JPS5855331A - Hydrophobic silica gel and its manufacture - Google Patents

Hydrophobic silica gel and its manufacture

Info

Publication number
JPS5855331A
JPS5855331A JP15009681A JP15009681A JPS5855331A JP S5855331 A JPS5855331 A JP S5855331A JP 15009681 A JP15009681 A JP 15009681A JP 15009681 A JP15009681 A JP 15009681A JP S5855331 A JPS5855331 A JP S5855331A
Authority
JP
Japan
Prior art keywords
silica gel
heat
silica
hydrophobic
adsorption
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15009681A
Other languages
Japanese (ja)
Inventor
Seiichi Kondo
近藤 精一
Yasuo Saito
斎藤 泰郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP15009681A priority Critical patent/JPS5855331A/en
Publication of JPS5855331A publication Critical patent/JPS5855331A/en
Pending legal-status Critical Current

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  • Silicon Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)

Abstract

PURPOSE:To obtain a hydrophobic surface having prescribed heat of adsorption of wate by hydrothermally treating silica hydrogel or silica xerogel immersed in an alkaline aqueous soln. of a prescribed pH. CONSTITUTION:Silica hydrogel or silica xerogel is immersed in an alkaline aqueous soln. of 10-11.2pH such as 0.001N aqueous NaOH soln., hydrothermally treated, taken out, and dried. The resulting silica gel has <=10.6kcal/mole heat of adsorption during adsorption of water on the surface. The heat is smaller than heat of condensation of water. The surface of the silica gel is hydrophobic, and the silica gel is widely used as hydrophobic and organophilic silica gel for org. paint, plastics and printing ink.

Description

【発明の詳細な説明】 本発明は新規な疎水性シリカゲルとその製法に関するも
のである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel hydrophobic silica gel and a method for producing the same.

従来のyyカゲルは、有機物又はその基をつけて1表面
修飾をしたものを除くと親水性、疎有機性であり、その
使用法及び用途は制限されていた。
Conventional yy gels are hydrophilic and organophobic, except for those that have been surface-modified with organic substances or groups thereof, and their usage and applications have been limited.

もし疎水性で親有機性のシリカゲルが存在しているなら
ば有機塗料、デッスナックス、印刷インキ、接着剤など
に使用されている微粉シリカの分散性の改良、またクロ
マトグラフィーの充填材や触媒の担体として今までのシ
リカゲルとは異なる特性を有する素材として幅広い用途
が考えられる。
If hydrophobic and organophilic silica gel is present, it can be used to improve the dispersibility of finely divided silica used in organic paints, desnaxes, printing inks, adhesives, etc., as well as as fillers and catalysts for chromatography. As a carrier, it can be used in a wide range of applications as a material with properties different from those of conventional silica gel.

そこで本発明者は疎水性のシリカゲルを生み出すべく研
究し、シリカヒドロゲルの水熱処理と表面性状、特にQ
H基との関係につき種々検討を重ねた。その結果従来性
なわれていなかった特別な条件下で水熱処理すると表面
に水素結合性の特有なQH基が出現し疎水性のシリカゲ
ルが得られることを見出し本発明を完成した。
Therefore, the present inventor conducted research to produce hydrophobic silica gel, and investigated the hydrothermal treatment and surface properties of silica hydrogel, especially Q.
Various studies have been conducted regarding the relationship with the H group. As a result, they discovered that when hydrothermally treated under special conditions that had not been done before, unique QH groups with hydrogen bonding properties appeared on the surface and a hydrophobic silica gel was obtained, and the present invention was completed.

すなわち本発明の要旨は表面に水が吸着する際の吸着熱
が、水の凝縮熱10.6 kcal / molより小
さい表面を有する疎水性シリカゲルと、シリカヒドロゲ
ル又はシリカキセロゲルをpH10,0〜11.2のア
ルカリ性溶液に浸漬し水熱処理し乾燥することを特徴と
する疎水性シリカゲルの製法にある。
That is, the gist of the present invention is to prepare hydrophobic silica gel having a surface on which the heat of adsorption when water is adsorbed is smaller than the heat of condensation of water, 10.6 kcal/mol, and silica hydrogel or silica xerogel at pH 10.0 to 11.0. 2. A process for producing hydrophobic silica gel characterized by immersing it in an alkaline solution, hydrothermally treating it, and drying it.

以下に本発明の詳細な説明するに1本発明シリカゲルを
製造するには、まずシリカヒドロゲル又はシリカキセロ
ゲルを製造する必要がある。Vすカとドロゲルを製造す
る方法としては、特に制限はないが1例えば−) 稀薄
なケイ酸アルカリ水溶液を過剰の酸の中に強く攪拌しな
がら注加してゲル状のりリカLドロゲルを得る方法、(
b)ケイ酸アルカリ水溶液を酸の鵬薄水溶液で中和し【
、比較的安定なりリカゾルを形成し、しかる後、このシ
リカゲルを加熱又は放置して粒状のシリカヒドロゲルを
形成する方法、<eJyリオヒドロゾルを水と非混和性
の熱液体媒体中へ押出すことによる方法等いずれの方法
であっても良い。t/T)11キセロゲルを製造するに
は、特に制限はないが、シリカヒドロゲルをW、sさせ
るなどし、Vリカv−yaゲル中の水分を除去し空気な
どの気体と置換してやればよいつ 次に製造したシリカヒドロゲル又はV9tlキセロゲ#
をpH10,0〜11.2のアルカリ性水溶液に浸漬す
る。用いるアルカリとしては、水酸化ナトリウム、アン
モニア等が挙げられ1通常水酸化す)リウ五0.003
〜0.004重量%(0,001規定)の濃度のものが
使用される。pHが10.0よりも低いと疎水性とはな
らず親水性となり、11.2よりも高いとシリカが溶け
てしまう、このアルカリ性水溶液に60〜3000分間
油浴中100℃にて浸漬し水熱処理を行なう、水からV
9★グルを引き上げ1次に150℃の温度にした乾燥機
中にて6時間放置して乾燥し疎水性シリカゲルが得られ
る。
The present invention will be described in detail below. In order to produce the silica gel of the present invention, it is first necessary to produce silica hydrogel or silica xerogel. There are no particular restrictions on the method for producing V-sca and drogel, but for example -) A dilute aqueous alkali silicate solution is poured into excess acid with strong stirring to obtain a gel-like glue drogel. Method,(
b) Neutralize the alkaline silicate aqueous solution with a dilute aqueous acid solution [
, by forming a relatively stable lyohydrosol and then heating or standing the silica gel to form a particulate silica hydrogel, by extruding the lyohydrosol into a hot liquid medium that is immiscible with water. Any method may be used. t/T) 11 There are no particular restrictions on how to produce xerogel, but it may be done by subjecting the silica hydrogel to W, S, etc. to remove the moisture in the V-lyca v-ya gel and replacing it with a gas such as air. Next, the produced silica hydrogel or V9tl xeroge #
is immersed in an alkaline aqueous solution with a pH of 10.0 to 11.2. Examples of the alkali to be used include sodium hydroxide and ammonia.
A concentration of 0.004% by weight (0.001 normal) is used. If the pH is lower than 10.0, it will not be hydrophobic but will be hydrophilic, and if it is higher than 11.2, silica will dissolve. From water to heat treatment
The 9★ glue was pulled up and dried by leaving it in a dryer at a temperature of 150° C. for 6 hours to obtain a hydrophobic silica gel.

こうして得られたシリカゲルの平均粒径は2000〜7
000μで、比表面積は100〜500〆/−で細孔面
積は0.4〜L2d/fである。またこの本発明シリカ
ゲルにつき次のクラシラス・クラペイロンの式を用いて
、次の方法により水とメタノールの吸着等温線により微
分吸着熱を測ってみると 式:q=RT8(占lnP ゴ「0・ R:ガス定数 q:吸着熱 T:絶対温度 P:圧力 方法:例えば10℃と30℃のように2つの温度におけ
る吸着等温線をとり、クラシラス・クラペイロン式を適
用し微分吸着熱を算出する。水の凝縮熱すなわち10.
6 kcal / motよりも小さいものとなる。言
い換えればシリカゲル表面が疎水性である。また主に自
由OH基をもつシリカゲルの水分子の入れる表面積当り
の湿潤熱が190X10−’J/cdであるのに比較し
て、上述の方法で製造したシリカゲルのそれは11:0
X10−’J / dとなりこの値は、氷表面のエネル
ギーよりも小さい。
The average particle size of the silica gel thus obtained was 2000-7.
000μ, specific surface area is 100-500〆/-, and pore area is 0.4-L2d/f. In addition, for this silica gel of the present invention, the differential heat of adsorption was measured by the adsorption isotherm of water and methanol using the following method using the following Cracilus-Clapeyron equation. : Gas constant q: Heat of adsorption T: Absolute temperature P: Pressure method: For example, take adsorption isotherms at two temperatures, such as 10°C and 30°C, and calculate the differential heat of adsorption by applying the Cracilus-Clapeyron equation.Water heat of condensation, i.e. 10.
It will be smaller than 6 kcal/mot. In other words, the silica gel surface is hydrophobic. Furthermore, compared to the heat of wetness per surface area for water molecules of silica gel, which mainly has free OH groups, is 190×10-'J/cd, that of silica gel produced by the above method is 11:0.
X10-'J/d, and this value is smaller than the energy of the ice surface.

この結果からもこれら表面が疎水性であることが判る。This result also shows that these surfaces are hydrophobic.

以上の方法により疎水性シリカゲルが得られる確かな理
由は不明であるが、一応アルカリ性水溶液に浸漬後の水
熱処理によりシリカ基質表面に内一部OH基やミクロデ
アをもつシリカゲルの水素結合性のOH基とは全く異な
るOH基が生成するからではないかと推定される。
The exact reason why hydrophobic silica gel can be obtained by the above method is unknown, but the hydrogen-bonding OH groups of the silica gel, which has some OH groups and microdea on the silica substrate surface, are formed by hydrothermal treatment after immersion in an alkaline aqueous solution. It is presumed that this is because an OH group that is completely different from that is generated.

このような本発明疎水性シリカゲルは前述したような従
来の親水性シリカゲルとは全く異なった用途への使用が
期待される。
The hydrophobic silica gel of the present invention is expected to be used for applications completely different from those of the conventional hydrophilic silica gel as described above.

以下C実施例により本発明を更に詳細に説明するが本発
明はその要旨を越えない限り以下の実施例により限定さ
れるものではない。
The present invention will be explained in more detail below using Example C, but the present invention is not limited to the following Examples unless the gist thereof is exceeded.

実施例1 四エチルケイ酸をpH2,0,80℃で100分加水分
解し、シリカヒドロゲルを調整した。そのヒドロゲルを
水酸化ナトリウムでpH11,2に一調節した水中で1
00℃にて110時間水熱処理(油浴中で110℃に加
熱、110時間処理後水を切る。)シ、その後ゆるやか
に乾惨しシリカゲルを得た。前述のクラシラス・クラペ
イロンの方法によりこのVリカゲ/I/IC対する水及
びメタノールの微分吸着熱を測定したところ第1図の曲
線A。
Example 1 Tetraethylsilicic acid was hydrolyzed at pH 2, 0, and 80° C. for 100 minutes to prepare a silica hydrogel. The hydrogel was dissolved in water adjusted to pH 11.2 with sodium hydroxide for 1 hour.
Hydrothermally treated at 00°C for 110 hours (heated to 110°C in an oil bath, drained after 110 hours of treatment), and then gently dried to obtain silica gel. The differential heat of adsorption of water and methanol to this Vlikage/I/IC was measured by the Clasillus Clapeyron method described above, and curve A in FIG. 1 was obtained.

及びA、のような結果となり疎水性であることが確認さ
れた1、 実施例2 水熱処理時間を2時間とする外は実施例1と同様にして
シリカゲルを製造し、水の微分吸着熱を測定したところ
第1図の曲線Bのような結果となり疎水性であることが
確認された。
The results were as follows, and it was confirmed that the gel was hydrophobic.1. Example 2 Silica gel was produced in the same manner as in Example 1, except that the hydrothermal treatment time was 2 hours, and the differential heat of adsorption of water was When measured, the results were as shown in curve B in Figure 1, confirming that it was hydrophobic.

比較例 水熱処理をpH8,9で2時間とする外は実施例1と同
様にしてVリカゲルを製造し、水及びメタノールの微分
吸着熱を測定したところ第1図の曲線CI、 C,のよ
うな結果となり親水性であることが確認された。
Comparative Example V licagel was produced in the same manner as in Example 1, except that the hydrothermal treatment was carried out at pH 8 and 9 for 2 hours, and the differential heat of adsorption of water and methanol was measured, as shown in curves CI and C in Figure 1. This result confirmed that it is hydrophilic.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は実施例及び比較例によって得られたりリカゲル
の微分吸着熱を示すグラフである。 代理人 弁理士 足置 勉 手続補正書(自発) 昭和56年10月16日 特許庁長官 島田春樹 殿 1、事件の表示 昭和56年 特 許 願第150091y号2、発明の
名称 疎水性シリカゲルとその製法3、 補正をする者 事件との関係 特許出願人 4、代理人 8、補正の内容 別紙の通り
FIG. 1 is a graph showing the differential heat of adsorption of licagel obtained in Examples and Comparative Examples. Agent Patent attorney Tsutomu Ashioki Procedural amendment (spontaneous) October 16, 1980 Commissioner of the Patent Office Haruki Shimada 1, Indication of the case 1981 Patent application No. 150091y 2, Title of invention Hydrophobic silica gel and its Manufacturing process 3. Relationship with the case of the person making the amendment Patent applicant 4, agent 8, contents of the amendment as shown in the attached sheet

Claims (1)

【特許請求の範囲】 1 表面に水が吸着する際の吸着熱が、水の凝縮熱10
.6 keil / molより小さい表面性状を有す
る疎水性シリカゲル。 字 シリカヒドロゲル又はシリカキセロゲルをPHi 
o、 o〜11.2のアルカリ性水溶液に浸漬し水熱処
理し、乾燥することを特徴とする疎水性シリカゲルの製
法。
[Claims] 1. The heat of adsorption when water is adsorbed on the surface is the heat of condensation of water 10
.. Hydrophobic silica gel with surface texture less than 6 keil/mol. PHi silica hydrogel or silica xerogel
A method for producing hydrophobic silica gel, which comprises immersing it in an alkaline aqueous solution of o to 11.2, hydrothermally treating it, and drying it.
JP15009681A 1981-09-22 1981-09-22 Hydrophobic silica gel and its manufacture Pending JPS5855331A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15009681A JPS5855331A (en) 1981-09-22 1981-09-22 Hydrophobic silica gel and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15009681A JPS5855331A (en) 1981-09-22 1981-09-22 Hydrophobic silica gel and its manufacture

Publications (1)

Publication Number Publication Date
JPS5855331A true JPS5855331A (en) 1983-04-01

Family

ID=15489419

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15009681A Pending JPS5855331A (en) 1981-09-22 1981-09-22 Hydrophobic silica gel and its manufacture

Country Status (1)

Country Link
JP (1) JPS5855331A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6189933A (en) * 1984-10-09 1986-05-08 Nissan Motor Co Ltd Regenerative type gas turbine
JPH0421732U (en) * 1990-06-14 1992-02-24
US5855112A (en) * 1995-09-08 1999-01-05 Honda Giken Kogyo Kabushiki Kaisha Gas turbine engine with recuperator
EP0922584A3 (en) * 1997-12-09 2000-02-02 Canon Kabushiki Kaisha Adsorbent used in inkjet printing
JP2015036359A (en) * 2013-08-13 2015-02-23 東ソー株式会社 Manufacturing method of silica solidified body and silica solidified body
JP2015036358A (en) * 2013-08-13 2015-02-23 東ソー株式会社 Solidification method of silica powder and high-purity silica solidified body

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6189933A (en) * 1984-10-09 1986-05-08 Nissan Motor Co Ltd Regenerative type gas turbine
JPH0331900B2 (en) * 1984-10-09 1991-05-09 Nissan Motor
JPH0421732U (en) * 1990-06-14 1992-02-24
US5855112A (en) * 1995-09-08 1999-01-05 Honda Giken Kogyo Kabushiki Kaisha Gas turbine engine with recuperator
EP0922584A3 (en) * 1997-12-09 2000-02-02 Canon Kabushiki Kaisha Adsorbent used in inkjet printing
US6302533B1 (en) 1997-12-09 2001-10-16 Canon Kabushiki Kaisha Adsorbent for ink jet use, an ink retaining container, an adsorption member using such adsorbent, an ink supply system having such adsorption member, and an ink jet recording apparatus
US6536884B2 (en) 1997-12-09 2003-03-25 Canon Kabushiki Kaisha Adsorbent for ink jet use, an ink retaining container, an adsorption member using such adsorbent, an ink supply system having such adsorption member, and an ink jet recording apparatus
US6951386B2 (en) 1997-12-09 2005-10-04 Canon Kabushiki Kaisha Adsorbent for ink jet use, an ink retaining container, an adsorption member using such an adsorbent, an ink supply system having such adsorption member, and an ink jet recording apparatus
JP2015036359A (en) * 2013-08-13 2015-02-23 東ソー株式会社 Manufacturing method of silica solidified body and silica solidified body
JP2015036358A (en) * 2013-08-13 2015-02-23 東ソー株式会社 Solidification method of silica powder and high-purity silica solidified body

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