JPS5873093A - Semiconductor memory - Google Patents

Semiconductor memory

Info

Publication number
JPS5873093A
JPS5873093A JP56171681A JP17168181A JPS5873093A JP S5873093 A JPS5873093 A JP S5873093A JP 56171681 A JP56171681 A JP 56171681A JP 17168181 A JP17168181 A JP 17168181A JP S5873093 A JPS5873093 A JP S5873093A
Authority
JP
Japan
Prior art keywords
column
voltage
lines
row
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56171681A
Other languages
Japanese (ja)
Inventor
Koichiro Okumura
奥村 孝一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56171681A priority Critical patent/JPS5873093A/en
Publication of JPS5873093A publication Critical patent/JPS5873093A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C7/00Arrangements for writing information into, or reading information out from, a digital store
    • G11C7/12Bit line control circuits, e.g. drivers, boosters, pull-up circuits, pull-down circuits, precharging circuits, equalising circuits, for bit lines

Landscapes

  • Read Only Memory (AREA)

Abstract

PURPOSE:To prevent malfunction and to attain high speed, by providing a means charging a voltage of row lines, rwo decoders, column lines, column decoders, voltage sense circuits of column lines and column lines of nonselection to a value between a ground level and a sense voltage level of the voltage sense circuits. CONSTITUTION:A memory is constituted by forming an integrated circuit of MOSTR on a semiconductor substrate. A voltage sense circuit 7 detecting the voltage of a plurality of row lines 11, 12..., a row decoder 2, memory cells 311, 312, 321, 322... driven via the row decoder and the row lines, a plurality of column lines 41, 42..., a column decoder 6, and column lines, is provided and a bias circuit 20 charging the column lines 41, 42... to a voltage over the ground level and less than the sense voltage of the circuit 7, is provided. Thus, the potential of column lines of nonselection can be kept to a potential higher than the ground level at all times, malfunction can be prevented and the high speed operation can be attained.

Description

【発明の詳細な説明】 本発明は半導体メモリー、41に絶縁ゲート電界効果ト
ランジスタを用いたメモリーに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor memory, a memory using an insulated gate field effect transistor as 41.

仁の種の半導体メモリーにおいて、セルアレイの列線は
、非選択の時には電気的にフローティング状態となシ、
行線の電位変化をノイズとしてひろって列線の電位が変
化し、その結果誤動作がおきた少高速動作が阻害された
シしてい友。
In a seed semiconductor memory, the column lines of the cell array are in an electrically floating state when they are not selected.
Changes in the potential of the row lines are picked up as noise and the potential of the column lines changes, resulting in malfunctions and high-speed operation being inhibited.

第1図は半導体基板上に集積回路で形成される半導体メ
モリーの従来例を示す。以下、説明め都合上、この半導
体メモリーはNチャンネルの絶縁ケート電界効果トラン
ジスタで構成されてぃル4のとする。xi、t、、・・
・はセルアレイでの行ll、2はアドレス久方AOI 
A1 m ”・Am K ! IfJ行線11゜12、
・・・のうちいずれかを選択する行デコーダー゛8o 
e i1s# °°°* 8Hs3He °・・杜絶縁
ゲート電界効果トランジスタ(以下xopg’rと略す
)よシなるメモリーセルて対応する行線によシ駆動され
る。これらメモリーセルのうち1行線と交差する列線’
1 * 411 #・・・にドレインが接続され友もの
が例え#i加”情報を記憶し、ドレインが開放端となっ
ているものカ(例えば甲情報を記憶してぃゐ。
FIG. 1 shows a conventional example of a semiconductor memory formed as an integrated circuit on a semiconductor substrate. Hereinafter, for convenience of explanation, it is assumed that this semiconductor memory is composed of an N-channel insulated gate field effect transistor. xi, t,...
- is row ll in the cell array, 2 is address Kugata AOI
A1 m”・Am K! IfJ row line 11°12,
A row decoder ゛8o that selects one of...
e i1s# °°°* 8Hs3He °... A memory cell such as an insulated gate field effect transistor (hereinafter abbreviated as xopg'r) is driven by a corresponding row line. A column line that intersects one row line among these memory cells'
1 * 411 If the drain is connected to #..., it stores information such as #i, and the drain is an open end (for example, stores information A).

これらメモリーセルのソース端は接地されている。The source ends of these memory cells are grounded.

列1714t a 4g e ・KFi列選択用IGF
FiT51 m 51 m、・・が接続され、これらの
IGFETのゲートは列デコーダー6に接続される。列
デコーダー6はアドレス人力BhB[1・・Bnの情報
により列選択用IGFET 51 e s、 e・・・
のいずれかひとつを選択し導通させる。電圧センス回路
7は選はれ九列線に電流を供給する手段を含み、選択さ
れた列線の電位がセンス電圧レベル以上であれば、選択
された行線と選択された列線との交点にはメそリー七ル
が存在しない即ち111情報が蓄えられているとし、@
1”情報を・データとして出力する。同様に電圧センス
回路7は選択された列線の電位がセンス電圧レベル以下
であれば、選択された行線と選択された列線との交点に
メモリーセルが存在する、即ち′mO”情報が蓄えられ
て―るとし、′0”情報をデータとして出力する。
Column 1714t a 4g e ・IGF for KFi column selection
FiTs 51 m 51 m, . . . are connected, and the gates of these IGFETs are connected to the column decoder 6. The column decoder 6 selects column selection IGFETs 51 e s, e .
Select one of them and make it conductive. The voltage sensing circuit 7 includes means for supplying current to the selected nine column lines, and if the potential of the selected column line is above the sense voltage level, the intersection of the selected row line and the selected column line is detected. Assuming that there is no Mary 7 file in , that is, 111 information is stored, @
Similarly, if the potential of the selected column line is below the sense voltage level, the voltage sense circuit 7 outputs the memory cell at the intersection of the selected row line and the selected column line. Assume that there exists ``mO'' information, that is, ``mO'' information is stored, and ``0'' information is output as data.

ところで第1図の従来例の半導体メそり一においてs行
m!11*11e・・・がすべて)−イレベルの状態か
ら選択された1本以外がローレベル(接地レベル)Kお
ちるような状況がある場合、たとえばこの半導体メモリ
ーチップが動作していない時に行11h、1g、・・・
のレベルがハイレベル[する回路形式の行デコーダーを
使用していて、この半導体メモリーが動作状態になると
行デコーダー2がアドレス入力’1 e A2 #・・
・、Amの入力情報に従って選択された°行4111本
のみがハイレベルK11tカ、他の2m−1本の行線が
ハイレベルからローレベルに下降する場合には、メモリ
ーセルのゲート電極とドしイン間のゲート絶縁膜を介し
た容量結合によシ、すべての列線41 e 42 e・
・・の電位が負電位側にひかれ、その結果、本来選択さ
れた導通すべき1個の列選択用IGFBT以外の本来非
選択であるはずの2n−1個の列選択用IGFBTもま
た導通してしまうので誤動作を生じたり、高速動作が阻
害されてしまうという欠点があった。
By the way, in the conventional semiconductor memory shown in FIG. 1, s rows m! 11*11e...) - If there is a situation where all but one selected line falls to low level (ground level) K from the low level state, for example, when this semiconductor memory chip is not operating, row 11h, 1g...
If you are using a row decoder with a circuit type in which the level of is high, and this semiconductor memory becomes operational, the row decoder 2 will input address '1 e A2 #...
・If only the 4111 rows selected according to the input information of , Am are at the high level K11t, and the other 2m-1 row lines fall from the high level to the low level, the gate electrode of the memory cell and the voltage All column lines 41 e 42 e・
The potential of ... is drawn to the negative potential side, and as a result, 2n-1 column selection IGFBTs that should originally be non-selected, other than the one selected column selection IGFBT that should be conductive, also become conductive. This has the drawback of causing malfunctions and hindering high-speed operation.

本発明の目的は、紡速の如き従来の半導体メモリーの欠
点を改良し、安定に高速動作を行うことが可能な半導体
メモリーを提供することKある。
An object of the present invention is to improve the drawbacks of conventional semiconductor memories, such as spinning speed, and to provide a semiconductor memory that can stably operate at high speed.

本発明の半導体メモリーは、半導体基板に集積回路で構
成され、複数の行線と前記行線を選択する行デコーダー
と、的記行デコーダー及び前記行線を介して駆動される
メモリーセルと、前記メモリーセルからデータを受ける
ために設けられる複数の列線と、前配列線を選択すゐ列
テコ−。グーと、前配列線の電圧検出を行なう電圧セン
ス回路と、前配列線のうち非選択の列線の電圧を常に接
地レベルと前記電圧センス回路のセンス電圧レベルの間
の値に充電する手段を具備して成ることを特徴とする。
The semiconductor memory of the present invention is configured of an integrated circuit on a semiconductor substrate, and includes a plurality of row lines, a row decoder for selecting the row line, a memory cell driven via the target row decoder and the row line, and a memory cell driven via the target row decoder and the row line. A plurality of column lines provided for receiving data from memory cells and a column lever for selecting the front array line. and a voltage sense circuit for detecting the voltage of the previous array lines, and means for always charging the voltage of unselected column lines among the previous array lines to a value between the ground level and the sense voltage level of the voltage sense circuit. It is characterized by comprising:

以下、図面を参照して本発明の意図するとζろを説明す
る。第2図は本発明の半導体メモリーの一実施例の回路
であるが、第1図の従来例との対応を容111にするた
めに、対応する箇所には同一の符号を付して、重複すゐ
説明は省略することとするO 第2図の本発明の実施例の回路での特徴は、列線41*
G*・・・を常に接地レベル以上で電圧センス回路7の
センス電圧レベル未満の範囲に充電するためのバイアス
回路20を含むことにある。バイアス回路20は、定電
圧電源vcにドレインが接続され、ソースとダートが相
互に接続されたディブレV1ン型IGFET22とドレ
インとゲートが相互に接続され、ソースが接地されたエ
ンハンスメント型IGFET 23を直列にII!続し
て成る定電圧発生部とドレインが定電圧電源vcに接続
され、ゲートが、IGFET 22およびIGFET2
Bから成る定電圧発生部の出力配線24と接続された列
線充電用エンハンスメント型IGFgTから構成されて
いて1列線充電用IGFgT2tl、21g。
Hereinafter, the intention of the present invention will be explained with reference to the drawings. FIG. 2 shows a circuit of one embodiment of the semiconductor memory of the present invention. In order to make the correspondence with the conventional example of FIG. The circuit of the embodiment of the present invention shown in FIG. 2 is characterized by the column line 41 *
The bias circuit 20 is included to always charge G* to a range above the ground level and below the sense voltage level of the voltage sense circuit 7. The bias circuit 20 includes, in series, a dible V1 type IGFET 22 whose drain is connected to a constant voltage power supply VC and whose source and dart are connected to each other, and an enhancement type IGFET 23 whose drain and gate are connected to each other and whose source is grounded. II! The constant voltage generator and the drain connected to the constant voltage power supply vc are connected to the constant voltage generator VC, and the gate is connected to the IGFET 22 and IGFET2.
The first column line charging IGFgT 2tl, 21g is composed of an enhancement type IGFgT for column line charging connected to the output wiring 24 of the constant voltage generating section consisting of B.

・・・のソースはそれぞれ対応する列114xe4gs
・・・に接続される。IGPgT22とIGFET2B
で構成された定電圧発生部はエンハンスメン) II 
IGFETの閾値電圧をvTとするとVT 十ggとな
る出力を出力配線24に供給し、その結果、列線充電用
1GFBTI!11 、21z e ・・・ノブ−)K
#i常1fC@値電圧よ〕αだけ高い電圧が印加される
ことKなる。従うて非選択の列mは常にaの電位へと充
電されるため、例えば行線11*ll*・・・がすべて
ハイレベルの状轢から選択されfCt本以外がローレベ
ルにおちる場合、従来例の第1図の半導体メモリーにお
いては誤動作したり、高速動作を阻害されたりするが、
第2図の本発明の実施例の半導体メモリーにおいては、
列線が負電位にひかれても、列線充電用IGFET21
1.21g、・・・が導通状態であり、速やかに正電位
の方向へ充電するので、本来選択され、導通すべき1個
の列線選択用IGF’BTを除いた列線選択用IGFE
Tは速やかに非導通となるので′、誤動作は生じなく、
また高速動作を阻害することもない。また、選択され九
列線例えば41の電位が列線充電用IGFET211に
よって充電されうる最大値はaボルトであるが、電圧セ
ンス回路7のセンス電圧レベルはaよシ高いので電圧セ
ンス回路7が動作する範囲では列線充電用IGFET 
211は非導通となっておシ、電圧センス回路7の動作
に影響を与えることはない。
... sources are in the corresponding column 114xe4gs
...is connected to... IGPgT22 and IGFET2B
The constant voltage generation section consisting of
If the threshold voltage of the IGFET is vT, an output of VT 0gg is supplied to the output wiring 24, and as a result, 1GFBTI for column line charging! 11, 21z e...Knob-)K
#i Normally 1fC@value voltage] K means that a voltage higher by α is applied. Therefore, the unselected column m is always charged to the potential of a, so if, for example, row lines 11*ll*... are all selected from a high level condition and all but fCt fall to low level, the conventional For example, the semiconductor memory shown in Figure 1 may malfunction or inhibit high-speed operation.
In the semiconductor memory according to the embodiment of the present invention shown in FIG.
Even if the column line is pulled to a negative potential, the column line charging IGFET21
1.21g, . . . are in a conductive state and quickly charged in the direction of positive potential, so the column line selection IGF'BT, which is originally selected and should be made conductive, is the column line selection IGF'BT.
Since T quickly becomes non-conductive, no malfunction occurs.
Moreover, high-speed operation is not obstructed. Further, the maximum value to which the potential of the selected ninth column line, for example 41, can be charged by the column line charging IGFET 211 is a volt, but since the sense voltage level of the voltage sense circuit 7 is higher than a, the voltage sense circuit 7 operates. IGFET for column line charging in the range
211 becomes non-conductive and does not affect the operation of the voltage sense circuit 7.

以上に説明した如く、本発明によれば非選択の列線の電
位を常に接地レベルよシ高い電位に保つことが可能とな
るので、非選択の列線の電位が負電位となるために生じ
る誤動作を防止し、高速動作が可能な半導体メモリーを
提供することができる。
As explained above, according to the present invention, it is possible to always maintain the potential of unselected column lines at a potential higher than the ground level. A semiconductor memory that can prevent malfunctions and operate at high speed can be provided.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の半導体メモリーを示す回路図、第2図は
本発明の一実施例の説明に用いる回路図である。 11 e 12・・・・・・行線、2・・・・・・行デ
コーダー、311*311 m 321 e 322 
・川・・メそリーセル、4114!0.。 列線、51s5jls・・・列選択IGFET、6・・
・・・・列デ5−タ、  7・・・・・・電圧センス回
M、20・旧・・バイアス回路、211 # 212 
、・・・・・・列線充電用IGFET。 22・・・・・・ディブレン璽ンfiIGFIT、23
・・曲エンハンスメン)WIGFET、24・・面配線
FIG. 1 is a circuit diagram showing a conventional semiconductor memory, and FIG. 2 is a circuit diagram used to explain an embodiment of the present invention. 11 e 12... Row line, 2... Row decoder, 311*311 m 321 e 322
・River...Marycel, 4114!0. . Column line, 51s5jls...column selection IGFET, 6...
・・・Column data 5-・・・・Voltage sense circuit M, 20・Old・・Bias circuit, 211 # 212
,...IGFET for column line charging. 22... Dibreen Seal fiIGFIT, 23
... Song Enhancement Men) WIGFET, 24... Surface wiring.

Claims (1)

【特許請求の範囲】 半導体基板に集積回路で形成される半導体メモリーにお
いて、複数の行線と、前記行線を選択する行デコーダー
と、前記行デコーダー及び前記行線を介して駆動される
メそリーセルと、前記メモリーセルからデー−を受ける
ために設けられる複数の列線と、前記列線を選択する列
デーーデーと。 前記列線の電圧検出を行なう電圧奄ンス回路と、前記列
線のうち非選択の列線の電圧を常KII地レベルとm配
電’rxセンス回路のセンスtfEレベルの間の値に充
電する手段を具備したことを4I黴とする半導体メモリ
ー。
[Scope of Claims] A semiconductor memory formed of an integrated circuit on a semiconductor substrate includes a plurality of row lines, a row decoder that selects the row lines, and a memory that is driven via the row decoders and the row lines. a memory cell, a plurality of column lines provided for receiving data from the memory cells, and a column data for selecting the column lines. a voltage boost circuit for detecting the voltage of the column line; and means for charging the voltage of an unselected column line among the column lines to a value between the normal KII ground level and the sense tfE level of the m power distribution'rx sense circuit. Semiconductor memory is classified as 4I mold by having the following.
JP56171681A 1981-10-27 1981-10-27 Semiconductor memory Pending JPS5873093A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56171681A JPS5873093A (en) 1981-10-27 1981-10-27 Semiconductor memory

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56171681A JPS5873093A (en) 1981-10-27 1981-10-27 Semiconductor memory

Publications (1)

Publication Number Publication Date
JPS5873093A true JPS5873093A (en) 1983-05-02

Family

ID=15927718

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56171681A Pending JPS5873093A (en) 1981-10-27 1981-10-27 Semiconductor memory

Country Status (1)

Country Link
JP (1) JPS5873093A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62143295A (en) * 1985-12-17 1987-06-26 Toshiba Corp Semiconductor memory
JPH023188A (en) * 1988-06-09 1990-01-08 Fujitsu Ltd Non-volatile semiconductor memory device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55160388A (en) * 1979-05-31 1980-12-13 Toshiba Corp Semiconductor memory
JPS55160389A (en) * 1979-08-10 1980-12-13 Toshiba Corp Semiconductor memory

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55160388A (en) * 1979-05-31 1980-12-13 Toshiba Corp Semiconductor memory
JPS55160389A (en) * 1979-08-10 1980-12-13 Toshiba Corp Semiconductor memory

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62143295A (en) * 1985-12-17 1987-06-26 Toshiba Corp Semiconductor memory
JPH0345479B2 (en) * 1985-12-17 1991-07-11 Tokyo Shibaura Electric Co
JPH023188A (en) * 1988-06-09 1990-01-08 Fujitsu Ltd Non-volatile semiconductor memory device

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