JPS59207853A - Glass composition - Google Patents

Glass composition

Info

Publication number
JPS59207853A
JPS59207853A JP8169983A JP8169983A JPS59207853A JP S59207853 A JPS59207853 A JP S59207853A JP 8169983 A JP8169983 A JP 8169983A JP 8169983 A JP8169983 A JP 8169983A JP S59207853 A JPS59207853 A JP S59207853A
Authority
JP
Japan
Prior art keywords
glass
filler
glass powder
composition
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8169983A
Other languages
Japanese (ja)
Other versions
JPS6221739B2 (en
Inventor
Yoshinori Kokubu
国分 可紀
Jiro Chiba
次郎 千葉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP8169983A priority Critical patent/JPS59207853A/en
Publication of JPS59207853A publication Critical patent/JPS59207853A/en
Publication of JPS6221739B2 publication Critical patent/JPS6221739B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/04Frit compositions, i.e. in a powdered or comminuted form containing zinc
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Glass Compositions (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Inorganic Insulating Materials (AREA)

Abstract

PURPOSE:To prepare electrically insulating glass of circuit of thick film, by providing a glass composition consisting of glass powder having a specific composition and a filler, specifying the glass powder and the filler. CONSTITUTION:A glass composition consisting of 70-99wt% glass powder, and 1-30wt% filler. The glass powder consists of 41-50wt% SiO2, 2-15wt% Al2O3, 30-45wt% BaO, 5-20wt% ZnO, 0.5-2wt% CaO+MgO, 0.5-4wt% ZrO2, 0.1-1.5wt% SnO2 and 0.05-1.5wt% K2O. The filler is shown by the formula ZrSiO4, 2MgO.SiO2, Al2O3. When an electrically insulating layer of circuit of thick film is made of this composition, PbO or B2O3 will not be diffused into a conductive material during the calcination process of the upper conductive material formed on it, so the conductive material has extremely high wetting properties to solder.

Description

【発明の詳細な説明】 本発明はガラス組成物に関する。[Detailed description of the invention] The present invention relates to glass compositions.

絶縁基板上に厚膜法により抵抗体、導体の回路、この回
路上に絶縁層、該絶縁層上に上部導体を形成した単層厚
膜回路部品、絶縁層を介して複数の回路を形成した多層
厚膜回路部品が電子部品として提案されている。かかる
部品の絶線層用ガラストしては、PbO−B2O3−6
i02系ガラスが知られている。
A single-layer thick film circuit component in which a resistor and a conductor circuit are formed on an insulating substrate by a thick film method, an insulating layer is formed on the circuit, and an upper conductor is formed on the insulating layer, and multiple circuits are formed through the insulating layer. Multilayer thick film circuit components have been proposed as electronic components. The glass for the disconnection layer of such parts is PbO-B2O3-6.
i02 series glass is known.

しかしながら、かかるガラスは上部導体の焼成過程にお
いて、PbO又はB2O3が導体に拡散し導体上にまで
浮き出る結果、上部導体に端子等を・・ンダ伺げする際
のハンダ濡れ性を著しく悪化させる難点があった。また
、焼成による抵抗体の抵抗値変化率及びバラツキが大き
く、目的とする抵抗値が得られ英(rいといつ英1[点
があった。
However, such glass has the disadvantage that during the firing process of the upper conductor, PbO or B2O3 diffuses into the conductor and floats onto the conductor, resulting in a significant deterioration of solder wettability when attaching terminals, etc. to the upper conductor. there were. In addition, the resistance change rate and variation of the resistor due to firing were large, and the target resistance value was obtained.

本発明は、かかるf、)+H点を解決した力1規なカラ
ス組成物の提供な目的とする。
It is an object of the present invention to provide a glass composition that solves the above f, ) + H points and has a uniform force.

即ち、本発明は、ガラス粉末70〜99重量係とフィラ
ー1〜30重量%とからなり、該ガラス粉末は重量表示
チで SiO24]  〜 50 A1203           2〜] 5BaO3
0〜 45 Zn0      .5−20 CaO+MgO0,5〜2 ZrO20,5〜 4 SnO20,1〜1.5 R200,05〜 15 (RはLi、 Na及び/又はKである)の範囲の組成
であり、該フィラーはZrSiO4゜2Mg0−8i0
2及び/又はAl2O3であるガラス組成物である。
That is, the present invention consists of a glass powder of 70 to 99% by weight and a filler of 1 to 30% by weight, and the glass powder has a weight ratio of SiO24] to 50 A12032 to]5BaO3.
0~45 Zn0. 5-20 CaO+MgO0.5~2 ZrO20.5~4 SnO20.1~1.5 R200.05~15 (R is Li, Na and/or K), and the filler is ZrSiO4° 2Mg0-8i0
2 and/or Al2O3.

本発明によれる組成物で厚膜回路の絶縁層を形成すると
、その上に形成される上部導体の焼成過程でP −o 
O又はB2O3が導体に拡散することがないので、該導
体とのハンダ濡れ性が極めてよい。また、該絶縁層は焼
成により回路中の抵抗体に影響を与えるととが極めて少
ないので抵抗体の抵抗値変化率及びバラツキが極めて少
ない。
When the insulating layer of a thick film circuit is formed using the composition according to the present invention, P-o
Since O or B2O3 does not diffuse into the conductor, the solder wettability with the conductor is extremely good. Furthermore, since the insulating layer has very little influence on the resistor in the circuit when fired, the rate of change and variation in the resistance value of the resistor is extremely small.

本発明による組成物は厚膜回路の絶縁層用ガラスとして
効適であるが、該組成物に導電粉末を添加して、導体又
は抵抗体を厚膜法によって形成するためのバインダーガ
ラスとしても使用できる。
The composition according to the present invention is effective as a glass for an insulating layer of a thick film circuit, but it can also be used as a binder glass for forming conductors or resistors by a thick film method by adding conductive powder to the composition. can.

本発明による組成物は、適当なビヒクルを混練してペー
スト化し、スクリーン印刷等によりづ布したのちす1:
成することによりガラス層を形成する。この焼成過程で
一部結晶化し、その結晶としては、主としてBaA12
Si○8であるが、3BaO−8iC1sも微量含まれ
る。
The composition according to the present invention is prepared by kneading a suitable vehicle to form a paste, and applying the paste by screen printing or the like.
A glass layer is formed by forming a glass layer. Part of the crystallization occurs during this firing process, and the crystals mainly consist of BaA12.
Although it is Si○8, a trace amount of 3BaO-8iC1s is also included.

本発明による組成物の限定理由は次の通りである。The reasons for limiting the composition according to the present invention are as follows.

組成物中のフィラーは、焼成過程におけるガラスと導体
又は抵抗体との反応を低減する目的で添加される。具体
的にはZrSiO4,ZrO2゜2Mg0・5iOz又
はAl2O3が、かかる目的が達成でき、かつ、比較的
入手し易いので望ましい。
The filler in the composition is added for the purpose of reducing the reaction between the glass and the conductor or resistor during the firing process. Specifically, ZrSiO4, ZrO2゜2Mg0.5iOz, or Al2O3 are desirable because they can achieve this purpose and are relatively easy to obtain.

本発明の組成物においては、ガラス粉末の残部としてフ
ィラーが1〜30重t%添加されるが、Jφより少ない
と上記目的が達成されず、30ヂより多いとガラス成分
が不足し緻密なガラス層が形成され難い。フィラーは上
記範囲中2〜25]i量係の範囲がより望ましい。
In the composition of the present invention, 1 to 30% by weight of filler is added as the balance of the glass powder, but if it is less than Jφ, the above purpose will not be achieved, and if it is more than 30J, the glass component will be insufficient and the dense glass will not be formed. A layer is difficult to form. The filler is preferably in the range of 2 to 25]i in the above range.

ガラス粉体の5102は、ガラスのネットワークフォー
マであり、一部焼成により析出する結晶の成分でもある
。S io 2<41重量裂では、軟化温度が低くなり
すぎ、焼成時に流動し過ぎる回路のパターンを変形させ
易く、また、導体、抵抗体との反応性が増加し、それら
の特性を損なう恐れかあるので好ましくない。一方、S
iO2>50’lj量予では、ガラス粉末を製造する際
の溶解性が低下するとともに、軟化温度が高くなり、焼
成温度が高くなり過ぎるので好ましくない。S〕02は
上記範囲中41〜48重量%の範囲がより望ましい。
The glass powder 5102 is a glass network former, and is also a component of crystals that partially precipitate during firing. If S io 2 < 41 weight crack, the softening temperature will be too low and the circuit pattern will be easily deformed due to excessive fluidity during firing, and the reactivity with conductors and resistors will increase and there is a risk of damaging their characteristics. I don't like it because it is. On the other hand, S
If iO2>50'lj, the solubility during production of glass powder decreases, the softening temperature increases, and the firing temperature becomes too high, which is not preferable. S]02 is more preferably in the range of 41 to 48% by weight within the above range.

Al2O3は析出結晶の成分である。Al2O3< 2
邪゛量チでは結晶が析出し郭く、Al2O3> 15重
量%ではガラス化し短くなる。Al2O3は上記範囲中
3〜14重−Jt’t%の範囲がより望ましい。
Al2O3 is a component of the precipitated crystals. Al2O3<2
If the concentration is too low, crystals will precipitate and become thin, and if Al2O3>15% by weight, it will become vitrified and become short. Among the above ranges, Al2O3 is preferably in the range of 3 to 14 times -Jt't%.

BaOはガラス粉末を製造する際の溶解性を向上する作
用をすると共に析出結晶の成分でもある。BaO< 3
0重量%では、ガラスの軟化温度が高くなり過ぎ、焼成
温度が高くなり過ぎるので好ましくない。また、Bad
>45重量%では、熱膨張係数が大きくなり過ぎ、アル
ミナ等の基板に対しては適用か菓ILかしくなる。Ba
Oは上記範囲中31〜42重i: %の範囲がより望ま
しい。
BaO functions to improve the solubility when producing glass powder, and is also a component of precipitated crystals. BaO<3
If it is 0% by weight, the softening temperature of the glass will become too high and the firing temperature will become too high, which is not preferable. Also, Bad
If it is >45% by weight, the coefficient of thermal expansion becomes too large, making it difficult to apply it to substrates such as alumina. Ba
Among the above ranges, O is preferably in the range of 31 to 42%.

ZnOは、ガラス粉末製造における溶解性を向上する作
用がある。Zno<5重量%では、ガラスの軟化温度か
高すぎる。ZnO>200重量%は、ガラスの軟化温度
か低ずぎ、焼成時に回路パターンを変形したり、導体、
抵抗体との反応性が増し特性を損う恐れがある。ZnO
は上記範囲中8〜18重量係′の範囲がより望ましい。
ZnO has the effect of improving solubility in glass powder production. When Zno<5% by weight, the softening temperature of the glass is too high. If ZnO>200% by weight, the softening temperature of the glass is too low, the circuit pattern may be deformed during firing, the conductor,
There is a risk that the reactivity with the resistor will increase and the characteristics will be impaired. ZnO
is more preferably in the range of 8 to 18% by weight within the above range.

CaO及びMgOは、ガラス粉末製造時の溶解過程で生
じる失透の防止作用および焼成時に析出する結晶の生成
速度を調整する作用をnKする。
CaO and MgO have the function of preventing devitrification that occurs during the melting process during glass powder production and the function of adjusting the rate of crystal formation that precipitates during firing.

CaO+MgO<0.5重量%では、かかる作用が少な
く、CaO+MgO>2fi−量チでは、ガラスの熱膨
張係数が大きくなりすぎ、いずれも好ましくない。Oa
O+MgOは上言e範囲中1−1.5 i′i!%の範
囲がより望ましい。
When CaO+MgO<0.5% by weight, this effect is small, and when CaO+MgO>2fi- the coefficient of thermal expansion of the glass becomes too large, both of which are unfavorable. Oa
O+MgO is 1-1.5 i'i! in the above e range! A range of % is more desirable.

Z r O2は、焼成後のガラスを高軟化点化する作用
及び焼成時の結晶の析出速度を調部する作用を有する。
Z r O2 has the effect of increasing the softening point of the glass after firing and the effect of adjusting the precipitation rate of crystals during firing.

ZrO2<0.5重量%では、かかる作用効果が不充分
であり、Z;roz>4:i量係では、ガラスの軟化温
度が高くなり過ぎ、いずれも好ましくない。ZrO2は
上記範囲中1〜3重ft%の範囲がより望ましい。
When ZrO2<0.5% by weight, such effects are insufficient, and when Z;roz>4:i, the softening temperature of the glass becomes too high, both of which are unfavorable. ZrO2 is more preferably in a range of 1 to 3 ft% within the above range.

5nOzは、ガラスの耐水性、耐酸性を向上するために
添加する。5nOz<0.1重量%では、添加による上
記効果が少なく、1.5重量%より多く添加しても、そ
の効果は向上しない。5nC1zは上記範囲中05〜1
重量係の範囲がより望ましい。
5 nOz is added to improve the water resistance and acid resistance of the glass. When 5nOz<0.1% by weight, the above effect due to addition is small, and even if more than 1.5% by weight is added, the effect does not improve. 5nC1z is 05 to 1 in the above range
A weight range is more desirable.

R20(RはLi、 Na及び/又はKである)は、ガ
ラスの軟化温度を低下させる作用及び化学的耐久性、特
に耐酸性の向上作用を有する。R20〈005重ftz
%では、かかる作用が不充分であり、R20>1.5重
量%では、熱膨張係数が太き(なり過き、いずれも好ま
しくない。RzOは上記範囲中01〜1重量ヂの範囲が
より望ましい。
R20 (R is Li, Na and/or K) has the effect of lowering the softening temperature of glass and improving chemical durability, especially acid resistance. R20〈005 heavy ftz
%, this effect is insufficient, and when R20 > 1.5% by weight, the coefficient of thermal expansion becomes too large (too much, both of which are unfavorable.) desirable.

本発明による組成物は、次のようにして製造することが
できる。
The composition according to the invention can be manufactured as follows.

常法により、目標組成となるように各原料を秤量し混合
し溶融する。次いで溶融したガラスを板状、フレーク状
に成形し、水砕または機械的粉砕によりガラス粉末を製
造する。次いで、かかるガラス粉末とフィラーとを所定
割合で混合することにより本発明の組成物が製造される
Each raw material is weighed, mixed and melted to achieve the target composition using a conventional method. Next, the molten glass is formed into a plate or flake shape, and glass powder is produced by water crushing or mechanical crushing. Next, the composition of the present invention is manufactured by mixing the glass powder and filler in a predetermined ratio.

か(して製造された組成物は、適当な有機ビヒクルを用
いて混練され、ペースト化されて使用される。
The composition prepared in this way is kneaded with a suitable organic vehicle and used after being made into a paste.

かかるペーストにAg、 C!u等の導電性金属粒子を
添加することにより導電性ペーストとすることができ、
また、RuO2等の抵抗性粒子を添加することにより抵
抗体ペーストとすることができる。これらのペーストは
、常法の印刷を行なった後、850〜950℃の温度で
焼成することにより絶縁層、導体、抵抗体を形成できる
Ag, C! It can be made into a conductive paste by adding conductive metal particles such as u.
Further, by adding resistive particles such as RuO2, a resistor paste can be obtained. These pastes can be used to form insulating layers, conductors, and resistors by printing in a conventional manner and then firing at a temperature of 850 to 950°C.

実施例 表1の目標組成のガラスになるように、各原料を秤量し
混合した後、これをルツボに入れ、140011500
°Cに加熱し、2〜3時間攪拌しつつ溶解した。次いで
、溶解したガラスな水砕しガラス粉末を製造した。次い
で、このガラス粉末とフィラーとか同表に記載の割合に
なるように秤量し、ボットミル中で微粉砕しつつ混合し
、同表記載の組成物を製造した。なお、ガラス粉末及び
フィラー粉末の粒径は、ファインパターンを形成する場
合には最大45μm、平均2μm以下とするのが望まし
い。
Example After weighing and mixing each raw material to obtain a glass with the target composition shown in Table 1, this was placed in a crucible, and 140011500
It was heated to °C and dissolved with stirring for 2-3 hours. A fused glass powder was then produced. Next, this glass powder and filler were weighed so as to have the proportions shown in the same table, and mixed while being finely pulverized in a bot mill to produce the compositions shown in the same table. Note that the particle size of the glass powder and filler powder is preferably 45 μm at maximum and 2 μm or less on average when forming a fine pattern.

この組成物によるガラスの特性を調べるために上記組成
物にα−テルピネオール95%及びエチルセルロース5
チからなる有機ビヒクルを添加しペースト化した。この
ペーストを印刷焼成してガラス層を形成し、このガラス
層について同表記載の特性を測定し、その結果を併記し
た。なお、表の資料扁7は従来のもので比較のために示
した。
In order to investigate the properties of glass made from this composition, the above composition was mixed with 95% α-terpineol and 5% ethyl cellulose.
It was made into a paste by adding an organic vehicle consisting of This paste was printed and fired to form a glass layer, and the properties described in the same table were measured for this glass layer, and the results are also listed. Note that the data sheet 7 in the table is a conventional one and is shown for comparison.

同表から明らかなように、本発明による組成物は抵抗体
の抵抗値変化率が極めて少なく優れたものである。
As is clear from the table, the composition according to the present invention is excellent in that the rate of change in resistance value of the resistor is extremely small.

なお、同表に示した特性値は次のものである。The characteristic values shown in the same table are as follows.

絶縁抵抗ニガラスにDC100Vを印加したときの室温
におけろ抵抗値Ωである。
This is the resistance value Ω at room temperature when DC 100V is applied to the insulation resistance glass.

誘 電 率: ] K)12の電圧印加における室温で
のr直である。
Dielectric constant: R direct at room temperature when a voltage of K) 12 is applied.

を含むPb−5n共晶ハンダ浴に3 秒間浸漬し引上げる。これにより 導体表面積の90係以上がハンダ に濡れているものを良とした。3 in a Pb-5n eutectic solder bath containing Dip for a second and pull out. This results in 90% or more of the conductor surface area is solder Those that were wet were considered good.

焼結断面構ニガラスの断面を走査型篭子顕微鏡造 により観察し気泡のないものを良 とした。Scanning basket microscope cross section of sintered glass Observe if there are no bubbles. And so.

しこの抵抗値を測定する。次いで この抵抗体にガラスペーストによ り絶縁層を形成し抵抗体の抵抗値 を測定する。絶縁層は形成、する前 後の抵抗体の抵抗値変化を示す。Measure the resistance value of the penis. then Apply glass paste to this resistor. The resistance value of the resistor is Measure. The insulation layer is formed before This shows the change in resistance value of the resistor afterward.

(+は絶縁層を形成することによ り抵抗値が増加したことを示す。)(+ is due to forming an insulating layer. This indicates that the resistance value has increased. )

Claims (3)

【特許請求の範囲】[Claims] (1)  ガラス粉末70〜99沖量%とフィラー1〜
30乎景係とからなり、該ガラス粉末は正m係表示で 5i02          41 〜50A1203
          2 〜 】5Ba、0     
       30 〜45Zn0         
    5 〜20CaO+Mg0     0.5 
 〜2zrO205〜 4 SnO20,1〜 1.5 に20          0.05 〜15(RはL
i、Na及び/又はKである)の範囲の組成であり、該
フィラーはZr5iO< 。 2Mgo−8102及び/又はA12C)3であるガラ
ス組成物。
(1) Glass powder 70~99% and filler 1~
It consists of 30 views, and the glass powder is 5i02 41 ~ 50A1203 in the regular m area display.
2 ~ ]5Ba, 0
30 ~45Zn0
5 ~20CaO+Mg0 0.5
~2zrO205~ 4 SnO20,1~1.5 to 20 0.05~15 (R is L
i, Na and/or K), and the filler has a composition in the range of Zr5iO<. 2Mgo-8102 and/or A12C)3.
(2)  前記ガラス粉末は重量係表示で5102  
       4’1〜48A1203       
  3〜14BaO31〜42 Zn0           8〜18CaO+Mg0
      1〜15 ZrOz           1〜3SnO20,5
〜 I R2o         O1〜 1 の範囲の組成である特許請求の範囲第1項記i+it5
の組成物。
(2) The glass powder has a weight rating of 5102
4'1~48A1203
3~14BaO31~42 Zn0 8~18CaO+Mg0
1~15 ZrOz 1~3SnO20,5
i+it5 according to claim 1, which has a composition in the range of ~ I R2o O1~ 1
Composition of.
(3)  前記ガラス粉末75〜98重p、 %と前記
フィラー2〜25乎景係とからなる特許請求の範囲第1
項又はぎ32項記載の封着用組成物。
(3) Claim 1, comprising the glass powder 75-98% by weight and the filler 2-25%.
The sealing composition according to item 32.
JP8169983A 1983-05-12 1983-05-12 Glass composition Granted JPS59207853A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8169983A JPS59207853A (en) 1983-05-12 1983-05-12 Glass composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8169983A JPS59207853A (en) 1983-05-12 1983-05-12 Glass composition

Publications (2)

Publication Number Publication Date
JPS59207853A true JPS59207853A (en) 1984-11-26
JPS6221739B2 JPS6221739B2 (en) 1987-05-14

Family

ID=13753620

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8169983A Granted JPS59207853A (en) 1983-05-12 1983-05-12 Glass composition

Country Status (1)

Country Link
JP (1) JPS59207853A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61227940A (en) * 1985-03-29 1986-10-11 Sumitomo Metal Mining Co Ltd Glass paste
EP0204261A2 (en) * 1985-06-03 1986-12-10 Hitachi, Ltd. Multilayer wiring board and method of manufacturing the same
JP2001058849A (en) * 1999-06-09 2001-03-06 Asahi Glass Co Ltd Barium borosilicate glass and glass ceramic composition
JP2015210902A (en) * 2014-04-25 2015-11-24 住友金属鉱山株式会社 Composition for formation of thick film conductor formed with the same

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0287496A (en) * 1988-09-22 1990-03-28 Wako Electric Co Ltd Lighting device
CN1316219C (en) * 2004-04-09 2007-05-16 Lg电子株式会社 Refrigerator

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61227940A (en) * 1985-03-29 1986-10-11 Sumitomo Metal Mining Co Ltd Glass paste
JPH0149654B2 (en) * 1985-03-29 1989-10-25 Sumitomo Metal Mining Co
EP0204261A2 (en) * 1985-06-03 1986-12-10 Hitachi, Ltd. Multilayer wiring board and method of manufacturing the same
EP0204261A3 (en) * 1985-06-03 1987-08-12 Hitachi, Ltd. Multilayer wiring board and method of manufacturing the same
JP2001058849A (en) * 1999-06-09 2001-03-06 Asahi Glass Co Ltd Barium borosilicate glass and glass ceramic composition
JP2015210902A (en) * 2014-04-25 2015-11-24 住友金属鉱山株式会社 Composition for formation of thick film conductor formed with the same

Also Published As

Publication number Publication date
JPS6221739B2 (en) 1987-05-14

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