JPS5871550A - Ion source - Google Patents
Ion sourceInfo
- Publication number
- JPS5871550A JPS5871550A JP56169558A JP16955881A JPS5871550A JP S5871550 A JPS5871550 A JP S5871550A JP 56169558 A JP56169558 A JP 56169558A JP 16955881 A JP16955881 A JP 16955881A JP S5871550 A JPS5871550 A JP S5871550A
- Authority
- JP
- Japan
- Prior art keywords
- ion
- neutral
- ions
- ion source
- collision
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
- H01J49/142—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers using a solid target which is not previously vapourised
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
Description
【発明の詳細な説明】
本@嘴は質量分析装置に用いて好適なイオン源に関し、
特に試料に高連中性粒子を衝突させてイオン化する方式
のイオン源に関する・
質量分析装置に用いられるイオン源のイオン化方式とし
ては、電子衝撃臘、化学電離臘、電界電離臘あるいは電
界脱離屋等が次々と開発され実用化されている0ところ
で近時試料に高いエネルギーを持った高速中性粒子(例
えばムr原子)を衝突させ、そのエネルギー1こ上り試
料をイオン化するイオン化方式が注目されており、この
方式は(1)イオン化のエネルギーが小さくソフトなイ
オン化法である。(2)正イオンばかりでなく員イオン
の生成率も高い、(3)加熱気化が不要なため試料の熱
分解が少ない、(4)中性粒子なのでチャージアップが
なく絶縁物でも容易にイオン化できる等多くの優れた点
を持った方式として今後の発達が期待されている。[Detailed description of the invention] This @Beak relates to an ion source suitable for use in a mass spectrometer,
In particular, it concerns an ion source that ionizes a sample by colliding with highly neutral particles.Ionization methods for ion sources used in mass spectrometers include electron impact, chemical ionization, electric field ionization, and electric field desorption. have been developed and put into practical use one after another.Recently, an ionization method that collides high-energy high-speed neutral particles (e.g., Mur atoms) with a sample, and ionizes the sample by increasing the energy by 1, has recently attracted attention. This method is (1) a soft ionization method with low ionization energy; (2) The production rate of not only positive ions but also member ions is high. (3) There is little thermal decomposition of the sample because heating vaporization is not required. (4) Since it is a neutral particle, there is no charge-up and even insulating materials can be easily ionized. It is expected to be developed in the future as a method with many excellent points such as.
ところでこの方式のイオン源においては、試料に照射す
るのが偏向が不可能な中性粒子ということで、試料への
中性粒子の蝋射位1ill会わせを試料の機械的な移動
により行わねばならず、複雑な精密微動機構が必要とな
るばかりでなく、位置会わせに手間と時間がかかつてい
た。However, in this type of ion source, the sample is irradiated with neutral particles that cannot be deflected, so the irradiation position of the neutral particles must be aligned with the sample by mechanical movement of the sample. Not only does this require a complicated precision fine movement mechanism, but it also takes time and effort to align the positions.
本発明はこの点に鑑みてなされたものであり、イオン銃
で作った高速イオンビームを衝突箱で中性粒子ビームに
変換するというイオン源の構造に着目し、イオン銃と衝
突箱の間にイオン偏向手段を配置しイオンビームを偏向
することにより中性粒子ビームの進行方向を変えること
を特徴としてい60以下図函を用いて本発明を詳説する
O1函は本発明の一実施例の構成を示すrr向内であり
、図中1は試料#c@射する中性粒子例えばAr原子を
一旦イオン化するためのイオン銃であるO該イオン銃1
は質量分析装置のイオン源側壁21こ取付けられており
、その内部は排気管6及び/くルブ4を介して真空ポン
プ(図示せず)によって排気されるolll[イオン銃
1は円筒状電極5と、咳円筒状電極5内部に形成される
イオン生成室6に配置される1ノード7及びフィラメン
ト8と、上記円筒状電極5の下端に取付けられた3段構
成の環状レンズ電極9,10.11から構成される。該
電極9.IIK、は接地電位、又電極10には電源12
により数KVの正電位が与えられており、1記生成室6
で生成された正電荷を持つムrイオン(Ar+)はこれ
らの電極間に形成される電界Iこよる加速作電罎セ〜
速のArイオンビーム16としてイオ
ン銃外へ取出される。The present invention has been made in view of this point, and focuses on the structure of an ion source in which a high-speed ion beam produced by an ion gun is converted into a neutral particle beam in a collision box. The present invention will be explained in detail using the box shown below.O1 box is a configuration of one embodiment of the present invention. In the figure, 1 is an ion gun for temporarily ionizing neutral particles such as Ar atoms that are irradiated onto the sample #c.
is attached to the ion source side wall 21 of the mass spectrometer, and its interior is evacuated by a vacuum pump (not shown) via an exhaust pipe 6 and/or tube 4 [the ion gun 1 has a cylindrical electrode 5 , a node 7 and a filament 8 disposed in the ion generation chamber 6 formed inside the cylindrical electrode 5 , and a three-stage annular lens electrode 9 , 10 . attached to the lower end of the cylindrical electrode 5 . It consists of 11 parts. The electrode 9. IIK is the ground potential, and the electrode 10 is connected to the power source 12.
A positive potential of several KV is applied to the generation chamber 6.
The generated positively charged ions (Ar+) are taken out of the ion gun as an Ar ion beam 16 which is accelerated by the electric field I formed between these electrodes.
ここで1配環状電極11は第1図6ζおけるI−I断I
ii図である第2図に示すように3分割されて間に絶縁
スペーサ14を介して一体に成形してあり、分割電極1
1に正又は気の数6vまでの可変電位を与えることによ
りArイオンビーム16をX方向へ偏向でき、又分割(
&11”に同様の可変電位を与えること!こよりY方向
へ偏向できる構造となっている。Here, one annular electrode 11 is connected to the I-I section I at 6ζ in FIG.
As shown in FIG.
By applying a positive or variable potential up to 6V to 1, the Ar ion beam 16 can be deflected in the X direction, and can also be split (
&11'' should be given a similar variable potential!The structure is such that it can be deflected in the Y direction.
尚15はフィラメント加熱用の電源、16はフィラメン
ト−1ノ一ド間に数6vの電圧を印加するための電源、
17はフィラメントから電極5の方向へ向けて発生した
電子を1ノードの方向へ反転させるために@’@’6
c’?R&”?与えるための電源、67は加速電圧を印
加するための電源である0この様にしてイオン銃1から
取出された高速Arイオンビーム15はイオン源@@2
4こ絶縁体18を介して固着された衝突$119を通過
してイオン源内部へ導入されるが、該衝突[19には電
源20から員の高電圧が印加されており、ムrイオンビ
ーム15は咳高電圧により更に高速度に加速されて衝突
箱19内へ入射してゆ(0鋏衝央$119の内部には導
入管21を介してムtガス(中性Ar原子)が満たされ
ており、衝突箱の内部を通過するイオンのかなりの部分
は該ム「原子と衝突して運動方向及び速度は殆んど変わ
らずに電荷のみを奪われて高速中性ムを原子に変換され
るため、該衝突箱19を通過したビーム中にはム「イオ
ンと中性ムを原子が混在することになる0このうらム「
イオンは後続して設けられた偏向器22#cよる偏向を
受けて除去され、中性Ar原子のみが錬偏向器22を通
過して高速Ar原子ビーふ2sとして取出されるO尚本
実施例ではこの時偏向器22の一対の電極のうち偏向を
受けたムrイオンが衝突する方の電極を電流針24を介
して接地することによりムrイオン電流をモ二りするよ
うにしている◎又ム「イオン電流と中性ムrj[子の量
とは比例関係かあるので中性Ar原子の量も間接的にモ
ニタできることになる。15 is a power source for heating the filament, 16 is a power source for applying a voltage of several 6 volts between the filament and one node,
17 is @'@'6 in order to reverse the electrons generated from the filament toward the electrode 5 toward one node.
c'? A power source 67 is a power source for applying an accelerating voltage.0 The high-speed Ar ion beam 15 taken out from the ion gun 1 in this way is an ion source @@2.
The ion beam is introduced into the ion source through a collision beam 119 fixed via an insulator 18, but a high voltage is applied to the collision beam 19 from a power source 20, and the ion beam is 15 is further accelerated to a higher speed by the cough high voltage and enters the collision box 19. A large portion of the ions passing through the collision chamber collide with the atoms, removing only their charge and converting the high-speed neutral atoms into atoms, with their direction and velocity remaining almost unchanged. As a result, the beam that has passed through the collision box 19 contains a mixture of atoms, including ions and neutral atoms.
The ions are deflected by a subsequent deflector 22#c and removed, and only neutral Ar atoms pass through the deflector 22 and are extracted as a high-speed Ar atomic beam 2s. At this time, of the pair of electrodes of the deflector 22, the electrode with which the deflected Mr ions collide is grounded via the current needle 24, so that the Mr ion current is monitored. Furthermore, since there is a proportional relationship between the ion current and the amount of neutral atoms, the amount of neutral Ar atoms can also be indirectly monitored.
1配偏向器22から取出された高速Ar原子ビーム26
は切欠き部25を介してイオン化箱26内へ導入され、
鋏イオン化箱26内へ後方から挿入されたターデッド2
7の原子ビーム26に対して傾斜が与えられたターゲツ
ト面に衝突し、該衝突@lζ塗布されているグリセリン
と被検物質とを混合調製した試料をイオン化させる。鋏
ターデッド27は例えば鋼製で絶縁体2Bを介して導入
プローブ29の先端に取付けられると共Iこ電源3oか
ら例えば3KV@変の加速電圧が印加されており、その
表面から飛び出した試料イオンは加速電圧を分圧器61
で分圧して得た適宜な電圧が夫々印加されているスリッ
ト電極群62〜65によって引出されて加速され、図示
しない質量分析部へ導かれる。尚66はターデッド27
とイオン化箱26との間JCバイアス電圧(正、*可変
)を印加するための電源である。High-speed Ar atomic beam 26 taken out from the 1-direction deflector 22
is introduced into the ionization box 26 through the notch 25,
Turded 2 inserted from the rear into the scissors ionization box 26
The atomic beam 26 of No. 7 collides with a tilted target surface, and the sample prepared by mixing glycerin and the test substance coated with the collision @lζ is ionized. The scissors tarded 27 is made of steel, for example, and is attached to the tip of the introduction probe 29 via an insulator 2B, and an accelerating voltage of, for example, 3 KV is applied from a power source 3o, and the sample ions ejected from its surface are Voltage divider 61 for accelerating voltage
Appropriate voltages obtained by dividing the voltage are drawn out and accelerated by the slit electrode groups 62 to 65 to which they are applied, respectively, and guided to a mass spectrometer (not shown). Furthermore, 66 is Tarded 27
This is a power supply for applying a JC bias voltage (positive, *variable) between the ionization box 26 and the ionization box 26.
斯かる構成において、イオン銃11ζ必要なムr(圧力
にして10 ”wlo ’Tort )は衝突箱(同じ
(1G ” 〜1G ”Torr)から供給されて
おり、両者を結ぶビーム通過口−の大きさとバルブ4の
調節によって夫々の圧力が保たれる様に設定されている
0又衝央箱19の出射個のビーム通過口すも^真空(I
Q ’Torr以下)のイオン源内部との圧力差が保た
れる様4Cmよりも小さな穴となっている0そしてイオ
ン銃1内の生成#16で生成されたム14オンは環状レ
ンズ電極9,10.Ilfζよって加速された後衝突箱
19を通過して中性ムr原子ビームに変換されるのであ
るが、本実施例ではレンズ電極11が5112図に示さ
れる様にX−Y偏向器を兼ねているのでイオンビーム1
&を任意の方向に偏向することができ、それlζ伴なっ
て衝突箱19を通過して変換された中性Ar原子ビーム
26も進行方向が任意#C疲わることになる。従って試
料上へのムr原子ビーム26の照射位置会わせを電気的
に制御することができ、試料を機械的に移動させた従来
に比べれば短い所要時間で正確な位置会わぜを行うこと
ができる。In such a configuration, the required torque (pressure: 10 ``wlo' Torr) of the ion gun 11ζ is supplied from the collision box (same (1 G'' to 1 G'' Torr), and the size of the beam passage opening connecting the two is The exit beam passage openings of the zero and center box 19 are set to maintain their respective pressures by adjusting the vacuum valves 4 and 4.
The hole is smaller than 4 cm to maintain a pressure difference between the inside of the ion source (below Q'Torr) and the ion generated by generation #16 in the ion gun 1 is connected to the annular lens electrode 9, 10. After being accelerated by Ilfζ, it passes through the collision box 19 and is converted into a neutral atomic beam. In this embodiment, the lens electrode 11 also serves as an X-Y deflector, as shown in Figure 5112. Ion beam 1 because there is
& can be deflected in any direction, and accordingly, the neutral Ar atomic beam 26 that passes through the collision box 19 and is converted will also be deflected in any direction #C. Therefore, the alignment of the irradiation position of the atomic beam 26 onto the sample can be electrically controlled, making it possible to achieve accurate alignment in a shorter time than in the past, in which the sample was moved mechanically. can.
尚衝突箱19のビーム通過口すはビームの位置会わせが
主に菖1図における矢印C方向1こついて行われるので
ビームがC方向く移動することと、―達した如く衝突箱
とイオン源七の圧力差を維持させることを考慮しC方向
に憂い長穴とすることが1ましい。The beam passage opening of the collision box 19 is mainly aligned in the direction of arrow C in Fig. In order to maintain the pressure difference of 7, it is preferable to make the hole long in the C direction.
1達した実施例ではイオン銃1のレンズ電極11を分割
して偏向電圧を印加し偏向器としても使用したが、これ
に限らずイオン銃と衝突箱との間に独立した偏向器を設
けても良いことは貫うまでもなく、偏向器として電磁臘
を使用しても良い。In the embodiment in which the lens electrode 11 of the ion gun 1 is divided and used as a deflector by applying a deflection voltage, the present invention is not limited to this, and an independent deflector may be provided between the ion gun and the collision box. Needless to say, an electromagnetic lug may be used as a deflector.
第tgは本発明の一実施例の構成を示す図であり、ga
sはその!−■1断函図である。
1:イオン銃、9,10.11:環状レンズ電極、N
、11 :分割電極、15 : Arイオンビーム11
9:衝突箱、22:偏向器、26:高速ムを原子ビーム
、27:ターゲット。Part tg is a diagram showing the configuration of an embodiment of the present invention, and ga
s is that! -■1 It is a cutaway diagram. 1: Ion gun, 9, 10.11: Annular lens electrode, N
, 11: split electrode, 15: Ar ion beam 11
9: Collision box, 22: Deflector, 26: High-speed atomic beam, 27: Target.
Claims (1)
ンを加速する手段と、加速されたイオンが通る通路を奮
し内@#c収容した衝突ガスによりイオンから電荷を奪
って中性粒子に変換するための衝突箱とを備え、該中性
粒子を試料SC@射して試料をイオン化するイオン源に
おいて、鋳紀衝央纏と―起イオン生成直の関にイオンを
偏向する偏向手段を設けたことを特徴とするイオン源 & ―起イオンを加速する電極がlll11起偏向手段
を兼ねることを特徴とする特許請求の範囲五項起鎮のイ
オン源◎[Scope of Claims] L A means for accelerating ions generated by direct ion generation and scissors generation, and a means for accelerating ions generated by scissors generation, and a means for accelerating the ions generated by the scissors generation, and a means for accelerating the ions through which the accelerated ions pass through, and by a collision gas contained within the ions. In an ion source that is equipped with a collision box that removes electric charge and converts it into neutral particles, and that ionizes the sample by injecting the neutral particles into the sample SC@, there is a relationship between the An ion source characterized by being provided with a deflection means for deflecting ions and an ion source according to claim 5, characterized in that an electrode for accelerating ions also serves as a deflection means.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56169558A JPS5838910B2 (en) | 1981-10-23 | 1981-10-23 | ion source |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56169558A JPS5838910B2 (en) | 1981-10-23 | 1981-10-23 | ion source |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5871550A true JPS5871550A (en) | 1983-04-28 |
JPS5838910B2 JPS5838910B2 (en) | 1983-08-26 |
Family
ID=15888683
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56169558A Expired JPS5838910B2 (en) | 1981-10-23 | 1981-10-23 | ion source |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5838910B2 (en) |
-
1981
- 1981-10-23 JP JP56169558A patent/JPS5838910B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5838910B2 (en) | 1983-08-26 |
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