JPS59170844A - Reforming method of photosensitive body - Google Patents
Reforming method of photosensitive bodyInfo
- Publication number
- JPS59170844A JPS59170844A JP4557483A JP4557483A JPS59170844A JP S59170844 A JPS59170844 A JP S59170844A JP 4557483 A JP4557483 A JP 4557483A JP 4557483 A JP4557483 A JP 4557483A JP S59170844 A JPS59170844 A JP S59170844A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive layer
- group
- resistance
- photoreceptor
- moisture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】
シリコン等からなる感光層の耐湿性、耐刷性を同上させ
る方法（こ関する。DETAILED DESCRIPTION OF THE INVENTION A method for improving the moisture resistance and printing durability of a photosensitive layer made of silicon or the like.
従来技術
近年、感光体として、基体」二（こアモルファスシ光
リコンその他の桿′市性材料からなる膜を感光層と△
してＪし成したものが開発されている。この種の感光体
はその感光層の電気抵抗が小さく湿度によって、あるい
は反復便用（こよって大きく影響を受けるため実用に供
し難いという問題があった。すなわちーこの種の感光体
を電子写真複写機に実装した場合、高湿時その周囲の水
分子が感光体表面に吸着されて感光層の抵抗が低下し、
帯電一露光１一で静電潜像を担持さぜたときーその電荷
が現像するまでの間に非画像領域へ流れてしまい、複写
物に画像流れとして現われる他、ナヤージーデイスチャ
ージの繰り返しくこより感光層表向に高抵抗の膜が形成
され、反復使用中に感光層内（・こ電荷がｍ積されるよ
うになり、その電荷の移動により複写物に画像流れとな
って現われるという問題があった。PRIOR ART In recent years, photoreceptors have been developed in which a substrate is made of a film made of amorphous silicon or other solid material as a photosensitive layer.This type of photoreceptor has a problem in that it is difficult to put it to practical use because the electrical resistance of its photosensitive layer is small and it is greatly affected by humidity or repeated use.In other words, when this type of photoreceptor is installed in an electrophotographic copying machine, When the humidity is high, surrounding water molecules are adsorbed to the surface of the photoreceptor, reducing the resistance of the photoreceptor layer.
When an electrostatic latent image is carried during charging and exposure 1-1, the charge flows to the non-image area before it is developed, which appears as image blur on the copy, and also causes repeated nagging discharge. As a result, a high-resistance film is formed on the surface of the photosensitive layer, and during repeated use, charges accumulate within the photosensitive layer, causing image blurring on copies due to the movement of the charges. was there.
発明の目的
本発明は、アモルファスシリコンその他の光専電性材料
からなる感光層の抵抗が湿度や、帯電および放電の繰返
しにより糺化するのを防止することを技術的課題とし、
耐湿性および耐刷性に優れた感光体を得ることができる
電子写真用感光体の改質方法を提供することを目的とす
るものである。Purpose of the Invention The technical object of the present invention is to prevent the resistance of a photosensitive layer made of amorphous silicon or other photosensitive material from becoming agglomerated due to humidity or repeated charging and discharging.
The object of the present invention is to provide a method for modifying an electrophotographic photoreceptor, which makes it possible to obtain a photoreceptor with excellent moisture resistance and printing durability.
発明の要旨
本発明は、アモルファスシリコンその他の光導市、性材
料からなる感光層を有する感光体の表面を、酸、オルガ
ノへ〔１ゲンシラン、高級脂肪酸塩および高級アミンか
ら１１′る群から選ばれた感光層安定化Ｎｉｌで処理す
ることを特徴とする感光体の改質法（こある。SUMMARY OF THE INVENTION The present invention provides a method for treating the surface of a photoreceptor having a photosensitive layer made of amorphous silicon or other light-guiding material with an acid, an organoelectrolyte selected from the group consisting of silane, higher fatty acid salts, and higher amines. A method for modifying a photoreceptor characterized by treating the photoreceptor layer with stabilized Nil.
すなわち一本発明は、アモルファスシリコンなとの感光
層表面には一親水ハであるＯＨ基が結合しており−これ
が感光体の耐湿性、耐刷性の劣化の原因であること（こ
織み−これを疎水基に置換する 一方、通Ｉ廷の４ｆＬ
抗を何する酸化層などの膜を形成−４゛ることにより特
ｔ’、ＩＥの安定化を図ったものである６゜
使用する酸には、弗酸、・硼酸−塩酸などのハロゲン化
水素酸、硝酸ｆλどが営まれる。In other words, one aspect of the present invention is that OH groups, which are hydrophilic, are bonded to the surface of the photosensitive layer made of amorphous silicon, and this is the cause of deterioration of the moisture resistance and printing durability of the photosensitive member. -Substitute this with a hydrophobic group On the other hand, 4fL of Tong I
It is intended to stabilize the IE by forming a film such as an oxidized layer that acts as a resistor.6 The acids used include halogenated acids such as hydrofluoric acid and boric acid-hydrochloric acid. Hydrogen acid, nitric acid fλ, etc. are used.
」ルガノハロゲンシランには−トリクロルメチルシラン
−ンクルジメチルシランークロルトリメチルシランージ
クロルジエチルシランなどのオルガノクロルンラン、ト
リフルオルメチルンランージフルオルジメチルシランー
ジフルオルジエナルシランなどのオルガノフルオルシラ
ン−トリブロムメチルシラン−ジブロムジメチルシラン
−ジブロムジエチルシランなどのオルガノプロ１８シラ
ンなどが含まれる。"Luganohalogensilanes include trichloromethylsilane, organochlorosilane such as dichlorodimethylsilane, chlortrimethylsilane, dichlorodiethylsilane, and organofluorosilane such as trifluoromethylsilane, difluorodimethylsilane, and difluorodienalsilane. - Tribromomethylsilane - dibromodimethylsilane - organopro-18 silane such as dibromodiethylsilane, and the like.
＝Ｒ脂肪酸塩には、パルミチン峻ナトリウムなどが含ま
れる。=R fatty acid salts include sodium palmitate and the like.
高級アミンには、トリメチルラウリルアミンなとが會ま
れる。Higher amines include trimethyllaurylamine.
処理法としては、製造した感光体を感光層安定化剤含有
液中に所定時間浸漬するか、あるいは感光層安定化剤含
有液を含浸させた紙、布、フェルト、スポンジ等を感光
体に巻き付けて所定時間放置するなど任意の方法を採用
でき、要は一感光体の感光層に感光層安定化剤を接触さ
せればよい。As a processing method, the manufactured photoreceptor is immersed in a solution containing a photosensitive layer stabilizer for a predetermined period of time, or paper, cloth, felt, sponge, etc. impregnated with a solution containing a photosensitive layer stabilizer is wrapped around the photoreceptor. Any method can be used, such as allowing the photosensitive layer to stand for a predetermined period of time.In short, it is sufficient to bring the photosensitive layer stabilizer into contact with the photosensitive layer of one photoreceptor.
なお−処理時世は濃度や温度番こよって異なるため一義
的（こ定めることはでき１【いが、通常−１〜１２０分
に設定される。これは処理時間が短か過ぎると処理の効
果が期待できず、長くなると感光層自体が劣化したり、
経済性に欠けるからである。Note that the treatment time varies depending on the concentration and temperature, so it cannot be determined unambiguously (1), but it is usually set to -1 to 120 minutes.This means that if the treatment time is too short, the effect of the treatment will be cannot be expected, and if it becomes long, the photosensitive layer itself may deteriorate,
This is because it lacks economic efficiency.
以下一本発明の実施例について説明する。An embodiment of the present invention will be described below.
実施例１
公知の容量結合型グロー放電分解装置を用い、Ｓ ｉｌ
’ｉ４＝ Ｂ２１−１６−０２およびｌＩ２ガスを原料
ガスとし、水素で希釈した３０％ＳＩ Ｈ４ガスの流量
を３００ＳＣＣｎｌ−水素で希釈しり４００ Ｐ ＰＩ
３”２Ｈ６ガスノ流＊＋ ２３ ｓｃｃｍ ｉｃ設定１
，７ Ｂ２％、／ＳｉＨ４比カ１×１０−になるよう（
こし−史ζこＨ２ガスを２７７ｓｃｃｍ、０２ガスを１
．３５ｓｅｃｍの流量に設定し−これらの混合ガス、￥
装置の反応室に供給する。他方、反応室は真空装置によ
り貝空にしておき一円筒状基体が２ Ｄ （］ ”Ｃに
加熱された状態で、反応室向の圧力が１゜゛［０目にな
るように混合ガスの供給量を調節（−ガス流１１：およ
び圧力が安定化した後、高周波電源がら３００〜■の商
周波電力を供給し、前記基体を回転さぜつつその周面に
アモルファスシリコンからなる感光層を形成した。Example 1 Using a known capacitively coupled glow discharge decomposition device, S il
'i4 = 30% SI diluted with hydrogen using B21-16-02 and lI2 gas as raw material gas Flow rate of H4 gas diluted with hydrogen 300 SCCnl - 400 P PI
3” 2H6 gas flow *+ 23 sccm ic setting 1
,7 B2%, /SiH4 ratio so that it becomes 1 x 10- (
277 sccm of H2 gas, 1 of 02 gas
．． Set the flow rate to 35 sec - these mixed gases, ￥
Supply to the reaction chamber of the device. On the other hand, the reaction chamber was emptied using a vacuum device, and while the cylindrical substrate was heated to 2D(]"C, a mixed gas was supplied so that the pressure in the direction of the reaction chamber was 1°[0"). Adjust the amount (-Gas flow 11: and after the pressure is stabilized, supply a quotient frequency power of 300~■ from a high frequency power source, and form a photosensitive layer made of amorphous silicon on the circumferential surface of the substrate while rotating it. did.
このようにして１−だ感光体ドラムの半分（こ、４７％
の弗酸を誇浸させたろ紙を巻き付は一常温（こて１０分
間放ｉｉ’ｆ Ｌ、その後、洗浄−乾燥させて感光体ド
ラｌ＼と１．た。In this way, half of the photoreceptor drum (47%)
A filter paper impregnated with hydrofluoric acid was wrapped around the filter paper and left for 10 minutes at room temperature (with a trowel), then washed and dried, and then attached to the photoreceptor drum.
この感光体ドラムをｒｌｊ販の電モ写真複写機に組み込
み、温度３０℃、湿度８０％の雰囲気中にて複写したと
ころ、感光層安定化剤で処理した領域では良質ｆＳｌｌ
！ＩＪ像が得られたが、処理してない領域では画像が流
れてしまった。When this photoreceptor drum was installed in an electrophotographic copying machine sold by RLJ and copies were made in an atmosphere with a temperature of 30°C and a humidity of 80%, good quality fSll was obtained in the area treated with a photosensitive layer stabilizer.
! An IJ image was obtained, but the image blurred in unprocessed areas.
また、温度２０℃、湿度６０％の条件トで連続複写した
ところ一非処理領域の部分では］０００枚複写すると画
像が流れぼけてしまったが、処理陽酸の部分では２００
００枚複写Ｉ−でも画像の流れは生じなかった。Also, when I made continuous copies under the conditions of temperature 20°C and humidity 60%, the images were blurry after 1,000 copies in the non-treated area, but 200 copies in the treated anodic area.
Even when copying 00 sheets I-, no image flow occurred.
なお、前記のよう番こして得た感光体ドラムをＭｉＪ記
濃度の弗酸で常温にて１分間処理したところ、ソノ効果
が得られず、３０分以上′処理したところ、感光層が侵
食されほろぼろになった。また−２３％の弗酸では６０
分でも良好な結果が得られた。。When the photoreceptor drum obtained by the above-mentioned process was treated with hydrofluoric acid having a concentration of MiJ for 1 minute at room temperature, no solenoid effect was obtained, and when the photoreceptor drum was treated for more than 30 minutes, the photosensitive layer was eroded. I was devastated. In addition, -23% hydrofluoric acid has 60
Good results were obtained even in minutes. .
実施例２
実施例１と同様にして同局状基体表面多こ感光層を形成
し、これを６０％硝酸にて１分間処理した後、感光体ド
ラムとして複写機に組み込み一実施例１と同様（こテス
トしたところ一処理した領域では画像流れを生じること
がなかった。Example 2 A multilayer photosensitive layer was formed on the surface of the same localized substrate in the same manner as in Example 1, and after being treated with 60% nitric acid for 1 minute, it was incorporated into a copying machine as a photoreceptor drum. In this test, no image blurring occurred in the area that had been processed once.
発明の詳細
な説明したように、本発明によれは、簡単な処理で電子
写真用感光体の感光層を安定化でき、ｌ性お、Ｊ−び耐
刷性を菖しく向■−させることができる。As described in detail, according to the present invention, the photosensitive layer of an electrophotographic photoreceptor can be stabilized by simple processing, and the properties, printing durability, and printing durability can be greatly improved. Can be done.
特 コ１ 出 願 人 ミノ／ＬタＶメラオ矢氏会
付代 理 人 弁理士 青白 葆 ほか２名３９１−Special Co. 1 Applicant: Mino/Lta V Melaoya Clan Association Attorney Patent attorney Aohaku Ao and 2 others 391-
Claims (1)
する感光体の表面を一酸、オルガノハロゲンシラン、尚
級脂肪酸塩および高級アミンからなる群から選ばれた感
光層安定化剤で処理することを特徴とする感光体の改質
法。(1) The surface of a photoreceptor having a photoreceptor layer made of an amorphous optically exclusive material is treated with a photoreceptor layer stabilizer selected from the group consisting of monoacids, organohalogensilanes, higher fatty acid salts, and higher amines. A photoreceptor modification method characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4557483A JPS59170844A (en) | 1983-03-17 | 1983-03-17 | Reforming method of photosensitive body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4557483A JPS59170844A (en) | 1983-03-17 | 1983-03-17 | Reforming method of photosensitive body |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59170844A true JPS59170844A (en) | 1984-09-27 |
Family
ID=12723114
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4557483A Pending JPS59170844A (en) | 1983-03-17 | 1983-03-17 | Reforming method of photosensitive body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59170844A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6300028B1 (en) * | 1998-03-25 | 2001-10-09 | Coulter International Corp. | Environmentally stable amorphous silicon photoreceptor and method for making same |
-
1983
- 1983-03-17 JP JP4557483A patent/JPS59170844A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6300028B1 (en) * | 1998-03-25 | 2001-10-09 | Coulter International Corp. | Environmentally stable amorphous silicon photoreceptor and method for making same |
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