JPS5898738A - Electrophotographic receptor - Google Patents
Electrophotographic receptorInfo
- Publication number
- JPS5898738A JPS5898738A JP19722381A JP19722381A JPS5898738A JP S5898738 A JPS5898738 A JP S5898738A JP 19722381 A JP19722381 A JP 19722381A JP 19722381 A JP19722381 A JP 19722381A JP S5898738 A JPS5898738 A JP S5898738A
- Authority
- JP
- Japan
- Prior art keywords
- modified silicone
- photoconductive
- silicone resin
- photoreceptor
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】 本発明は電子写真感光体に関する。[Detailed description of the invention] The present invention relates to an electrophotographic photoreceptor.
電子写真感光体は、所定の特性を得るため、あるいは適
用される電子写真プロセスの種類に応じて種々の構成を
とるものである。そして、電子写真感光体の代表的なも
のとして、支持体上に光導電層が形成されている感光体
および表面に絶縁層を備えた感光体があり、広く用いら
れている。支持体と光導電層から構成される感光体は、
最も一般的な電子写真プロセスによる即ち、帯電、画像
露光および現像、更に必要に応じて転写による画像形成
に用いられる。また絶縁層を備えた感光体について、こ
の絶縁層は光導電層の保鏝、感光体の機械的強度の改善
、暗減衰特性の改善、または、特定の電子写真プロセス
に適用されるため(更には無公害化の為)等の目的のた
めに設けられるものである。このような絶縁層を有する
感光体ま九は絶縁層を有する感光体を用いる電子写真プ
ロセスの代表的な例は、例えば、米国特許第28600
48号公報、特公昭41−16429号公報、特公昭3
8−15446号公報、特公昭46−3713号公報、
特公昭42−23910号公報、特公昭43−24’7
48号公報、特公昭42−19747号公報、特公昭3
6−4121号公報などに記載されている。Electrophotographic photoreceptors have various configurations in order to obtain predetermined characteristics or depending on the type of electrophotographic process to which they are applied. As representative electrophotographic photoreceptors, there are photoreceptors having a photoconductive layer formed on a support and photoreceptors having an insulating layer on the surface, which are widely used. The photoreceptor is composed of a support and a photoconductive layer.
It is used for image formation by the most common electrophotographic processes, ie, charging, image exposure and development, and optionally transfer. For photoreceptors with an insulating layer, this insulating layer can be used to protect the photoconductive layer, improve the mechanical strength of the photoreceptor, improve dark decay properties, or be applied to certain electrophotographic processes (and It is established for the purpose of eliminating pollution). A typical example of an electrophotographic process using a photoreceptor having an insulating layer is disclosed in US Pat. No. 28600, for example.
48 Publication, Special Publication No. 41-16429, Special Publication No. 3
Publication No. 8-15446, Japanese Patent Publication No. 46-3713,
Special Publication No. 42-23910, Special Publication No. 43-24'7
48 Publication, Special Publication No. 42-19747, Special Publication No. 3
It is described in Publication No. 6-4121 and the like.
電子写真感光体は、当然のことであるが、適用される電
子写真プロセスに応じた所定の感度、電気特性、更には
光学特性を備えていることが要求される。しかし、それ
ばかりでなく、感光体の耐湿性も重要な性質である。低
湿において優れた電子写真特性を備えていても、高湿下
で感光体表面電位が著しく低下する感光体においては、
安定した鮮明な画像を得ることが困難である。また、転
写を行う電子写真プロセスでは、通常感光体は繰り返し
使用されるため、感光体の帯電劣化により、さらに耐湿
性が低下することが多い。これは、感光体をヒーターで
加温し、除湿を行うことによっておる程度改善されるが
、それでも常に安定した鮮明な画像を”得るためには十
分ではなく、耳つ、常にヒーターを作動させなければな
らないため、コストアップの要因となるものである。As a matter of course, an electrophotographic photoreceptor is required to have predetermined sensitivity, electrical properties, and optical properties depending on the electrophotographic process to which it is applied. However, not only that, but also the moisture resistance of the photoreceptor is an important property. Even if a photoreceptor has excellent electrophotographic properties at low humidity, the surface potential of the photoreceptor decreases significantly under high humidity.
It is difficult to obtain stable and clear images. Further, in an electrophotographic process in which transfer is performed, a photoreceptor is usually used repeatedly, so that the moisture resistance of the photoreceptor often deteriorates further due to charging deterioration of the photoreceptor. This can be improved to some extent by heating the photoconductor with a heater and dehumidifying it, but it is still not enough to always obtain stable and clear images, and the heater must be constantly activated. This causes an increase in costs.
感光体の耐湿性を決める主な要因は、光導電層における
、結着剤の耐湿性、及び結着剤と光′導電材料とのなじ
みやすさである。従って結着剤の選択は、感光体の耐湿
性に極めて大肯い影響を与えるものである。
3しかしながら、結着剤としては他に塗工性
、耐溶剤性(絶縁層塗布の場合)も要求され、これらも
含めて電子写真感光体として十分な特性を有するような
光導電層を結着剤単独で達成することは非常に困難であ
る。The main factors determining the moisture resistance of a photoreceptor are the moisture resistance of the binder in the photoconductive layer and the compatibility of the binder with the photoconductive material. Therefore, the selection of binder has a very large influence on the moisture resistance of the photoreceptor.
3 However, as a binder, coatability and solvent resistance (in the case of coating an insulating layer) are also required, and including these, it is necessary to bind a photoconductive layer that has sufficient characteristics as an electrophotographic photoreceptor. This is very difficult to achieve with agents alone.
而して本発明の目的は耐湿性に優れた電子写真感光体を
提供することを主たる目的とする。The main object of the present invention is to provide an electrophotographic photoreceptor having excellent moisture resistance.
本発明による電子写真感光体は、表面に変性シリコン樹
脂の硬化被覆を有する光導電材料粒子と結着樹脂から成
る光導電層を有することを特徴とするものである。The electrophotographic photoreceptor according to the present invention is characterized in that it has a photoconductive layer comprising photoconductive material particles having a hardened coating of modified silicone resin on the surface and a binder resin.
本発明に用いられる変性シリコン樹脂として代表的なも
のは次式で示されるエポキシ変性シリコン樹脂である。A typical modified silicone resin used in the present invention is an epoxy modified silicone resin represented by the following formula.
R=H,C!H,、0,H,、0,H。R=H,C! H,,0,H,,0,H.
で表わされるもので市販品として代表的なものは
TSR194(商品名 東芝シリコン製)F81001
N (商品名 信越化学展)等がある。A typical commercially available product represented by is TSR194 (product name: Toshiba Silicon) F81001.
N (product name: Shin-Etsu Chemical Exhibition), etc.
変性シ」ノコ/樹脂を光導電材料粒子表面に塗布した後
硬化して硬化樹脂被覆とするために、硬化剤が添加され
る。A curing agent is added to apply the modified resin/resin to the surface of the photoconductive material particles and then cure to form a cured resin coating.
硬化剤としてはブロックイソシアネートが特に好aであ
る。ブロックイソシアネートとしては、インシアネート
プレポリマーを芳香族第2アミン、第3級アルコール、
アミド、ラクタム、フェノールオキシム等でマスキング
したものを使用する。代表的なインシアネートプレボリ
マイソシアネートプレポリマーをマスキングしたものは
加熱によりNOO基が再生し、再生体は活性水素化合物
と反応する。すなわち、ブロックイソシアネートは加熱
によりNOO基が再生し、再生したNOO基・がシリコ
ン樹脂末端の水酸基と反応し、耐溶剤性、耐久性に優れ
た塗膜を形成する。また加熱硬化の際、触媒としてアミ
ン化合物、カルボン酸アミン塩を添加するととくより硬
化温度を下げることができる。シリコン樹脂に対するブ
ロックイソシアネートの添加比率は10〜200Xの範
囲即ち、10:1−1:2の範囲、ブロックイソシアネ
ートに対する触媒の添加比率は1〜5に程度と設定され
る。Blocked isocyanates are particularly preferred as curing agents. As the block isocyanate, incyanate prepolymer can be used as aromatic secondary amine, tertiary alcohol,
Use one masked with amide, lactam, phenol oxime, etc. When a typical incyanate prebolimisocyanate prepolymer is masked, the NOO groups are regenerated by heating, and the regenerated product reacts with an active hydrogen compound. That is, the NOO groups of the blocked isocyanate are regenerated by heating, and the regenerated NOO groups react with the hydroxyl groups at the terminals of the silicone resin to form a coating film with excellent solvent resistance and durability. Further, during heat curing, the curing temperature can be particularly lowered by adding an amine compound or carboxylic acid amine salt as a catalyst. The addition ratio of the block isocyanate to the silicone resin is set in the range of 10 to 200X, that is, in the range of 10:1 to 1:2, and the addition ratio of the catalyst to the block isocyanate is set to about 1 to 5.
この樹脂は結着剤としても用いることが可能であり、千
の耐湿性は良好である。またブロックイソシアネートで
架橋硬化することにより、耐溶剤性が出現する。This resin can also be used as a binder and has good moisture resistance. Further, solvent resistance appears by crosslinking and curing with blocked isocyanate.
もつとも粉末状の光導電材料を用いた場合、分散性が悪
く、均一な塗面を形成し難いが、本発明では、光導電材
料粒子を変性シリコン樹脂でカプセル化することにより
、変性シリコン樹脂のすぐれた被覆性を生かし、゛結着
痢により塗面性の良好な光導電層を形成できるものであ
る。Naturally, when a powdered photoconductive material is used, its dispersibility is poor and it is difficult to form a uniform coating surface. However, in the present invention, by encapsulating the photoconductive material particles with a modified silicone resin, By taking advantage of its excellent coating properties, it is possible to form a photoconductive layer with good coating properties due to ``adhesion.''
カプセル化の方法としては、(1)あらかじめ光導電材
料粒子と変性シリコン樹脂を混合し、硬化させたのち粉
砕して結着剤に分散させる。(2)光導電材料粒子と変
性シリコン樹脂を混合し、未硬化の状態で結着樹脂に分
散させる、という方法も採用できるが、(1)の方法で
は、硬化後の粉砕により光導電材料が破壊され、電子写
真特性が劣化したり、また(2)では十分にカプセル化
が行われない場合もある。蝦も好適な方法は、表面に変
性シリコン樹脂の被覆を有する光導電材料粒子を該被覆
が溶解しない媒体に分散させた状態で硬化処理して形成
する方法である。The encapsulation method is as follows: (1) Photoconductive material particles and modified silicone resin are mixed in advance, hardened, and then pulverized and dispersed in a binder. (2) A method of mixing photoconductive material particles and modified silicone resin and dispersing them in a binder resin in an uncured state can also be adopted, but in method (1), the photoconductive material is crushed by pulverization after curing. The electrophotographic properties may be destroyed and the electrophotographic properties may be deteriorated, and (2) may not result in sufficient encapsulation. A suitable method is one in which particles of a photoconductive material having a surface coated with a modified silicone resin are dispersed in a medium in which the coating is not dissolved, and then subjected to a curing treatment.
この場合、光導電材料と変性シリコン樹脂とブロックイ
ソシアネートの比(固形分9重量比)は100:10〜
100:30、混合したときの粘度は30〜100 c
psが好適で、また分散媒としては水、あるいは、脂肪
族炭化水素系溶剤が用いられる。In this case, the ratio of photoconductive material, modified silicone resin, and blocked isocyanate (solid content 9 weight ratio) is 100:10 to
100:30, viscosity when mixed is 30-100c
PS is preferred, and water or an aliphatic hydrocarbon solvent is used as the dispersion medium.
光導電材料と変性シリコン樹脂の混合比、及び粘度は、
光導電材料粒子の被覆度に影響し、被覆度が高すぎると
(シリコン樹脂の比重大、粘度高)、光導電材料粒子間
のコンタクトが悪くキャリヤー(1!荷)の移動が不十
分になる。The mixing ratio and viscosity of the photoconductive material and modified silicone resin are as follows:
It affects the degree of coverage of the photoconductive material particles, and if the degree of coverage is too high (specific weight of silicone resin, high viscosity), the contact between the photoconductive material particles will be poor and the movement of carriers (1! charge) will be insufficient. .
一方、被覆度が低いと(W脂率小、粘度低)、耐湿性が
不十分になる。On the other hand, if the degree of coverage is low (low W fat percentage, low viscosity), moisture resistance will be insufficient.
本発明に用いられる光導電材料として仕、ZnO、Od
8 、 Tiet、 0dSe 、 Se 、 8eT
e 、 8eAsなどの。The photoconductive materials used in the present invention include ZnO, Od
8, Tiet, 0dSe, Se, 8eT
e, 8eAs, etc.
無機材料、フタロシアニン、ポリビニルカルバゾール、
アントラセン、ポリビニルピレン、ポリビニルアントラ
センなどがある。Inorganic materials, phthalocyanine, polyvinylcarbazole,
Examples include anthracene, polyvinylpyrene, and polyvinylanthracene.
光導電層の結着剤として用いられる樹脂としては溶剤可
S型の塩化ビニル−酢酸ビニル共重合体、飽和ポリエス
テル樹脂、ポリカーボネート−脂、ポリサルフォノ樹脂
、ポリアセタール樹脂、ポリアクリレート樹脂、エポキ
シ樹脂、ブチラール樹脂、アルキド樹脂、アクリル樹脂
などである。Resins used as binders for the photoconductive layer include solvent-soluble S-type vinyl chloride-vinyl acetate copolymers, saturated polyester resins, polycarbonate resins, polysulfono resins, polyacetal resins, polyacrylate resins, epoxy resins, and butyral resins. , alkyd resin, acrylic resin, etc.
光導電層の厚さは、使用する光導電物質の種類特性にも
よるが、一般的には5〜100μ、特には10〜50μ
程度が好適である。The thickness of the photoconductive layer depends on the type and characteristics of the photoconductive material used, but is generally 5 to 100 μm, particularly 10 to 50 μm.
degree is suitable.
絶縁層の厚さは適宜設定されるものであるが、通常5〜
70μ、特には10〜50μに設定される。The thickness of the insulating layer is set appropriately, but is usually 5~
It is set to 70μ, particularly 10 to 50μ.
実施例1
OdS粉末100部(重量部、以下同じ)を、エポキシ
変性シリコン樹脂溶液(商品名: TSR194、J[
芝シリコン製)とブロックインシアネート(商品名;D
O2971、日本ボリウレタ/製)との混合物20mK
加えて攪拌する。シリコン樹脂(以下Sと略す)、とブ
ロックイソシアネート(以下BIと略す)との比は5:
2とする。これを粘度50 cps K調整して水中に
分散し、激しく攪拌し、オートクレーブ中で140℃、
30分加熱硬化させる。得られたカプセル化OdS粉末
を100℃、60分間加熱処理した後、これを100部
に対し、結着剤の飽叩ポリエステル樹脂(商品名;バイ
ロン200゜東洋紡製)のトルエン溶液10部を加えて
混合し、80μギヤツプのロールミル装置に3回通して
分散させる。Example 1 100 parts (by weight, the same applies hereinafter) of OdS powder was added to an epoxy modified silicone resin solution (trade name: TSR194, J[
Made of Shiba Silicone) and Block Incyanate (Product name: D
20mK mixture with O2971 (manufactured by Nippon Boliureta)
Add and stir. The ratio of silicone resin (hereinafter abbreviated as S) to blocked isocyanate (hereinafter abbreviated as BI) is 5:
Set it to 2. The viscosity of this was adjusted to 50 cps K, dispersed in water, stirred vigorously, and heated at 140°C in an autoclave.
Heat and cure for 30 minutes. After heat-treating the obtained encapsulated OdS powder at 100°C for 60 minutes, 10 parts of a toluene solution of a beaten polyester resin (trade name: Vylon 200° manufactured by Toyobo Co., Ltd.) as a binder was added to 100 parts of the powder. Mix and disperse through three passes through a roll mill with an 80μ gap.
上記塗料を長さ40備のMドラム支持体上にディッピン
グ法で塗布し゛100℃、20分間乾燥処理を施して膜
厚35μの光導電層を形成する。続いて20μ厚の円筒
形熱収縮ポリエチレンテレフタレートフィルム(商品名
:Ho5taphanshrink Film KAL
LE 製)90+m≠を上記シリンダーKかぶせ、12
0℃で30分間の熱収縮を行ない、絶縁層を形成した。The above coating material was applied by dipping onto an M drum support having a length of 40 mm, and dried at 100 DEG C. for 20 minutes to form a photoconductive layer having a thickness of 35 .mu.m. Next, a cylindrical heat-shrinkable polyethylene terephthalate film with a thickness of 20μ (product name: Ho5taphanshrink Film KAL
LE) 90+m≠ covered with the above cylinder K, 12
Heat shrinkage was performed at 0° C. for 30 minutes to form an insulating layer.
これを感光体Iとする。This will be referred to as photoreceptor I.
実施例2
0d8粉末100部にSとBIの混合物10部を加えて
その粘度を80 cpsとしたこと、・および結着剤と
して塩ビー酢と共重合樹脂(商品名: VMOH,UO
O製)を用いたことを除いては実施例1と同様に作成さ
れた感光体を感光体I−とする。Example 2 10 parts of a mixture of S and BI was added to 100 parts of 0d8 powder to make the viscosity 80 cps, and chlorine vinegar and copolymer resin (trade name: VMOH, UO) were used as a binder.
A photoreceptor manufactured in the same manner as in Example 1 except that a photoreceptor manufactured by O.
比較例1
0dS粉末100部にSとBIの混合物20部を加えて
よく混合し、これを100℃、30分子備乾燥する。こ
れを粉砕した粉末100部に対して結着剤バイロン20
0を10部用いて混合し命料の乾燥、硬化温度を140
℃、20分間としたことを除いては後は実施例1と同様
に作成された感光体を感光体■とする。Comparative Example 1 20 parts of a mixture of S and BI were added to 100 parts of 0dS powder, mixed well, and dried at 100° C. for 30 molecules. For 100 parts of the crushed powder, binder Vyron 20
Mix 10 parts of 0 and dry the material and set the curing temperature to 140
A photoreceptor prepared in the same manner as in Example 1 except that the temperature was changed to 20 minutes was used as photoreceptor ①.
比較例2
0dS粉末100部とSとBI混合部lO部、バイロン
200.10部を加えて混合し、この塗料を80μギヤ
ツプのロールミル装置に3回通過させた後は実施例1と
同様に作成された感光体を感光体■とする。Comparative Example 2 100 parts of 0dS powder, 10 parts of S and BI mixture, and 200.10 parts of Vylon were added and mixed, and the paint was passed through a roll mill device with an 80μ gap three times, and then prepared in the same manner as in Example 1. The resulting photoreceptor is referred to as photoreceptor (■).
この様にして得られた感光体I〜■について、−次■帯
電、二次AO除電同時露光、全面照射、eトナーによる
乾式現倫、転写、ブレードクリーニングからなるプロセ
スで各種評価を行った。Various evaluations were performed on the photoreceptors I to (2) obtained in this way using a process consisting of -2 charging, secondary AO static elimination simultaneous exposure, full surface irradiation, dry development with e-toner, transfer, and blade cleaning.
その結果は第1表に示される。The results are shown in Table 1.
第1表
表IK示されるように比較例1の方法で作成された感光
体■は、画倫上で問題が見られ、カプセル化の方法とし
ては不適格である。As shown in Table 1, Table IK, the photoreceptor (2) produced by the method of Comparative Example 1 had problems in image quality and was unsuitable as an encapsulation method.
次VcwJJ像暗部の感光体表面電位が高湿下での耐久
テストによってどれだけ低下するかを調べたO
第2表 耐久後の画像暗部電位保持率第2表に示すよ
うに、感光体I、lについては、良好な電位保持率を示
し、画像濃度も低下しなかった。How much the surface potential of the photoreceptor in the dark area of the next VcwJJ image was reduced by a durability test under high humidity was investigated. 1 showed a good potential retention rate, and the image density did not decrease.
しかし、感光体■はシリコン樹脂とOd8の加熱混合物
を粉砕する際にOdS表面が一部破壊され水分の攻撃を
受けやすくなったと考えられる。However, it is considered that the OdS surface of the photoreceptor (1) was partially destroyed during the crushing of the heated mixture of silicone resin and Od8, making it susceptible to moisture attack.
また感光体■はシリコン樹脂と、他の結着剤(バイロン
200)が同時にOd8と混合されているため、Od8
表面のシリコン樹脂による被覆が十分でないと考えられ
る。・
実施例3
0d8粉末100 gK対しS トB I fi合41
140部を加えて、粘度を200cpsKail整した
ことを除いては実施例1と同様に作成された感光体を感
光体■とする。In addition, since the photoreceptor ■ contains silicone resin and another binder (Vylon 200) mixed with Od8 at the same time, Od8
It is thought that the surface is not sufficiently coated with silicone resin.・Example 3 0d8 powder 100 gK to S to B I fi 41
A photoreceptor was prepared in the same manner as in Example 1, except that 140 parts were added and the viscosity was adjusted to 200 cps Kail.
実施例4
0d8粉末100部に対し、SとBI混合物を10部加
えて、粘度を80 cpsとし、結着剤として、塩化ビ
ニル−酢酸ビニル共重合樹脂(商品名VMOH:ユニオ
ンカーバイド製)を用い、実施例1と同様な方法で感光
体を作成する。そ■につ匹ても感光体Iおよび■と同様
に画像性および耐湿性が良好であった。Example 4 10 parts of S and BI mixture were added to 100 parts of 0d8 powder to give a viscosity of 80 cps, and a vinyl chloride-vinyl acetate copolymer resin (trade name: VMOH, manufactured by Union Carbide) was used as a binder. , a photoreceptor was prepared in the same manner as in Example 1. On the other hand, the image properties and moisture resistance of photoreceptors I and II were also good.
出 順 人 キャノン株式会社In order of appearance: Canon Co., Ltd.
Claims (2)
電材料粒子と結着樹脂から成る光導電層を有することを
特徴とする電子写真感光体。(1) An electrophotographic photoreceptor characterized by having a photoconductive layer consisting of photoconductive material particles having a hardened powder of modified silicone resin on the surface and a binder resin.
する光導電材料粒子を該被覆が溶解しない媒体忙分散さ
せた状態で硬化処理して形成されたものである特許請求
の範囲第1項記載の電子写真感光体。(2) The cured coating is formed by curing the photoconductive material particles having a modified silicone resin coating on the surface while being dispersed in a medium in which the coating does not dissolve. The electrophotographic photoreceptor described above.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19722381A JPS5898738A (en) | 1981-12-08 | 1981-12-08 | Electrophotographic receptor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19722381A JPS5898738A (en) | 1981-12-08 | 1981-12-08 | Electrophotographic receptor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5898738A true JPS5898738A (en) | 1983-06-11 |
Family
ID=16370880
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19722381A Pending JPS5898738A (en) | 1981-12-08 | 1981-12-08 | Electrophotographic receptor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5898738A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61170747A (en) * | 1985-01-25 | 1986-08-01 | ゼロツクス コーポレーシヨン | Photosensitive image forming member containing polysilylene hole transfer compound |
JP2019075265A (en) * | 2017-10-16 | 2019-05-16 | 信越ポリマー株式会社 | Conductive particle and method for producing the same, and conductive resin composition |
-
1981
- 1981-12-08 JP JP19722381A patent/JPS5898738A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61170747A (en) * | 1985-01-25 | 1986-08-01 | ゼロツクス コーポレーシヨン | Photosensitive image forming member containing polysilylene hole transfer compound |
JP2019075265A (en) * | 2017-10-16 | 2019-05-16 | 信越ポリマー株式会社 | Conductive particle and method for producing the same, and conductive resin composition |
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