JPS59169039U - Coaxial cylindrical plasma CVD equipment - Google Patents
Coaxial cylindrical plasma CVD equipmentInfo
- Publication number
- JPS59169039U JPS59169039U JP6352483U JP6352483U JPS59169039U JP S59169039 U JPS59169039 U JP S59169039U JP 6352483 U JP6352483 U JP 6352483U JP 6352483 U JP6352483 U JP 6352483U JP S59169039 U JPS59169039 U JP S59169039U
- Authority
- JP
- Japan
- Prior art keywords
- plasma cvd
- coaxial cylindrical
- cylindrical plasma
- cvd equipment
- abstract
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図、第2図、第3図はそれぞれ従来のCVD装置を
示す概略図、第4図は本考案−実施例のCVD装置を示
す概略図である。
1、・・・陰極、2・・・グランド、3・・・基板、4
川磁界、5・・・電界、8・・・導体。FIGS. 1, 2, and 3 are schematic diagrams showing conventional CVD equipment, respectively, and FIG. 4 is a schematic diagram showing a CVD equipment according to an embodiment of the present invention. 1,...Cathode, 2...Ground, 3...Substrate, 4
River magnetic field, 5... electric field, 8... conductor.
Claims (1)
に電流を流す手段を備え、これにより円周方向の磁界を
生じさせることを特徴とする同軸円筒型プラズマCVD
装置。A coaxial cylindrical plasma CVD apparatus characterized by comprising means for flowing a current in the direction of the central axis, thereby generating a circumferential magnetic field.
Device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6352483U JPS59169039U (en) | 1983-04-27 | 1983-04-27 | Coaxial cylindrical plasma CVD equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6352483U JPS59169039U (en) | 1983-04-27 | 1983-04-27 | Coaxial cylindrical plasma CVD equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS59169039U true JPS59169039U (en) | 1984-11-12 |
Family
ID=30193708
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6352483U Pending JPS59169039U (en) | 1983-04-27 | 1983-04-27 | Coaxial cylindrical plasma CVD equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59169039U (en) |
-
1983
- 1983-04-27 JP JP6352483U patent/JPS59169039U/en active Pending
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