JPS59168449A - Photosensitive lithographic plate improved in safelight safety - Google Patents

Photosensitive lithographic plate improved in safelight safety

Info

Publication number
JPS59168449A
JPS59168449A JP4243683A JP4243683A JPS59168449A JP S59168449 A JPS59168449 A JP S59168449A JP 4243683 A JP4243683 A JP 4243683A JP 4243683 A JP4243683 A JP 4243683A JP S59168449 A JPS59168449 A JP S59168449A
Authority
JP
Japan
Prior art keywords
silver halide
photosensitive
layer
silver
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4243683A
Other languages
Japanese (ja)
Inventor
Shigeo Koizumi
滋夫 小泉
Toshimi Hirano
平野 利美
Keiichi Adachi
慶一 安達
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP4243683A priority Critical patent/JPS59168449A/en
Publication of JPS59168449A publication Critical patent/JPS59168449A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/06Silver salts

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To obtain the titled plate without increasing a load in a film dissolving step by forming a photosensitive silver halide emulsion layer contg. a negative photosensitive silver halide and a specified desensitizing dye on a support having a hydrophilic surface. CONSTITUTION:A support, such as an aluminum plate, having a hydrophilic surface is coated with a 0.1-5g/m<2> photopolymerizable compsn. composed of an addition-polymerizable unsatd. compd. and a photopolymn. initiator and dried to form a photosensitive nonsilver layer capable of forming an oleophilic image. A photosensitive silver halide emulsion layer is formed by coating this layer with a photosensitive silver halide emulsion contg. negative photosensitive silver halide sensitized up to 560nm wavelength and having 0.01-5mum average grain diameter, and a desensitizing dye having absorption on the side of wavelengths longer than the intrinsic wavelength of this silver halide, and its main absorption in 560-680nm. wavelengths, such as comps. of formulae I and II in an amt. of 1-10g/m<2>, and drying this emulsion.

Description

【発明の詳細な説明】 本発明は、ハロゲン化銀乳剤層を用いた高感度の感光性
平版印刷版において、黄な込し、赤色のセーフライトに
対して著しく安全性が改良された感光性平版印刷版に関
するもので、とくに高感度をもちながら、黄色ないし赤
色のセーフライトのもとて作業できるよう安全性が改良
された感光性平版印刷版に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides a high-sensitivity photosensitive lithographic printing plate using a silver halide emulsion layer, which has significantly improved safety against yellowing and red safelight. It relates to lithographic printing plates, and in particular to photosensitive lithographic printing plates that have high sensitivity and are improved in safety so that they can be worked under yellow or red safelights.

従来、ハロゲン化銀の感光性を利用した28版(Pre
sensitized Plateの略)は例えば特公
昭44−27242号、特公昭48−16725号、特
公昭48−30562号、米国特許第4221858号
、同4173477号、同5086097号、I南51
61508号、同3721559号および同、5,14
6,104号などに知られている。
Conventionally, the 28th edition (Pre
Sensitized Plate) is, for example, Japanese Patent Publication No. 44-27242, Japanese Patent Publication No. 16725-1982, Japanese Patent Publication No. 30562-1982, U.S. Patent No. 4221858, U.S. Patent No. 4173477, U.S. Pat.
61508, 3721559 and 5,14
6,104, etc.

さらにそれらを改良した28版として例えば、特公昭4
6−26521号、特開昭54.27804号、西独特
許公開(OLS)2517711号、同2640766
号などが知られCいる。またさらに改良されたPS版と
して例えば、米国特許6゜245.793号、米国防衛
特許出願T870022号や特公昭47−23721号
などが知られている。また耐刷性、感脂性や画像の再現
性などを改良するために、親水性アルεニウム支持体の
上に非銀感光層を設けその上に直接的にハロゲン化銀を
含有する感光層を設けたPS版が米国特許第42686
09号、同第4299912号などで知られて17)る
Furthermore, as the 28th edition that improved them, for example,
6-26521, Japanese Patent Application Publication No. 54.27804, West German Patent Publication (OLS) No. 2517711, OLS No. 2640766
The number etc. are known. Furthermore, further improved PS versions are known, such as US Pat. In addition, in order to improve printing durability, oil sensitivity, and image reproducibility, a non-silver photosensitive layer is provided on the hydrophilic aluminum support, and a photosensitive layer containing silver halide is directly applied on top of the non-silver photosensitive layer. The PS version created is US Patent No. 42686.
No. 09, No. 4299912, etc.17).

これらの感光性ハロゲン化銀を用いたPS版は高感度を
有するが、一方では現像前の製版作業時に該ハロゲン化
銀感光層の感光波長域の光に曝光するとかぶりを生じた
り、又前述の感光波長域の感度に比べ一でその感度が1
/10以下であり、実質的に感度がない、より長波の感
光域の光によっても副露光効果により増感等の影響を及
ぼすため、黄ないし赤色の暗いセーフライト下で取扱わ
ねばならないという欠点があった。
PS plates using these photosensitive silver halides have high sensitivity, but on the other hand, when exposed to light in the photosensitive wavelength range of the silver halide photosensitive layer during plate-making work before development, fogging may occur, and the above-mentioned problems may occur. The sensitivity is 1 compared to the sensitivity of the photosensitive wavelength range.
/10 or less, so there is virtually no sensitivity, and even light in the longer wavelength photosensitive range causes sensitization due to the sub-exposure effect, so it has the disadvantage of having to be handled under a dark yellow or red safelight. there were.

この欠点を解消させる方法として該ハロゲン化銀感光層
の上に副露光効果を与える長波光をカットする様なフィ
ルタ一層を設けることがフィルム記録材料では一般的に
用いられている。しかしながらフィルタ一層を設けるこ
とは製造工程を複雑にするばかりではなく製造コスト高
となる点で好ましくない。更には、例えば特開昭55−
166645号に示されている複合型PS版においては
フィルタ一層の存在は溶脱工程の負担増大につな嬶 かり、溶脱不良を起こせる場合が多々ある。
As a method of overcoming this drawback, it is generally used in film recording materials to provide a single filter layer on the silver halide photosensitive layer for cutting off long wavelength light that produces a sub-exposure effect. However, providing a single filter layer is not preferable because it not only complicates the manufacturing process but also increases manufacturing costs. Furthermore, for example, JP-A-55-
In the composite PS plate shown in No. 166645, the presence of one filter increases the burden of the leaching process, and often causes defective leaching.

従って本発明゛の目的は層構成を複雑にしないで、更に
は複合型PS版にあっては溶脱工程の負担を増大するこ
となくセーフライトに対する安全性が改良された感光性
平版印刷版を提供することにある。
Therefore, an object of the present invention is to provide a photosensitive lithographic printing plate with improved safety against safelight without complicating the layer structure and, in the case of composite PS plates, without increasing the burden of the leaching process. It's about doing.

本発明者らは上記のような事情に鑑み種々検討を重ねた
結果、親水′性表面を有する支持体上に感光性ハロゲン
化銀乳剤層か又は親油性画像を形成し得る非銀感光層と
感光性ハロゲン化銀乳剤層とをこの順に設けてなる感光
性平版印刷版にお−で、ネガ感光性ハロゲン化銀ととも
に、該ノ・ロゲン化優の固有波長より長波長側に吸収を
有する減感性染料を共存させることにより上記の目的が
達成されることを見出した。
The inventors of the present invention have conducted various studies in view of the above circumstances, and have found that a photosensitive silver halide emulsion layer or a non-silver photosensitive layer capable of forming a lipophilic image on a support having a hydrophilic surface has been developed. A photosensitive lithographic printing plate having a photosensitive silver halide emulsion layer provided in this order is coated with a negative light-sensitive silver halide emulsion layer and a light-sensitive silver halide emulsion layer having an absorption on the longer wavelength side than the characteristic wavelength of the silver halide emulsion layer. It has been found that the above object can be achieved by coexisting a sensitive dye.

上記、本発明の好ましい態様によれば、/・ロゲン化銀
が普々560nmまで増感されており、と。
According to the preferred embodiment of the present invention, the silver halide is usually sensitized to 560 nm.

れと共存させる減感性染料が560nm〜680nmに
主吸収を有しCおり、黄ないし赤色光のセーフライトに
対する安全性が改良された感光性平版印刷版が提供され
る。
A desensitizing dye coexisting therewith has main absorption at 560 nm to 680 nm, and a photosensitive lithographic printing plate with improved safety against yellow to red safelight is provided.

本発明の特徴は、感光性ノ・ロゲン化銀乳剤層中に、ネ
ガ型ハロゲン化銀とともに、該710ゲン化銀の固有感
度波長より長波長側に吸収を有し、且つ減感性を示す染
料を共存することにある。
A feature of the present invention is that the photosensitive silver halide emulsion layer contains, together with negative-working silver halide, a dye that has absorption at a wavelength longer than the intrinsic sensitivity wavelength of the 710 silver halide and exhibits desensitization properties. The goal is to coexist.

以下、本発明の詳細な説明する。The present invention will be explained in detail below.

本発明における減感性とは減感性染料を添加した平版印
刷材料の画像形成感度が減感性染料を添加しない以外は
同一の平版印刷材料の感度より1ogE(但し、Eは露
光量を示す。)で0.02〜1好ましくは0.05〜0
.4低感となるものをいい、実施例−1に記した方法に
より確認できる。
Desensitization in the present invention means that the image forming sensitivity of a lithographic printing material to which a desensitizing dye has been added is 1 ogE (where E indicates the exposure amount) compared to the sensitivity of the same lithographic printing material except that no desensitizing dye has been added. 0.02-1 preferably 0.05-0
.. 4. This refers to a feeling of low sensation, which can be confirmed by the method described in Example-1.

本発明に用いる減感性染料はs6onmないし680n
mに主吸収をもつものが用いられ、好ましい染料類とし
てはトリフェニルメタン類、アントラキノン類、アゾ類
、オキンノール類、ピラゾロンアゾメチン類、インドフ
ェノール類、フタロシアニン類などから選ばれる。この
種の減感性染料は、従来よシ種々のものが知られておシ
、これらは本発明において好適に使用できるが、以下に
特に好ましい具体例をあげる。勿論、これに限定される
ものではない。
The desensitizing dye used in the present invention is from s6onm to 680n.
Dyes having main absorption in m are used, and preferred dyes are selected from triphenylmethanes, anthraquinones, azos, oquinoles, pyrazolone azomethines, indophenols, phthalocyanines, and the like. Various types of desensitizing dyes of this kind have been known in the past, and these can be suitably used in the present invention, but particularly preferred specific examples will be given below. Of course, it is not limited to this.

1、 オリエントソルブルブ化−0BB(オリエント社
)λmax     61[]nm 2、 パテントブルー AFX (ヘキスト社)λma
x    656nm 6、  リオノールブルー GSF−1(東洋インキ製
造)λmax  667.666nm 4、スミノールロイエリングプルー AGG(住友化学
)λmax λmax  612nm 8゜ λmax  617nm /ゝCH2CH2CH25o3K )i3に れらの染料は前記の如く感光性ノ・ロゲン化銀の副露光
効果による影響を防ぐものであるから単独で上記目的を
達成し得ない場合には、2種以上の染料を組合わせて使
用される。又ネガ感光性ノ・ロゲン化銀乳剤が特定され
れば、これら染料の添加量は簡単な実験を行うことによ
り容易に決定することかできる。
1. Orient Solving - 0BB (Orient) λmax 61 [] nm 2. Patent Blue AFX (Hoechst) λmax
x 656nm 6, Lionol Blue GSF-1 (Toyo Ink Manufacturing) λmax 667.666nm 4, Suminol Royering Blue AGG (Sumitomo Chemical) λmax λmax 612nm 8゜λmax 617nm /ゝCH2CH2CH25o3K) These dyes in i3 are as described above. The purpose of this is to prevent the influence of the sub-exposure effect of photosensitive silver halogenide, so if the above object cannot be achieved alone, two or more types of dyes are used in combination. If a negative light-sensitive silver halide emulsion is specified, the amount of these dyes to be added can be easily determined by simple experiments.

次に本発明の感光性平版印刷劇構成要素につい°C説明
する。本発明に使用される支持体は、親水性表面をもつ
支持体で、平版印刷版とし°C用いられる何れの支持体
でもよいが、特に好ましいものはアルミニウム板であり
、その表面は砂目立て処理、例えば珪酸ソーダ、弗化ジ
ルコニウム酸カリウム、燐酸塩などの水溶液による化成
処理、寸たは陽1@酸化処理などの表面処理の施されて
いることが好ましい。
Next, the photosensitive lithographic printing component of the present invention will be explained. The support used in the present invention has a hydrophilic surface and may be any support used as a lithographic printing plate at °C, but particularly preferred is an aluminum plate, the surface of which is grained. For example, surface treatment such as chemical conversion treatment using an aqueous solution of sodium silicate, potassium fluorozirconate, or phosphate, or oxidation treatment is preferably performed.

このような支持体上に設けられる、親油性画像を形成し
うる非銀感光層としては感光性平版印刷版(Pre−8
ensitized Plate と呼ばれ、28版と
略称されている。)に好適な感光層が含まれる。ここで
上記の「親油性」とけ、印刷時に使用される湿し水を弾
き、油性インクを受容する性質を意味する。このような
非銀感光層の具体的な組成物としては、ジアゾ樹脂から
なるもの、〇−キノンジアジド化合物からなるもの、感
光性アジド化合物からなるもの、重合体の主鎖又は側鎖
に−CH=、CH−C−基を含む高分子化合物からなる
もの、付加重合性不飽和化合物と光開始剤とからなる光
重合性組成物などが挙げられ、いずれもこの分野で良く
知られた組成物である。これらの組成物の更なる詳細は
、例えば米国特許第4゜299.912号に記載されて
いる。これらの組成物は、適当な溶剤の溶液から支持体
上に塗布され、乾燥後の重量で約0.1 y / mか
ら約5 y / mとなるように設けられる。
A photosensitive lithographic printing plate (Pre-8
It is called the Ensitized Plate and is abbreviated as the 28th edition. ) includes a suitable photosensitive layer. Here, the above-mentioned "oleophilicity" refers to the property of repelling dampening water used during printing and accepting oil-based ink. Specific compositions of such a non-silver photosensitive layer include those consisting of a diazo resin, those consisting of a 〇-quinonediazide compound, those consisting of a photosensitive azide compound, and those containing -CH= in the main chain or side chain of the polymer. , those made of polymeric compounds containing CH-C- groups, and photopolymerizable compositions made of addition-polymerizable unsaturated compounds and photoinitiators, all of which are well-known compositions in this field. be. Further details of these compositions are described, for example, in US Pat. No. 4,299,912. These compositions are coated onto a support from a solution in a suitable solvent and provided at a dry weight of about 0.1 y/m to about 5 y/m.

本発明に用すられるハロゲン化銀含有感光層は特開昭5
5−166645号、特開昭56−14269号き開昭
56−50330号の各公報などに記載されたようなも
のが用いられる。感光性710グン化銀乳剤はネガ型の
乳剤でノ・ロゲン化銀は通常用(八られる塩化銀、臭化
銀、よう化銀またはその混合ハロゲン化銀を使用できる
。その平均粒子径は0.01ないし経5μが好ましい。
The silver halide-containing photosensitive layer used in the present invention is
Those described in JP-A-5-166645, JP-A-56-14269 and JP-A-56-50330 are used. The photosensitive 710 silver halide emulsion is a negative type emulsion, and silver chloride, silver bromide, silver iodide, or a mixed silver halide thereof can be used.The average grain size is 0. A diameter of .01 to 5μ is preferred.

この粒子は、適切な感度になるように例えば硫黄増感、
還元増感、工r、Rh、Ptなどの貴金属の塩による増
感などの化学増感、増感色素による分光増感をほどこす
ことができる。表面潜像型や内部潜像型の潜像分布をも
ついずれの粒子でもよい。これに通常用いられる添加剤
を加えることができる。
The particles may be sensitized by e.g. sulfur to achieve appropriate sensitivity.
Chemical sensitization such as reduction sensitization, sensitization with salts of noble metals such as Rh, Rh, and Pt, and spectral sensitization using sensitizing dyes can be performed. Any particle having a surface latent image type or internal latent image type latent image distribution may be used. Commonly used additives can be added to this.

感光性ハロゲン化銀乳剤には、オ・rル状、ワックス状
または樹脂状の親油性化合物を微細粒子状に分散含有さ
せておくことが好ましく、この点につい゛〔は米国特許
第4,268,609号に詳しく説明され′Cいる。
It is preferable that the photosensitive silver halide emulsion contains an oil-like, wax-like, or resin-like lipophilic compound dispersed in the form of fine particles. , No. 609.

これらの感光性ハロゲン化銀乳剤層は、約1ないし10
y/i好ましくは2ないし6 y / mの乾燥量で塗
布することができる。塗布はディップ、エアーナイフ、
カーテンなどの塗布法また例えば米国特許第2,681
,294号に記載のホツ7ξ−塗布法、エクストルージ
ョン塗布法を適用できる。
These light-sensitive silver halide emulsion layers have a density of about 1 to 10
It can be applied in a dry amount of y/i preferably from 2 to 6 y/m. Application is done by dip, air knife,
Coating methods such as curtains also e.g. U.S. Pat. No. 2,681
, 7ξ-coating method and extrusion coating method described in No. 294 can be applied.

本発明による感光性平版印刷版を用いて平版印刷版を作
る方法及び処理は次のようである。先ず像露光し、ハロ
ゲン化銀を含有する感光層中のハロゲン化銀に潜像−を
形成せしめる。次にハロゲン化銀の現像(第1現像)を
行い、而ちにまたは定着液で処理するかの何れかの工程
を経て紫外線を含む活性光線に曝光させ、次いでゼラチ
ンハロゲン化銀乳剤層を洗い出した後、第2現像に送ら
れ非銀感光層の、非画線部のみ溶解除去して支持体の親
水性表面を露出させ刷版をうる工程である。
The method and process for making a lithographic printing plate using the photosensitive lithographic printing plate according to the present invention are as follows. First, imagewise exposure is performed to form a latent image on the silver halide in the photosensitive layer containing silver halide. Next, the silver halide is developed (first development), and then exposed to active light including ultraviolet rays through a process of treatment with a fixing solution, and then the gelatin silver halide emulsion layer is washed out. After that, the support is sent to a second development stage where only the non-image areas of the non-silver photosensitive layer are dissolved and removed to expose the hydrophilic surface of the support to obtain a printing plate.

この場合第2現像に使用される処理液は非銀感光層の非
画像部のみ撰択的に溶解するような処理液が必要で、と
くに通常の非銀感光層を有する28版の現像に用いられ
ている現像液またはそれに類似の現像液の中から撰ぶこ
とができる。例えば、非銀感光層が0−キノンジアジド
化合物からなる層である場合には、珪酸ナトリウムの水
溶液や、米国特許第4,141,733号に記されてい
るような現像液が使用される。
In this case, the processing solution used for the second development needs to be such that it selectively dissolves only the non-image areas of the non-silver photosensitive layer, and is particularly suitable for developing the 28 plate which has a normal non-silver photosensitive layer. The developer can be selected from among the developer solutions listed above or similar developers. For example, when the non-silver photosensitive layer is a layer made of an 0-quinonediazide compound, an aqueous solution of sodium silicate or a developer as described in US Pat. No. 4,141,733 is used.

以下実施例によって本発明の内容を具体的に説明する。The content of the present invention will be explained in detail below using Examples.

なお、チは重量%を示すものとする。Note that ``chi'' indicates weight %.

実施例1゜ 特開昭48−43911号の方法によシ機械的に砂目室
てされた2S材アルミニウム板を40℃に保たれた2%
の水酸化ナトリウム水溶液に1分間浸漬し表面の一部を
腐蝕した。水洗後、硫酸−クロム酸溶液に約1分間浸漬
して純アルミニウムの表面を露呈した。60℃に保たれ
た20%硫酸に浸漬し、電流電圧1.5V、電流密度3
 A / drn”の条件下で2分間陽極酸化処理を行
った後、水洗、乾燥した。次に下記組成の感光液を乾燥
重量が21yゴ位になるようエクストルージョン型ギー
サーを用いて連続的に塗布を行った。
Example 1゜A 2S material aluminum plate mechanically grained by the method of JP-A No. 48-43911 was heated to 2% at 40°C.
It was immersed in an aqueous sodium hydroxide solution for 1 minute to corrode a part of the surface. After washing with water, it was immersed in a sulfuric acid-chromic acid solution for about 1 minute to expose the pure aluminum surface. Immersed in 20% sulfuric acid kept at 60°C, current voltage 1.5V, current density 3
After anodizing for 2 minutes under the condition of ``A/drn'', it was washed with water and dried.Next, a photosensitive solution with the following composition was continuously applied using an extrusion type Giesser so that the dry weight was about 21y. I applied the coating.

アセトン−ピロガロール樹脂のナフ トキノン−1,2−ジアジド(2)−5−スルホン酸エ
ステル(合成法は米 国特許3,635,709号明細書実施例1の方法によ
る)        ・・・2.5′iPクレゾールホ
ルムアルデヒド樹脂      ・・・5.0?メチル
エチルケトン        ・・・75y−シクロヘ
キザノン         ・・・6C1別に沃臭化銀
乳剤を次のようにして調製した。
Naphthoquinone-1,2-diazide(2)-5-sulfonic acid ester of acetone-pyrogallol resin (synthesis method is according to the method of Example 1 of US Pat. No. 3,635,709)...2.5'iP Cresol formaldehyde resin...5.0? Methyl ethyl ketone...75y-cyclohexanone...6C1 Separate silver iodobromide emulsions were prepared as follows.

50℃に保ったゼラチン水溶液中に硝酸銀水溶液と臭化
カリ水溶液を同時に50分間で攪拌しながら加えてその
間pAg を79にコントロールすることによシ平均粒
子径0.25μの臭化銀乳剤をえた。この乳剤は可溶性
塩類を常法により除去したのち、臭化銀1モル当シ46
rvのチオ硫酸ナトリウムを加えて60℃で60分間化
学熟成した。次に0.4モルチ相当量の沃化カリウムを
加えて沃臭化銀乳剤をえた。この乳剤は沃臭化銀1モル
当り、701のゼラチンを富み、乳剤1KfI当1.8
5モルの沃臭化銀を含んでいた。
A silver bromide emulsion with an average grain size of 0.25 μm was obtained by adding a silver nitrate aqueous solution and a potassium bromide aqueous solution to an aqueous gelatin solution kept at 50° C. while stirring simultaneously for 50 minutes, and controlling the pAg at 79 during that time. . After removing soluble salts by a conventional method, this emulsion was prepared with 46 mg/mole of silver bromide.
RV sodium thiosulfate was added and chemically aged at 60°C for 60 minutes. Next, potassium iodide in an amount equivalent to 0.4 molty was added to obtain a silver iodobromide emulsion. This emulsion is enriched with 701 gelatin per mole of silver iodobromide and 1.8 per KfI of emulsion.
It contained 5 moles of silver iodobromide.

フェノールホルムアルデヒド樹脂MP120HH(群栄
化学工業■製)の459−を酢酸エチル660?とメチ
ルエチルクトン120y−との混液にとかしゼラチン1
0チ水溶液6DOyd中にノニルベンゼンスルホン酸ナ
トリウム10%溶液を60ゴとロート油の10%メタノ
ール溶液の15.0−を混えた溶液を分散した乳化物・
・−13005’ 1.6−ジニチルー5−C2−(3−(3−スルホプロ
ピル)ベンズオキサゾール−2−イリデン)エチリデン
〕チオヒダントインナトリウム塩の0.1チメタノール
溶液 ・・・100m1 4−ヒドロキシ−6−メチル−1,3,3a。
Ethyl acetate 660?459 of phenol formaldehyde resin MP120HH (Gunei Chemical Industry ■) and methyl ethyl lactone 120y- dissolved in a mixture of gelatin 1
An emulsion prepared by dispersing a solution of 10% sodium nonylbenzenesulfonate solution mixed with 15.0% of a 10% methanol solution of funnel oil in 60yd of an aqueous solution.
・-13005' 0.1 timethanol solution of 1.6-dinityl-5-C2-(3-(3-sulfopropyl)benzoxazol-2-ylidene)ethylidene]thiohydantoin sodium salt...100ml 4-hydroxy- 6-methyl-1,3,3a.

7−チトラザインデンの0.5%アルカリ水溶液・・・
20〇− 光層の上に乾燥重量が4y−/ゴになるように連結塗布
して最終温度が110℃の熱風で乾燥し試料Pをえた。
7 - 0.5% alkaline aqueous solution of chitrazaindene...
Sample P was obtained by coating on the 200-light layer so that the dry weight was 4y/g and drying with hot air at a final temperature of 110°C.

又、前記完成乳剤Aに オリエントンルプルブルー(オリエント社製)の2チ水
溶液           ・・・90m1を加えて得
た完成乳剤BをAと同様の方法で非銀感光層の上に塗布
乾燥し試料Qを得た。
Further, finished emulsion B obtained by adding 90 ml of a 2-water solution of Orienton Lupul Blue (manufactured by Orient Co., Ltd.) to the finished emulsion A was coated and dried on the non-silver photosensitive layer in the same manner as A, and a sample was prepared. I got Q.

試料P、Qを室温に一週間放置した後、センシトメトリ
ー用階段ウェッジを撮影した後、自現機を用いて次の処
理を施した。下記の組成の現像液(1)を62℃で20
秒間通しだ後、下記の組成の定着液(1)を室温で10
秒間通しだ。続いてレフレクタ−型水銀灯3ケからなる
紫外線曝光部を15秒間かけとおし、洗い出し部で40
〜45℃の温湯につけてブラシでとすシ、スクイズロー
ラーを経て下記の組成の現像液(If)で60℃で30
秒間とおし、富士写真フィルム■製ガムコーター800
Gを用い、FPを塗シ刷版を得た。
After samples P and Q were left at room temperature for one week, a step wedge for sensitometry was photographed, and then the following processing was performed using an automatic processor. Developing solution (1) with the following composition was heated at 62℃ for 20 minutes.
After passing for a second, fixer solution (1) with the following composition was added for 10 minutes at room temperature.
It lasts for seconds. Next, an ultraviolet exposure section consisting of three reflector-type mercury lamps was applied for 15 seconds, and the washing section
Soak in ~45°C warm water, remove with a brush, use a squeeze roller, and then use a developer (If) with the following composition at 60°C for 30 minutes.
Gum coater 800 manufactured by Fuji Photo Film ■
Using G, a FP coating plate was obtained.

現像液(1)の組成 水                    −700
1nlメトール            ・・・ 6、
Oy−亜硫酸ナトリウム         ・・・45
.O?ハイドロキノン          ・・・12
.0y−炭酸ナトリウム(1水塩)    ・・・8[
3,[3?臭化カリウム           ・・・
  2.P水を加えて           1tとす
るこの原液を水で(1: 2 ’)に希釈して用いる。
Composition water of developer (1) -700
1nl metol...6,
Oy-Sodium sulfite...45
.. O? Hydroquinone...12
.. 0y-Sodium carbonate (monohydrate)...8[
3, [3? Potassium bromide...
2. This stock solution, made up to 1 t by adding P water, is diluted with water (1:2') and used.

現像液(If) J工S1号珪酸ナトリウム    ・・・100y−メ
タ珪酸ナトリウム         ・・・5(1純水
            ・・−180[]y定着液(
1) 水                    −700
mlチオ硫酸アンモニウム      ・・・224f
!−亜硫酸ナトリウム        ・・・ 21水
を加えて       ・・・1000ζ昧する試料P
、Qから得た刷版を比較した所、QはPよ1) 1ag
E (露光量の対数)で0.1減感していることが認め
られた。
Developer (If) J Engineering S1 Sodium silicate...100y-sodium metasilicate...5(1) Pure water...-180[]y Fixer (
1) Water -700
ml ammonium thiosulfate...224f
! - Sodium sulfite... 21 Add water to... 1000 ml of sample P
, when comparing the printing plates obtained from Q, Q is P 1) 1ag
A desensitization of 0.1 in E (logarithm of exposure amount) was observed.

そこで前記完成乳剤Bの1,6ジエチルー5−[2−(
3−スルホプロピル)ペンズオキザゾールー2−イリデ
ン)エチリデンコチオヒダントインナトリウム塩の0.
1%メタノール溶液を200−に増量してこの減感分を
補正した乳剤Cを、乳剤A、Bと同様の方法で非銀感光
層の上に塗布。
Therefore, the 1,6 diethyl-5-[2-(
0.3-sulfopropyl)penzoxazole-2-ylidene)ethylidenecothiohydantoin sodium salt.
Emulsion C, which corrected this desensitization by increasing the amount of 1% methanol solution to 200 -, was coated on the non-silver sensitive layer in the same manner as emulsions A and B.

乾燥し試料Rを得だ。Sample R was obtained by drying.

試料Rを呈温に一週間放置した後、1/2に裁断し、そ
れぞれをR1,R2とする。又同時に試別Pも1/2に
裁断しpl、p2とする。これら4枚の試料を次のよう
に製版した。
After leaving the sample R at the same temperature for one week, it was cut into 1/2 pieces and designated as R1 and R2, respectively. At the same time, the sample P is also cut into 1/2 and designated as pl and p2. These four samples were made into plates as follows.

Pl、R1は560 nmよシ短波長の光をカットした
橙黄色のセーフライト光(富士フィルム■製s2cセー
フライト1枚を用いて560 nmよシ短波長の光をカ
ット)に20ルツクスの照度で60分間全面曝光した。
Pl and R1 are orange-yellow safelight light that cuts out light with wavelengths as short as 560 nm (using one S2C safelight made by Fuji Film ■ to cut out light with wavelengths as short as 560 nm) and an illuminance of 20 lux. The entire surface was exposed to light for 60 minutes.

このあとセーフライト光に曝光していない試料P2.R
2とともに約115に縮少されて文字画線を撮影されて
得た透明ネガフィルムを600ルツクスの光源をもつ引
伸し機を用いて5倍拡大で15秒間、試料p1.p2゜
R1,R2それぞれに露光した。次に自現機を用いて前
記試料Qと同じ処理を施し4枚の印刷版P1 、P2.
R1、R2を得た。
Sample P2 which was not exposed to safelight light after this. R
Sample p1. Exposure was carried out at p2°R1 and R2, respectively. Next, using an automatic processor, the same treatment as the sample Q was applied to produce four printing plates P1, P2.
R1 and R2 were obtained.

これら4枚の印刷版で印刷機ハイデルKORを用いて印
刷し、印刷物の画質を調べたところ次の実施例2 実施例1に準じて砂目立てされ、陽極酸化処理を行なっ
たアルミニウム支持体の上に実施例1に準じて非銀感光
層を設けたこの上に次の完成乳剤Cを乾燥重量が4’i
/m”になるように連結塗布する。
These four printing plates were printed using a Heidel KOR printing machine, and the image quality of the printed matter was examined. A non-silver photosensitive layer was provided in accordance with Example 1, and the following finished emulsion C was added thereon to a dry weight of 4'i.
/m”.

フェノールホルムアルデヒド樹脂M p−120HH(
群栄化学工業■製)の451とジオクチルアジペートを
酢酸エチル660y″とメチルエチルケトン1201と
の混液に溶かし、ゼラチン10% 水溶液60 Ome
中に、ノニールベンゼンスルホン酸ナトリウム10ql
)溶液を60ゴとロート油の10%メタノール溶液の1
50m1を混えた溶液に分散した乳化物       
 ・・・・・・130(1塩臭化銀ゼラチン乳剤(Ct
 −70モル%、Br−60モル係の塩臭化銀、平均粒
子径・・・0.28μ乳剤l Ky当クシゼラチン55
?ハロゲン化銀085モル含有)       ・・・
・・・20005’1.3−tエチル−5−[2−(3
−(3−スルホプロピル)ベンズオキサゾール−2−イ
リデン)エチリデンコチオヒダントインナトリウム塩の
0.1%メタノール溶液      ・・・・・・10
0rnl。
Phenol formaldehyde resin M p-120HH (
451 (manufactured by Gunei Chemical Industry ■) and dioctyl adipate were dissolved in a mixture of ethyl acetate 660y'' and methyl ethyl ketone 1201 to make a 10% gelatin aqueous solution 60 Ome.
Inside, 10ql of sodium nonylbenzenesulfonate
) 60% solution of 10% methanol solution of funnel oil
Emulsion dispersed in a solution mixed with 50ml
...130 (silver chlorobromide gelatin emulsion (Ct
-70 mol%, Br-60 mol of silver chlorobromide, average grain size...0.28μ emulsion l Ky, comb gelatin 55
? Contains 085 moles of silver halide)...
...20005'1.3-tethyl-5-[2-(3
-(3-sulfopropyl)benzoxazol-2-ylidene)ethylidenecothiohydantoin sodium salt 0.1% methanol solution 10
0rnl.

4−ヒドロキシ−6−メチル−1,3z3aj7−チト
ラザインデンの0.5係アルカリ水溶液・・・・・・2
001n1 2.4”−ジクロロ−6−ヒドロキシ−8−トリアジン
の2%水溶液        ・・・・・・70d最終
温度が110℃の熱風で乾燥し試料Sをえた。又、前記
乳剤りの1,3−ジエチル−5−[2−13−(S−ス
ルホプロピル)ベンズオキサゾール−2−イリデン)エ
チリデンコチオヒダントインナトリウム塩の0,1%メ
タノール溶液を200艷に増量し、更にスミノールロイ
エリングプルーAGG (住友化学製)の1%水溶液・
・・・・・9〇− を加えて得た完成乳剤EをDと同様な方法で非銀感光層
の上に塗布乾燥し試料Tを得だ。
0.5 aqueous alkaline solution of 4-hydroxy-6-methyl-1,3z3aj7-chitrazaindene...2
001n1 2% aqueous solution of 2.4"-dichloro-6-hydroxy-8-triazine...70d Dry with hot air at a final temperature of 110°C to obtain sample S. Also, sample S was obtained from the emulsion 1 and 3 of the above emulsion. - The amount of 0.1% methanol solution of diethyl-5-[2-13-(S-sulfopropyl)benzoxazol-2-ylidene)ethylidene cothiohydantoin sodium salt was increased to 200 μg, and Suminol Royering Plug AGG (manufactured by Sumitomo Chemical) 1% aqueous solution
A finished emulsion E obtained by adding ...90- was coated on a non-silver photosensitive layer in the same manner as D and dried to obtain sample T.

試料S、Tを室温に一週間放置した後、それぞれの資料
を1/2に裁断し81.S2.TI、T2とする。これ
ら2対の資料を実施例1に准じて次のように製版した。
After leaving samples S and T at room temperature for one week, each material was cut into 1/2 pieces and 81. S2. Let TI be T2. These two pairs of materials were made into plates according to Example 1 as follows.

si、’riは560℃mより短波長の光をカットした
橙色のセーフライト光に20フレツクスの照度で60分
間全面曝光した。このあとセーフライト光に曜光してい
ない資料82.T2とともに約115に縮小されて文字
画線を撮影されて得た透明ネガフィルムを600ルツク
スの光源をもつ引伸し機を用いて5倍拡大で10秒間試
試料1.s2、T1.T2それぞれに露光した。次に実
施例1と同じ現像処理を施し印刷版を得た。
si and 'ri were completely exposed to orange safelight light, which cuts out light with a wavelength shorter than 560°C, at an illuminance of 20 flex for 60 minutes. After this, document 82 that is not illuminated by safelight light. A transparent negative film obtained by reducing the size to about 115 with T2 and photographing the character lines was enlarged 5 times using an enlarger with a 600 lux light source for 10 seconds as a test sample 1. s2, T1. Each was exposed to T2. Next, the same development treatment as in Example 1 was performed to obtain a printing plate.

これら4枚の印刷版で印刷機・・イデルKORを用いて
印刷し、印刷物の画質を調べたところ、次のような結果
となった。
When these four printing plates were printed using an Idel KOR printing machine and the image quality of the printed matter was examined, the following results were obtained.

Claims (1)

【特許請求の範囲】 1)親水性表面を有する支持体の上に感光性ハロゲン化
銀乳剤層か又は親油性画像を形成し得る非銀感光層と感
光性ハロゲン化銀乳剤層とをこの順に有する感光性平版
印刷版において、ネガ感光性ハロゲン化銀とともに、該
ハロゲン化銀の固有感光波長より長波長側に吸収を有す
る減感性染料を共存さ、せたことを特徴とする該ハロゲ
ン化銀の固有感光波長より長波長のセーフライトに対す
る安全性が改良された感光性平版印刷版。 2)ハロゲン化銀が高々約560nmまで増感されてお
り、該ハロゲン化銀と共存させる減感性染料が560n
m〜680nmに主吸収を有する黄ないし赤色光のセー
フライトに対する安全性が改良された特許請求の範囲第
1)項に記載の感光性平版印刷版。
[Claims] 1) A photosensitive silver halide emulsion layer or a non-silver photosensitive layer capable of forming a lipophilic image and a photosensitive silver halide emulsion layer on a support having a hydrophilic surface in this order. In the photosensitive lithographic printing plate comprising the negative photosensitive silver halide, a desensitizing dye having absorption at a wavelength longer than the intrinsic sensitivity wavelength of the silver halide is co-presented. A photosensitive lithographic printing plate with improved safety against safelight with wavelengths longer than the specific photosensitive wavelength of . 2) The silver halide is sensitized to at most about 560 nm, and the desensitizing dye coexisting with the silver halide is sensitized to about 560 nm.
The photosensitive lithographic printing plate according to claim 1, which has improved safety against safelight of yellow to red light having main absorption in the wavelength range of m to 680 nm.
JP4243683A 1983-03-16 1983-03-16 Photosensitive lithographic plate improved in safelight safety Pending JPS59168449A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4243683A JPS59168449A (en) 1983-03-16 1983-03-16 Photosensitive lithographic plate improved in safelight safety

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4243683A JPS59168449A (en) 1983-03-16 1983-03-16 Photosensitive lithographic plate improved in safelight safety

Publications (1)

Publication Number Publication Date
JPS59168449A true JPS59168449A (en) 1984-09-22

Family

ID=12636014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4243683A Pending JPS59168449A (en) 1983-03-16 1983-03-16 Photosensitive lithographic plate improved in safelight safety

Country Status (1)

Country Link
JP (1) JPS59168449A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5948574A (en) * 1988-11-22 1999-09-07 Hitachi, Ltd. Mask for manufacturing semiconductor device and method of manufacture thereof

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5948574A (en) * 1988-11-22 1999-09-07 Hitachi, Ltd. Mask for manufacturing semiconductor device and method of manufacture thereof
US6106981A (en) * 1988-11-22 2000-08-22 Hitachi, Ltd. Mask for manufacturing semiconductor device and method of manufacture thereof
US6420075B1 (en) 1988-11-22 2002-07-16 Hitachi, Ltd. Mask for manufacturing semiconductor device and method of manufacture thereof
US6458497B2 (en) 1988-11-22 2002-10-01 Hitachi, Ltd. Mask for manufacturing semiconductor device and method of manufacture thereof
US6548213B2 (en) 1988-11-22 2003-04-15 Hitachi, Ltd. Mask for manufacturing semiconductor device and method of manufacture thereof
US6733933B2 (en) 1988-11-22 2004-05-11 Renesas Technology Corporation Mask for manufacturing semiconductor device and method of manufacture thereof
US7008736B2 (en) 1988-11-22 2006-03-07 Renesas Technology Corp. Semiconductor integrated circuit device fabrication method using a mask having a phase shifting film covering region and an opening region

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