JPS5885847A - 2-naphthol-1-diazonium lewis acid salt and its preparation - Google Patents

2-naphthol-1-diazonium lewis acid salt and its preparation

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Publication number
JPS5885847A
JPS5885847A JP18511481A JP18511481A JPS5885847A JP S5885847 A JPS5885847 A JP S5885847A JP 18511481 A JP18511481 A JP 18511481A JP 18511481 A JP18511481 A JP 18511481A JP S5885847 A JPS5885847 A JP S5885847A
Authority
JP
Japan
Prior art keywords
salt
acid
lewis acid
naphthol
diazonium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18511481A
Other languages
Japanese (ja)
Inventor
Juichi Kurosaki
岡本邦夫
Takashi Numakura
原島進
Kunio Okamoto
黒崎壽一
Noriaki Tsukada
沼倉孝
Susumu Harashima
塚田典明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yamatoya and Co Ltd
Original Assignee
Yamatoya and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yamatoya and Co Ltd filed Critical Yamatoya and Co Ltd
Priority to JP18511481A priority Critical patent/JPS5885847A/en
Publication of JPS5885847A publication Critical patent/JPS5885847A/en
Pending legal-status Critical Current

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  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

NEW MATERIAL:The compound of formulaI[R1, R2, R3, R4, R5 and R6 are H, alkyl, sulfonic acid group, carboxylic acid group or its derivative; X is an anion group (Lewis acid salt) such as BF<->4, PF<->6, AsF<->6, SbF<->6, SnCl<-2>6, FeCl<->4, BiCl<-2>5, etc. which generates a Lewis acid by light irradiation]. EXAMPLE:2-Naphthol-1-diazonium boron tetrafluoride. USE:Raw material for the preparation of photo-sensitive resin. PROCESS:The compound of formulaIcan be prepared by (1) reacting aminonaphthol of formula II, or an aminonaphthol salt derived from said aminonaphthol and hydrochloric acid or the above Lewis acid salt, with sodium nitrite or an alkyl nitrite, and (2) reacting the product with a Lewis acid and a compound composed of the complex of the acid and its salt (e.g. fluoboric acid or its K or Na salt).

Description

【発明の詳細な説明】 本発明は感光性樹脂の製造原料として有用な2−ナフト
ール−1−ジアゾニウムルイス酸塩類およびその製造方
法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to 2-naphthol-1-diazonium Lewis acid salts useful as raw materials for producing photosensitive resins and a method for producing the same.

これまでの感光性樹脂はジアゾ基、アジド基、シンナモ
イル基あるいはカルコン基を感光基として有するものが
知られている。これら感光基の感恍機構は光二量化反応
、またはラジカルの発生を伴い、これらの反応機構を利
用して高゛分子間の架橋を生じせしめるものである。し
かし、これら感光基には光に対する量子収率の低さおよ
び光反応性の選択性に問題がある。これらの問題点を解
決するために鋭意研究の結果。
Conventional photosensitive resins are known to have a diazo group, an azide group, a cinnamoyl group, or a chalcone group as a photosensitive group. The sensitization mechanism of these photosensitive groups involves a photodimerization reaction or the generation of radicals, and these reaction mechanisms are used to generate crosslinks between macromolecules. However, these photosensitive groups have problems with low quantum yield to light and selectivity of photoreactivity. This is the result of intensive research to solve these problems.

2−ナフトール−1−ジアゾニウムルイス酸塩iがその
目的に合)することを見出した。すなわち2本発明の2
−ナフトール−1:゛ジアゾニウムルイス酸塩に光照射
を行うと選択性かつ高反応性のケテンが発゛生し、これ
がエポキシ化合物と反応し、高重合度の化合物を生成す
る。このとき同時に発生するルイ゛ス酸が触媒としテ反
応を容易かつ迅速ならしむる作用することを見出、し本
発明を完成するに至った。
It has been found that 2-naphthol-1-diazonium Lewis acid salt i) is suitable for that purpose. That is, 2 of the present invention
-Naphthol-1: ``When diazonium Lewis acid salt is irradiated with light, selective and highly reactive ketene is generated, which reacts with the epoxy compound to produce a compound with a high degree of polymerization. It has been discovered that the Lewis acid generated at the same time acts as a catalyst to facilitate and speed up the reaction, and has completed the present invention.

、すなわち9本発明は一般式 %式% (R1,R2,R3,、R4,R5,Re、は前記と同
様の意味を持つ)で表わされる2−ナフトール−1=ジ
アゾニウムルイス酸塩類なら汀にその製造方法を提供す
るものである。
, that is, 9 The present invention is applicable to 2-naphthol-1=diazonium Lewis acid salts represented by the general formula % (R1, R2, R3, , R4, R5, Re have the same meanings as above). The present invention provides a method for manufacturing the same.

本発明の2−ナフトール−1−ジアゾニウムルイス酸塩
類はアミノナフトール類もしくはそのルイス酸まだは塩
酸塩と亜硝酸ナトリウムあるいはアクキルナイトライド
を有機溶媒中(アミンナフトール類の溶解性に応じ塩化
亜鉛を加える−)で反応させ、ルイス酸とその酸および
塩のコンブレタスからなる化合物例えばホウフッ化水素
酸またはそのK 、 Na塩を加えることによシ得られ
る。
The 2-naphthol-1-diazonium Lewis acid salts of the present invention are prepared by mixing aminonaphthols or their Lewis acid hydrochloride and sodium nitrite or alkyl nitride in an organic solvent (according to the solubility of the amine naphthols, zinc chloride may be added). A compound consisting of a Lewis acid and a combination of its acids and salts, such as fluoroboric acid or its K, Na salt, is added.

この反応は次のとおシである。This reaction is as follows.

R6NH2 当発明におけるアミノナフトール類には1−アミノ−2
−ナフトールおよびその無機酸塩。
R6NH2 The aminonaphthols in the present invention include 1-amino-2
- Naphthol and its inorganic acid salts.

1−アミノ−2−・ナフトール−4−スルホン酸または
カルボン酸及びその誘導体、1−アミノ−2−ナフトー
ル−7−スルホン酸またはカルボン酸およびその誘導体
などが挙げられる。−ルイス酸塩としそはBF4 、 
PF; 、 AsF; 、 St+C’l ; 、 F
ecl; 、 BiCl3などが挙げられる。ジアゾ化
剤として亜硝酸ナトリウム、インブチルナイトライド、
イソプロピルナイトライト、プロピルナイトライド、な
どが挙げられ、る。反応溶媒としてはアミノナフ・トー
ル類の溶解性の良い溶媒が使用される。その例としては
メタノール、エタノール、イソプケルアルコール、ベン
ゼン、ジオキサン、テトラハイドロフラン、ジメチルホ
ルムアミド、ジメチルアセトアミド、などの溶媒が用い
られるがこれに限定されるものではない。
Examples include 1-amino-2-naphthol-4-sulfonic acid or carboxylic acid and its derivatives, 1-amino-2-naphthol-7-sulfonic acid or carboxylic acid and its derivatives. - Lewis acid salt and soo are BF4,
PF; , AsF; , St+C'l; , F
ecl; , BiCl3, etc. Sodium nitrite, inbutyl nitride, as a diazotizing agent
Examples include isopropyl nitrite, propyl nitride, etc. As the reaction solvent, a solvent with good solubility of aminonaph tols is used. Examples include, but are not limited to, solvents such as methanol, ethanol, isopchelic alcohol, benzene, dioxane, tetrahydrofuran, dimethylformamide, and dimethylacetamide.

反応温度はO〜−5℃位が望ましい。The reaction temperature is preferably about 0 to -5°C.

この際のアミノナフトール類と亜硝酸ナトリウムあるい
はアルキルナイトライドのモル比は1、=1が望ましい
がこれた限定されるものでぼな゛い。反応生成物は再結
晶法によシ精製される。
In this case, the molar ratio of aminonaphthols and sodium nitrite or alkyl nitride is preferably 1, but it is not limited to this. The reaction product is purified by a recrystallization method.

このようにして得られた2−ナフトール−1−ジアゾニ
ウムルイス酸塩例えば4ふっ化ホウ素塩は感光性樹脂、
印刷インキ、紫外線硬化接着剤、塗料などの用途に利用
される。
The thus obtained 2-naphthol-1-diazonium Lewis acid salt, for example, the tetrafluoroborate salt, can be used as a photosensitive resin,
Used in applications such as printing inks, UV-curable adhesives, and paints.

次に本発明を実施例に基づき詳細に説明する。Next, the present invention will be explained in detail based on examples.

実施例1.2−ナフ〜トールー1−ジアゾニウム4フッ
化ホウ素の合成 5fの1−アミノ−2−ナフトール塩酸塩と3.5tの
塩化亜鉛を80−のエタノールに溶解した。この反応溶
液を一5℃以下に冷却し、1゜8fの亜硝酸ナトリウム
を4++dの蒸留水に溶解した水溶液を20〜30分費
し滴下”した。40〜50分後42チホウフッ化水素酸
11−を加えた。析出した4フツ化ホウ素酸ナトリウム
を戸別し、P液を常温で減圧濃縮した。これを冷却する
ことによシ析出した物を沖取し、95チエタノールで再
結晶することにより精製した。
Example 1. Synthesis of 2-naph-thol-1-diazonium boron tetrafluoride 5f of 1-amino-2-naphthol hydrochloride and 3.5t of zinc chloride were dissolved in 80% of ethanol. This reaction solution was cooled to below -5°C, and an aqueous solution of 1°8f sodium nitrite dissolved in 4++d distilled water was added dropwise over 20 to 30 minutes.After 40 to 50 minutes, 42 thioborhydrofluoric acid 11 - was added. The precipitated sodium tetrafluoroborate was separated from each other, and the P solution was concentrated under reduced pressure at room temperature. By cooling it, the precipitated material was taken off and recrystallized with 95% ethanol. It was purified by

3.3f精製物が得られた。A 3.3f purified product was obtained.

赤外吸収スペクトルより、2100,2190ffi−
1にジアゾニウム、350−Oc++s に水酸基を一
確認した。結晶の融点は115(分解)℃である。さ、
′らに熱重量分析により:重量減少量が測定値と理論値
が一致した。    ゛ 実施例2.2−ナフトールー1−ジアゾニウム4フッ化
ホウ素の合成 2.5fの1−アミノ−2−ナフトール塩酸塩を80−
のメタノールに溶解し、これを−5℃に冷却し、これに
2fのイソブチルナイトライドのメタノール溶液(10
d)’を攪拌しながら30分で滴iする。1終了後、1
時間後に、42チホウフッ化水素酸11−を滴70−ト
から除々に滴下する。これを室温で1時間放置後2反応
液を常温で減圧濃縮し、これを冷却すると結晶が析出す
る。これを炉集し、95チエタノールで再結晶すると1
.5fの結晶が得られる。
From the infrared absorption spectrum, 2100, 2190ffi-
Diazonium was confirmed in 1 and hydroxyl group was confirmed in 350-Oc++s. The melting point of the crystals is 115 (decomposition)°C. difference,
Furthermore, thermogravimetric analysis showed that the measured weight loss and the theoretical value agreed. Example 2. Synthesis of 2-naphthol-1-diazonium boron tetrafluoride 2.5f of 1-amino-2-naphthol hydrochloride was converted into 80-
of methanol, cooled to -5°C, and added 2f of isobutyl nitride in methanol solution (10
d)' dropwise over 30 minutes with stirring. After 1, 1
After an hour, 42-thioboric hydrofluoric acid (11) is gradually added dropwise. After this was left at room temperature for 1 hour, the two reaction solutions were concentrated under reduced pressure at room temperature, and upon cooling, crystals were precipitated. When this was collected in a furnace and recrystallized with 95% ethanol, 1
.. A 5f crystal is obtained.

赤外吸収スペクトルにより実施例1.と同じ2100 
、2190cm−”にジアゾニウムに基づく吸収、35
00tyn に水酸基に基づく吸収を確認した。融点1
14〜115(分解)℃。熱重量分析により理論どう沙
の分析結果が得られた6実施例3.2−ナフトールー1
−ジアゾニウ“ム4フッ化ホウ素の合成 5fの1−アミノ−2、−ナフトール塩酸塩を80−の
メタノールに溶解し、42%ホウフッ化水素酸11−を
加え、1−アミノ−2−ナフトールホウフッ化水素酸塩
とし、塩化亜鉛3.52を加え、この反応溶液を一5℃
以下に冷却し4−の蒸留水に溶解した1、8fの亜硝酸
ナト、リウムを30分で滴下する。滴下終了後、析出し
た4フツ化ホウ素酸ナトリウムを戸別し、F液を常温で
減圧濃縮した。これを冷却することによシ析出した物を
炉取し、95%エタノールで一再結晶することによシ精
製して3.Of得られた。
Example 1 by infrared absorption spectrum. same as 2100
, diazonium-based absorption at 2190 cm-”, 35
Absorption based on hydroxyl groups was confirmed at 00tyn. Melting point 1
14-115 (decomposition) °C. 6 Examples 3.2-Naphthol-1 in which theoretical analytical results were obtained by thermogravimetric analysis
-Synthesis of diazonium tetrafluoroboron 5F 1-amino-2,-naphthol hydrochloride was dissolved in 80-methanol, 42% borohydrofluoric acid 11- was added, and 1-amino-2-naphthol borofluoride was dissolved in 5f. 3.52% of zinc chloride was added to the hydrochloride salt, and the reaction solution was heated to -5°C.
Below, 1.8 f of sodium and lithium nitrite dissolved in 4-g distilled water was cooled and added dropwise over 30 minutes. After the dropwise addition was completed, the precipitated sodium tetrafluoroborate was separated from each other, and the F solution was concentrated under reduced pressure at room temperature. By cooling this, the precipitated material was collected in a furnace and purified by recrystallization with 95% ethanol.3. Of obtained.

赤外吸収スペクトルに千シ実施例1.と同じ2Zoo、
2190crn にジアゾニウムに基づく吸1 収、3500cIn に水酸基に基づく吸収を確認しt
た。
Infrared absorption spectrum Example 1. Same as 2Zoo,
Absorption based on diazonium was confirmed at 2190 crn and absorption based on hydroxyl group at 3500 cIn.
Ta.

実施例4.2−ナフトール−7−スルホン酸−1−ジア
ゾニウム47フ化ホウ素の合成ゝ\ 2.5tの1−アミノ−2−ナフトール−7−スルホン
酸を80fIiのメタノールに溶解し、これを−5℃に
冷却し、これに2tのインブチルナ  4゜イトライト
のメタノール溶液(10m)を攪拌しながら、30分で
滴下する9滴下終了後、1時間後に42%ホウフッ化水
素酸lO−を滴下ロートから除々に滴下する。これを−
5℃で1時間放置後反応液を常温で減圧濃縮し、これを
冷却すると結晶示析出するこれをF集し、イソプロピル
アルコールで洗うと2.29の結晶が得られる。
Example 4. Synthesis of 2-naphthol-7-sulfonic acid-1-diazonium 47 boron fluoride \ 2.5 t of 1-amino-2-naphthol-7-sulfonic acid was dissolved in 80 fIi of methanol. After cooling to -5°C, add 2 tons of imbutylnatrilite methanol solution (10 m) dropwise over 30 minutes while stirring. After 1 hour, add 42% 42% borohydrofluoric acid lO- to the solution using a dropping funnel. Drip gradually. This-
After standing at 5° C. for 1 hour, the reaction solution was concentrated under reduced pressure at room temperature, and when cooled, crystals were precipitated. This was collected in F and washed with isopropyl alcohol to obtain 2.29 crystals.

赤外吸収スペクトルによシ実施例1.と同じ2100.
2190cIgK に7アゾニウムに基づく吸収、35
00crn−に水酸基に基づく吸収を確認した。
Example 1 based on infrared absorption spectrum. Same as 2100.
7 azonium-based absorption in 2190cIgK, 35
Absorption based on hydroxyl groups was confirmed at 00crn-.

上記実施例は各々4フツ化ホウ素酸を用いたものである
が代りにその塩例えばナトリウム塩、カリウム塩を用い
゛ても同様の結果を得られた。
Although each of the above examples used tetrafluoroboric acid, similar results were obtained by using its salts, such as sodium salt and potassium salt, instead.

また他のルイス酸とその酸または塩とのコンブv、クス
よシなる化合物HPF6 、 NaPF6 、 HSb
F6、 KSbF6 、 HAsF6などを実施例と同
様方法で使用すれば夫々に対応した2−ナフトール−1
−ジアゾニウムルイス酸塩類が得られる。
Also, other Lewis acids and their acids or salts, such as kelp v, kusuyoshi compounds HPF6, NaPF6, HSb
If F6, KSbF6, HAsF6, etc. are used in the same manner as in the example, the corresponding 2-naphthol-1
- Diazonium Lewis acid salts are obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は実施例1の2−ナフトール−1−ジアゾニウム
47ツ化ホウ素の熱重量分析である。
FIG. 1 is a thermogravimetric analysis of 2-naphthol-1-diazonium boron 47tsride of Example 1.

Claims (2)

【特許請求の範囲】[Claims] (1)一般式 (但し、R1tR2、R3tR4、R5、R6、は水素
、アルキル基、スルホン酸基、カルボン酸基およびその
誘導体を表わす。Xは光の照射によシルイス酸を発生す
るB F; 、 P F; 、 A S F″; t 
S b Fts + S uCl a −、F eCl
; 、B1C1:2などの陰イオングループすなわちル
イス酸塩を表わす)、で示されるナフタレン環〕 を基礎成分とし、その互いのオルト位がヒドロ−!f−
シル基、!ニルイス酸ジアゾニウム基で置換された2−
ナフトール−1−ジアゾニウムシイ3酸塩の誘導体
(1) General formula (where R1tR2, R3tR4, R5, and R6 represent hydrogen, an alkyl group, a sulfonic acid group, a carboxylic acid group, and a derivative thereof. , PF; , A SF″; t
S b Fts + S uCl a −, FeCl
; , representing an anion group such as B1C1:2, i.e., a Lewis acid salt),] is the basic component, and the mutual ortho positions are hydro-! f-
Sil group! 2- substituted with a diazonium acid group
Derivatives of naphthol-1-diazonium cytriate salts
(2)一般式 %式% (R1,R,2,R3,几4 + R5+ R6’+・
は(1)と同じ意味を持つ)で表わされるアミノナフト
ール、もしくは当該アミノナフトルと塩酸または(1)
によるルイス酸塩とから生成されるアミノナフトール塩
に亜硝酸ナトリウムまだはアルキルナイトライドを反応
させ、更にルイス酸とその酸及び塩のコンプレックスか
らなる化合物を反応させることからなる。 一般式 %式% (It、 、 R2,R3,R4,R5,R6、は前記
と同様の意味を持つ)で表わされる2−ナフトール−1
−ジアゾニウムルイス酸塩の製造方法
(2) General formula % formula % (R1, R, 2, R3, 几4 + R5+ R6'+・
has the same meaning as (1)), or the aminonaphthol and hydrochloric acid, or (1)
The method consists of reacting the aminonaphthol salt produced from the Lewis acid salt with sodium nitrite or an alkyl nitride, and further reacting the Lewis acid with a compound consisting of a complex of the acid and its salt. 2-naphthol-1 represented by the general formula % formula % (It, , R2, R3, R4, R5, R6 have the same meanings as above)
-Production method of diazonium Lewis acid salt
JP18511481A 1981-11-18 1981-11-18 2-naphthol-1-diazonium lewis acid salt and its preparation Pending JPS5885847A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18511481A JPS5885847A (en) 1981-11-18 1981-11-18 2-naphthol-1-diazonium lewis acid salt and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18511481A JPS5885847A (en) 1981-11-18 1981-11-18 2-naphthol-1-diazonium lewis acid salt and its preparation

Publications (1)

Publication Number Publication Date
JPS5885847A true JPS5885847A (en) 1983-05-23

Family

ID=16165102

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18511481A Pending JPS5885847A (en) 1981-11-18 1981-11-18 2-naphthol-1-diazonium lewis acid salt and its preparation

Country Status (1)

Country Link
JP (1) JPS5885847A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0677761U (en) * 1993-04-26 1994-11-01 炳鑑 謝 Universal training ball

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4963423A (en) * 1972-05-31 1974-06-19

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4963423A (en) * 1972-05-31 1974-06-19

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0677761U (en) * 1993-04-26 1994-11-01 炳鑑 謝 Universal training ball

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