JPS59151126A - Projection inspecting machine - Google Patents

Abstract

PURPOSE:To execute selectively reflection/transmission illuminations by placing plural mirrors whose reflection selecting wavelengths are different from each other, on the side opposite to a half mirror of a work, so that they can go into and out of a telecentric illuminating system. CONSTITUTION:A half mirror 6 is placed on an optical axis 13A of a magnifying projection lens 13, a projected light from the side of this mirror 6 is reflected by this mirror 6, a telecentric illuminating system for irradiating a work W placed at a focal position of the projection lens 13 is provided, and a shape of the work is magnified and made to form an image on a screen 8 from the magnifying projection lens 13 by utilizing a reflected light from the work W. Plural mirrors 14A-14C whose reflection selecting wavelengths are different from each other are placed on the side opposite to the half mirror 6 of the work W so that they can go selectively into and out of the telecentric illuminating system. The mirrors 14A-14C are placed concentrically on a rotating plate 15 so that the turret is replaced freely.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to improvements in projection inspection 1 for inspecting hide cutting edges, gears, etc. of workpieces by enlarging projection.

Conventionally, as shown in FIG. 1, light from a light source lamp 1 is transmitted via a condenser lens 2 to a stage 3 with φ, (a placed knob (not shown in the figure)) from a lower knob if, If you have diarrhea, or on the side of the soft food table 3 described in 1IIJ (this is placed l-
Marugen Umbu 4 Forces' own light is illuminated from above the workpiece on the document table 3 through the condenser lens 5J-3 and the 11-fumirror 6, and the light is emitted from above. Or, the shape of the workpiece 11" by reflected light can be imaged on the screen 8 via the enlarged projection device h7! :There are several projections.

Reference number 10 in the figure is a thermal KA absorption filter, 11J3 and 1
2 is the projection lens 13 of the enlarged projection device 7.
Mirrors are shown for redirecting the light rays and directing them to the screen F3.

The above-mentioned conventional projection (stage) is designed to obtain an optimal enlarged shadow by covering the workpiece on the stage 3 using either or both of transmitted illumination and counter illumination, but transmitted illumination Since separate light source lamps 1 and 4 are attached to the main body H for the purpose of illumination and for counter illumination, measures must be taken to prevent thermal distortion from occurring on the enlarged projection device 7, and separate light sources must be installed for each. (-) When the amount of light is large and only one of the light source lamps is used, the light source lamp on the 11υ side is not used.
There are problems in that the IJ"4f is low and the overall size is increased.

Furthermore, in the past, in order to reduce I'\$k % fatigue, a filter was installed in the illumination system to transmit only light of a specific wavelength (for example, green light), and the outline of the workpiece was colored in the color of the specific wavelength. There is one in which the image is projected onto a screen 8, but the problem is that the installation volume becomes larger due to the installation of a filter.

This light interval is the same as the conventional l? 18] The object of the present invention is to provide a projection inspection device that can perform counter illumination and transmitted illumination using a reflective illumination system, and can be made into a single unit and compact device. purpose.

Another object of the present invention is to provide a projection image that can be imaged on a screen using light of a specific wavelength without passing through a filter.

A further object of the present invention is to provide a projection inspection machine that can selectively perform counter illumination and transmitted illumination or only counter illumination using a reflective illumination system.

Historically, this light beam was used to create a projection (scanning) beam that made it possible to easily convert the specific wavelength of the results projected onto the screen.
presentation (written with the purpose of sharing)

In this invention, a half mirror is arranged on the optical axis of a magnifying projection lens, and the fi! It is equipped with a telecenter 1~rick illumination system that reflects the light projected from one direction by the half mirror and illuminates the work placed at the focal position of the projection lens 1I□j, and reflects the reflected light from il'' Zug n+ et al. In the projection inspection machine, the shape of the workpiece is magnified and projected on the screen by the magnifying projection lens using a plurality of mirrors having different reflection selection wavelengths on the opposite side of the workpiece to the half mirror. The above object is achieved by arranging it so that it can selectively enter and exit the telesend link lighting system.

In addition, the present invention provides a method for selectively transmitting transmitted illumination light of different wavelengths by arranging the nine mirrors on a rotary plate (two concentrically arranged turrets that can be exchanged) in the three-ray inspection.
This helmet accomplishes the above purpose.

Further, the present invention provides that, in the projection inspection M1, a non-reflective QJ portion is formed on the rotary plate concentrically with the plurality of mirrors, so that only the counter illumination, the transmitted illumination, or the counter illumination can be selected. It achieves and overcomes the above objectives.

Embodiments of the present invention will be described below with reference to the drawings.

In this example, + in FIG. 1 is replaced by the projection of rice (
The same month as the contract question or) U to 811 minutes is spelled as the same month as 1-].

In this embodiment, as shown in FIG. 2, a Harno mirror 6 is arranged on the optical axis 13A of the enlarged projection lens 13, and the in! The projector is equipped with a telecenter 1~rick illumination system that reflects the projected light from the half mirror 6 and illuminates the work piece placed at the focal position of the projection lens 13. , a projection reconnaissance 1 in which the shape of the workpiece is enlarged and imaged on the screen 8 by the enlargement projection lens T3 using the reflected light from the workpiece ＼. ,0ki half mirror 6
And on the other side, foul i! Reflection mirror 14 with different selective wavelengths
A to 14C are arranged such that they can be selectively moved in and out of the telecentric illumination thread.

These mirrors 14A to 14C are arranged on a rotating machine 15 in the same shape as shown in FIG. 3 so as to be replaceable with the turret 1.

That is, the rotation speed 15 is such that the rotation center axis 15A is arranged parallel to the optical axis 13 of the telesend link illumination system, and the mirrors 14A to 14C arranged on the rotation (k15) are rotated to the optical axis 13. I turn in the direction perpendicular to the
It is possible to move in and out of the telecentric illumination system.

(rotation) k15 includes the mirror 14A-1/
4 Non-recurved part 14DD1 consisting of thin hairs) k concentrically with C
Illustrated 1), ``1' anti-punishment? J 14 Dno) Rotating plate 1
When the rotation of 5 occurs, the half mirror absorbs the repulsive light from the half mirror 6 and prevents the formation of bright light. ing.

Also, one δ1 of the rotation) 11 is protruded from the tool stand 3 in the n direction, and the projection (the opening of the rotation) is performed by the worker 7'.
It can be operated.''

Therefore, in this embodiment, the workpiece \,\,', which is placed at the focal position of the projection lens 1, is illuminated by reflection from the light source lamp 4n) through the half mirror 6, and the workpiece\, ＼ 1 d 5 reversal J light, 1 1 shadow lens 13 (
The image is enlarged and formed on an 8-screen screen, and this (Koyotsu)
The state of the surface of the workpiece can be determined, and after being reflected by the half mirror 6, the light travels around the workpiece and hits the anti-silk surfaces of the mirrors 14A to 14C. [Project the outline shape of the workpiece ＼・＼ onto the screen 8 through the projection lens 13 and form an image of the shape 1
It is possible to measure the amount of energy that is lost.

Therefore, it is possible to inspect the surface shape and contour shape of the work by reflecting and over-illuminating the workpiece using only the modified illumination thread attached to the conventional projection moxibustion machine. .

1 temple (d5 in this execution row 1 (mirror 14A)
-14 and C are each made to have a different wavelength selection, so the screen 8 (two projections)
1 person in the middle crystal form of Niwork\\I' (well, mirror 14ha)
~ By carrying 114C within the unit, worker D.
, can be formed by light of a specific wavelength that causes the least fatigue.

Furthermore, this fruit 7. Since the mirrors 14A to 14.0 are attached to the rotating plate 15 at t and DI, it is extremely easy to replace these mirrors 14A to 14G.

In history, Msuji rotation skill] 5, nirki mirror] 4A
After the non-conforming part 1 /ID i><τ is formed concentrically with ~14C, the rotating plate 15 is rotated to form the non-conforming part 1/11.
By shining 11i on the side opposite to the half mirror 6 and λ4 of the work~\', the opposite Q4 illumination light from the half mirror 6 is absorbed, and the work \, \, Nyo-C is directly opposite 9J. ``It's only for the rays of light'', so that the surface of the work \\・ is thrown onto the screen 8. Now, mirror 14
Since A.~14C itself is designed to filter out only the light beam of a specific wavelength, there is no need to install a filter in the middle of the optical path as in the case of I.F.

In the above-mentioned embodiment 1'7, a plurality of true mirrors of the anti-selection wavelength are mounted on the rotary plate 15 (at the openings to be mounted concentrically).
So, go to telecentre 1~rick lighting system/\telecenter 1j (
It is possible to move in and out of the bar, but the present invention is not limited to this.For example, the rear and rear mirrors can be moved from slide 1 to Accordingly, the telecentric illumination system IX may be linearly and selectively turned on and off.

! Ninokoshi, when a conventional mirror is attached to the rotating plate (,
1.Compared to the case where you get 1-(Shini Tori E) with a slur,
The father (cut) (21 skewers is 11 degrees Celsius).

In addition, the present invention is not limited to the above-mentioned embodiment 1, rotation (15 [(3 words) mirrors 14A to 1/1. It is okay to have a plurality of 2 (j, 2 or more).

In the above embodiment 1511, a half mirror (5) is installed with a length of about 1*' between the projection lens 13 and the workpiece.
7) 1. This Komei is not limited to this, but it is also possible to use a convex device to place the half mirror 6 between the lens G1' that constitutes the projection lens 13.
Alternatively, a half mirror 6 may be placed between the projection lens 13 and the screen 8.

The present invention has been constructed as described above, and with a simple method,
(Is it possible to obtain reverse illumination and j6 over-illumination only by means of the reverse illumination system of il'?
1] L over-illuminated thread (no longer needed, projection!?! Miniaturizing and simplifying the growing lees - reducing the effect of heat M, 77 to 8) Deki, 100, Ka)
It is important to significantly reduce M-, E-s1, and history i =
By switching the wavelength of the target passing illumination light to a specific wavelength called H4 of the return wave, it is possible to create a condensation (image) on the screen with light of a wavelength that does not cause fingernail fatigue to the worker. It is said that it can be done (has a cloudy effect).

[Brief explanation of drawings]

Fig. 1 is an optical system layout diagram showing an outline of the optical system in the projection inspection (Fig. System layout diagram, Fig. 3 is an enlarged diagram showing a part of the mirror in the same embodiment. 4...Light source Rashif, 6...Half mirror 1, 8...Screen, 13...・Projection lens, 13A...Optical axis, 14△~14C...Mirror, 14L)...Non-sword section, 15...Rotating plate, \・\・'...Work. Agent (Public Yamate City (1 person) Figure 1

Claims (1)

[Claims] (1) A half mirror is placed on the optical axis of the magnified projection-2 ratio, and the projected light from the measurement direction of the half mirror is transmitted to the half mirror.
11, placed at the focal position of the projection lens.
Use the telecenter 1 helical illumination system to illuminate the workpiece, and use the light from the workpiece to project the shape of the workpiece onto the screen from the 11mm projection lens. I failed the Shinoko projection test to make the i1 elephant convex.
i it! In II, a plurality of mirrors with different extension lengths are installed in the fiIJFie telescopic illumination system I
＼、Selection (1) Projection 1 moxibustion (1 moxibustion) that is placed so that it can be accessed and taken out (1) The projection of the 11th m rotation in the claimed range of 1 Moriyama and Zuru has been placed in the exchange self r-f. (U Shokaku 1
How many?