JPS59120034A - Illumination culturing method - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electric cultivation method for growing plants under high illuminance.

Light cultivation, in which plants are cultivated under relatively low-intensity artificial light sources such as fluorescent lights, has been practiced for some time71; however, recently it has become possible to grow plants under high illuminance of about 1d20,000 lux. is being attempted. In cultivation under such high illuminance, the illuminance on the irradiated surface is extremely uneven, making the growth of plants uneven, and the cost of lighting accounts for a high proportion of the production cost. It is desirable to obtain it by the number of lights. Illumination with fluorescent lamps provides a relatively uniform illumination effect, but because the number of luminous fluxes per light source is small, it is difficult to obtain the required high illuminance.
Further, even if the required illuminance is obtained, a very large number of light sources are required, which increases maintenance costs.

Furthermore, when high-efficiency light sources such as metal halide lamps and high-pressure sodium lamps are arranged at equal intervals, the light distribution of each light source overlaps with each other, and mutual reflection is added, resulting in illuminance in the center being ≠ high (in the periphery, illuminance is low). Cultivation with reduced and uniform illuminance @
The drawback was that it was difficult to obtain and the growth of the plants was uneven.

The present invention eliminates these defects, obtains high illuminance with as few lights as possible, and achieves uniform growth of plants cultivated under the high illuminance by using a high-efficiency light source and directing it toward the periphery of the cultivation field. When ≠;, the lighting fixtures to which the light sources are installed are arranged with a reduced distance from each other, and a banner with high reflectance is provided around the cultivation field (il-characteristic).

Next, embodiments of the present invention will be described with reference to the drawings.

Fig. 1 is a diagram showing an example of the arrangement of lighting equipment in the light cultivation method according to the present invention - Fig. 2 is a front view of the apparatus according to the light cultivation method described above, and Fig. 3 is a diagram showing an example of the lighting equipment arrangement in the light cultivation method according to the present invention. FIG. 4, which is a diagram showing another embodiment of the arrangement of lighting equipment, is an isoluminance curve diagram on the surface of the cultivation 1 of the above embodiment. An example of the arrangement of lighting equipment shown in Fig. 1 is horizontal 15. ．． In the rectangular cultivation field 3 with a length of 5 m and a vertical ID m, a lighting fixture is installed at a height of 2 m from the surface of the cultivation field 3, and in order to equalize the illuminance on the surface of cultivation field 3. The distance between the lighting fixtures is reduced from the center to the periphery.

Further, around the cultivation field 3, as shown in FIG. 2, a highly reflective banner 4 is hung that reaches from the height of the light source to the cultivation field surface. The lighting equipment interval of the above example in which a special wide illumination type reflective umbrella 1 equipped with an IJum lamp 2 (with a high voltage of 940 W as a lighting equipment) and a banner 4 with a reflectance of 70% is installed is as follows: A = o, 8 m; B=2.2m-C=2.5m-D-
1.8m, E=2.4m-F=2.6m-()=3.2
m, a substantially uniform illuminance distribution was obtained over the entire area of the cultivation field. When arranging the lighting equipment as described above, the light emitted from each lighting equipment overlaps with each other except for one peripheral area, and a sufficiently high averaged illuminance is obtained.
# of lighting equipment as you get closer to the periphery of d3! Since the y interval becomes narrower, the overlap of the irradiated light becomes thicker (this increases the illumination intensity, and the insufficient illuminance is further compensated for by the reflection of the banner 40, which is almost averaged by the number of lights, resulting in fc + koshiki illuminance. Therefore, high illuminance is obtained. Even under illuminance, it is possible to uniformize the growth of plants in cultivation field 3. Figure 3 shows a high-pressure sodium lamp of % 940W in a -a culture 1i1ffi 3 of the same scale as in the above example. Another arrangement example in which the lighting equipment is attached to the wide-illuminated reflective umbrella 1 and installed at a height of 12 m, the installation interval of the lighting equipment H, H = 0.75 m, knee 2.8 m - J = 5.2 m, K=0.8m, L=18m=
M = 2.11 m, and a drop 44 with a reflectance of about 70% is placed around each cultivated plant 4'. An isoluminous curve as shown in Fig. 4 is obtained on the surface of each cultivated plant 4'. In other words, except for a small part of the periphery of cultivation ① above, i 5o
A highly averaged illuminance distribution (9) of 1 M is obtained from 00 lux to 20,000 lux, thus the plant growth≠2 is homogenized.

Is it for the cultivation F mentioned above? If the banner 4 is not installed, the temperature will vary from 10,000 lux to 20,000 lux C depending on the location.
There was some unevenness in illuminance during the time.

As described above, the present invention is a high-intensity electric cultivation method that uses a large number of high-efficiency light sources, in which the installation interval of the lighting fixtures equipped with high-efficiency light sources is shortened according to the direction of G toward the periphery of the cultivation field. In addition to compensating for the decrease in illuminance in the surrounding area, the high reflectance sag-4 was used around the cultivation field to utilize total internal reflection of the light irradiated towards the outside of the cultivation field, further reducing the illuminance in the peripheral area.

Little l! The cultivation field can be uniformly illuminated with high illuminance using the σ light beam. Therefore, in the electric light cultivation method according to i according to the present invention, it is possible to uniformly grow one plant even though cultivation is performed under high illumination.

[Brief explanation of the drawing]

FIG. 1 is a diagram showing an embodiment of the lighting fixture arrangement in the electric cultivation method according to the present invention, FIG. 2 is a front view of the embodiment shown in FIG. 1, and FIG. Fig. 4 is an isoluminance curve diagram on the surface of the cultivation field of the above embodiment, showing another example. 1...Reflection umbrella. 2...High efficiency light source (high pressure sodium lamp). 3...Cultivation field-4...Top t7 axe.+11+-F → Figure 1 2 Figure 3 Not shown 4

Claims (1)

[Claims] In the electric cultivation method in which plants are cultivated in a cultivation field under high illuminance with a large number of high-efficiency light sources arranged, the distance between the lighting fixtures equipped with high-efficiency light sources is adjusted by increasing the distance toward the periphery of the cultivation field. The electric lamp is arranged in a shortened manner, and a banner with a high reflectance is provided around the cultivation field 1a with a length extending from the height of the light source to the surface of the cultivation field, thereby making the illuminance distribution of the cultivation field uniform. Light cultivation method.