JPS59153542A - Removing agent for deposit on mold - Google Patents

Removing agent for deposit on mold

Info

Publication number
JPS59153542A
JPS59153542A JP2657183A JP2657183A JPS59153542A JP S59153542 A JPS59153542 A JP S59153542A JP 2657183 A JP2657183 A JP 2657183A JP 2657183 A JP2657183 A JP 2657183A JP S59153542 A JPS59153542 A JP S59153542A
Authority
JP
Japan
Prior art keywords
mold
active agent
surfactant
surface active
deposit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2657183A
Other languages
Japanese (ja)
Inventor
Tetsuo Kawasaki
哲生 川崎
Hideki Wakao
英樹 若生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Neos Co Ltd
Original Assignee
Neos Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Neos Co Ltd filed Critical Neos Co Ltd
Priority to JP2657183A priority Critical patent/JPS59153542A/en
Publication of JPS59153542A publication Critical patent/JPS59153542A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22CFOUNDRY MOULDING
    • B22C1/00Compositions of refractory mould or core materials; Grain structures thereof; Chemical or physical features in the formation or manufacture of moulds

Abstract

PURPOSE:To provide an agent capable of removing easily deposit on the surface of a mold having complex structure using a solvent contg. a specified amt. of dimethyl sulphoxide and a specified amt. of surface active agent. CONSTITUTION:A remover of deposit on the mold is composed of a compsn. consisting of 0.01-10wt% surface active agent and >=60, pref. >=70wt% dimethyl sulphoxide. Preferred surface active agent is a fluorine-contg. surface active agent e.g. a derivative from dimer or trimer of hexafluoropropene, or a hydrocarbon type surface active agent, e.g. dialkyl sulphosuccinate.

Description

【発明の詳細な説明】 本発明は鋳型付着物除去剤に関する。[Detailed description of the invention] The present invention relates to a mold deposit removal agent.

金属の成形金型には樹脂と砂を混合し、これを反応させ
固着させたものを用いている。この反応物を作る金型に
は反応物が付着してその除去が従来から間額ニなってい
た。
The metal mold used is a mixture of resin and sand, which is reacted and solidified. The reactant adheres to the mold for producing the reactant, and its removal has traditionally been time-consuming.

従来この問題を解決するためにはハンマやブラシ、ショ
ツトブラスト等の物理的方法を用いるか適当な溶媒を用
いて溶解除去する方法が採用されていた。
Conventionally, in order to solve this problem, physical methods such as hammer, brush, shot blasting, etc., or methods of dissolving and removing using an appropriate solvent have been adopted.

しかしながら、物理的方法では複雑な構造の鋳型では人
間か手作業で行なわざるを得す、労力と時間を要し、そ
の上傷かつき易く、最良の方法とは云い難い。溶剤法で
は除去に通常1週間以上を要し、しかもしばしば除去が
不完全で、処理後、更にブラシング等を行なう必要があ
った。
However, the physical method cannot be said to be the best method because it must be done manually for molds with complex structures, which requires labor and time, and is easily damaged. In the solvent method, removal usually takes one week or more, and removal is often incomplete, requiring further brushing or the like after treatment.

本発明はジメチルスルホキシドを少なくとも60屯量%
含む溶剤と界面活性剤とを0.01〜10市量%含有す
る鋳型付着物除去剤に関する。
The present invention contains at least 60 tonne of dimethyl sulfoxide.
The present invention relates to a mold deposit removal agent containing 0.01 to 10% by market weight of a solvent and a surfactant.

本発明に使用する界面活性剤はフッ素系界面活性剤、炭
化水素系アニオン界面活性剤、炭化水素糸ノニオン界面
活性剤が好ましいが、フッ素系界面活性剤と炭化水素系
アニオン界面活性剤が特に好ましい。
The surfactant used in the present invention is preferably a fluorine-based surfactant, a hydrocarbon-based anionic surfactant, or a hydrocarbon-based nonionic surfactant, with fluorine-based surfactants and hydrocarbon-based anionic surfactants being particularly preferred. .

フッ素系界面活性剤としてはペルフルオロカルボン酸や
スルホン酸のアルカリ塩、スルホン酸アミド化合物;テ
トラフルオロエチレンやヘキサフルオロプロペンのオリ
ゴマーまたはポリマーを疎水基とするもの、例えばペル
フルオロアルケニルアリールエーテル誘導体、例えば特
開昭51−11084号公報、英国特許第127066
2号明細書記載のもの、テトラフルオロエチレンやヘキ
サフルオロプロペンまたはそのオリゴマーと多価アルコ
ーノペ特にポリアルキレンクリコールトノ反応物等が例
示される。これらのフッ素化合物はいずれも本発明の目
的にとって特に好ましいものであるが、中でもヘキサフ
ルオロプロペンの二量体および三量体から誘導されるも
のはペルフルオロカルボン酸やスルホン酸等(こ比べ安
価であり、テトラフルオロエチレンオリコマ−に比へ均
質す製品をi尋ることができるので特に好ましい。
Examples of fluorosurfactants include alkali salts of perfluorocarboxylic acids and sulfonic acids, and sulfonic acid amide compounds; those having oligomers or polymers of tetrafluoroethylene and hexafluoropropene as hydrophobic groups, such as perfluoroalkenyl aryl ether derivatives, such as JP-A Publication No. 51-11084, British Patent No. 127066
Examples include those described in Specification No. 2, and reaction products of tetrafluoroethylene, hexafluoropropene, or oligomers thereof with polyhydric alcohols, especially polyalkylene glycols. All of these fluorine compounds are particularly preferred for the purpose of the present invention, but among them, those derived from dimers and trimers of hexafluoropropene include perfluorocarboxylic acids and sulfonic acids (which are less expensive than these). This is particularly preferred because it allows products to be produced that are more homogeneous than tetrafluoroethylene oligomers.

炭化水3!8糸ノニオン界面活性剤]としてはポリオキ
シエチレンアルキルエーテル、ポリオキシエチレンアル
キルフェニルエーテル等が好ましい。いずれも酸化エチ
レンの付加モル数が比較的少ないもの、例えば3〜10
モル程度のもの、即ち、親水性が小さく、表面張力の小
さいものが適している。
As the hydrocarbon water 3!8 thread nonionic surfactant], polyoxyethylene alkyl ether, polyoxyethylene alkyl phenyl ether, etc. are preferable. Both have a relatively small number of added moles of ethylene oxide, for example 3 to 10
A compound having a molar level, that is, a compound having low hydrophilicity and low surface tension is suitable.

炭化水素系アニオン界面活性剤としてはスルホン酸型ま
たは硫酸エステル型が好ましく、典型的にはジアルキル
スルホコハク酸塩、アルキルベンゼンスルホン酸塩、ア
ルキル硫酸エステル塩である。特(こジオクチルスルホ
コハク酸ソーダ、ドデシルベンゼンスルホン酸ソーダ、
ラウリル硫酸エステルに半ソーダ塩等が好ましい。
The hydrocarbon anionic surfactant is preferably a sulfonic acid type or a sulfuric acid ester type, and typically dialkyl sulfosuccinates, alkylbenzene sulfonates, and alkyl sulfate ester salts. Special (dioctyl sodium sulfosuccinate, dodecylbenzenesulfonic acid sodium,
Half soda salt of lauryl sulfate is preferred.

これらの界面活性剤は二種以上配合して用いてもよい。Two or more of these surfactants may be used in combination.

使用量はフッ素系界面活性剤の場合鋳型付着物除去剤全
量の0.01〜10市重%、好ましくは0.01−1.
0重量%、炭化水素系界面活性剤の場合、0.1〜10
屯縫%、好ましくは1〜5重量%である。
In the case of a fluorine-based surfactant, the amount used is 0.01 to 10% by weight of the total mold deposit removal agent, preferably 0.01 to 1.
0% by weight, in the case of hydrocarbon surfactants, 0.1-10
% of seams, preferably 1 to 5% by weight.

本発明において有機溶剤はジメチルスルホキシドを用い
る。他の有機溶剤、例えばN−メチル−2−ピロリドン
は単独で比較した場合、ジメチルスルホキシドに近い付
着物除去率を示すが、界面活性剤と併用してもそれ程顕
著な除去率の向上を示さない。ジメチルスルホlキシド
による除去率か界面活性剤によって著るしく向上するこ
とは唸くべきことである。
In the present invention, dimethyl sulfoxide is used as the organic solvent. Other organic solvents, such as N-methyl-2-pyrrolidone, show a deposit removal rate close to that of dimethyl sulfoxide when compared alone, but do not show such a significant improvement in removal rate when used in combination with a surfactant. . It is remarkable that the removal rate with dimethyl sulfoxide is significantly improved by surfactants.

しかしながらジメチルスルホlキシドは融点が高<(1
8’C)、冬期の使用(こは支1牽をきたすことかある
。この陣な場合、他の低融点有機溶剤、他えはlN−メ
チル−2−ピロリドン、γ−フチルラクトン、カーヒト
ール、/メチルー2−ホルムアミド、エチレンクリコー
ルンアセテート等を用いて除去剤の融点を下げてもよい
。この場合、実質上、除去率を低下させないためにはジ
メチルスルホキシドは全溶剤の60屯量魂以−1−1好
ましくは70屯指%す、上用いなりれはならない。
However, dimethyl sulfoxide has a high melting point <(1
8'C), use in winter (this may cause some problems. In this case, other low melting point organic solvents, such as lN-methyl-2-pyrrolidone, γ-phthyllactone, carhitol, / Methyl-2-formamide, ethylene glycolne acetate, etc. may be used to lower the melting point of the removing agent.In this case, dimethyl sulfoxide must be used in an amount of 60 tons or more of the total solvent in order not to substantially reduce the removal rate. 1-1 preferably 70%, but not more than 1-1%.

本発明によれは、従来の物理的方法に比べて傷を生ぜず
、複雑な構造の鋳型付着物を簡単(こ除去することがで
き、しかも従来の溶剤法に比べ短時間(例えば2日)で
、しかも満足すべき程度に付着物を除去することができ
る。
According to the present invention, mold deposits with complex structures can be easily removed without causing damage compared to conventional physical methods, and in a shorter time (e.g., 2 days) compared to conventional solvent methods. Moreover, deposits can be removed to a satisfactory degree.

以下、実施例をあけて本発明を説明する。実施例中、部
または%とあるは特にことわらない限り重量で表わす。
The present invention will be explained below with reference to Examples. In the examples, parts and percentages are expressed by weight unless otherwise specified.

実施例 鋳物砂(砕砂:浜岡砂)100部に樹脂(フェノール樹
脂(レゾール型))1.0部硬化剤(ポリイソシアネー
ト系)10部を配合し、コールドボックス法により硬化
した中子をテストピースとし、鋳物砂の付着した状態で
重量を測定する。次いで表−1に示す鋳型付着物除去剤
(こ室温で48時間浸漬する。弓1きあげ乾燥し@量を
測定して除去率を求める。結果を表−1に示す(表中、
A 、 B 。
Example: 100 parts of foundry sand (crushed sand: Hamaoka sand) was mixed with 1.0 parts of a resin (phenol resin (resol type)) and 10 parts of a hardening agent (polyisocyanate type), and a core hardened by the cold box method was made into a test piece. and measure the weight with foundry sand attached. Next, use the mold deposit removal agent shown in Table 1 (soak at room temperature for 48 hours. Raise the bow, dry it, and measure the amount to determine the removal rate. The results are shown in Table 1 (in the table,
A, B.

CおよびI)は比較例を示す)。C and I) show comparative examples).

Claims (1)

【特許請求の範囲】 1、 ジメチルスルホキシドを少なくとも60市量%含
む溶剤と界面活性剤とを001〜10重鍬%含有する鋳
型付着物除去剤。 2、界面活性剤がフッ素系界面活性剤である第1項記載
の除去剤。 3 界面活性剤が炭化水素糸アニオン界面活性剤である
第1項記載の除去剤。 4、炭化水素系アニオン界面活性剤がスルホン酸塩また
は硫酸エステル塩であり、これを0.01〜10 重重
:%含む第3項記載の除去剤。
[Scope of Claims] 1. A mold deposit removal agent containing a solvent containing at least 60% by weight of dimethyl sulfoxide and a surfactant in an amount of 0.001 to 10% by weight. 2. The removing agent according to item 1, wherein the surfactant is a fluorosurfactant. 3. The removing agent according to item 1, wherein the surfactant is a hydrocarbon thread anionic surfactant. 4. The removing agent according to item 3, wherein the hydrocarbon anionic surfactant is a sulfonate or a sulfuric acid ester salt, and contains 0.01 to 10% by weight.
JP2657183A 1983-02-18 1983-02-18 Removing agent for deposit on mold Pending JPS59153542A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2657183A JPS59153542A (en) 1983-02-18 1983-02-18 Removing agent for deposit on mold

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2657183A JPS59153542A (en) 1983-02-18 1983-02-18 Removing agent for deposit on mold

Publications (1)

Publication Number Publication Date
JPS59153542A true JPS59153542A (en) 1984-09-01

Family

ID=12197233

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2657183A Pending JPS59153542A (en) 1983-02-18 1983-02-18 Removing agent for deposit on mold

Country Status (1)

Country Link
JP (1) JPS59153542A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013060511A (en) * 2011-09-13 2013-04-04 Toray Fine Chemicals Co Ltd Cleaning liquid

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013060511A (en) * 2011-09-13 2013-04-04 Toray Fine Chemicals Co Ltd Cleaning liquid

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