JPS59113179A - Vacuum deposition device and start-up method thereof - Google Patents

Vacuum deposition device and start-up method thereof

Info

Publication number
JPS59113179A
JPS59113179A JP22178382A JP22178382A JPS59113179A JP S59113179 A JPS59113179 A JP S59113179A JP 22178382 A JP22178382 A JP 22178382A JP 22178382 A JP22178382 A JP 22178382A JP S59113179 A JPS59113179 A JP S59113179A
Authority
JP
Japan
Prior art keywords
evaporation
receiver
oxide film
molten metal
level
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22178382A
Other languages
Japanese (ja)
Other versions
JPH027397B2 (en
Inventor
Shigeo Itano
板野 重夫
Tetsuyoshi Wada
哲義 和田
Kenichi Yanagi
謙一 柳
Toshio Taguchi
田口 俊夫
Yoshimitsu Nakamura
中村 善満
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Nisshin Steel Co Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP22178382A priority Critical patent/JPS59113179A/en
Publication of JPS59113179A publication Critical patent/JPS59113179A/en
Publication of JPH027397B2 publication Critical patent/JPH027397B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/246Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To provide a vapor deposition device which coats continuously a long- sized material thereon with a metal and which has no oxide film on an evaporation surface by providing specifically a means for scrapping the oxide film of the molten metal for evaporation and an oxide film receiver made of a carbonaceous material with a heating mechanism. CONSTITUTION:A scraper bar 22 for scraping oxide film, a receiver 23 for the scraped oxide film, and a heater 24 for heating the receiver are provided in a crucible 5 for evaporation at the position higher than the level of the molten metal, for example, molten Zn 6 in the stage of vapor deposition. The crucible 5, the bar 22, the receiver 23 and a communication pipe 8 are heated to the m. p. of Zn or above and the bar 22 is placed in the position 22'. The inside of a vapor deposition chamber 4 is thereupon evacuated to rise the Zn 6 in a melting furnace 7 through the pipe 8 into the crucible and to maintain the level thereof at the level A in the crucible 5 and thereafter the bar 22 is moved right from the inside of the receiver 23' to the position of the receiver 23, thereby scraping the oxide film on the Zn 6. The level of the Zn 6 is then lowered to the level B in the stage of vapor deposition by a level adjuster 11, and the vapor deposition is started.

Description

【発明の詳細な説明】 本発明は、銅帯等の長尺材に連続的に金属被膜を真空蒸
着し、かつ蒸発用の金属を大気圧下の溶融金属槽から真
空蒸着室内の蒸発用ルツボに連通管により供給する真空
蒸着装置と、そのスタートアップ法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention involves continuously vacuum-depositing a metal coating on a long material such as a copper strip, and transferring the metal for evaporation from a molten metal tank under atmospheric pressure to an evaporation crucible in a vacuum deposition chamber. This article relates to a vacuum evaporation device that supplies water via a communicating tube, and its start-up method.

従来のスタートアップ法を第1図、第2図により説明す
る。
A conventional startup method will be explained with reference to FIGS. 1 and 2.

第1図は銅帯にZnを連続的に蒸着する態様を示してお
り、アンコイラ2から巻戻された鋼帯1は差圧排気室群
5を経た後、真空蒸着室411?:入り、その表向にZ
nが蒸着され、次いで出側差圧排気室群12を経てコイ
ン15Vc巻かれて製品となる。
FIG. 1 shows a mode in which Zn is continuously deposited on a copper strip, and the steel strip 1 uncoiled from the uncoiler 2 passes through the differential pressure exhaust chamber group 5 and then into the vacuum deposition chamber 411? : Enter, Z on the front
n is vapor-deposited, and then passed through the outlet differential pressure exhaust chamber group 12 and wound with a coin 15Vc to become a product.

真空蒸着室4内には、蒸発用ルツボ5が設置されており
、該ルツボ5の中に蒸発用の溶融Zn6が保持されてい
る。この溶融Zn 6は、大気中にある溶解炉(すなわ
ち溶融金属槽)7から大気圧により連通管8を介して補
給される。蒸発用ルツボ5、連通管8お工び溶解炉7 
VCはヒータ9.10が付設されており、所定の温度1
てZnを加熱している。
An evaporation crucible 5 is installed in the vacuum deposition chamber 4, and molten Zn6 for evaporation is held in the crucible 5. This molten Zn 6 is supplied from a melting furnace (that is, a molten metal tank) 7 located in the atmosphere at atmospheric pressure via a communication pipe 8. Evaporation crucible 5, communication pipe 8 and melting furnace 7
The VC is equipped with a heater 9.10, and the predetermined temperature 1
to heat Zn.

なお、11は溶解炉7を上昇又は下降させて蒸発用ルツ
ボ5内のZnレベルを一定に保持又は変更するためのレ
ベル調整機、14は差圧排気室群5,12に設けられた
シールロール、15は同室群5,12に設けられた排気
口、16は真空蒸着室4に設けられた排気口でちゃ、1
これらの排気口15.16は図示省略の真空ポンプに連
結されている。
In addition, 11 is a level adjustment machine for raising or lowering the melting furnace 7 to maintain or change the Zn level in the evaporation crucible 5, and 14 is a seal roll provided in the differential pressure exhaust chamber group 5, 12. , 15 is an exhaust port provided in the same chamber group 5, 12, 16 is an exhaust port provided in the vacuum deposition chamber 4, 1
These exhaust ports 15, 16 are connected to a vacuum pump (not shown).

この工うな態様においては、図示するように蒸発用ルツ
ボ5内の浴融Zn6の表面に酸化Zn(スカム)17が
浮いており、沸騰現象の原因となっている。沸騰が生じ
ると、液滴状のZnが生成し、鋼帯1vc付着して蒸看
面の状態を悪化させ、製品価値を損うという問題がある
In this unconventional embodiment, as shown in the figure, oxidized Zn (scum) 17 floats on the surface of the bath molten Zn 6 in the evaporation crucible 5, causing a boiling phenomenon. When boiling occurs, droplet-shaped Zn is generated and adheres to the steel strip 1vc, deteriorating the condition of the steaming surface and impairing product value.

この酸化Zn(スカム)17が生成する原因としては、
第2図に示すような従来のスタートアップ法に欠点があ
るためである。
The reason why this oxidized Zn (scum) 17 is generated is as follows.
This is because the conventional startup method as shown in FIG. 2 has drawbacks.

すなわち第2図において、蒸着作業を一時停止するよう
な場合、溶解炉7のレベルを下げて蒸発用ルツボ5内よ
り溶融Zn6を排出する必要がある。この際に溶融Zn
の一部が蒸発用ルツボ5および連通管8の内壁に付着残
留する。この付着残留したZn20が大気又は不活性ガ
ス雰囲気中の酸化性ガスにより酸化され、付着Zn20
の表面に酸化Znの被膜21を生成する。
That is, in FIG. 2, when the vapor deposition operation is temporarily stopped, it is necessary to lower the level of the melting furnace 7 and discharge the molten Zn 6 from the evaporation crucible 5. At this time, melted Zn
A part of it remains attached to the inner walls of the evaporation crucible 5 and the communication pipe 8. This remaining Zn20 is oxidized by oxidizing gas in the air or inert gas atmosphere, and the Zn20
A Zn oxide film 21 is formed on the surface of the .

この状態で次にスタートアップすると、溶解炉7から連
通管8を介して蒸発用ルツボ5内に溶融Znを供給しな
ければならないので、この通過溶融Znにより、連通管
8や蒸発用ルツボ5iC付着していた酸化Zn被膜21
が剥離し、蒸発ルツボ5内の浴融Zn6の表面にスカム
として浮遊してし1うのである。
When the next startup is performed in this state, molten Zn must be supplied from the melting furnace 7 to the evaporation crucible 5 through the communication pipe 8, so this passing molten Zn will cause adhesion to the communication pipe 8 and the evaporation crucible 5iC. Zn oxide film 21
is peeled off and floats as scum on the surface of the bath-molten Zn 6 in the evaporation crucible 5.

本発明は、以上の欠点を解決するためになされたもので
、 (1)銅帯等の長尺材に連続的に金属被膜を真空蒸着し
、かつ蒸発用金属を大気圧下の溶融金属槽から真空蒸着
室内の蒸発ルツボに連通管により供給する連続真空蒸着
装置において、蒸発ルツボ内に、蒸発用溶融金属表面上
の酸化被膜を掻取るための掻取手段および該掻取手段に
よって掻取られた酸化被膜を受けるための受けを蒸着時
の溶融金属レベルよりも上方に設け、かつ該受けをカロ
熱する機構を有すると共に、該受けの構成材料を炭素質
材料とすること全特徴とする連続真空蒸着装置、(2)
  上記(1)に記載の装置の始動時に、真空蒸着室内
を排気することにより溶融金属を一旦蒸発ルツボ円の酸
化被膜の受けより上方のレベルまで供給した後、掻取手
段にて溶融金属上の酸化被膜を掻取り、その後、溶融金
属を蒸着時のレベルまで下げて蒸M全開始することf:
特徴とする真空蒸着装置のスタートアップ法、 に関するものである1、 以下、添付図面を参照して本発明の装置および方法を詳
細に説明する。
The present invention has been made to solve the above-mentioned drawbacks. (1) A metal coating is continuously vacuum-deposited on a long material such as a copper strip, and the metal for evaporation is deposited in a molten metal tank under atmospheric pressure. In a continuous vacuum evaporation apparatus in which the oxide film is supplied from the evaporation crucible in the vacuum evaporation chamber to the evaporation crucible in the vacuum evaporation chamber through a communicating pipe, a scraping means for scraping off the oxide film on the surface of the molten metal for evaporation is provided in the evaporation crucible, and the oxide film is scraped off by the scraping means. A continuous method characterized in that a receiver for receiving the oxidized film is provided above the level of the molten metal during vapor deposition, a mechanism is provided to heat the receiver, and the constituent material of the receiver is a carbonaceous material. Vacuum deposition equipment, (2)
When starting up the apparatus described in (1) above, the molten metal is once supplied to a level above the oxide film receptacle of the evaporation crucible circle by evacuating the vacuum evaporation chamber, and then the molten metal is removed by the scraping means. After scraping off the oxide film, the molten metal is lowered to the level at which it was deposited and the entire evaporation process is started f:
1. Hereinafter, the apparatus and method of the present invention will be described in detail with reference to the accompanying drawings.

第5図は本発明の装置および方法の一実施態様例を示す
図で、該図中第1.2図と同一符号は第1.2図と同一
のものを示す。
FIG. 5 is a diagram showing an embodiment of the apparatus and method of the present invention, in which the same reference numerals as in FIG. 1.2 indicate the same elements as in FIG. 1.2.

第5図において、溶解炉7を予め加熱して炉内の蒸発用
のZnを溶融させた状態にしておく。
In FIG. 5, the melting furnace 7 is heated in advance to melt Zn for evaporation in the furnace.

一方、蒸発用ルツボ5内には溶融金属上の酸化被膜を掻
取る几めの掻取棒22、掻取った酸化被膜の受け25、
および受け25を加熱するためのヒータ24が設置され
ており、蒸発ルツボ5、掻取棒22、受け25および連
通管8をZnの融点以上の温度に加熱しておく。また、
この時、掻取棒22は受け25′の位置に保持(図中、
22′で表示)しておく。
On the other hand, inside the evaporation crucible 5, there is a sharp scraping rod 22 for scraping off the oxide film on the molten metal, a receiver 25 for the scraped oxide film,
A heater 24 is installed to heat the receiver 25, and the evaporation crucible 5, scraping rod 22, receiver 25, and communication tube 8 are heated to a temperature equal to or higher than the melting point of Zn. Also,
At this time, the scraping rod 22 is held at the position of the receiver 25' (in the figure,
22').

この状態で蒸着室4内を排気し、溶解炉7内の溶融Zn
を連通管8を通して上昇させ、溶融Znの浴mが蒸発用
ルツボ5のレベルAまで上昇した後、受け25′に保持
していた掻取@ 22’ i受け25の位置まで移動さ
せ、溶融Zn上の酸化被膜を掻取る。
In this state, the vapor deposition chamber 4 is evacuated, and the molten Zn in the melting furnace 7 is
is raised through the communication pipe 8, and after the molten Zn bath m has risen to the level A of the evaporation crucible 5, it is moved to the position of the scraping @ 22'i receiver 25 held in the receiver 25', and the molten Zn is Scrape off the oxide film on top.

次に、レベル調節機11により溶融Znのレベル會蒸看
時のレベルBtで下げて蒸着を開始する。
Next, the level of molten Zn is lowered by the level controller 11 to the level Bt during evaporation, and evaporation is started.

この操作によって、溶融Zn上の酸化被膜は掻取られて
受け25に集められているため、蒸発面には酸化被膜は
なく、異常沸騰を生じることはない。
By this operation, the oxide film on the molten Zn is scraped off and collected in the receiver 25, so there is no oxide film on the evaporation surface and no abnormal boiling occurs.

また受け23は炭素質材料で構成されているため、該受
け23に果められた酸化被膜21は、ヒーター24vc
工って加熱でれた受け25の炭素質材料の作用VCよシ
、 znO十C→zn↑十Co↑ −−−−−−0(1)の
反応によって還元されて消失するため、酸化被膜が蓄積
されることはない。
Further, since the receiver 23 is made of a carbonaceous material, the oxide film 21 formed on the receiver 23 is
The action of the carbonaceous material of the receiver 25 which has been heated by VC is reduced and disappears by the reaction znO0C→zn↑0Co↑------0(1), so that the oxide film is is never accumulated.

掻取棒22は、上記の棒状のものに限らず、板状でも良
く、材質は溶融Znと反応せず、かつ耐熱性のあるもの
が好ましく、W、Mo等の高融点金属、A403 、 
Zr01等の酸化物、炭素質材料等が使用されるが、上
記受け23による酸化被膜の還元除去全助長する意味か
らは炭素質材料が最適である。また受け25は、酸化被
膜の還元除去のために炭素質材料を構成材料とする必要
があり、蒸発ルツボ5と一体として炭素質材料で製作し
ても良いし、還元反応は表面反応であるため炭素質材料
で受け25をライニングしても良い。さらにヒータ24
は、真空中で使用されるためW 、 Mo 、黒鉛等が
適している。
The scraping rod 22 is not limited to the above-mentioned rod shape, but may also be a plate shape, and the material is preferably one that does not react with molten Zn and is heat resistant, such as a high melting point metal such as W, Mo, etc., A403,
Although oxides such as Zr01, carbonaceous materials, etc. are used, carbonaceous materials are most suitable in terms of fully promoting the reduction and removal of the oxide film by the receiver 23. In addition, the receiver 25 needs to be made of a carbonaceous material in order to reduce and remove the oxide film, and may be made of a carbonaceous material integrally with the evaporation crucible 5, and since the reduction reaction is a surface reaction. The receiver 25 may be lined with a carbonaceous material. Furthermore, the heater 24
W, Mo, graphite, etc. are suitable for use in a vacuum.

以上詳述したように、本発明装置および方法によれば、
蒸着操業時に、蒸発用ルツボ5円の溶融金属上(すなわ
ち蒸発面上)に酸化物被膜かないため、異常沸騰が生ぜ
ず鋼帯1へ正常な蒸着を行うことができる。
As detailed above, according to the device and method of the present invention,
During the vapor deposition operation, there is no oxide film on the molten metal of the evaporation crucible (ie, on the evaporation surface), so abnormal boiling does not occur and normal vapor deposition can be performed on the steel strip 1.

【図面の簡単な説明】[Brief explanation of drawings]

第1図および第2図は従来の連続真空蒸着装置およびそ
のスタートアップ法を説明するための図、第5図は本発
明の装置および方法の一実施態様例を説明するための図
である。 復代理人  内 1)  明 復代理人  萩 原 亮 − 第1頁の続き 0発 明 者 中村善満 広島市西区観音新町四丁目6番 22号三菱重工業株式会社広島研 突所内 ■出 願 人 日新製鋼株式会社 東京都千代田区丸の内3丁目4 番1号 −391=
1 and 2 are diagrams for explaining a conventional continuous vacuum evaporation apparatus and its start-up method, and FIG. 5 is a diagram for explaining an embodiment of the apparatus and method of the present invention. Sub-Agent 1) Meifuku Agent Ryo Hagiwara - Continued from page 1 0 Inventor Zenman Nakamura Mitsubishi Heavy Industries, Ltd. Hiroshima Research Center, 4-6-22 Kannon-Shinmachi, Nishi-ku, Hiroshima ■Applicant Date Shin Steel Co., Ltd. 3-4-1-391 Marunouchi, Chiyoda-ku, Tokyo =

Claims (2)

【特許請求の範囲】[Claims] (1)  *A帯等の長尺材に連続的に金属被膜を真空
蒸着し、かつ蒸発用金属を大気圧下の溶融金属槽ηλら
真空蒸着室内の蒸発ルツボに連通管により供給する連続
真空蒸着装置において、蒸発ルツボ内に蒸発用溶融金属
表面上の酸化被膜を掻取るための掻取手段および該掻取
手段によって掻取られた酸化被膜を受けるための受けを
蒸着時の溶融金属レベルよりも上方に設け、かつ該受け
を加熱する機構を有すると共に、該受けの構成材料金炭
素質材料とすることft特徴とする連続真空蒸着装置。
(1) *A continuous vacuum system in which a metal coating is continuously vacuum-deposited on a long material such as an A-band, and the metal for evaporation is supplied from a molten metal tank ηλ under atmospheric pressure to an evaporation crucible in a vacuum deposition chamber through a communication pipe. In the vapor deposition apparatus, a scraping means for scraping off the oxide film on the surface of the molten metal for evaporation and a receiver for receiving the oxide film scraped off by the scraping means are provided in the evaporation crucible below the level of the molten metal during vapor deposition. 1. A continuous vacuum evaporation apparatus, characterized in that the receiver is provided above and has a mechanism for heating the receiver, and the constituent material of the receiver is a gold-carbonaceous material.
(2)−帯等の長尺材に連続的に金属被膜を真空蒸着し
、かつ蒸発用金属を大気圧下の溶融金属槽から真空蒸着
室内の蒸発ルツボに連通管により供給する連続真空蒸着
装置でろって、蒸発ルツボ内に、蒸発用溶融金属表面上
の酸化被膜を掻取るための掻取手段および該掻取手段に
よって掻取られた酸化被膜を受けるための受けを蒸着時
の溶融金属レベルよりも上方に設け、かつ該受けを加熱
する機構を有すると共に、該受けの構成材料全炭素質材
料とする真空蒸着装置の始動時に、真空蒸着室内を排気
することにより溶融金属を一旦蒸発ルツボ内の酸化被膜
の受けよジ上方のレベルまで供給した後、掻取手段にて
溶融金属上の酸化被膜を掻取り、その後、溶融金属を蒸
着時のレベルまで下げて蒸Nを開始することを特徴とす
る真空蒸着装置のスタートアップ法。
(2) - Continuous vacuum evaporation equipment that continuously vacuum evaporates a metal coating onto a long material such as a belt, and supplies the evaporation metal from a molten metal tank under atmospheric pressure to an evaporation crucible in a vacuum evaporation chamber through a communicating pipe. In addition, a scraping means for scraping off the oxide film on the surface of the molten metal for evaporation and a receiver for receiving the oxide film scraped off by the scraping means are installed in the evaporation crucible to reduce the level of the molten metal during evaporation. At the start of the vacuum evaporation apparatus, the evaporation chamber is evacuated and the molten metal is temporarily heated inside the evaporation crucible. After supplying the molten metal to a level above the oxidation layer, the oxide film on the molten metal is scraped off by a scraping means, and then the molten metal is lowered to the level at the time of evaporation and evaporation of N is started. Start-up method for vacuum evaporation equipment.
JP22178382A 1982-12-20 1982-12-20 Vacuum deposition device and start-up method thereof Granted JPS59113179A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22178382A JPS59113179A (en) 1982-12-20 1982-12-20 Vacuum deposition device and start-up method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22178382A JPS59113179A (en) 1982-12-20 1982-12-20 Vacuum deposition device and start-up method thereof

Publications (2)

Publication Number Publication Date
JPS59113179A true JPS59113179A (en) 1984-06-29
JPH027397B2 JPH027397B2 (en) 1990-02-16

Family

ID=16772128

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22178382A Granted JPS59113179A (en) 1982-12-20 1982-12-20 Vacuum deposition device and start-up method thereof

Country Status (1)

Country Link
JP (1) JPS59113179A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1967604A1 (en) * 2007-03-08 2008-09-10 Applied Materials, Inc. Evaporation crucible and evaporation apparatus with directional evaporation
US20130199447A1 (en) * 2010-12-13 2013-08-08 Posco Continuous Coating Apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1967604A1 (en) * 2007-03-08 2008-09-10 Applied Materials, Inc. Evaporation crucible and evaporation apparatus with directional evaporation
US20130199447A1 (en) * 2010-12-13 2013-08-08 Posco Continuous Coating Apparatus
JP2013545900A (en) * 2010-12-13 2013-12-26 ポスコ Continuous coating equipment
US9267203B2 (en) 2010-12-13 2016-02-23 Posco Continuous coating apparatus

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