小発熱抵抗体の配列方向両側に導出さ′t1.穴リード
電極と、これらの外表面を被う保護層と全備えた感熱記
録ヘッドにおいて、前記各微小発熱抵抗体の間の前記保
護層を他の部分よル薄肉にしたこと全特徴とする感熱記
録ヘッド。 2、特許請求の範囲第1項において、前記保護層の薄肉
部の肉厚は、他の部分の肉厚の0.4以下であることを
特徴とする感熱記録ヘッド。 3、特許請求の範囲第1項または第2項において、前記
保護層の薄肉部は、前記微小発熱抵抗体の配列方向に1
μm以上の幅をもっていることを特徴とする感熱記録ヘ
ッド。
[Scope of Claims] 1. A rough heat insulating layer formed on a substrate, a plurality of minute heat generating resistors arranged at intervals on the heat insulating layer, and leads out on both sides in the arrangement direction of the minute heat generating resistors. .. A thermal recording head that is completely equipped with a hole lead electrode and a protective layer covering the outer surface thereof, wherein the protective layer between each of the minute heating resistors is made thinner than other parts. recording head. 2. The thermal recording head according to claim 1, wherein the thickness of the thin portion of the protective layer is 0.4 or less of the thickness of the other portion. 3. In claim 1 or 2, the thin portion of the protective layer has a thickness of 1.5 mm in the direction in which the micro heating resistors are arranged.
A thermal recording head characterized by having a width of μm or more.
JP58084169A 1983-05-16 1983-05-16 Thermal recording head Pending JPS59209892A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58084169A JPS59209892A (en) 1983-05-16 1983-05-16 Thermal recording head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58084169A JPS59209892A (en) 1983-05-16 1983-05-16 Thermal recording head

Publications (1)

Publication Number Publication Date
JPS59209892A true JPS59209892A (en) 1984-11-28

Family

ID=13822991

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58084169A Pending JPS59209892A (en) 1983-05-16 1983-05-16 Thermal recording head

Country Status (1)

Country Link
JP (1) JPS59209892A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62282949A (en) * 1986-05-31 1987-12-08 Toshiba Corp Preparation of thermal head
JP2012247108A (en) * 2011-05-26 2012-12-13 Japan Ultra-High Temperature Materials Research Center Thermal efficiency improvement method of heat treatment furnace, and heat treatment furnace

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62282949A (en) * 1986-05-31 1987-12-08 Toshiba Corp Preparation of thermal head
JP2012247108A (en) * 2011-05-26 2012-12-13 Japan Ultra-High Temperature Materials Research Center Thermal efficiency improvement method of heat treatment furnace, and heat treatment furnace

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