JPS59139898U - light irradiation furnace - Google Patents

light irradiation furnace

Info

Publication number
JPS59139898U
JPS59139898U JP3354583U JP3354583U JPS59139898U JP S59139898 U JPS59139898 U JP S59139898U JP 3354583 U JP3354583 U JP 3354583U JP 3354583 U JP3354583 U JP 3354583U JP S59139898 U JPS59139898 U JP S59139898U
Authority
JP
Japan
Prior art keywords
light irradiation
heater
sub
furnace
processed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3354583U
Other languages
Japanese (ja)
Other versions
JPS6115511Y2 (en
Inventor
立躬 平本
芳樹 三村
洋 清水
荒井 徹治
悟 福田
Original Assignee
ウシオ電機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ウシオ電機株式会社 filed Critical ウシオ電機株式会社
Priority to JP3354583U priority Critical patent/JPS59139898U/en
Publication of JPS59139898U publication Critical patent/JPS59139898U/en
Application granted granted Critical
Publication of JPS6115511Y2 publication Critical patent/JPS6115511Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Vertical, Hearth, Or Arc Furnaces (AREA)
  • Furnace Details (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の実施例を示す断面図、第2図は同じく
斜視図である。 1・・・炉体、3・・・主加熱器、4・・・副加熱器、
4C・・・基端部、4d・・・シール部、5・・・被処
理物(ウェハー)、11・・・開閉扉。
FIG. 1 is a sectional view showing an embodiment of the present invention, and FIG. 2 is a perspective view thereof. 1...Furnace body, 3...Main heater, 4...Sub-heater,
4C... Base end portion, 4d... Seal portion, 5... Processed object (wafer), 11... Opening/closing door.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 主に被処理物の中央部を光照射で加熱する主加熱器と、
主に被処理物の周辺部を加熱する副加熱器とを備え、被
処理物が副加熱器により支持される光照射炉であって、
副加熱器の基端部が開閉扉に嵌挿されてシール部が外部
に突出した状態で固′   着され、この扉を開いた際
に副加熱器が炉外に移動することを特徴とする光照射炉
A main heater that mainly heats the center part of the object to be processed by light irradiation;
A light irradiation furnace comprising a sub-heater that mainly heats the peripheral part of the object to be processed, and in which the object to be processed is supported by the sub-heater,
The base end of the sub-heater is fitted into the opening/closing door and fixed with the seal part protruding to the outside, and when the door is opened, the sub-heater moves out of the furnace. Light irradiation furnace.
JP3354583U 1983-03-10 1983-03-10 light irradiation furnace Granted JPS59139898U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3354583U JPS59139898U (en) 1983-03-10 1983-03-10 light irradiation furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3354583U JPS59139898U (en) 1983-03-10 1983-03-10 light irradiation furnace

Publications (2)

Publication Number Publication Date
JPS59139898U true JPS59139898U (en) 1984-09-18
JPS6115511Y2 JPS6115511Y2 (en) 1986-05-14

Family

ID=30164328

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3354583U Granted JPS59139898U (en) 1983-03-10 1983-03-10 light irradiation furnace

Country Status (1)

Country Link
JP (1) JPS59139898U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6293378A (en) * 1985-10-07 1987-04-28 アドヴァンスト セミコンダクター マティリアルズ アメリカ インコーポレイテッド Method and apparatus for heating substrate in axially symmetric epitaxial growing apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6293378A (en) * 1985-10-07 1987-04-28 アドヴァンスト セミコンダクター マティリアルズ アメリカ インコーポレイテッド Method and apparatus for heating substrate in axially symmetric epitaxial growing apparatus

Also Published As

Publication number Publication date
JPS6115511Y2 (en) 1986-05-14

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