JPS5857856B2 - Exposure machine for color selection electrodes - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an exposure machine for color selection electrodes, and particularly to a reinforcing structure for this exposure machine.

In general, a color selection electrode such as a shadow mask allows three electron beams emitted from an electron gun to pass through and strike a predetermined phosphor dot or phosphor stripe, and has a color selection function. There is.

Structurally, it can be broadly divided into those with circular holes and those with slot holes, but in either case, a photoresist film is formed on a thin iron plate as a material, and an exposure machine for color selection electrodes is used to form this film. By exposing and developing the photoresist film, portions of the photoresist film that were not irradiated with light during exposure are removed, and predetermined openings are provided in the photoresist film.

Next, by etching this thin iron plate,
Holes are formed at locations corresponding to the openings of the photoresist film, and then this thin iron plate is pressed and shaped to form a color selection electrode for a color picture tube.

FIG. 1 is a cross-sectional view showing an example of a conventional exposure machine for color selection electrodes. In the same figure, la and Ib are glass dry plates, each having a dot-shaped emulsion surface 2at2b on the opposing surface. .

The dot shape of one emulsion surface 2a is the same as that of the other emulsion surface 2b.
smaller than the dot shape.

In this case, the dry plates 1a and 1b are integrated with each other using a jig (not shown).

Exposure can be carried out by holding the thin iron plate 4 having the photoresist film 3 in the exposure machine having such a structure as shown in the figure, and irradiating it with light from a light source (not shown) from both sides.

Therefore, since the exposure machine performs such an important function, it needs to have excellent strength.

However, according to the conventional exposure machine for color selection electrodes having such a configuration, during exposure, the dry plate la.

Since the emulsion surfaces 2a and 2b of 1b are always in contact with the photoresist film 3, the emulsion surfaces 2a and 2b may be scratched or worn in the worst case. The disadvantage is that a predetermined portion of the image cannot be exposed in a predetermined shape.

Further, since dust adheres to the emulsion surfaces 2a and 2b, extra holes may be formed in the photoresist film 3 corresponding to these areas.

In this case, the dust can be wiped off, but the emulsion surface 2a,
2b is extremely soft and easily scratched, and therefore has the disadvantage that such a wiping operation cannot be performed.

Therefore, in order to eliminate such defects, the dry plate 1
Methods have been proposed in which transparent resin is coated or sprayed onto the emulsion surfaces 2a and 2b of a and 1b, but it is difficult to obtain a uniform thin film, and the resin solvent is generally used. O has the drawback that workability is very poor and impractical due to flammability. Therefore, the object of the present invention is to eliminate the above-mentioned drawbacks, and will be explained in detail below using Examples.

FIG. 2 shows an exposure plate for color selection electrodes according to the present invention, in which the first
The same reference numerals are used for the same parts as in the figure.

In the figure, 20 is a thin film made of polyester or the like, which is a feature of the present invention, and is deposited on the emulsion surfaces 2a and 2b.

The thin film 20 is pressed onto the emulsion surfaces 2a and 2b using, for example, a heated roller. Specifically, a polyester film is used as the film 20, and this is
If the film is bonded by passing it through a heated roller at 20° C., the film will firmly adhere to the emulsion surfaces 2a and 2b with a uniform thickness.

Next, the thickness of the film 20 will be described.

The thickness of this film 20 is 10-3 as shown in the following table.
It requires a thickness of 0μ.

From the table above, the transparent film 20 has no protective effect on the emulsion surfaces 2a and 2b when the film thickness is less than 5μ, and when it is more than 35μ the distance between the emulsion surfaces 2a and 2b of the glass pattern and the photoresist film 3 is too large, making it difficult to expose. The light of time wraps around so much that normal dots cannot be formed on the thin iron plate 4.

Therefore, the thickness of the film 20 should be 10-30μ.

Further, according to the present invention, since the distance between the dots on the emulsion surfaces 2 a and 2 b and the photoresist film 3 is increased by the thickness of the film 20, the wraparound of light increases, and
The dots on the iron plate 4 are smaller in size than the dots on the a + 2 b.

Therefore, when obtaining a predetermined pore diameter after etching, the dots on the emulsion surfaces 2a and 2b can be made larger by the smaller diameter, making pattern production very easy.

Figure 3 shows the difference between the film thickness of the color selection electrode and the dot diameter on the emulsion surface.As is clear from the figure, when the film thickness is 20μ, the amount of reduction in baked iron plate dots is 6
．． This means that the dots on the emulsion surface can be made larger.

As a result, emulsion surface pattern fabrication becomes easy.

Here, the present invention has been described with reference to an exposure machine that manufactures color selection electrodes having dot-shaped holes, but the present invention is not limited to this, and may also be applied to an exposure machine that manufactures shadow masks having slot holes. Applicable.

As explained above, according to the exposure machine for color selection electrodes according to the present invention, since a transparent resin film is laminated on the emulsion surface by thermocompression bonding, scratches and abrasion of the emulsion surface can be prevented, and highly accurate color selection electrodes can be formed. In addition to being easy to manufacture, the emulsion surface pattern can be manufactured easily and workability can be improved.

[Brief explanation of the drawing]

Fig. 1 is a sectional view showing the -ψ angle of a conventional exposure machine for color selection electrodes, Fig. 2 is a sectional view showing an embodiment of the exposure machine for color selection electrodes according to the present invention, and Fig. 3 is a sectional view of the film. FIG. 3 is a characteristic diagram showing the relationship between the thickness and the amount of reduction in baked plate dots. la, 1b...dry plate, 2a, 2b...emulsion surface, 3.
...Photosensitive film, 4...Thin iron plate, 20...Film.

Claims (1)

[Scope of Claims] 1. A color selection method comprising an emulsion surface with a predetermined pattern formed on the surface of a transparent glass dry plate and exposing a predetermined portion of a photoresist film formed on the surface of a thin iron plate to obtain a color selection electrode. An exposure machine for color selection electrodes, which heats and presses a transparent resin film onto the emulsion surface of the electrode exposure machine. 2. The color-selecting electrode exposure machine according to claim 1, wherein the resin film has a thickness of 10 to 30 μm.