JPS5849842B2 - Manufacturing method of high-resolution scattering plate - Google Patents

Manufacturing method of high-resolution scattering plate

Info

Publication number
JPS5849842B2
JPS5849842B2 JP55072838A JP7283880A JPS5849842B2 JP S5849842 B2 JPS5849842 B2 JP S5849842B2 JP 55072838 A JP55072838 A JP 55072838A JP 7283880 A JP7283880 A JP 7283880A JP S5849842 B2 JPS5849842 B2 JP S5849842B2
Authority
JP
Japan
Prior art keywords
scattering
lacquer
resolution
weight
scattering plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55072838A
Other languages
Japanese (ja)
Other versions
JPS5622401A (en
Inventor
ベルンハルト・メ−リス
クラウス・デイ−タ−・パレンデイ
クリストフ・シユラ−
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jenoptik AG
Original Assignee
Carl Zeiss Jena GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss Jena GmbH filed Critical Carl Zeiss Jena GmbH
Publication of JPS5622401A publication Critical patent/JPS5622401A/en
Publication of JPS5849842B2 publication Critical patent/JPS5849842B2/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/54Accessories
    • G03B21/56Projection screens
    • G03B21/60Projection screens characterised by the nature of the surface
    • G03B21/62Translucent screens

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Overhead Projectors And Projection Screens (AREA)
  • Surface Treatment Of Glass (AREA)

Description

【発明の詳細な説明】 本発明は、透過光を投影して像、計測目盛等を再生する
光学器械に用いる高分解能散乱板の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a high-resolution scattering plate used in an optical instrument that reproduces images, measurement scales, etc. by projecting transmitted light.

その他、この種の散乱板は立体や平面を均等に散乱照明
するために光学器械に用いられる。
In addition, this type of scattering plate is used in optical instruments to uniformly scatter and illuminate a three-dimensional or flat surface.

研磨または腐食によってガラス面に一定の粗さを設けて
投影用散乱板を製造することは知られている( Opt
ik第1巻、238頁(1946))。
It is known to manufacture projection scattering plates by providing a certain roughness on the glass surface by polishing or etching (Opt
ik Vol. 1, p. 238 (1946)).

投影スクリーンを製造する別の公知の方法として、皮膜
形成バインダーによって微細無機顔料の被膜がポリメタ
クリル酸メチルから成る透明支持板に固着される(ドイ
ツ実用新案第1834760号)。
In another known method for producing projection screens, a film of finely divided inorganic pigments is fixed to a transparent support plate of polymethyl methacrylate by means of a film-forming binder (German Utility Model No. 1834760).

しかし、こうして製造された散乱板は半値角が3°〜5
°以下ときわめて小さく、像再生時の分解能もきわめて
不十分である点が大きな不利である。
However, the scattering plate manufactured in this way has a half-value angle of 3° to 5°.
The major disadvantage is that it is very small, less than 100°C, and the resolution during image reproduction is also extremely insufficient.

この火気を除去するため、ポリエステル分散体から成る
散乱剤を添加して有機重合体混合物から散乱板またはマ
ットフイルムを製造する方法が知られている(東独経済
特許第51090号、第101333号)。
In order to remove this flame, a method is known in which a scattering agent made of a polyester dispersion is added to produce a scattering plate or a matte film from an organic polymer mixture (East German Economic Patent Nos. 51090 and 101333).

これによって散乱能は約25°の半値角まで高められた
のであったが、分解能が幾分不十分である。
This increased the scattering power to a half-power angle of about 25°, but the resolution was somewhat inadequate.

その他、半値角の高まりに伴なって散乱板または散乱フ
イルムの透過率、したがって像の明るさが極度に低下す
る。
In addition, as the half-value angle increases, the transmittance of the scattering plate or scattering film, and therefore the brightness of the image, decreases extremely.

最後に、機械的、気候的および熱的影響に関し表面の安
定性が不十分であり、補足的保護処理によってもこの安
定性は十分保証されない。
Finally, the stability of the surface with respect to mechanical, climatic and thermal influences is insufficient, and even supplementary protective treatments do not sufficiently ensure this stability.

さらに、摩擦、損傷抵抗性を改善し、プラスチック支持
体への散乱被膜の付着性を改善するため、ニトロセルロ
ースラッカーと事前にシラン類で処理し疎水化した後、
該ラッカーに微細分布させ湿落下させた高分散珪酸とか
ら成る拡散被膜をプラスチック支持板に設ける方法が知
られていろ(東独経済特許第112006号)。
Furthermore, in order to improve the abrasion and damage resistance and to improve the adhesion of the scattering coating to the plastic support, the nitrocellulose lacquer has been previously treated with silanes to make it hydrophobic.
It is known to provide a plastic support plate with a diffusion coating consisting of highly dispersed silicic acid finely distributed in the lacquer and wet-dropped (East German Economic Patent No. 112,006).

しかしながらこの方法でも透過率が、半値角15°以上
の場合極端に低下する点に欠点がある。
However, this method also has a drawback in that the transmittance is extremely reduced when the half-value angle is 15 degrees or more.

その他、15°以上の高半値角は何回も被覆を繰り返し
てのみ達成しうるのであり、技術的、時間的支出が増加
する。
Additionally, high half-value angles of 15° or more can only be achieved by repeated coatings, which increases the technical and time expenditure.

その他、この方法はプラスチック支持体に限られている
Additionally, this method is limited to plastic supports.

別の公知の技術的解決として、投影スクリーンは、例え
ば単斜珪酸マグネシウム、珪酸カルシウム、硫酸バリウ
ム、酸化亜鉛等の無機顔料が充填されたプラステック板
またはフイルムから成る(ドイツ特許公開明細書第22
01467号)。
In another known technical solution, the projection screen consists of a plastic plate or film filled with inorganic pigments, such as, for example, magnesium monoclinic silicate, calcium silicate, barium sulfate, zinc oxide, etc.
No. 01467).

しかしこの場合の不利として、透過率の高いことと分解
肯ヒコントラストおよび散乱能の不十分さ(半値角の小
ささ)とが結びついて、この種の散乱板は光学器械に用
いるのに適していない。
However, the disadvantage in this case is that the high transmittance combined with the insufficient resolution contrast and scattering power (small half-value angle) makes this type of scattering plate suitable for use in optical instruments. do not have.

最後に、重合体層と間挿したワックス成分または結晶重
合体成分と表面に刻印したレンズ構造とによって散乱効
果を惹き起こす投影スクリーンが知られている(ドイツ
特許公開明細書第 2614606号)。
Finally, projection screens are known (DE 26 14 606) in which a scattering effect is produced by means of a wax component or a crystalline polymer component interposed with a polymer layer and a lens structure engraved on the surface.

しかしこの場合にも分解能および透過率が不十分である
However, in this case too, the resolution and transmittance are insufficient.

以上をまとめるなら、分解能が高く、同時に半値角が大
きくて(高散乱能)、透過率が高く(像鮮明度)、また
機械的、熱的および気候の影響に対して補足的保護手段
を要せぜとも安定した透過光投影用散乱板の製造は先行
技術によるとこれまで不可能であった、と確認できる。
To summarize, high resolution, at the same time large half-power angle (high scattering power), high transmission (image sharpness), and additional protection measures against mechanical, thermal and climatic influences are required. It can be confirmed that it has been impossible to manufacture a stable scattering plate for transmitted light projection according to the prior art.

本発明の目的は、上記欠点ないし不利を回避しうる高分
解能散乱板の製造方法にある。
The object of the invention is a method for producing a high-resolution scattering plate, which avoids the above-mentioned disadvantages.

半値角を大きくしても(散乱能が高くても)同時に高分
解能と高透過率が保証されねばならない。
Even if the half-value angle is large (even if the scattering power is high), high resolution and high transmittance must be guaranteed at the same time.

本発明の課題は、散乱板の半値角が8°と30°との間
の範囲で選択的かつ目的通りに調整でき、1m71L当
たり22線対と15線対の間の分解能および最低50%
の透過率を保証する方法を提供することである。
The object of the invention is that the half-value angle of the scattering plate can be adjusted selectively and purposefully in the range between 8° and 30°, with a resolution between 22 and 15 line pairs per 1 m71 and a minimum of 50%
The object of the present invention is to provide a method for guaranteeing the transmittance.

その他、この散乱板は機械的、熱的および気候の影響に
対して安定し、散乱板の寸法は必要ならば1,,?1以
上でも可能でなげればならない。
In addition, this scattering plate is stable against mechanical, thermal and climatic influences, and the dimensions of the scattering plate are 1, ?, if necessary. It must be possible to get 1 or more.

この課題は、本発明により、自由落下するラッカー皮膜
を使ってガラス支持体またはプラスチック支持体に散乱
ラッカーを塗布して高分解能散乱板を製造する方法によ
って解決され、該方法は次のような特徴を有する。
This problem is solved according to the invention by a method for producing high-resolution scattering plates by applying a scattering lacquer to a glass or plastic support using a free-falling lacquer film, which method has the following characteristics: has.

すなわち、ポリメタクリル酸メチル・透明ラッカー10
〜20重量%に、シリコーン油0.01〜0.02重量
%と分散剤1〜1.5重量%とを同時に添加しつつ粒度
1〜10μmおよび/または10〜30μ汎の粉砕石英
を加え、次の工程において散乱ラッカーの粘度を20℃
の場合253cP〜133cPとし、出来上った散乱ラ
ッカーを流延装置において乾燥状態で測定して層厚80
〜250μ扉で支持体物質に塗布する。
That is, polymethyl methacrylate transparent lacquer 10
to ~20% by weight, adding crushed quartz with a particle size of 1 to 10 μm and/or 10 to 30 μm while simultaneously adding 0.01 to 0.02% by weight of silicone oil and 1 to 1.5% by weight of a dispersant, In the next step, the viscosity of the scattering lacquer is reduced to 20°C.
253 cP to 133 cP, and the resulting scattering lacquer was measured dry in a casting machine to give a layer thickness of 80 cP.
Apply to support material with ~250μ door.

本発明によって製造された散乱板は、半値角8°の場合
分解能が最低22線対/關、透過率が最低80%である
The scattering plate manufactured according to the present invention has a resolution of at least 22 line pairs/double and a transmittance of at least 80% when the half-value angle is 8°.

半値角300の場合分解能は最低15線対/關、透過率
は最低55%である。
For a half-power angle of 300, the resolution is at least 15 line pairs/square and the transmittance is at least 55%.

光学的パラメーターの均一性は面積177I″以上の場
合にも保証される。
Uniformity of the optical parameters is guaranteed even for areas greater than 177 I''.

この散乱板は、損傷および払拭抵抗性も有しており、6
0℃までの温度ではその光学的性質を損うことなく使用
しうる。
This scattering plate is also scratch and wipe resistant and has 6
It can be used at temperatures up to 0° C. without losing its optical properties.

実施例 本発明を以下の実施例に基づいて詳しく説明する。Example The present invention will be explained in detail based on the following examples.

実施例 1 粘度1〜10μmの粉砕石英12重量%を、シリコーン
油(例えばVERニュンヒリッッ化学工場のNMI−5
0)の1%キシレン溶液1.5重量%、および分散剤と
して珪酸ナトリウムアルミニウム分散体(例えばVER
フエールブリュツケ化学工場のミクロエキステンダーA
l 0 3 ) 1.5重量%とともに、25重量%の
ニトロ稀釈液中で均等に混合し、この混合物を60重量
%のポリメタクリル酸メチル・ラッカー(例えばVER
ピースタリツツ窒素工場のLT30)に混入攪拌する。
Example 1 12% by weight of crushed quartz with a viscosity of 1-10 μm was mixed with silicone oil (e.g.
1.5% by weight of a 1% xylene solution of 0) and a sodium aluminum silicate dispersion (e.g. VER
Micro Extender A from Fehrbrützke Chemical Factory
l 0 3 ) with 1.5% by weight in a 25% by weight nitro diluent and this mixture is mixed with a 60% by weight polymethyl methacrylate lacquer (e.g. VER
Mix in LT30) manufactured by Peastarits Nitrogen Factory and stir.

さらにニトロ稀釈液を加えて散乱ラッカーを20℃にお
いて253cPと1 3 3 cPとの間の粘性に調整
する。
Further nitro dilution is added to adjust the scattering lacquer to a viscosity of between 253 cP and 1 33 cP at 20°C.

この調整済み散乱ラッカーは流延装置において自由落下
するラッカー皮膜としてガラスまたはプラステックから
成る支持体に塗布され、乾燥した散乱フイルムは厚さが
80と100μ扉の間にある。
This prepared scattering lacquer is applied as a free-falling lacquer film to a support made of glass or plastic in a casting apparatus, the dry scattering film having a thickness between 80 and 100 μm.

こうして得られた散乱板は分解能22線対/mrttの
場合半値角が8°〜100である。
The scattering plate thus obtained has a half-value angle of 8° to 100° when the resolution is 22 line pairs/mrtt.

望ましくは、乾燥した散乱板は80℃で2〜5時間再硬
化される。
Desirably, the dried scattering plate is recured at 80° C. for 2 to 5 hours.

コントラスト改善のため、または応用生埋学上の理由か
ら、散乱板は着色されてもよい。
For contrast improvement or for biomedical reasons, the scattering plate may be colored.

これには、有機溶剤に溶解したウオファノール系または
ネオザボン系の顔料が適している。
Wophanol or neozabon pigments dissolved in organic solvents are suitable for this purpose.

顔料は、それぞれ、50%まで二トロ稀釈液に代って散
乱ラッカーに添加される1%溶液として使用される。
The pigments are each used as a 1% solution which is added to the scattering lacquer instead of a nitro dilution up to 50%.

耐温度性および耐気候性は、散乱ラッカーで被覆する前
に支持板表面を層厚25〜50μ瓶の市販のマットラッ
カーまたはポリ酢酸ビニール・透明ラッカーで下塗りす
ることによって、用途に応じて高めることができ、これ
によって散乱板は高温多湿の変動天候で最低6日の天候
安定性と+55゜C〜−40℃の耐温度性を獲得する。
Temperature and climate resistance can be increased, depending on the application, by priming the support plate surface with a commercially available matt lacquer or polyvinyl acetate clear lacquer in a layer thickness of 25 to 50 μm before coating with the scattering lacquer. As a result, the scattering plate achieves weather stability of at least 6 days in hot and humid fluctuating weather and temperature resistance of +55°C to -40°C.

この散乱被膜は、損傷抵抗性を有しており、特別に保護
する必要がない。
This scattering coating is damage resistant and does not require special protection.

実施例 2 実施例1と同様の方法により、散乱ラッカーを粒度1〜
10μ扉の粉砕石英15重量%を用いて製造し、使用し
た。
Example 2 Using a method similar to Example 1, a scattering lacquer with a particle size of 1 to
It was manufactured and used using 15% by weight of crushed quartz with a 10μ door.

こうして乾燥状態における散乱被膜の層厚120〜15
0μ扉の場合20°〜25°の半値角の散乱板が得られ
た。
Thus, the layer thickness of the scattering coating in the dry state is 120 to 15
In the case of a 0μ door, a scattering plate with a half-value angle of 20° to 25° was obtained.

分解能は20と22線対/mmの間である。The resolution is between 20 and 22 line pairs/mm.

粒子の大きさ10と30μmとの間の粉砕石英を等量用
いると、半値角がそのままで分解能20線対/關が得ら
れる。
If an equal amount of crushed quartz with particle size between 10 and 30 μm is used, a resolution of 20 line pairs/field can be obtained with the same half-value angle.

実施例 3 実施例1と同様の方法により、散乱ラッカーを用いて散
乱板を製造した。
Example 3 A scattering plate was manufactured using a scattering lacquer in the same manner as in Example 1.

この際、粘度1〜10μmの粉砕石英の量は18重量%
で、乾燥散乱被膜の層厚は200〜250μ扉に高めら
れた。
At this time, the amount of crushed quartz with a viscosity of 1 to 10 μm was 18% by weight.
Then, the layer thickness of the dry scattering coating was increased to 200-250μ.

分解能が15線対/mm以上の場合300と35° と
の間の半値角を有する散乱板が得られた。
Scattering plates with half-value angles between 300 and 35° were obtained for resolutions of 15 line pairs/mm or more.

Claims (1)

【特許請求の範囲】[Claims] 1 自由落下するラッカー皮膜を使ってガラスまたはプ
ラステック支持体に散乱ラッカーを塗布する高分解能散
乱板の製造方法において、ポリメタクリル酸メチル・透
明ラッカー10〜20重量%に、シリコーン油0.01
〜0.02重量%と分散剤1〜1.5重量%とを同時に
添加しつつ粒度1〜10μ胤および/または10〜30
μmの粉砕石英を加え、次の工程において散乱ラッカー
の粘度を20℃の場合253cP〜133cPとし、出
来上がった散乱ラッカーを流延装置において乾燥状態で
測定して層厚80〜250μ瓶で支持体物質に塗布する
ことを特徴とする方法。
1. A method for producing a high-resolution scattering plate in which a scattering lacquer is applied to a glass or plastic support using a free-falling lacquer film, in which 10 to 20% by weight of polymethyl methacrylate clear lacquer is mixed with 0.01% silicone oil.
Particle size 1-10μ and/or 10-30μ with simultaneous addition of ~0.02% by weight and 1-1.5% by weight of dispersant
μm of crushed quartz is added, and in the next step the viscosity of the scattering lacquer is adjusted to 253 cP to 133 cP at 20°C, the finished scattering lacquer is measured dry in a casting device and the layer thickness is 80 to 250 μm. A method characterized by applying it to
JP55072838A 1979-06-01 1980-06-02 Manufacturing method of high-resolution scattering plate Expired JPS5849842B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DD02B/21333 1979-06-01
DD79213338A DD143182A1 (en) 1979-06-01 1979-06-01 METHOD FOR THE PRODUCTION OF SCISSORS WITH HIGH RESOLUTION MIXTURES

Publications (2)

Publication Number Publication Date
JPS5622401A JPS5622401A (en) 1981-03-03
JPS5849842B2 true JPS5849842B2 (en) 1983-11-07

Family

ID=5518490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55072838A Expired JPS5849842B2 (en) 1979-06-01 1980-06-02 Manufacturing method of high-resolution scattering plate

Country Status (5)

Country Link
JP (1) JPS5849842B2 (en)
BG (1) BG36315A1 (en)
DD (1) DD143182A1 (en)
DE (1) DE3019100A1 (en)
SU (1) SU1125066A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0342586Y2 (en) * 1985-07-19 1991-09-06

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE8902851U1 (en) * 1989-03-08 1989-06-29 Kempf, Georg-Ulrich, 2057 Wentorf Device for image processing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0342586Y2 (en) * 1985-07-19 1991-09-06

Also Published As

Publication number Publication date
SU1125066A1 (en) 1984-11-23
DD143182A1 (en) 1980-08-06
DE3019100A1 (en) 1980-12-11
BG36315A1 (en) 1984-10-15
JPS5622401A (en) 1981-03-03

Similar Documents

Publication Publication Date Title
JP4937827B2 (en) Method for producing coloring structure
JP2005530891A (en) Color composition
CN111748270B (en) Coating for projection screen and preparation method thereof
US3598640A (en) Rear projection screen,screen coating and method
KR101123151B1 (en) Thermo shield paint composition
JPS61155474A (en) Aqueous coating composition
JP5026855B2 (en) Method for producing coloring structure
JPS5849842B2 (en) Manufacturing method of high-resolution scattering plate
JP2018203908A (en) Aqueous multicolor pattern coating composition and multicolor pattern coated film
JPH0212756B2 (en)
TW200413488A (en) Multicolor coating compositions and method of forming patterned surface
JPH06116512A (en) Production of low-temperature curable inorganic coating agent and method for forming low-temperature curable inorganic coating layer
CN115505327B (en) Anti-dazzle coating, anti-dazzle film and preparation method
TW201609990A (en) A red coloring agent composition for a color filter
JP4751221B2 (en) Method for producing coloring structure
US2368161A (en) Composition and method for marking base materials
JP2021130764A (en) Aqueous multicolor coating composition and multicolor coated film
DE3503957C1 (en) Coating agent for anti-reflective coatings and process for its production
JP3346505B2 (en) Manufacturing method of mirror surface
CN109535355B (en) Preparation method of copolymer coated particle and copolymer coated particle
JPS59193949A (en) Light-diffusing acrylic resin composition
JPH10316904A (en) Composition for forming black matrix and colored liquid crystal display with black matrix prepared therefrom
JPS59117562A (en) Metal product scall preventing and marking composition, manufacture and method of making readable marking on metal product surface
US20140161989A1 (en) Anti-Glare Using a Two-Step Texturing Process
JPH0665531A (en) Method of coating with stone-like coloring and finishing