JPS59116280A - Treatment of phthalic anhydride distillation residue - Google Patents

Treatment of phthalic anhydride distillation residue

Info

Publication number
JPS59116280A
JPS59116280A JP22389482A JP22389482A JPS59116280A JP S59116280 A JPS59116280 A JP S59116280A JP 22389482 A JP22389482 A JP 22389482A JP 22389482 A JP22389482 A JP 22389482A JP S59116280 A JPS59116280 A JP S59116280A
Authority
JP
Japan
Prior art keywords
phthalic anhydride
residue
distillation
fraction
boiling point
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22389482A
Other languages
Japanese (ja)
Other versions
JPH0359901B2 (en
Inventor
Yasuo Harada
原田 靖雄
Seiji Yoshizaki
吉崎 征治
Shinji Yoshizuka
吉塚 伸司
Yuji Okumura
奥村 雄司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Nippon Steel Chemical and Materials Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Nippon Steel Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd, Nippon Steel Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP22389482A priority Critical patent/JPS59116280A/en
Publication of JPS59116280A publication Critical patent/JPS59116280A/en
Publication of JPH0359901B2 publication Critical patent/JPH0359901B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To dispose the distillation residue of phthalic anhydride obtained by the catalytic vapor-phase oxidation of naphthalene or o-xylene, by mixing the residue with a fraction having lower boiling point than phthalic anhydride and extracting the residue from the distillation pot. CONSTITUTION:Crude phthalic anhydride obtained by the catalytic vapor-phase oxidation of naphthalene or o-xylene with a gas containing molecular oxygen is purified by distillation to separate the low-boiling fraction and phthalic anhydride fraction. The distillation residue produced by the distillation is distilled batchwise in vacuum to recover the phthalic anhydride remaining in the residue. The residue left after the recovery of the residual phthalic anhydride is mixed with a fraction having lower boiling point than phthalic anhydride (e.g. benzoic acid, toluic acid, etc.) and the residue is extracted from the distillation pot. The extraction can be carried out easily by adding 0.1-2pts.wt. of the low-boiling fraction to 1pt.wt. of the residue, thereby lowering the freezing point of the residue preferably to <=130 deg.C. EFFECT:Phthalic anhydride can be recovered from the distillation residue at a high rate of recovery.

Description

【発明の詳細な説明】 本発明は、無水フタル酸蒸留残渣の処理方法に関するも
のである。詳しく述べると、ナフタリンまたはオルソキ
シレンを接触気相酸化して得られる無水7タル酸の蒸留
残渣の処理方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for treating phthalic anhydride distillation residue. More specifically, the present invention relates to a method for treating a distillation residue of heptallic anhydride obtained by catalytic gas phase oxidation of naphthalene or ortho-xylene.

無水フタル酸はナフタリンまたはオルソキシレンの空気
酸化により製造されるが、同時に種々の化合物が不純物
として副生ずるのでこれを精製する必要がある。この精
製は、蒸留による精製が通常であり、連続若しくは回分
蒸留により蒸留精製される。
Phthalic anhydride is produced by air oxidation of naphthalene or ortho-xylene, but at the same time various compounds are produced as impurities, which must be purified. This purification is usually carried out by distillation, and is carried out by continuous or batch distillation.

この蒸留では無水フタル酸より低沸点の留分と高沸点の
留分若しくは残渣とが分離除去され、無水フタル酸留分
が精製無水フタル酸として回収される。ここで、無水フ
タル酸より高沸点の留分若しくは残渣は、なお多量の無
水フタル酸分を含有しているので製品歩留を向上させる
ため、これを再蒸留して無水フタル酸分を回収すること
が有利である。そこで、本発明者らは粗製無水フタル酸
を精製蒸留に供した際発生する蒸留残渣(無水フタル酸
より高沸点の留分若しくは残渣を意味する)の一部を、
粗製無水フタル酸の蒸留工程へ循環する方法について検
討を行なった。しかしながら、このように塔底物を蒸留
工程に循環しながら、ナフタリンの接触気相酸化により
えられる粗製無水フタル酸の連続蒸留を行なうと、未知
不純物の製品への混入、そのための製品歩留の低下、装
置の腐食など、従来の回分操作においては予想もしえな
かったようなトラブルが生じることを見出した。
In this distillation, a fraction with a lower boiling point than phthalic anhydride and a fraction or residue with a higher boiling point are separated and removed, and the phthalic anhydride fraction is recovered as purified phthalic anhydride. Here, the fraction or residue with a higher boiling point than phthalic anhydride still contains a large amount of phthalic anhydride, so in order to improve the product yield, this is redistilled to recover the phthalic anhydride. That is advantageous. Therefore, the present inventors used a part of the distillation residue (meaning a fraction or residue with a higher boiling point than phthalic anhydride) generated when crude phthalic anhydride was subjected to purification distillation to
We investigated a method for recycling crude phthalic anhydride to the distillation process. However, if crude phthalic anhydride obtained by catalytic gas-phase oxidation of naphthalene is continuously distilled while circulating the column bottoms to the distillation process, unknown impurities may be mixed into the product, resulting in a reduction in product yield. They discovered that problems that could not have been predicted in conventional batch operations, such as deterioration and equipment corrosion, occurred.

そこで、蒸留残渣を粗製無水フタル酸の蒸留工程へその
まま循環させる方法ではなく、別に蒸留を行い、無水フ
タダル酸を留出させ、それを製品とし、て回収または留
出物を粗製無水7タル酸の蒸留工程へ循環させる方法に
ついて検討した。この場合は前述のような問題は生じな
いことが認められたが、蒸留残渣から無水フタル酸を一
定量以上回収すると凝固点が上昇し、蒸留が困難となる
ばかりでなく蒸留釜に残存する残渣物の除去が困難とな
ることさえ生ずることが認められた。
Therefore, instead of circulating the distillation residue directly to the distillation process for crude phthalic anhydride, we conducted a separate distillation to distill out phthalic anhydride, which was then recovered as a product, or the distillate was used to produce crude 7-thalic anhydride. We investigated a method of circulating the water to the distillation process. In this case, it was found that the above-mentioned problem did not occur, but if more than a certain amount of phthalic anhydride is recovered from the distillation residue, the freezing point will rise, making distillation difficult and causing the residue remaining in the distillation vessel to rise. It has been observed that even the removal of the substances becomes difficult.

回分蒸留の場合は、連続蒸留の場合に比べて蒸留残渣か
らの無水フタル酸の回収率を高くすることが可能である
が、やはりその残渣物中の無水フタル酸分が一定量以下
になると凝固点が上昇し、蒸留釜からの抜取り作業が困
難となると同時に移送管内での閉塞問題が生ずる。蒸留
残渣の組成によっても異なるが、−例としてナフタリン
の接触気相酸化により得られた粗製無水フタル酸の蒸留
残渣であって、無水フタル酸分85重量%およびその他
生として約300°C以下の留分15爪量%からなる蒸
留残渣の場合、無水フタル酸分が70重社%以下になる
と残渣物の凝固点が160°C以上になることが認めら
れ、この場合は無水7タル酸の回収率を50%にするこ
とさえ困難であることが判明した。
In the case of batch distillation, it is possible to increase the recovery rate of phthalic anhydride from the distillation residue compared to the case of continuous distillation, but when the phthalic anhydride content in the residue falls below a certain amount, the freezing point As a result, it becomes difficult to extract the distillate from the distillation vessel, and at the same time, the problem of clogging in the transfer pipe occurs. Although it varies depending on the composition of the distillation residue, for example, it is a distillation residue of crude phthalic anhydride obtained by catalytic gas phase oxidation of naphthalene, with a phthalic anhydride content of 85% by weight and other raw materials below about 300°C. In the case of a distillation residue consisting of a fraction of 15%, when the phthalic anhydride content is 70% or less, the freezing point of the residue is found to be 160°C or higher, and in this case, recovery of 7thalic anhydride is confirmed. Even getting the rate to 50% proved difficult.

本発明は、前記のごとき従来法の諸欠点を解消するため
になされたもので、ナフタリンまたはオルソキシレンを
分子状酸素含有ガスにより接触気相酸化して得られ・る
粗製無水フタル酸を精製蒸留に供して低沸点留分および
無水フタル酸留分を分離する際に発生ずる蒸留残渣を、
回分式に減圧蒸留することによって該蒸留残渣中に含有
されている無水フタル酸を回収し、該無水フタル酸回収
後の残渣物には無水フタル酸より低沸点の留分を混合し
て該残渣物を蒸留釜外へ抜出すことを特徴とする無水フ
タル酸蒸留残渣の処理方法である。
The present invention was made in order to eliminate the various drawbacks of the conventional methods as described above, and purification distillation of crude phthalic anhydride obtained by catalytic gas phase oxidation of naphthalene or ortho-xylene with a molecular oxygen-containing gas. The distillation residue generated when separating the low boiling point fraction and phthalic anhydride fraction by subjecting it to
The phthalic anhydride contained in the distillation residue is recovered by batch distillation under reduced pressure, and the residue after recovering the phthalic anhydride is mixed with a fraction having a boiling point lower than that of phthalic anhydride. This is a method for treating phthalic anhydride distillation residue, which is characterized by extracting the substance from the distillation pot.

つぎに図面を参照しつつ本発明を説明する。すなわち、
図面において、ナフタリンまたはオルソキシレン、好ま
しくはナフタリンの空気による接触気相酸化により得ら
れた粗製無水フタル酸は、必要により熱処理等の前処理
をされたのち、ライン1より第1蒸留塔2に送られ、ピ
ッチ等の重質物がライン3から分離される。第1蒸留塔
2で気化した留分は、塔頂よりライン4を経て凝縮器5
に送られ、ここで凝縮してライン6より第2蒸留塔7へ
送られ、減圧蒸留に供される。この際、凝縮器5を省略
して気化物を蒸留塔7へ直接供給することも可能である
。蒸留残渣の一部は、ライン8より高沸点物蒸留塔9の
蒸発釜10に送られ、回分式で減圧蒸留に供される。高
沸点物蒸留塔9からの留分は、製品とすることもできる
が、ライン11を経て、凝縮器12で凝縮してその一部
を蒸留塔9へ環流したのち、残余は必要により第2蒸留
塔7へ循環することが好ましい。純無水フタル酸は、ラ
イン13より取出され、凝縮器14で凝縮されたのち、
ライン15より製品として取出される。
Next, the present invention will be explained with reference to the drawings. That is,
In the drawing, crude phthalic anhydride obtained by catalytic gas phase oxidation of naphthalene or ortho-xylene, preferably naphthalene, with air is sent from line 1 to first distillation column 2 after being pretreated, such as heat treatment, if necessary. Heavy materials such as pitch are separated from line 3. The fraction vaporized in the first distillation column 2 is passed from the top of the column through a line 4 to a condenser 5.
There, it is condensed and sent via line 6 to second distillation column 7, where it is subjected to vacuum distillation. At this time, it is also possible to omit the condenser 5 and directly supply the vapor to the distillation column 7. A part of the distillation residue is sent to the evaporator 10 of the high-boiling point distillation column 9 through the line 8 and subjected to vacuum distillation in a batch manner. The fraction from the high-boiling distillation column 9 can be converted into a product, but after passing through the line 11 and condensing in the condenser 12 and refluxing a part of it to the distillation column 9, the remainder can be used in the second distillation column if necessary. It is preferable to circulate it to the distillation column 7. Pure phthalic anhydride is taken out from line 13, condensed in condenser 14, and then
The product is taken out from line 15.

無水フタル酸より佛点の低い成分は、塔頂よりライン1
6を経て凝縮器17に送られて凝縮され、その一部はラ
イン18により蒸留塔へ還流され、残りはライン19に
より排出され、タンク21に送られる。その一部は、蒸
発釜1o中の蒸留残渣−から所定量の無水フタル酸を回
収して生じる高粘度の残渣物中に混合され、該残渣物を
溶解してライン20により糸外へ排出される。なお、第
2蒸留塔は更に二つの蒸留塔に分けてもよく、この場金
弟1蒸留塔の次の蒸留塔では低沸点の留分が塔頂から分
離され、塔底液はその次の蒸留塔へ送−られ、塔頂より
純無水フタル酸が回収され、塔頂から蒸留残渣が抜き出
される。
Components with a lower Buddha point than phthalic anhydride are passed through line 1 from the top of the column.
6 to a condenser 17 for condensation, a portion of which is refluxed to the distillation column via line 18, and the remainder is discharged via line 19 and sent to tank 21. A part of it is mixed with a high viscosity residue produced by recovering a predetermined amount of phthalic anhydride from the distillation residue in the evaporator 1o, and the residue is dissolved and discharged to the outside of the thread through a line 20. Ru. Note that the second distillation column may be further divided into two distillation columns, in which case the low boiling point fraction is separated from the top of the column after the first distillation column, and the bottom liquid is separated from the top of the column. It is sent to a distillation column, where pure phthalic anhydride is recovered from the top of the column, and a distillation residue is extracted from the top of the column.

しかして、高沸点物蒸留塔9における蒸留は、回分式で
200 Torr以下、好ましくは50〜50Torr
の減田下に行なわれる。この蒸留は、残渣物中の無水フ
タル酸分が50重量%以下となるまで行なうことが可能
であるが、残渣物の凝固点が230℃を越えない時点で
終了させることが好ましい。なお、ここで蒸留する蒸留
残渣は無水フタル酸より高沸点の留分若しくは残渣の全
部であってもよいが、ピッチ分等の特に重質の残渣は図
面に示した例のように分けて別に処理することが無水フ
タル酸の回収率を上げるためには有利である。
Therefore, the distillation in the high boiling point distillation column 9 is carried out batchwise at a temperature of 200 Torr or less, preferably 50 to 50 Torr.
It is held in Masutashita. This distillation can be carried out until the phthalic anhydride content in the residue becomes 50% by weight or less, but it is preferable to end the distillation when the freezing point of the residue does not exceed 230°C. Note that the distillation residue to be distilled here may be a fraction with a higher boiling point than phthalic anhydride, or the entire residue, but particularly heavy residues such as pitch may be separated and separated as shown in the example shown in the drawing. Treatment is advantageous to increase the recovery rate of phthalic anhydride.

このようにして蒸留残渣中の無水フタル酸分を高率に回
収することにより、蒸発釜10内に残存する残渣物は凝
固点が130℃、好ましくは160°Cを越える高いも
のとなるので、このままでは抜き出しが困難である。そ
こで、本発明においてはこの残渣物に無水フタル酸より
低沸点の留分を添加混合する。すなわち、安息香酸また
はトルイル酸等を主成分とする無水フタル酸より低沸点
の留分をこの残渣物に添加すると凝固点および粘度が著
しく低下し、抜き出しが極めて容易になることが認めら
れたのである。そのため、残渣物の凝固点が160℃を
越えるまで無水フタル酸分を回収したとしても、抜き出
しが十分可能となるのである。
By recovering the phthalic anhydride content in the distillation residue at a high rate in this way, the residue remaining in the evaporator 10 has a freezing point of 130°C, preferably over 160°C, so it can be kept as it is. It is difficult to extract it. Therefore, in the present invention, a fraction having a boiling point lower than that of phthalic anhydride is added to and mixed with this residue. In other words, it was found that when a fraction with a lower boiling point than phthalic anhydride, mainly composed of benzoic acid or toluic acid, was added to this residue, the freezing point and viscosity were significantly lowered, making extraction extremely easy. . Therefore, even if the phthalic anhydride content is recovered until the solidification point of the residue exceeds 160°C, it can be sufficiently extracted.

残渣物に添加混合する低沸点の留分としては安息香酸ま
たはトルイル酸等の無水フタル酸を製造する際に副生ず
る低沸点成分を主として含有する留分が好ましく、低沸
点成分の含有量は10〜100%、好ましくは30〜9
0%程度がよい。
The low-boiling fraction to be added to and mixed with the residue is preferably a fraction that mainly contains low-boiling components that are produced as by-products during the production of phthalic anhydride such as benzoic acid or toluic acid, and the content of the low-boiling components is 10%. ~100%, preferably 30-9
Approximately 0% is good.

このような留分としては、粗製無水フタル酸を精製蒸留
する際に塔頂から得られる低沸点留分が最も好ましい。
As such a fraction, a low-boiling fraction obtained from the top of the column during purification distillation of crude phthalic anhydride is most preferable.

低沸点留分の添加量は残渣物の組成および低沸点留分の
組成によって異なるが、いずれにしてもこれを添加混合
したのち、約150℃以下、好ましくは約130℃以下
の凝固点となるように添加する。ナフタリンを酸化して
得られた粗製無水フタル酸精製蒸留の際の蒸留残渣から
無水フタル酸を回収したのちの凝固魚釣160〜200
℃の残渣物に対しては、安息香酸を50〜90%および
無水フタル酸50〜10%含有する低沸点留分を残渣物
100重量部に対し5〜100重量部以上添加すればよ
い。
The amount of the low-boiling point fraction added varies depending on the composition of the residue and the composition of the low-boiling point fraction, but in any case, after adding and mixing, the amount of the low-boiling point fraction added should be such that the freezing point is about 150°C or less, preferably about 130°C or less. Add to. Crude phthalic anhydride obtained by oxidizing naphthalene After recovering phthalic anhydride from the distillation residue during purification distillation
C., a low boiling point fraction containing 50 to 90% benzoic acid and 50 to 10% phthalic anhydride may be added in an amount of 5 to 100 parts by weight or more per 100 parts by weight of the residue.

蒸発釜において、残渣物と低沸点留分を凝固点以上の温
度で混合したのち、これをライン32から抜き出す。ラ
イン32の保温は抜き出された混合物の凝固点以上であ
ればよいので、島田スチーム等による保温で十分である
。なお、扶き出された混合物は必要に応じ焼却装置にお
いて焼却され、あるいは燃料として使用される。
After the residue and the low-boiling fraction are mixed in the evaporator at a temperature above the freezing point, they are extracted through line 32. Since the line 32 only needs to be kept warm as long as it is above the freezing point of the extracted mixture, keeping it warm with Shimada steam or the like is sufficient. Note that the released mixture is incinerated in an incinerator or used as fuel, if necessary.

以上述べたように、本発明による無水フタル酸蒸留残渣
の処理方法は、ナフタリンまたはオルソキシレンを分子
状酸素含有ガスにより接触気相酸化して得られる粗製無
水フタル酸を精製蒸留に供して低沸点留分および無水フ
タル酸留分を分離する際に発生する蒸留残渣を、回分式
に減圧蒸留することによって該蒸留残渣中に含有されて
いる無水フタル酸を回収し、該無水フタル酸回収後の残
渣物には無水フタル酸より低沸点の留分を混合して該残
渣物を蒸留釜外へ抜出すことにより行なわれるものであ
るから、高沸点留分の分離が十分に行われると共に、無
水フタル酸の回収率を高めることができる。また該回分
式減圧蒸留における残渣物中に無水フタル酸より低沸点
の留分を混合することにより前記残渣物の凝固点が大幅
に降下するので、抜取作業が容易となり、同時に移送配
管内での閉塞問題が解決できる。このため、前記蒸留残
渣からの無水フタル酸の回収率を50%以上にまで上昇
させることが可能となる。また、前記無水フタル酸より
低沸点の留分として、粗製無水フタル酸の精製蒸留によ
り無水フタル酸留分を分離する際に得られる低沸点留分
を使用すれば、処理費用が安価となる。
As described above, the method for treating phthalic anhydride distillation residue according to the present invention involves subjecting crude phthalic anhydride obtained by catalytic gas phase oxidation of naphthalene or ortho-xylene with a molecular oxygen-containing gas to purification distillation to obtain a product with a low boiling point. The phthalic anhydride contained in the distillation residue is recovered by batch distillation of the distillation residue generated when separating the distillate and the phthalic anhydride fraction, and the phthalic anhydride contained in the distillation residue is recovered. Since the residue is mixed with a fraction having a lower boiling point than phthalic anhydride and the residue is extracted from the distillation vessel, the high boiling point fraction can be sufficiently separated, and the anhydrous The recovery rate of phthalic acid can be increased. In addition, by mixing a fraction with a lower boiling point than phthalic anhydride into the residue from the batch vacuum distillation, the freezing point of the residue is significantly lowered, making extraction work easier and at the same time preventing blockages in the transfer piping. Problems can be solved. Therefore, it becomes possible to increase the recovery rate of phthalic anhydride from the distillation residue to 50% or more. Furthermore, if a low boiling point fraction obtained when the phthalic anhydride fraction is separated by purification distillation of crude phthalic anhydride is used as the fraction having a lower boiling point than the phthalic anhydride, the processing cost will be reduced.

つぎに、実施例を挙げて本発明をさらに詳細に説明する
Next, the present invention will be explained in more detail by giving examples.

実施例1 ナフタリンの空気による接触気相酸化により得られた粗
製無水フタル酸を熱処理を行なったのち、第1蒸留塔に
供給した。第1蒸留塔で気化した留分を第2蒸留塔に送
り、低沸点留分を除去した。
Example 1 Crude phthalic anhydride obtained by catalytic gas phase oxidation of naphthalene with air was heat treated and then supplied to a first distillation column. The fraction vaporized in the first distillation column was sent to the second distillation column to remove the low boiling point fraction.

塔底液は、第3蒸留塔に送り減圧蒸留を行なって、塔頂
より純無水フタル酸をえた。
The bottom liquid was sent to a third distillation column, where it was distilled under reduced pressure, and pure phthalic anhydride was obtained from the top of the column.

第6蒸留塔の蒸留残液(塔底液)中には無水フタル酸8
5重量%および含窒素化合物等の不純物15重量%を含
有しており、凝固点は130℃であった。この蒸留残渣
を高沸点物蒸留塔の蒸発釜に送り、減圧度50 Tor
r 、塔底温度230℃、還流比2〜3で回分蒸留する
ことにより無水フタル酸純度99.8%を回収した。こ
の場合、無水フタル酸の回収率約50重量%時点におけ
る残漬物(無水フタル酸濃度702%)の凝固点は16
0℃と大幅に上昇し、蒸発釜からの抜出し移送配管を1
0 ki/1yn2Gのスチームで保温しても管内閉塞
トラブルが生じた。したがって、このままでは無水フタ
ル酸の回収率50%以上に上昇させることは不可能であ
った。
The distillation residual liquid (bottom liquid) of the sixth distillation column contains 8 phthalic anhydride.
It contained 5% by weight and 15% by weight of impurities such as nitrogen-containing compounds, and its freezing point was 130°C. This distillation residue is sent to the evaporator of the high-boiling point distillation column, and the pressure is reduced to 50 Tor.
r, phthalic anhydride purity of 99.8% was recovered by batch distillation at a bottom temperature of 230° C. and a reflux ratio of 2 to 3. In this case, the freezing point of the residual pickles (phthalic anhydride concentration 702%) at a recovery rate of about 50% by weight of phthalic anhydride is 16
The temperature rose significantly to 0°C, and the pipe for extraction from the evaporator was removed from the evaporator.
Even though the tube was kept warm with steam at 0 ki/1yn2G, a problem of clogging inside the tube occurred. Therefore, it was impossible to increase the recovery rate of phthalic anhydride to 50% or more under this condition.

そこで、得られた残渣物に対して第2蒸留塔から得られ
る低沸点留分(安息香酸約70%、無水フタル酸約30
%)を無水フタル酸回収後の残渣物に、第1表し示す割
合で混合したところ、その凝固点は第1表に示すとおり
となり、いずれの場合も釜残抜取りや移送配管内での閉
塞トラブルは全くなく、焼却炉での噴燃処理にも支障が
なかった。なお、回収無水フタル酸は第2蒸留塔へ循環
した。
Therefore, the low boiling point fraction obtained from the second distillation column (about 70% benzoic acid, about 30% phthalic anhydride) is added to the obtained residue.
%) was mixed with the residue after recovering phthalic anhydride in the proportions shown in Table 1, its freezing point was as shown in Table 1, and in both cases, there was no problem of removing the residue from the pot or clogging the transfer piping. There was no problem at all, and there was no problem with the incineration process at the incinerator. Note that the recovered phthalic anhydride was circulated to the second distillation column.

第  1  表 100   0  160 90   10  117 80   20  109 60   40  90 40   60  88 20   80   B6 実施例2 実施例1の方法(=おいて蒸留残渣からの無水フタル酸
の回収率を約80重量%としたときの残渣物(無水フタ
ル酸濃度50%)の凝固点は183℃であったが、第2
表に示す割合で低沸点留分を混合したところ、その凝固
点は第2表に示すとおりとなり、低沸点留分を60重量
部以上混合したものについては釜残抜取りや移送配管内
での閉塞トラブルは全くなく、焼却炉での噴燃処理にも
支障がなかった。
Table 1 100 0 160 90 10 117 80 20 109 60 40 90 40 60 88 20 80 B6 Example 2 The method of Example 1 (= the recovery rate of phthalic anhydride from the distillation residue was about 80% by weight) The freezing point of the residue (50% phthalic anhydride concentration) was 183°C, but the second
When low boiling point fractions are mixed in the proportions shown in the table, the solidification points are as shown in Table 2. If 60 parts by weight or more of low boiling point fractions are mixed, problems such as removal of the residue from the pot and blockage in the transfer piping may occur. There was no problem at all, and there was no problem with the incineration process at the incinerator.

1 00              0      
      1 8390     10     1
73 80           20          
 1 6660           40     
      14840           60 
            9920         
  80              B6実施例3 実施例1の方法(=おいて、蒸留残渣からの無水フタル
酸の回収率を約90重量%としたときのq漬物(無水フ
タル酸30%)の凝固点は216℃であったが第3表に
示す割合で低沸点留分を混合したところ、その凝固点は
第3表に示すとおりとなった。凝固点が130℃以下と
なるものについては釜残抜取りや移送管内での閉塞トラ
ブルは全くなかった。
1 00 0
1 8390 10 1
73 80 20
1 6660 40
14840 60
9920
80 B6 Example 3 In the method of Example 1 (=), when the recovery rate of phthalic anhydride from the distillation residue is about 90% by weight, the freezing point of q pickles (phthalic anhydride 30%) is 216 ° C. However, when low boiling point fractions were mixed in the proportions shown in Table 3, the freezing points were as shown in Table 3.If the freezing point is below 130°C, remove the residue from the pot or block it in the transfer pipe. There were no problems at all.

第  5  表 100   0  216 90  10  208 80  20  195 60  40  172 40  60  107 20  80  10’0Table 5 100 0 216 90 10 208 80 20 195 60 40 172 40 60 107 20 80 10'0

【図面の簡単な説明】[Brief explanation of drawings]

図面は、本発明の一実施例を示すフローシートである。 2.7.9・・・蒸留塔。 The drawing is a flow sheet showing one embodiment of the present invention. 2.7.9... Distillation column.

Claims (4)

【特許請求の範囲】[Claims] (1)  ナフタリンまたはオルソキシレンを分子状酸
素含有ガスにより接触気相酸化して得られる粗製無水フ
タル酸を、精製蒸留に供して低沸点留分および無水フタ
ル酸留分を分離する際に発生する蒸留残渣を、回分式に
減圧蒸留することによって該蒸留残渣中に含有されてい
る無水フタル酸を回収し、該無水フタル酸回収後の残渣
物には無水フタル酸より低沸点の留分を混合して該残渣
物を蒸留釜外へ抜出すことを特徴とする無水フタル酸蒸
留残渣の処理方法。
(1) Generated when crude phthalic anhydride obtained by catalytic gas phase oxidation of naphthalene or ortho-xylene with molecular oxygen-containing gas is subjected to purification distillation to separate a low-boiling point fraction and a phthalic anhydride fraction. The phthalic anhydride contained in the distillation residue is recovered by batchwise vacuum distillation of the distillation residue, and a fraction with a boiling point lower than that of phthalic anhydride is mixed with the residue after the phthalic anhydride recovery. 1. A method for treating phthalic anhydride distillation residue, which comprises removing the residue from the distillation vessel.
(2)残渣物中に混合される低沸点留分の割合は、該残
渣物1重量部に対して0.1〜2重量部である特許請求
の範囲第1項に記載の処理方法。
(2) The treatment method according to claim 1, wherein the proportion of the low boiling point fraction mixed into the residue is 0.1 to 2 parts by weight per 1 part by weight of the residue.
(3)蒸留残渣は無水フタル酸を95〜70重量%含有
してなる特許請求の範囲第1項または第2項に記載の処
理方法。
(3) The treatment method according to claim 1 or 2, wherein the distillation residue contains 95 to 70% by weight of phthalic anhydride.
(4)無水フタル酸回収後の残漬物には無水フタル酸が
10〜60重量%残存する特許請求の範囲第1項ないし
第3項のいずれか一つに記載の処理方法。
(4) The treatment method according to any one of claims 1 to 3, wherein 10 to 60% by weight of phthalic anhydride remains in the pickled material after phthalic anhydride recovery.
JP22389482A 1982-12-22 1982-12-22 Treatment of phthalic anhydride distillation residue Granted JPS59116280A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22389482A JPS59116280A (en) 1982-12-22 1982-12-22 Treatment of phthalic anhydride distillation residue

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22389482A JPS59116280A (en) 1982-12-22 1982-12-22 Treatment of phthalic anhydride distillation residue

Publications (2)

Publication Number Publication Date
JPS59116280A true JPS59116280A (en) 1984-07-05
JPH0359901B2 JPH0359901B2 (en) 1991-09-12

Family

ID=16805367

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22389482A Granted JPS59116280A (en) 1982-12-22 1982-12-22 Treatment of phthalic anhydride distillation residue

Country Status (1)

Country Link
JP (1) JPS59116280A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007331571A (en) * 2006-06-15 2007-12-27 Unipres Corp Automobile center pillar structure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007331571A (en) * 2006-06-15 2007-12-27 Unipres Corp Automobile center pillar structure

Also Published As

Publication number Publication date
JPH0359901B2 (en) 1991-09-12

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