JPS59208553A - Exposure for photomechanical process - Google Patents

Exposure for photomechanical process

Info

Publication number
JPS59208553A
JPS59208553A JP58081725A JP8172583A JPS59208553A JP S59208553 A JPS59208553 A JP S59208553A JP 58081725 A JP58081725 A JP 58081725A JP 8172583 A JP8172583 A JP 8172583A JP S59208553 A JPS59208553 A JP S59208553A
Authority
JP
Japan
Prior art keywords
plate
light
printing
light source
synthetic resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58081725A
Other languages
Japanese (ja)
Inventor
Manabu Fukuda
学 福田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP58081725A priority Critical patent/JPS59208553A/en
Publication of JPS59208553A publication Critical patent/JPS59208553A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To prevent the bending and breaking of the projections of a relief due to printing pressure and to enable clear printing by superposing a negative film having an image of letters or a figure on the surface of a synthetic resin plate for forming a relief, placing the resin plate opposite to a light source, and placing a light reflecting plate behind the resin plate. CONSTITUTION:A negative film 5 having an image of letters or a figure is superposed on the surface of a synthetic resin plate 4 for forming a relief, the plate 4 is placed opposite to a light source, and a light reflecting plate 6 is placed behind the plate 4. An ultraviolet light source 1 is used as the light source, a screen having many slits 2 for giving parallel rays of light is placed in front of the film 5, and a reflecting plate 3 is placed behind the source 1. Nearly parallel rays of light (t) are irradiated on the plate 4 through the slits 2 to form a photosensitive layer insoluble in water or alcohol on the support 7 of polyester or the like. The rays of light (t) enter the plate 4 at a small angle alpha of diffusion, and they are reflected by the plate 6. The resulting scattered rays of light (u) produce an insoluble part corresponding to the dotted part, and a curve (r) whose bottom has a circular cross-section is formed. The projections of the photosensitive layer are not easily bent or broken, and satisfactory halftone printing can be carried out.

Description

【発明の詳細な説明】 合成回脂板をtljいて輪転[4月:1iIj柚等の凸
版を装作する場合は、その合成樹脂板に所望の文字また
は図形のネガフィルムを重合して紫外線等の光線を1i
l剤することにより焼付を行い・その樹脂板を水または
アルコールで洗ざ1トシて、光線の照射を受けない部分
を溶解除去する。このようにして作られた合成樹脂の凸
版で例えば第1図に示したような網点の印刷を行うもの
とすると、そのA−A部分(二相当する版の断面は第2
図のような形状(二なる。
[Detailed Description of the Invention] A synthetic resin board is rotated by rotary printing [April: 1iIj When mounting a letterpress such as Yuzu, a negative film of desired characters or figures is polymerized on the synthetic resin board and exposed to ultraviolet rays, etc. The ray of light is 1i
Baking is performed by applying a lubricant, and the resin plate is washed with water or alcohol to dissolve and remove the portions that are not irradiated with light. If the synthetic resin letterpress plate made in this way is used to print halftone dots as shown in Figure 1, the cross section of the plate corresponding to the A-A section (2) is
Shape as shown in the figure (two.

すなわち網点の間@扉は例えば0.1mm程度である 
1− が、このような合成樹脂の版を用いて印刷を行うと、そ
の印刷圧で凸部が鎖線pで示したように屈曲して、紙面
を汚損しf!#、Rな網点の印刷を行い得ない。かつ屈
曲の繰返しによって凸部が折損するから版のが命も短い
欠点がある。また@2図に鎖綴qで示したように谷部を
7字形にするとN印刷インキによる目詰を生じて印刷面
が汚損し、連続印刷の可能な枚数が著しく減少する。更
に鎖01rのように谷部の深さを浅くすると、版を自由
に屈曲し得ないようになるため、これを輪転印刷機の版
胴に貼着して印刷を行う場合の支障どなる。従って本発
明はこのような欠点のない版を得ることのできる焼付装
置を提供するものである。
In other words, the distance between the halftone dots @ the door is, for example, about 0.1 mm.
1-, when printing is performed using such a synthetic resin plate, the printing pressure causes the convex portion to bend as shown by the chain line p, staining the paper surface and f! #, R halftone dots cannot be printed. Another disadvantage is that the life of the plate is short because the protrusions break due to repeated bending. Furthermore, if the valley portions are made into a 7-shape as shown by the chain stitch q in Figure @2, clogging occurs due to N printing ink, the printing surface becomes stained, and the number of sheets that can be continuously printed is significantly reduced. Furthermore, if the depth of the troughs is made shallow as in chain 01r, the plate cannot be bent freely, which poses a problem when printing is carried out by attaching this to the plate cylinder of a rotary printing press. Accordingly, the present invention provides a printing apparatus capable of producing plates free of such defects.

第3図は本発明実施例の構成を示した図で、水銀灯のよ
うな紫外線光源1の前面に多数の筒状細隙よりなる平行
光腺形成用のスリット2を配置L1必要に応じてこのス
リット鵞を矢印Sのように揺動させると共に光源lの背
後に反射笠3を配置しである。従って点線の矢印tで示
したように、はぼ平行な光線が上記スリット8を通過す
る。このスリット2に版を形成しようとする合成樹脂板
4を対設して、上記平行光線を入射させると共にその合
成樹脂板4の前面に所望の文字あるいは図形等のネガフ
ィルムjを密着させ、かつ背面に光線反射板6を配置し
たものである。なお合成樹脂板4は’/is 4図に一
部の拡大図を示したように、ポリエステル等の支持基板
ワの上に紫外線照射によって水またはアルコールに対し
不溶性となるナイロン等の感光層8を設けた構造である
。また上記反射板6は確のような全反射板あるいけ白色
の光線散乱板であって合成樹脂散4の裏面に密着させる
か、ある−は多少の距離全弁して配置されている。
FIG. 3 is a diagram showing the configuration of an embodiment of the present invention, in which a slit 2 for forming a parallel light gland consisting of a large number of cylindrical slits is arranged in front of an ultraviolet light source 1 such as a mercury lamp. The slit cage is swung in the direction of arrow S, and a reflective shade 3 is placed behind the light source 1. Therefore, as shown by the dotted arrow t, substantially parallel light rays pass through the slit 8. A synthetic resin plate 4 on which a plate is to be formed is placed opposite to this slit 2, and the above-mentioned parallel light beams are made incident thereon, and a negative film j of desired characters or figures is closely attached to the front surface of the synthetic resin plate 4, and A light reflecting plate 6 is arranged on the back surface. As shown in a partially enlarged view in Figure 4, the synthetic resin plate 4 has a photosensitive layer 8 made of nylon or the like that becomes insoluble in water or alcohol when irradiated with ultraviolet rays on a support substrate made of polyester or the like. This is a built-in structure. The reflecting plate 6 is a total reflecting plate or a white light scattering plate, and is placed either in close contact with the back surface of the synthetic resin powder 4 or at a distance of some distance.

上述の装置において、スリ7)2を通った光線114図
に点線の矢印で示したようにP+ぼ平行な光線を形成し
ているが、多少の拡散角αを有する。従ってネガフィル
ム5における例えばF1形の微小な透明部Iを通った光
線は、その断面が次第に拡大して基板りに入射する。こ
の基板7は通常半透明体であるから入射光線の一部はI
11!乱するが、大部分は週過して光線反射板6に入射
する。反射板6Fi鏡面または散乱面であるが何れにし
ても高1反射率を有するから、基板ワで散乱して更に反
射板6で反射した光線あるいは反射板6で散乱した光線
等Uが基板7に近い部分における感光層8の広い範囲(
二人射する。すなわちこの反射光綴りはフィルムの透明
部1を通って直進した光線lの周辺にまで拡散する−1
ら、感光層8(二は第4図に打点部分で示したような範
凹に光線が入射して、その入射部分が不溶性に変化する
。従ってこのようにして焼付を行った合成樹脂板4を水
またはアルコールで洗滌すると、光線の入射しない部分
が溶解して除失さn、上述の打点部分が基板7と共に残
留する。
In the above-mentioned apparatus, the light ray passing through the pickpocket 7) 2 forms a P+ substantially parallel light ray as shown by the dotted arrow in the diagram, but it has a certain degree of diffusion angle α. Therefore, a light beam passing through a small transparent part I of, for example, F1 shape in the negative film 5 gradually enlarges its cross section and enters the substrate. Since this substrate 7 is usually semi-transparent, part of the incident light is I
11! However, most of the light is incident on the light reflecting plate 6 after a few weeks. The reflector 6Fi is a mirror surface or a scattering surface, but in any case, it has a high reflectance of 1, so that the light rays scattered by the substrate W and further reflected by the reflector 6 or the rays U scattered by the reflector 6 reach the substrate 7. A wide range of the photosensitive layer 8 in the near part (
Two people shoot. In other words, this reflected light beam is diffused to the periphery of the ray l that has passed through the transparent part 1 of the film -1
The light rays enter the photosensitive layer 8 (2) into the recesses shown by the dotted areas in FIG. When the substrate 7 is washed with water or alcohol, the portion where the light beam does not enter is dissolved and removed, and the above-mentioned dot portion remains together with the substrate 7.

第5図は上述の焼付装置を用いて、第1図のような網点
の版を製作した場合における第2図と同一部分の断面図
である。すなわち合成樹脂板番の背面に配置した光線反
射板6で散乱した光わが基板ツに近い部分における感光
層8に多量に入射して、その入射部分が不溶性となるた
めに、網点を印刷する突起の基部が拡大して、谷部の断
面は円弧状の曲線rを形成する。従って突起の頂部υに
大きな印刷圧が加わった場合でも、その突起が容易に屈
曲して印刷された網点の周辺が汚損するような欠点がな
く、極めて鮮明で良好な網点その他の印刷を行うことが
できる。かつ版の凸部が上述のようC:印刷圧で屈曲し
なりから、上記網点のような細い凸部が屈曲の経返しで
短期【1■ζ二折損して版の0命が短縮するような欠点
も除かれる。更に谷の底部が前述のように円弧状の曲線
rを形成9るから、従来の版のよう(二梢点部分等の谷
底が狭隘になり、そのK15分(−印刷インクが捕捉さ
れて目詰を生じ、連続して印刷し得る枚数が制限される
ような欠点も除かnる。しかも谷の深さは、これを充分
深くして、その最深部でI11@5図のように感光Ha
を完全に溶解除去する仁とができるから、版の屈曲性が
阻害されるような欠点も除かれる。
FIG. 5 is a cross-sectional view of the same portion as FIG. 2 in the case where a halftone dot plate as shown in FIG. 1 is manufactured using the above-described printing apparatus. In other words, a large amount of light scattered by the light reflecting plate 6 placed on the back side of the synthetic resin board enters the photosensitive layer 8 in the area close to the substrate, and the incident area becomes insoluble, thereby printing halftone dots. The base of the protrusion expands, and the cross section of the valley forms an arcuate curve r. Therefore, even if a large printing pressure is applied to the top υ of the protrusion, the protrusion will not easily bend and the area around the printed halftone dots will be smeared, resulting in extremely clear and good halftone dots and other printing. It can be carried out. And the convex part of the plate is as mentioned above.C: As the printing pressure bends and bends, the fine convex part like the halftone dots mentioned above will break in a short period of time [1■ζ2] and the life of the plate will be shortened. Such shortcomings are also removed. Furthermore, since the bottom of the valley forms an arc-shaped curve 9 as described above, the bottom of the valley (at the two-point point, etc.) becomes narrow, and the printing ink is captured and the This also excludes defects such as clogging and limiting the number of sheets that can be printed continuously.Moreover, the depth of the valley should be made deep enough so that the deepest part is exposed to light as shown in Figure I11@5. Ha
Since it is possible to completely dissolve and remove the particles, defects such as inhibiting the flexibility of the plate are also eliminated.

なお反射板と版材の合成樹脂板との闇の距Mおよび反射
率によって第5図C二おける曲線rの形状を適当に調整
することができる◎
Note that the shape of the curve r in Figure 5 C2 can be adjusted appropriately depending on the distance M between the reflector and the synthetic resin plate of the printing plate and the reflectance.

【図面の簡単な説明】[Brief explanation of the drawing]

9A1図は印刷された網点の拡大図%第2図は第1図C
二おけろA−A部分の印刷を行うための往来の凸版の断
面図、第3図は本発明実施例の初成を示した図、M4図
は本発明の詳細な説明するための第3図の一部を拡大し
た図、第5図は本発明の焼付装置を用いて鎧作された凸
版の一部の断面図である口なお図にむいて、1け光源、
2は平行光線形成用のスリット、3は反射笠、4け合成
樹脂板S 5はネガフィルム、6J’を反射板、フは合
成樹脂藪4における支持基板、8は同じく感光〃jであ
る。 特許出願人 福1)学 ○  ○  O ○  0 0 ジt ta し 材Z砧 仲3 td
Figure 9A1 is an enlarged view of the printed halftone dots Figure 2 is Figure 1C
A sectional view of a conventional letterpress plate for printing the A-A section of the second station, FIG. 3 is a diagram showing the initial production of an embodiment of the present invention, and FIG. FIG. 5 is a cross-sectional view of a part of a relief plate made using the printing apparatus of the present invention.
2 is a slit for forming parallel light beams, 3 is a reflecting shade, 4 synthetic resin plates S5 is a negative film, 6J' is a reflecting plate, F is a support substrate for the synthetic resin thicket 4, and 8 is also a photosensitive material. Patent applicant Fuku 1) Gaku○ ○ O ○ 0 0 Jit ta Shizai Z Kinunaka 3 td

Claims (1)

【特許請求の範囲】[Claims] 凸版を形成しようとする合成胎脂板の表面に所望の文字
または図形のネガフィルムを重合して光沢((二対設す
ると共に上記合成樹脂板の裏面(二光線反射板を配置し
たことを特徴とするb服用焼付装置
A negative film of desired characters or figures is polymerized on the surface of the synthetic vernix plate on which the letterpress is to be formed to give it a glossy appearance ((two light reflecting plates are placed on the back side of the synthetic resin plate). Printing device for clothing
JP58081725A 1983-05-12 1983-05-12 Exposure for photomechanical process Pending JPS59208553A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58081725A JPS59208553A (en) 1983-05-12 1983-05-12 Exposure for photomechanical process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58081725A JPS59208553A (en) 1983-05-12 1983-05-12 Exposure for photomechanical process

Publications (1)

Publication Number Publication Date
JPS59208553A true JPS59208553A (en) 1984-11-26

Family

ID=13754384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58081725A Pending JPS59208553A (en) 1983-05-12 1983-05-12 Exposure for photomechanical process

Country Status (1)

Country Link
JP (1) JPS59208553A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6329132U (en) * 1986-08-08 1988-02-25

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5077101A (en) * 1973-11-09 1975-06-24

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5077101A (en) * 1973-11-09 1975-06-24

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6329132U (en) * 1986-08-08 1988-02-25

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