JPS5864615A - Thin film magnetic head - Google Patents

Thin film magnetic head

Info

Publication number
JPS5864615A
JPS5864615A JP16272181A JP16272181A JPS5864615A JP S5864615 A JPS5864615 A JP S5864615A JP 16272181 A JP16272181 A JP 16272181A JP 16272181 A JP16272181 A JP 16272181A JP S5864615 A JPS5864615 A JP S5864615A
Authority
JP
Japan
Prior art keywords
short
circuit
polishing
magnetic head
resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16272181A
Other languages
Japanese (ja)
Inventor
Nobuo Arai
信夫 新井
Yoshihiko Noro
良彦 野呂
Nobuhiro Tokuyado
徳宿 伸弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP16272181A priority Critical patent/JPS5864615A/en
Publication of JPS5864615A publication Critical patent/JPS5864615A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G11B5/3166Testing or indicating in relation thereto, e.g. before the fabrication is completed

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To improve the reliability of polishing position detection by forming a resistance detecting electrode for detecting a short circuit of a circuit of >=2 kinds of different metallic materials. CONSTITUTION:The short-circuit detection part 71 of a resistance detecting electrode is formed of Al to a 0.5mum film thickness, and the open detection part 72 is formed of permalloy to a 0.1mum film thickness. The resistance detecting electrode is arranged as a substitute for a resistance detecting electrode 23 used on both sides of the conductor coil 22 of a thin-film magnetic head. The short detection part 71 is formed of soft Al, so a short-circuit due to a burr and a shear drop during polishing is never generated; and the open detection part 72 is formed of hard ''Permalloy '' and is thin, so neither burrs nor shear drops are generted, so that an open circuit and a short circuit at a polishing stop position X are detected by resistance detectors 27 and 27', respectively.

Description

【発明の詳細な説明】 ′ 本発明は薄膜磁気ヘッドに関する。iしくけ、薄膜
磁気ヘッドの製造工程中のギツプデプス研磨加工に係る
特に研磨用電極の改良に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thin film magnetic head. The present invention relates to improvements in polishing electrodes, particularly in relation to the depth polishing process during the manufacturing process of thin-film magnetic heads.

従来における上記研磨加工の研磨方法としては第1図に
示すような下部磁性層11と導体コイル12と上部磁性
層とを積層して形成される薄jIa気ヘッド14で上記
導体コイル120両側に回路のオープンを検出するため
の研麿用電極15を配置し、111J配電&15が研1
1時に切断、されることを検出して崩定の寸法管得ると
いうものが知られている。
A conventional polishing method for the above-mentioned polishing process is to use a thin JIa magnetic head 14 formed by laminating a lower magnetic layer 11, a conductive coil 12, and an upper magnetic layer as shown in FIG. 111J power distribution &
It is known that a tube with a collapsed dimension is obtained by detecting that the tube is cut at one time.

しかし、鮎1図のように簿膜磁気ヘッドの下部#+  
                         
        2 −磁性層1141製作プロセスの
複雑化をさけるために全チャンネル共通の磁性層として
作られる。さらに帥起磁性層11は通常パーマロイ、セ
ンダスト等の導電体で作られるため上記のような方法で
は研極時に研磨用電極15と上記導電性磁性層とがパリ
やブレのためにショート°シ研磨用電極が切断され九位
置を正確に検出することができないという欠点がある。
However, as shown in Figure 1, the lower part of the film magnetic head #+

2 - The magnetic layer 1141 is made as a common magnetic layer for all channels in order to avoid complication of the manufacturing process. Furthermore, since the conductive magnetic layer 11 is usually made of a conductive material such as permalloy or sendust, the polishing electrode 15 and the conductive magnetic layer may be short-circuited during polishing due to flashing or wobbling in the above method. There is a drawback that the electrodes are cut off and the nine positions cannot be detected accurately.

上記の欠点を解決する方法として前記ショート現象を積
極的に利用する研磨方法が提案されている。これを第2
図及び第3図を参照しつつ説明するに、第2図及び第3
図社上部磁性体21、導体コ、  イル22、抵抗検出
用電極23.8i01等の絶縁層24、導体層(下部磁
性層)25、基板26で構成される薄膜磁気ヘッドを示
し、前記抵抗検出用電極23と導体層25との間には抵
抗検出装置27および27’が接続され、その出力28
は後述する平衡検出装置81の入力となっている。尚第
3図は第2図におけるYY/巌に沿う断面図である。
As a method for solving the above-mentioned drawbacks, a polishing method that actively utilizes the short-circuit phenomenon has been proposed. This is the second
To explain with reference to Figs. 2 and 3, Figs.
The figure shows a thin film magnetic head composed of an upper magnetic body 21, a conductor coil 22, an insulating layer 24 such as a resistance detection electrode 23.8I01, a conductor layer (lower magnetic layer) 25, and a substrate 26, and the resistance detection Resistance detection devices 27 and 27' are connected between the electrode 23 and the conductor layer 25, and the output 28
is an input to an equilibrium detection device 81, which will be described later. Note that FIG. 3 is a sectional view taken along the YY/Iwao line in FIG. 2.

また研麿目標位置は第2図中X−X/縁で示され3頁 抵抗検出用電極23の一端がX−Xt縁線上東なるよう
に設定されている。
Further, the Kenmaro target position is indicated by the X-X/edge in FIG. 2, and is set so that one end of the page 3 resistance detection electrode 23 is above and east of the X-Xt edge line.

このような構成をとることにより研磨停止位置X−XI
は上記抵抗検出用電極2!3と導体層25との間のショ
ートを上記抵抗検出装置27および27’で検出できる
ため研麓の少滴りは著しく改善された。
With this configuration, the polishing stop position X-XI
Since the short-circuit between the resistance detection electrodes 2 and 3 and the conductor layer 25 can be detected by the resistance detection devices 27 and 27', the problem of small drips at the base of the polishing plate has been significantly improved.

一方研磨時には研庸面に傾きがあるためその傾きを検出
し角度補正をしなけれシならない。このためには研磨中
に数回研磨状態を検出する必要があり、本発明者らは第
4図のような複数回の位置検出が可能な形状の抵抗検出
用電極を提案した。
On the other hand, during polishing, since the polishing surface has an inclination, the inclination must be detected and the angle corrected. For this purpose, it is necessary to detect the polishing state several times during polishing, and the present inventors proposed a resistance detection electrode having a shape that allows position detection multiple times as shown in FIG.

しかし第4図の抵抗検出電極はショート現象を起こしゃ
すいM、Cu、 Auのやわらかい金属で形成するため
オープン検出部43の線幅をショート検出部42に比べ
て極めて細くシ、厚を薄くしても、ノ(りやダレが発生
する可能性があシ信頼性が低いという欠点を有する。尚
第4図中41は抵抗検出用電極を示す。
However, since the resistance detection electrode shown in FIG. 4 is made of soft metals such as M, Cu, and Au that are likely to cause short-circuit phenomena, the line width of the open detection section 43 is made extremely narrower than that of the short-circuit detection section 42, and the thickness is reduced. However, it has the disadvantage of low reliability due to the possibility of staining or sagging.In addition, numeral 41 in FIG. 4 indicates a resistance detection electrode.

本発明はこのような欠点を解消−rる丸めに成されたも
ので、本発明は導体層の上部または下部に特開昭58−
 64615(2) 絶縁層を介して回路のショートを検出するための抵抗検
出用電極を有する薄膜磁気ヘッドにおいて、上記抵抗検
出用電極を二種類以上の異なる材質の金属−で形成して
成ることを特徴とする薄膜磁気ヘッドに存し、抵抗検出
用電極のオープン検出部とショート検出部を異なる材質
の金属で形成することにより研磨位置検出の信頼性を向
上させたことを特長とする。
The present invention has been developed to eliminate such drawbacks.
64615 (2) In a thin film magnetic head having a resistance detection electrode for detecting a short circuit in a circuit through an insulating layer, the resistance detection electrode is formed of two or more different metals. The thin-film magnetic head is characterized by improving the reliability of polishing position detection by forming the open detection part and the short detection part of the resistance detection electrode from different metals.

詳しくは、本発明は抵抗検出用電極をショート検出部と
オープン検出部の二層構造として、ショート検出部はA
j!、Cu、Auなどのやわらかい金属で形成すること
によりショートを起こしやすくし、オープン検出部はT
+、Crパーマロイ等のかたい材料で形成することによ
りショートが起こらないようにすることで抵抗検出用電
極の位置検出の信頼性を向上させたことを特長とする。
Specifically, in the present invention, the resistance detection electrode has a two-layer structure of a short detection part and an open detection part, and the short detection part is A.
j! , Cu, Au, and other soft metals to easily cause short circuits, and the open detection part is
It is characterized by improving the reliability of position detection of the resistance detection electrode by preventing short-circuits by forming it with a hard material such as + or Cr permalloy.

以下本発明の一実施例を第5図乃至第8図に従って評細
に説明する。
An embodiment of the present invention will be described in detail below with reference to FIGS. 5 to 8.

第5図は抵抗検出用11&の形状図で、第6図はそのz
−z’縁に沿う断面図である。これら第5図   1r 第6図中でaお、よびす、c、d、e、fの長さはそれ
ぞれM=z100um 、b=25um 、c=25u
m。
Figure 5 is a shape diagram of resistance detection 11&, Figure 6 is its z
- It is a sectional view along a z' edge. The lengths of a, y, c, d, e, and f in FIG.
m.

d = 25um、 e゛=25um、 f rm l
umであシ、ショート検出部71はMで膜厚Q、 5 
u mに形成し、オープン検出部72はパーマロイで膜
厚Q、lumに形成した。
d = 25um, e = 25um, f rm l
The short detection part 71 is M and has a film thickness Q, 5
The open detection portion 72 was formed of permalloy with a film thickness of Q and lum.

このような二層構造の抵抗検出用電極を第2図の抵抗検
出用電極23の代りに用いれば研磨の進行に従って第5
図中のA−B間およびC−D間ではショート検出部71
と導体層(下部磁性層)との間はショート検出部がやわ
らかいMで形成されているため研磨によるパリやダレの
ためにショートが、又B−C問およびD−X間ではオー
プン検出部72がかたいパーマロイで膜厚も薄く形成さ
れているためパリやダレが発生せずにオープンが、研磨
停止位置Xでは再びショートが抵抗検出装置27および
27′によシ第7図のように検知される。
If such a two-layered resistance detection electrode is used in place of the resistance detection electrode 23 shown in FIG.
The short detection section 71 is located between A and B and between C and D in the figure.
Since the short-circuit detection part between the and the conductor layer (lower magnetic layer) is formed of soft M, short-circuits may occur due to cracks or sag due to polishing, and the open detection part 72 between B-C and D-X. Since the film is made of hard permalloy and has a thin film thickness, it opens without any cracks or sagging, but at the polishing stop position X, a short circuit is detected again by the resistance detection devices 27 and 27' as shown in Figure 7. be done.

また第8図は研麿装置の概略図で抵抗検出装置27およ
び27′、平衡検出装置81、角度補正装置82、圧力
装置83、薄膜磁気ヘッド84、駆動用モータ85、ベ
ルト86、砥石87で構成される。
FIG. 8 is a schematic diagram of the Kenmaro device, which includes resistance detection devices 27 and 27', balance detection device 81, angle correction device 82, pressure device 83, thin film magnetic head 84, drive motor 85, belt 86, and grindstone 87. configured.

このような構成であれば、薄膜磁気ヘッド84を砥石8
7に接触させ圧力装置83で矢印20の方向に適当な圧
力を加えながら駆動用モータ85でベルト86を介して
砥石87を駆動し薄膜磁気ヘッド84を研磨することが
できる。
With such a configuration, the thin film magnetic head 84 is connected to the grinding wheel 8.
The thin film magnetic head 84 can be polished by driving the grinding wheel 87 via a belt 86 with a driving motor 85 while applying appropriate pressure in the direction of the arrow 20 using a pressure device 83.

従って第2図の抵抗検出用電極23の代わりに第5図の
抵抗検出用電極を用いて目標位装置X −X/まで平衡
に研磨されたならば平衡検出装置81は抵抗検出装置2
7および27′の同一の出力により平衡に研磨されたこ
とを検知し圧力装置83の矢印20方向の圧力を解除す
ると共に駆動用モータ85を停止し研磨を終る。また抵
抗検出装置27および27/検出出力が一致しない場合
、平衡検出装置81は不平衡に研麿された状態を検知し
両者の検出出力が一致するまで角度補正装置82で薄膜
磁気ヘッド120角度補正を行ないながら研磨を続は目
標位置X −X/に達したならば圧力装置83の矢印2
0方向の圧力を解除すると共に駆動用モータ85を停止
し研磨を終る。
Therefore, if the resistance detection electrode shown in FIG. 5 is used in place of the resistance detection electrode 23 shown in FIG.
7 and 27', it is detected that the polishing has been balanced, and the pressure of the pressure device 83 in the direction of the arrow 20 is released, and the drive motor 85 is stopped to complete the polishing. If the resistance detection devices 27 and 27/detection outputs do not match, the balance detection device 81 detects the unbalanced state and corrects the angle of the thin film magnetic head 120 using the angle correction device 82 until the detection outputs of both match. When the target position X -X/ is reached, press arrow 2 of the pressure device
The pressure in the 0 direction is released and the drive motor 85 is stopped to complete the polishing.

従って上記のような抵抗検出用X極を有する薄膜磁気ヘ
ッドは研磨中宮に角度補正ができるため極めて正確に薄
膜磁気ヘッドの先端の平衡をとることができる。
Therefore, since the thin film magnetic head having the X-pole for resistance detection as described above can correct the angle during polishing, it is possible to balance the tip of the thin film magnetic head very accurately.

なお上記の実施例ではショート検出部71はAlで形成
しオープン検出部72はパーマロイで形成したものにつ
いて述べたがかならずしもこれに@定される本のではな
く、ショート検出部71はCu、Au。
In the above embodiment, the short detection section 71 is made of Al and the open detection section 72 is made of permalloy, but this is not necessarily the case; the short detection section 71 is made of Cu or Au.

等のやわらかい金属で、オープン検出部72はTi。The open detection part 72 is made of a soft metal such as Ti.

Cr等のかたい金属で形成しても同様の結果が得られる
A similar result can be obtained even if it is made of a hard metal such as Cr.

以上述べたように本発明によれば薄膜磁気ヘッドを所定
の位置まで研磨する場合に、ショート検出部をAI、C
u、Au等の比較的やわらかい金属で、オープン検出部
をパーマロイ、Ti、Cr等の比較的かたい金属で形成
した抵抗用検出用電極を設けることによシ、ギャップデ
プス加工が容易になシ量産に過した同一の特性を有する
薄層磁気ヘッドを提供することができる。
As described above, according to the present invention, when polishing a thin film magnetic head to a predetermined position, the short detection section is
By providing a resistance detection electrode made of a relatively soft metal such as u, Au, etc., and the open detection part made of a relatively hard metal such as permalloy, Ti, or Cr, gap depth processing can be easily performed. It is possible to provide a thin-layer magnetic head having the same characteristics as mass-produced.

【図面の簡単な説明】[Brief explanation of drawings]

図および第2図は平面図、第3図は第2図のY−Y′線
に沿う断面図、第4図は従来の抵抗検出用電極の形状図
である。 また第5図乃至第8図は本発明の実施例を示すもので第
5図は抵抗検出用電極の形状図で第6図けそのZ−Z’
@tic沿う断面図、第7図は抵抗検出用電極と導体層
(下部磁性層)との間の研磨量に対する抵抗の変化を示
したグラフ、第8図は研磨装置の概略図である。 23・・・抵抗検出用電極、24・・・絶縁層、25・
・・導体層。 代理人 弁理士    秋  本  正  実第1図 第2図 93 第3図 第4図 jI5回
2 and 2 are plan views, FIG. 3 is a sectional view taken along line Y--Y' in FIG. 2, and FIG. 4 is a shape diagram of a conventional resistance detection electrode. Further, FIGS. 5 to 8 show embodiments of the present invention, and FIG. 5 shows the shape of the resistance detection electrode, and FIG. 6 shows the shape of the resistance detection electrode.
7 is a graph showing the change in resistance with respect to the amount of polishing between the resistance detection electrode and the conductor layer (lower magnetic layer), and FIG. 8 is a schematic diagram of the polishing apparatus. 23... Resistance detection electrode, 24... Insulating layer, 25...
...Conductor layer. Agent Patent Attorney Tadashi Akimoto Figure 1 Figure 2 Figure 93 Figure 3 Figure 4 jI5 times

Claims (1)

【特許請求の範囲】[Claims] 導体層の上部または下部に絶縁層を介して回路のシ田−
トを検出する丸めの抵抗検出用電極を有する薄膜磁気ヘ
ッドにおいて、上記抵抗検出用電極を二種類以上の異な
る材質の金楓で形成して成ることを特徴とする薄膜磁気
ヘッド。
The circuit board is connected via an insulating layer above or below the conductor layer.
What is claimed is: 1. A thin film magnetic head having a rounded resistance detection electrode for detecting resistance, characterized in that the resistance detection electrode is formed of two or more different types of gold maple.
JP16272181A 1981-10-14 1981-10-14 Thin film magnetic head Pending JPS5864615A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16272181A JPS5864615A (en) 1981-10-14 1981-10-14 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16272181A JPS5864615A (en) 1981-10-14 1981-10-14 Thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS5864615A true JPS5864615A (en) 1983-04-18

Family

ID=15760011

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16272181A Pending JPS5864615A (en) 1981-10-14 1981-10-14 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS5864615A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995002241A1 (en) * 1993-07-07 1995-01-19 Digital Equipment Corporation Electrical lapping guides for thin-film disk sliders

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995002241A1 (en) * 1993-07-07 1995-01-19 Digital Equipment Corporation Electrical lapping guides for thin-film disk sliders

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