JPS585276B2 - Electrical contact surface treatment method for copper-coated aluminum busbar - Google Patents
Electrical contact surface treatment method for copper-coated aluminum busbarInfo
- Publication number
- JPS585276B2 JPS585276B2 JP13108574A JP13108574A JPS585276B2 JP S585276 B2 JPS585276 B2 JP S585276B2 JP 13108574 A JP13108574 A JP 13108574A JP 13108574 A JP13108574 A JP 13108574A JP S585276 B2 JPS585276 B2 JP S585276B2
- Authority
- JP
- Japan
- Prior art keywords
- copper
- plating
- aluminum
- section
- coated aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
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- Electroplating Methods And Accessories (AREA)
- Electrolytic Production Of Metals (AREA)
Description
【発明の詳細な説明】
本発明はアルミニウムを基体としてその周囲に銅被覆を
施して構成される銅被覆アルミニウムブスバーの電気的
接続面のメッキ処理方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for plating the electrical connection surface of a copper-coated aluminum busbar, which is constructed by using aluminum as a base and coating the periphery with copper.
銅被覆アルミニウムブスバー(以下銅被アルミブスバー
と略称する。Copper-coated aluminum busbar (hereinafter abbreviated as copper-coated aluminum busbar).
)は1、資源、供給、価格等の面で不安定な銅の使用量
を極めて少くして資源豊富、安価という点で優れたアル
ミを多量に使用し、銅、アルミの採長補短的なものとし
て開発された複合材である。) is 1. The use of copper, which is unstable in terms of resources, supply, price, etc., is extremely reduced, and a large amount of aluminum, which is excellent in terms of resource abundance and low cost, is used in large quantities, and the production of copper and aluminum is compensated and shortened. It is a composite material developed as a material.
しかしてそのような特長のあるブスバーとしてもそのブ
スバー同士を接続したり、端子と接続する場合等に必要
な電気的接続面を得る場合当該面に沿って切断された端
面と接続ボルト貫通穴が形成されており、その表面処理
におけるメッキ処理において問題があった。However, even though the busbar has such features, when connecting the busbars to each other or connecting them to terminals, etc., to obtain the necessary electrical connection surface, the end surface cut along the surface and the connection bolt through hole are required. However, there was a problem with the plating process in the surface treatment.
第1図及び第2図は銅被アルミブスバーの端末を示した
もので、切断端面1と接続ボルト貫通用穴2が形成され
ており、その端面1、穴2にはブスバ一本体3のアルミ
基体地肌3Aと銅被覆層3Bの複合断面が露出される。Figures 1 and 2 show the end of a copper-coated aluminum busbar, in which a cut end face 1 and a hole 2 for connecting bolts are formed. A composite cross section of the base surface 3A and the copper coating layer 3B is exposed.
従来そのようにアルミ地肌3Aを露出する銅被アルミブ
スバーに対しては特に実用的なメッキとしてNi、Sn
、Agのメッキ金属をして被覆することが為され、経験
をつむ中で次のような手法がとられていた。Conventionally, Ni and Sn are particularly practical plating methods for copper-covered aluminum busbars that expose the aluminum surface 3A.
, it was attempted to cover it with Ag plating metal, and as experience was gained, the following methods were used.
すなわち、まず露出したアルミ地肌をマスキングして表
面の鋼部に銅単独のみに施すNi、Sn。That is, first, the exposed aluminum surface is masked, and Ni and Sn are applied only to the copper on the steel surface.
Agの中の適当な一種のメッキを施し、必要あればその
後アルミ地肌のマスキングをとりさる。A suitable type of Ag plating is applied, and if necessary, the masking of the aluminum surface is removed.
そして露出アルミ地肌にも完全なメッキを施す場合は、
次に表面の鋼部をマスキングしてアルミ地肌に対しアル
ミ単独のみに施すメッキの中適当なメッキ法を選んで表
面処理し、その後鋼部のマスキングをとり去る。If you want to completely plate the exposed aluminum surface,
Next, the steel parts on the surface are masked, and the aluminum base is surface-treated by selecting an appropriate plating method among the plating methods applied only to aluminum alone, and then the masking of the steel parts is removed.
(この反対の方法もある。)しかしてかかる方法である
と、鋼部に施すメッキとアルミ部に施すメッキが別工程
となり、工程の複雑と高加工費であるという大きな欠点
をもっており、メッキ処理の簡素化が望まれていた。(The opposite method is also available.) However, with this method, the plating applied to the steel part and the plating applied to the aluminum part are separate processes, which has the major disadvantage of complicating the process and high processing cost. simplification was desired.
従来そのような簡素化メッキ処理が考えられてはいた。Conventionally, such simplified plating processes have been considered.
例えば、アルミにメッキする場合、亜鉛置換法で行うこ
とが提案されているが、銅が黒っぽく変色し、鋼部への
メッキののりが悪くなるという不都合を生じており、さ
らに銅のみに施す場合のメッキを鋼部、アルミ部を含む
全体に施すことも考えてはいたが、
(1)アルミがメッキ液でおかされることが著しい、(
2)アルミがメッキ板に悪影響を与える、(3)アルミ
につくメッキの剥離が生ずる等の観念と慣習のとられれ
から過分に批判的に傾いてその後−願の価値も与えられ
なかった。For example, when plating aluminum, it has been proposed to use the zinc substitution method, but this has the disadvantage of discoloring the copper and making it difficult for the plating to adhere to the steel parts. I was thinking of applying this plating to the entire steel and aluminum parts, but (1) the aluminum would be seriously damaged by the plating solution;
2) Aluminum has a negative effect on plated plates, and (3) The plating on aluminum peels off.The idea and customs were taken too seriously, and the application was not given any value.
本発明は、その最後の発想を重要視したもので、多くの
調査研究と発想を育成した結果、従来のような別工程の
メッキ、マスキング等を要しない実用価値高き銅被アル
ミブスバーへの電接面処理方法を得た。The present invention places importance on that last idea, and as a result of much research and development, it has been developed to create an electrically conductive copper-covered aluminum busbar with high practical value that does not require separate processes such as conventional plating and masking. A contact surface treatment method was obtained.
すなわち、本発明方法は、銅被アルミブスバーの切口断
面及び穿孔断面部を含む電気的接続面にNi、Sn、A
gの中いずれか一種の電気メッキを施すに際して、当該
切口断面及び穿孔断面部をそのままとして、その接続粗
部全体表面に、銅のみに対する当該電気メッキを低pH
の短時間脱脂及び酸処理をして施すことを特徴とする。That is, in the method of the present invention, Ni, Sn, A, etc.
When applying any type of electroplating in g, the cut section and perforation section are left as they are, and the entire surface of the rough connection part is electroplated only on copper at a low pH.
It is characterized by being subjected to short-time degreasing and acid treatment.
上記方法においてNi、Sn、Agメッキはそのメッキ
処理でアルカリ性の溶剤例えばトリクレン洗浄等による
脱脂が行なわれるが、特に高pH、長時間の脱脂はアル
ミが溶は出し、アルミ基体をおかすとともにメッキ液に
影響を及ぼす。In the above method, Ni, Sn, and Ag plating is degreased by washing with an alkaline solvent such as trichlene during the plating process, but degreasing at particularly high pH and for a long time will cause the aluminum to dissolve, which will destroy the aluminum substrate and remove the plating solution. affect.
しかしてそのpH1時間を適切なものとすればアルミを
それ程おかすことなく、かつまたメッキ液に与える影響
も殆んどなくて済む。However, if the pH for 1 hour is set to an appropriate value, the aluminum will not be degraded that much and the plating solution will not be affected much.
またかかる脱脂処理とともに行なわれてきた銅ストライ
ク処理は前記脱脂と同様アルカリ性で行なわれており、
しかも本処理を除いても本メッキでの支障は殆んどなく
て済むものであった。In addition, the copper strike treatment that has been carried out together with such degreasing treatment is carried out in an alkaline environment like the aforementioned degreasing treatment.
Moreover, even if this treatment was excluded, there was almost no problem with the actual plating.
そうした背景のもとに為された銅被アルミブスバーへの
本発明の具体化方法は次の通り要約される。The method of implementing the present invention into a copper-covered aluminum busbar, which was made against this background, is summarized as follows.
(1)Niメッキ
当該銅被アルミブスバーの被メツキ部を低pHの短時間
溶剤(例:トリクレン)脱脂および酸洗(例:5%硫酸
水溶液)後硫酸ニッケルあるいは塩化ニッケルの水溶液
を使用して電気メッキすること。(1) After degreasing and pickling (e.g. 5% sulfuric acid aqueous solution) the plated part of the copper-coated busbar with a low pH short-time solvent (e.g. trichloride) and pickling (e.g. 5% sulfuric acid aqueous solution), the plated part of the copper-coated busbar is degreased using a nickel sulfate or nickel chloride aqueous solution. To be electroplated.
(2)Snメッキ
当該銅被アルミブスバーの被メツキ部を低pHの短時間
脱脂および酸洗後硫酸錫の水溶液中あるいは錫酸ソーダ
の水溶液を使用して電気メッキすること。(2) Sn plating The part to be plated of the copper-coated aluminum busbar is degreased and pickled for a short time at low pH, and then electroplated using an aqueous solution of tin sulfate or an aqueous solution of sodium stannate.
(3)Agメッキ
当該銅被アルミブスバーの被メツキ部を低pHの短時間
脱脂および酸洗後、青化銀あるいは 酸銀の水溶液を使
用して電気メッキすること。(3) Ag plating After short-time degreasing and pickling at low pH, electroplating is performed using an aqueous solution of silver cyanide or acid silver.
以下本発明方法の実洲例によってその効果を確認した結
果を説明する。The results of confirming the effects of the method of the present invention using actual examples will be explained below.
(1)Niメッキ (イ) NiSO4・7H2Oを200g/l、。(1) Ni plating (a) 200g/l of NiSO4.7H2O.
NH4Clを20g/l、H2BO3を15g/lを含
む水溶液(pH:6.0)を用い、液温20℃、電流密
度1A/dm2にて銅被アルミブスバーの切口断面、穿
孔断面を有する端末に3分間Niを電気メッキをした。Using an aqueous solution (pH: 6.0) containing 20 g/l of NH4Cl and 15 g/l of H2BO3, at a liquid temperature of 20°C and a current density of 1 A/dm2, a terminal having a cut cross section and a perforated cross section of a copper-covered aluminum busbar was prepared. Ni was electroplated for 3 minutes.
第3図はその様相を示しており、メッキ前の切口断面1
、穿孔断面部2はメッキ後、アルミ地肌3A、鋼部3B
ともに約2μの厚さのNi4で被覆された。Figure 3 shows the situation, and the cut section 1 before plating.
, after plating, the perforated cross section 2 has an aluminum base 3A and a steel part 3B.
Both were coated with Ni4 approximately 2μ thick.
当該メッキ部材4は、性能確認の為、150℃にて10
時間加熱したが、膨れによって脱落することもなく、ま
たJISZ 2371に基く塩水噴霧試験(5%NaC
l水溶液噴霧、温度35℃、湿度96%)を1週間行な
ったが黒錆を発生することなくCu、Al上ともNiメ
ッキ層は十分な防食効果を示した。The plated member 4 was heated at 150°C for 10 minutes to confirm its performance.
Although it was heated for a long time, it did not swell and fall off, and it also passed the salt spray test based on JIS Z 2371 (5% NaC
The Ni plating layer showed a sufficient anticorrosion effect on both Cu and Al without generating black rust when spraying with an aqueous solution (temperature: 35° C., humidity: 96%) for one week.
(ロ)NiSO4・7H2Oを330g/l、NiCl
2・6H2を45g/l、H3BO3を30g/lを含
むpH3,0の水溶液を用い液温50℃、電流密度6A
/dm2にて(イ)と同様にに1分間Niを電気メッキ
(約3μ被覆)した結果、Al、Cu部ともに被覆され
、上記と同様の性能を示した。(b) 330g/l of NiSO4.7H2O, NiCl
Using a pH 3.0 aqueous solution containing 45 g/l of 2.6H2 and 30 g/l of H3BO3, the liquid temperature was 50°C and the current density was 6 A.
As a result of electroplating Ni (approximately 3μ coating) at /dm2 for 1 minute in the same manner as in (a), both the Al and Cu portions were coated, and the same performance as above was exhibited.
(2)Snメッキ
(イ)60g/lのSnSO4,90g/lのH2SO
4,0,7g/lのゼラチン、100g/lのスルホン
酸クレゾールを含む水溶液を用い、温度35℃、電流密
度4A/dm2で3分間Snを電気メッキ(約4μ)し
た。(2) Sn plating (a) 60g/l SnSO4, 90g/l H2SO
Using an aqueous solution containing 4,0,7 g/l of gelatin and 100 g/l of cresol sulfonate, Sn was electroplated (approximately 4 μ) at a temperature of 35° C. and a current density of 4 A/dm 2 for 3 minutes.
その結果は(1)と同様のメッキ状態性能を得た。As a result, the same plating condition performance as (1) was obtained.
(ロ)80g/lのNa25nO3・33H2O112
/1NaOHを含む水溶液を用い温度70℃、電流密度
2A/dm2で3分間Snを電気メッキ(約2μ被覆)
した。(b) 80g/l Na25nO3.33H2O112
/1 Electroplating of Sn using an aqueous solution containing NaOH at a temperature of 70°C and a current density of 2A/dm2 for 3 minutes (approximately 2μ coating)
did.
結果は(イ)と同様。(3)Agメッキ
(イ)60g/lのAgCN、70g/lのNaCN、
25g/lのNa2CO3,25g/lの遊離NaCN
を含む水溶液を用い、温度60℃、電流密度1.0A/
dm2でAgを電気めっき(約3μ/3分間)
(ロ) 200g/l AgNO3・33H2O16
0/1HNO3を含む水溶液を用い温度40℃、電流密
度2A/dm2でAgを電気めっき(約2μ/1分間)
※ (イ)、(ロ)ともNiメッキの(イ)で述べたと
同じ様相にAgが被覆され十分な性能を示した。The result is the same as (a). (3) Ag plating (a) 60g/l AgCN, 70g/l NaCN,
25g/l Na2CO3, 25g/l free NaCN
Using an aqueous solution containing
Electroplating Ag at dm2 (approximately 3μ/3 minutes) (b) 200g/l AgNO3・33H2O16
Electroplating Ag using an aqueous solution containing 0/1HNO3 at a temperature of 40℃ and a current density of 2A/dm2 (approximately 2μ/1 minute) * (A) and (B) are the same as described in (A) for Ni plating. It was coated with Ag and showed sufficient performance.
以上実施例によって明らかな通り本発明の処理方法は、
Ni、Sn、Agの各メッキは基本的に銅に対する各金
属のメッキ法と同様であるが、元来これらは銅に対して
開発されたものであるが故に、また従来はこの種の銅被
アルミブスバーが普遍的に存在せず、従ってAl、Cu
共存下で同時めっきの必要性がなかったが故に、Alに
対するめつき状態が試験されるに至らなかった。As is clear from the above examples, the treatment method of the present invention is as follows:
Ni, Sn, and Ag plating are basically the same as the plating methods for each metal on copper, but because these were originally developed for copper, and in the past, this type of copper plating was Aluminum bus bars do not universally exist, so Al, Cu
Since there was no need for simultaneous plating under the coexistence, the state of plating for Al was not tested.
しかしながら、本発明者らはCuを主体としてのAl、
Cuの同時めっきの必要性に迫られ、これら在来めっき
法の適用を試みたところ、既に述べた如くCuは熱論の
ことA1部にもめつき層が被覆され、所要の性能を有す
ることを確認するに至ったのである。However, the present inventors discovered that Al containing Cu as a main component,
Faced with the need for simultaneous Cu plating, we tried applying these conventional plating methods, and as mentioned above, we confirmed that Cu was hot and that the A1 area was also covered with a plating layer and had the required performance. That's what I came to do.
これは、上記めっき液がAlに対してもその表面の酸化
膜を除去し、清浄化並に適当に活性化する作用を結果的
に有していたことによるものであると推定される。This is presumed to be due to the fact that the plating solution removed the oxide film on the surface of Al and had the effect of cleaning and activating it appropriately.
以上説明してきたように本発明方法によれば、銅被アル
ミブスバーのしかもアルミ地肌を銅とともに露州する切
口断面、穿孔断面を有する電接面に対するメッキ処理が
単一化された工程で簡単に行ない得、またアルミ部につ
くメッキも剥離等を生ぜず物理的に強固に密着できるの
であり、この種銅被アルミブスバーの適用を拡大する上
で極めて有効である。As explained above, according to the method of the present invention, the plating process for the electrical connection surface of the copper-coated aluminum busbar, which has a cut cross section and a perforated cross section in which the bare aluminum surface is exposed with the copper, can be easily performed in a single process. Moreover, the plating on the aluminum part can be physically firmly adhered without peeling, etc., and is extremely effective in expanding the application of this type of copper-covered aluminum bus bar.
第1図は銅被アルミブスバーの電接面を設定する端部を
示す斜視図、第2図同ブスバ一端部の縦断面図、第3図
は同ブスバ一端部のメッキ処理後の縦断面図を示す。Fig. 1 is a perspective view showing the end of the copper-coated aluminum bus bar where the electrical contact surface is set, Fig. 2 is a longitudinal sectional view of one end of the same bus bar, and Fig. 3 is a longitudinal sectional view of one end of the same bus bar after plating treatment. shows.
Claims (1)
切口断面及び穿孔断面部に露出したアルミ地肌をそのま
まとして、その接続相部全体表面に、銅のみに対する当
該電気メッキを低pHの短時間脱脂及び酸洗処理をして
施すことを特徴とする銅被覆アルミニウムブスバーの電
接面処理方法。[Claims] 1. A cut cross section of a copper-coated aluminum busbar. Ni and Sn are applied to the electrical connection surface including the perforated cross section. When electroplating any type of Ag, the aluminum bare surface exposed on the cut cross section and perforation cross section is left as is, and the electroplating only on copper is applied to the entire surface of the connecting phase at a low pH for a short period of time. A method for treating an electrical contact surface of a copper-coated aluminum busbar, characterized by performing degreasing and pickling treatment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13108574A JPS585276B2 (en) | 1974-11-15 | 1974-11-15 | Electrical contact surface treatment method for copper-coated aluminum busbar |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13108574A JPS585276B2 (en) | 1974-11-15 | 1974-11-15 | Electrical contact surface treatment method for copper-coated aluminum busbar |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5156740A JPS5156740A (en) | 1976-05-18 |
JPS585276B2 true JPS585276B2 (en) | 1983-01-29 |
Family
ID=15049622
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13108574A Expired JPS585276B2 (en) | 1974-11-15 | 1974-11-15 | Electrical contact surface treatment method for copper-coated aluminum busbar |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS585276B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006505693A (en) * | 2002-11-07 | 2006-02-16 | オウトクンプ オサケイティオ ユルキネン | Method for forming a good contact surface on an aluminum support bar and support bar |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FI114927B (en) * | 2002-11-07 | 2005-01-31 | Outokumpu Oy | A method of forming a good contact surface with a cathode support bar and a support bar |
FI121813B (en) * | 2009-06-25 | 2011-04-29 | Valvas Oy | A method of providing a current rail for use in electrolysis and current rail |
-
1974
- 1974-11-15 JP JP13108574A patent/JPS585276B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006505693A (en) * | 2002-11-07 | 2006-02-16 | オウトクンプ オサケイティオ ユルキネン | Method for forming a good contact surface on an aluminum support bar and support bar |
Also Published As
Publication number | Publication date |
---|---|
JPS5156740A (en) | 1976-05-18 |
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