JPS59172228A - Method of producing moisture detecting element - Google Patents

Method of producing moisture detecting element

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Publication number
JPS59172228A
JPS59172228A JP58046284A JP4628483A JPS59172228A JP S59172228 A JPS59172228 A JP S59172228A JP 58046284 A JP58046284 A JP 58046284A JP 4628483 A JP4628483 A JP 4628483A JP S59172228 A JPS59172228 A JP S59172228A
Authority
JP
Japan
Prior art keywords
manufacturing
sensing element
organosilicon compound
polymer
humidity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58046284A
Other languages
Japanese (ja)
Inventor
棚橋 一郎
敦 西野
昭彦 吉田
安福 利行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58046284A priority Critical patent/JPS59172228A/en
Publication of JPS59172228A publication Critical patent/JPS59172228A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、湿度検出素子特に静電容量変化型の湿度検出
素子の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method of manufacturing a humidity sensing element, particularly a variable capacitance type humidity sensing element.

従来例の構成とその問題点 現在、湿度を検知し電気信号の形で出力できる素子とし
て種々のものが知られているが、そのうちで静電容量変
化を利用する湿度検出素子は、従来の素子に比べて精度
、感度、応答性、ヒステリシス、経時変化、耐薬品性、
測定範囲、Ii1熱性などの点において優れている。
Configurations of conventional examples and their problems Currently, various devices are known that can detect humidity and output it in the form of an electrical signal.Among them, humidity detection devices that use capacitance changes are accuracy, sensitivity, responsiveness, hysteresis, aging, chemical resistance,
It is excellent in terms of measurement range, Ii1 thermal properties, etc.

次にこの湿度検出素子の一例の基本構成を第1図に示す
。同図において、1はクンタルのような弁作用金属であ
り、この金属基体1の表面には、誘電性陽極酸化皮膜2
が形成され、この誘電性陽極3 ・ −−゛ 酸化皮膜2の上には二酸化マンガンのような半導電性金
属酸化物層3が形成されている。そしてこの半導電性金
属酸化物層3の上には、金属基体1との対向電極4が設
けられている。対向電極として例えば、まず金属酸化物
」−に10ρ7〜数百μ2ノ2の炭素粒子を刺着させ、
次いで銀ペイント層を形成する。しかしながら−ヒ述の
各構成材料はいずれも水を含み、水蒸気の吸脱着がスム
ーズに進行しなくなり、ヒステリシス現象を示す。この
ことはみかけの経時変化の一因ともなる。また従来用い
てきた銀ベイ71−は、フッ素系樹脂あるいはエボギシ
系樹脂ヲ1.0%含みかつ有機溶媒中に銀ペイントラ分
散させたタイプのものであり、撥水性を有するが、有機
物であるバインダーの耐候性が劣ること、さらに銀の自
然酸化がおこること、さらに高温高湿下では銀のマイグ
レーションが起こることが欠点としてあげられる。この
ようなこともまた素子の経時変化をもたらす一要因とな
る。
Next, the basic configuration of an example of this humidity detection element is shown in FIG. In the figure, 1 is a valve metal such as Kuntal, and the surface of this metal base 1 is coated with a dielectric anodic oxide film 2.
A dielectric anode 3 is formed, and a semiconductive metal oxide layer 3 such as manganese dioxide is formed on the oxide film 2. On this semiconductive metal oxide layer 3, an electrode 4 facing the metal base 1 is provided. For example, as a counter electrode, first, carbon particles of 10ρ7 to several hundred μ2 are attached to a metal oxide.
A silver paint layer is then formed. However, all of the above-mentioned constituent materials contain water, and adsorption and desorption of water vapor does not proceed smoothly, resulting in a hysteresis phenomenon. This also contributes to the apparent change over time. Furthermore, the silver bay 71- which has been used conventionally is a type containing 1.0% of fluororesin or epoxy resin and dispersed in silver paint in an organic solvent, and has water repellency, but does not contain an organic binder. Disadvantages include poor weather resistance, natural oxidation of silver, and silver migration under high temperature and high humidity conditions. This also becomes a factor that causes the element to change over time.

発明の目的 本発明は、」1記のような構成材わ自体に一度吸湿した
水分が月別内に保持されるととにより生じるヒステリシ
ス現象を小さくすると共に環境変動に伴う経時変化の小
さい湿度検出素子を製造する方法を提供することを目的
とする。
Purpose of the Invention The present invention provides a humidity sensing element which reduces the hysteresis phenomenon that occurs when moisture once absorbed by the constituent material itself is retained within a month, as described in item 1, and which exhibits small changes over time due to environmental changes. The purpose is to provide a method for manufacturing.

発明の構成 本発明は、上記の目的を達成するため、湿度検出素子を
構成している半導電性金属酸化物層を形成する時、その
熱分解性金属塩溶液に撥水性を有する有機ケイ素化合物
を分散させ、熱分解後の半導電性金属酸化物層に撥水性
をもたせると共に、高温多湿状態下で起こりやすい銀ペ
イントのマイグレーションを防止し、さらに銀ペイント
層形成後、130°C以下の焼成温度で硬化させ、被膜
を形成する有機ケイ素化合物に浸漬、焼成し、銀ペイン
トの自然酸化を防ぐことにより、高信頼性の湿度検出素
子を製造することができる。
Structure of the Invention In order to achieve the above object, the present invention uses an organosilicon compound having water repellency to a thermally decomposable metal salt solution when forming a semiconductive metal oxide layer constituting a humidity sensing element. is dispersed to impart water repellency to the semiconductive metal oxide layer after thermal decomposition, as well as to prevent migration of silver paint that tends to occur under high temperature and humidity conditions. A highly reliable humidity sensing element can be manufactured by curing the silver paint at high temperature, immersing it in an organosilicon compound that forms a film, and baking it to prevent natural oxidation of the silver paint.

実施例の説明 実施例1 本発明の湿度検出素子が従来の素子と比較して吸水率の
小さいことを具体例をあげ説明する。
Description of Examples Example 1 The fact that the humidity detection element of the present invention has a lower water absorption rate than conventional elements will be explained using a specific example.

51リ−2) 直径o、8yym、長さ15賭のタンタルからなる金属
基体の一部を50%リン酸溶液中40Vで定電圧化成し
て、酸化タンタル皮膜を形成し、さらにこれを比重1.
10の硝酸マンガン溶液に有機ケイ素化合物の重合体を
○wt、0.0001wt%。
51 Lee-2) A part of a metal substrate made of tantalum with a diameter of 8 yym and a length of 15 mm was subjected to constant voltage chemical conversion at 40 V in a 50% phosphoric acid solution to form a tantalum oxide film, which was further coated with a specific gravity of 1. ..
○wt, 0.0001wt% of a polymer of an organosilicon compound was added to a manganese nitrate solution of No. 10.

0、○o1wj%、 0,01 wt%、 0,1 w
t%、1wt%。
0,○o1wj%, 0,01 wt%, 0,1 w
t%, 1wt%.

Swt%、10wt%含有した溶液(いずれも重量百分
率である)に浸漬した後、2o○°Cで20分間熱分解
し二酸化マンガン層を形成する。第2図は上記各濃度有
機ケイ素化合物を含んでいる溶液を用いて作製した素子
を50’C,相対湿度90%FtHの恒温、恒湿下に放
置した場合の吸湿性を経時時間と素子の重量増加率を用
いて示す。図中人は、0wt%すなわち従来の素子、B
は0.0001wt%、Cは0.001wt%、Dは0
.01wt%、Eは0.1 wt%、Fは1wt%、G
は5wt%、Hは10wt%の結果を示す。人の曲線よ
り陽極酸化皮膜上に熱分解により形成された二酸化マン
ガン層は多孔質であり、水分を吸着しやすいことがわか
る。また有機ケイ素化合物の含有量が増加するにつれ著
るしく吸水量が低下することがわかる。A−Hの条件下
二酸化マンガン層を形成し、さらにコロイダルカーボン
を用いてカーボッ層を形成した後、銀ペイント層を形成
する。このようにして作製した素子の初期特性を第1表
に示す。
After being immersed in a solution containing Swt% and 10wt% (all percentages are by weight), it was thermally decomposed at 2°C for 20 minutes to form a manganese dioxide layer. Figure 2 shows the hygroscopicity of the elements fabricated using solutions containing the above-mentioned organosilicon compounds at various concentrations when left at a constant temperature and humidity of 50'C and relative humidity of 90% FtH. It is shown using the weight increase rate. In the figure, 0wt%, that is, the conventional element, B
is 0.0001wt%, C is 0.001wt%, D is 0
.. 01 wt%, E is 0.1 wt%, F is 1 wt%, G
shows the results at 5 wt% and H at 10 wt%. From the human curve, it can be seen that the manganese dioxide layer formed by thermal decomposition on the anodic oxide film is porous and easily absorbs moisture. It can also be seen that as the content of the organosilicon compound increases, the amount of water absorption decreases significantly. After forming a manganese dioxide layer under the conditions of A-H and further forming a carbon layer using colloidal carbon, a silver paint layer is formed. Table 1 shows the initial characteristics of the device thus manufactured.

第   1   表 この第1表より、二酸化マンガンの固体電解質中に異物
質である有機ケイ素化合物を加える量に7 よ−)で抵抗、  tanδ(周波数120H7?測定
)の点で二酸化マノガ/の固体電解質の特性をそこねる
ことになり、好寸しくない。壕だ、濃度が小さすぎると
、撥水性が十分発揮されず、効果が薄い。したがってt
anδを小さくしかも顕著な撥水性能をもたすには、0
.001wt%から6Wt係程度の濃度にする必要があ
る。なお初期特性は60係RHで徂1定しだ。
Table 1 From Table 1, the amount of organosilicon compound, which is a foreign substance, added to the solid electrolyte of manganese dioxide is 7. This would impair the characteristics of the product, which is not a good idea. However, if the concentration is too low, the water repellency will not be sufficient and the effect will be weak. Therefore t
In order to make anδ small and have remarkable water repellency,
.. It is necessary to set the concentration to about 0.001 wt% to 6 Wt. The initial characteristics are fixed at 60 RH.

次に」二記A〜G条件で作製した素子の耐湿性能につい
て述べる。A〜Gのものを60℃、相対湿度90 tI
)RHの恒温恒湿槽に1000時間放置した後の出力容
喰値を60%RH雰囲気下で測定し初期値と比較した第
2表にその結果を示す。表より、Aの従来例に比べて特
性変化が小さくなっていることがわかる。このことは第
2図に示した二酸化マンガン層の水の吸水量と対応して
おり、撥水性がないと高温下で一度水分を含むと容易に
脱離しにくくなることによると考えられる。以上のごと
く本発明の方法により、長期高湿にも強い温度検出素子
が製造できる。
Next, the moisture resistance of the elements produced under conditions A to G in Section 2 will be described. A to G at 60℃, relative humidity 90tI
) The output capacity values after being left in a constant temperature and humidity chamber at RH for 1000 hours were measured in a 60% RH atmosphere and compared with the initial values, and the results are shown in Table 2. From the table, it can be seen that the change in characteristics is smaller compared to the conventional example A. This corresponds to the amount of water absorbed by the manganese dioxide layer shown in FIG. 2, and is thought to be due to the fact that without water repellency, once moisture is included at high temperatures, it becomes difficult to desorb. As described above, by the method of the present invention, a temperature sensing element that is resistant to long-term high humidity can be manufactured.

第   2  表 実施例2 直径0.8 mm 、長さ15ff屑のタンタルからな
る金属基体の一部を50係リン酸溶液中40Vで定電圧
化成して、酸化タンタル皮膜を形成し、さらにこれを比
重1.10の硝酸マンガン溶液に有機ケイ素化合物の重
合体をo−oiwt%含才せだ溶液に浸漬した後、20
0℃で2o分間熱分解し、二酸化マンガンP?Jk形成
する。そののちコロイダルカーボンに浸漬して、カーボ
ン層を、さらに銀ペイントに浸漬し100℃で焼成して
銀ペイント層を順9 い・ −・ 次形成する。銀ベイノド上に常温乾燥型の有機ケイ素の
重合体膜を形成する。この膜は水蒸気透過性であるが大
きな撥水性をもつものである。このような本発明の方法
で製造した温度検出素子と、径径の方法すなわち上記製
造法で硝酸マンガンに有機ケイ素化合物を欠いており、
また、銀ベイメト上の有機ケイ素皮膜も欠いている素子
との経時変化を比較1〜だ。本発明の製造法による素子
と従来の製造法による素子を屋外に5000時間放置し
た後の初期特性からの変動幅を各素子60個の平均値で
示した。特性測定は相対湿度60%RHで行なった。さ
らに50℃、901%RH雰囲気下1000時間放置後
、66℃、10係RH雰囲気下1000時間放置後の特
性変動幅もあわせて第3表に示した。第3表より明らか
に本発明の製造方法による素子の方が、耐候性、特に高
湿、低湿雰囲気にも強いことがわかる。
Table 2 Example 2 A part of a metal substrate made of scrap tantalum with a diameter of 0.8 mm and a length of 15 ff was subjected to constant voltage chemical conversion at 40 V in a 50% phosphoric acid solution to form a tantalum oxide film. After immersing a polymer of an organosilicon compound in a manganese nitrate solution with a specific gravity of 1.10 and an o-oiwt% diaphragm solution,
Pyrolyzed at 0℃ for 20 minutes to produce manganese dioxide P? Form Jk. Thereafter, the carbon layer is immersed in colloidal carbon, and the carbon layer is further immersed in silver paint and fired at 100° C. to form a silver paint layer. An organosilicon polymer film that dries at room temperature is formed on the silver oxide. This membrane is water vapor permeable but highly water repellent. The temperature sensing element manufactured by the method of the present invention and the diameter method, that is, the manufacturing method described above, lacks an organosilicon compound in manganese nitrate,
In addition, the changes over time are compared with a device that also lacks an organosilicon film on silver baymeth. The fluctuation range from the initial characteristics of the device manufactured by the manufacturing method of the present invention and the device manufactured by the conventional manufacturing method after being left outdoors for 5000 hours is shown as the average value of 60 devices for each device. Characteristic measurements were performed at a relative humidity of 60% RH. Furthermore, Table 3 also shows the range of characteristic fluctuations after being left in an atmosphere of 901% RH at 50°C for 1000 hours and after being left in an atmosphere of 10% RH at 66°C for 1000 hours. Table 3 clearly shows that the elements manufactured by the manufacturing method of the present invention have better weather resistance, especially in high humidity and low humidity atmospheres.

1 。1.

第   3   表 発明の効果 本発明の方法により、すなわち二酸化マンガン層の吸水
率を低下させると共に撥水性をもたせ、ヒステリシス現
象を小さくでき、高湿に強い素子を製造することができ
、また例界に暴露されている陰極表面上に有機ケイ素重
合体の被膜を形成し素子の耐候性を高めることができ、
経時変化の小さい高信頼性の湿度検出素子を製造するこ
とができ産業上火なる効果をもたらすものである。
Table 3 Effects of the Invention By the method of the present invention, it is possible to reduce the water absorption rate of the manganese dioxide layer and to make it water repellent, to reduce the hysteresis phenomenon, and to produce an element that is resistant to high humidity. A film of organosilicon polymer can be formed on the exposed cathode surface to improve the weather resistance of the device.
It is possible to manufacture a highly reliable humidity detection element with little change over time, which brings great benefits to industry.

【図面の簡単な説明】[Brief explanation of the drawing]

11ベー。S゛ 第1図は従来の湿度検出素子の基本構成図、第2図は硝
酸マンガン中の有機ケイ素化合物の含有濃度と吸水率を
経過時間に対して示す図である。 1・・・・・・弁作用金属、2・・・・・・誘電性陽極
酸化皮膜、3・・・・・・半導電性金属酸化物層、4・
・・・・・対向電極。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名第1
図 第2図 λ rジF     Fl(bンノ
11 bae. Fig. 1 is a basic configuration diagram of a conventional humidity detection element, and Fig. 2 is a diagram showing the content concentration and water absorption rate of organosilicon compounds in manganese nitrate versus elapsed time. DESCRIPTION OF SYMBOLS 1... Valve metal, 2... Dielectric anodic oxide film, 3... Semiconductive metal oxide layer, 4...
...Counter electrode. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
Figure 2

Claims (4)

【特許請求の範囲】[Claims] (1)金属基体上に陽極酸化法により誘電性陽極酸化皮
膜を形成したのち、有機ケイ素化合物の重合体を分散捷
たは溶解させた熱分解性金属塩溶液に浸漬し、これを熱
分解して半導電性金属酸化物より々る固体電解質を形成
し、この固体電解質層上にカーボン層、銀ペイント層な
どの陰極導電層を設けることを特徴とする湿度検出素子
の製造方法。
(1) After forming a dielectric anodic oxide film on a metal substrate by an anodizing method, it is immersed in a pyrolyzable metal salt solution in which a polymer of an organosilicon compound is dispersed or dissolved, and then thermally decomposed. 1. A method for manufacturing a humidity sensing element, comprising: forming a solid electrolyte made of a semiconductive metal oxide; and providing a cathode conductive layer such as a carbon layer or a silver paint layer on the solid electrolyte layer.
(2)陰極導電層がその上に水蒸気透過性の有機ケイ素
化合物の重合体よりなる被膜を有することを特徴とする
特許請求の範囲第1項記戦の湿度検出素子の製造方法。
(2) The method for manufacturing a humidity detection element according to claim 1, wherein the cathode conductive layer has a coating made of a polymer of a water vapor permeable organosilicon compound thereon.
(3)有機ケイ素化合物の重合体が熱分解性金属塩溶液
に対して0.0001〜Swt%(重合百分率)添加さ
れていることを特徴とする特許請求の範囲第1項記載の
湿度検出素子の製造方法。
(3) The humidity sensing element according to claim 1, characterized in that a polymer of an organosilicon compound is added in an amount of 0.0001 to Swt% (polymerization percentage) to the thermally decomposable metal salt solution. manufacturing method.
(4)有機ケイ素化合物の重合体は、130″C以下の
熱処理で硬化形成でき、本湿度検出素子の使用環境下で
物理、化学的に安定であることを特徴とする特許請求の
範囲第1項記載の湿度検出素子の製造方法。
(4) The polymer of the organosilicon compound can be hardened and formed by heat treatment at 130"C or less, and is physically and chemically stable in the usage environment of the humidity sensing element. 2. Method for manufacturing the humidity sensing element described in .
JP58046284A 1983-03-18 1983-03-18 Method of producing moisture detecting element Pending JPS59172228A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58046284A JPS59172228A (en) 1983-03-18 1983-03-18 Method of producing moisture detecting element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58046284A JPS59172228A (en) 1983-03-18 1983-03-18 Method of producing moisture detecting element

Publications (1)

Publication Number Publication Date
JPS59172228A true JPS59172228A (en) 1984-09-28

Family

ID=12742920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58046284A Pending JPS59172228A (en) 1983-03-18 1983-03-18 Method of producing moisture detecting element

Country Status (1)

Country Link
JP (1) JPS59172228A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4958606A (en) * 1986-11-27 1990-09-25 Mazda Motor Corporation Supercharged engine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4958606A (en) * 1986-11-27 1990-09-25 Mazda Motor Corporation Supercharged engine

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