JPS584738A - Preparation of 2-halogenated vinylcyclohexanol - Google Patents

Preparation of 2-halogenated vinylcyclohexanol

Info

Publication number
JPS584738A
JPS584738A JP10237581A JP10237581A JPS584738A JP S584738 A JPS584738 A JP S584738A JP 10237581 A JP10237581 A JP 10237581A JP 10237581 A JP10237581 A JP 10237581A JP S584738 A JPS584738 A JP S584738A
Authority
JP
Japan
Prior art keywords
halogenated
cyclohexanol
halogenated ethylene
formula
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10237581A
Other languages
Japanese (ja)
Other versions
JPS5936967B2 (en
Inventor
Takaari Yumoto
湯本 高在
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP10237581A priority Critical patent/JPS5936967B2/en
Publication of JPS584738A publication Critical patent/JPS584738A/en
Publication of JPS5936967B2 publication Critical patent/JPS5936967B2/en
Expired legal-status Critical Current

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  • Physical Or Chemical Processes And Apparatus (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

PURPOSE:To obtain the titled substance useful for synthesizing a raw material for a flame retardant of nylon, etc. easily, by irradiating a mixture of cyclohexanol with a halogenated ethylene with a high energy radiation, and introducing a halogenated vinyl group directly into the 2-position of the cyclohexanol. CONSTITUTION:A mixture containing cyclohexanol with a halogenated ethylene of formulaI(X1, X2, X3 and X4 are halogen atoms), preferably at a molar ratio between the cyclohexanol and the halogenated ethylene of 1:(0.01-100), is irradiated with a high energy radiation and reacted to give a compound of formula III having a halogenated vinyl group of formula II at the 2-position. Tetrachloroethylene, etc. may be cited as the halogenated ethylene. Gamma rays using cobalt 60 or cesium 137 as the radiation source is used, and the exposed dose thereof is selected in the range of 0.1-10<3>MR.

Description

【発明の詳細な説明】 本発明は、2−の位置にハロゲン化ビニル基を有−J−
,6シクロヘギ4JノールのiJΦθぐに係り、その特
徴とするところは、ンクl−J /\キーリ゛ノールと
一般式X+  C=、−CX4 (式中x1、×2、X
、オ、1: ヒX4はハロゲン原子を示す)のハロゲン
化エチレンの混合物に高エネルギー放q、を線を照躬し
て反応させる2X3 1 ことにより、3−の位置に一般式X、 −C=−C−(
X、+ 、 X2およびχ(は前記と同じ意味を持つ)
のハロゲン化ビニルl:’: t 有するシクロヘギザ
ノールを収率よく製造することである。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides -J-
, 6 cyclohegi 4J nor's iJΦθ, and its characteristics are the link l-J /\ key linol and the general formula
, E, 1: By reacting a mixture of halogenated ethylenes (X4 represents a halogen atom) with high-energy radiation q by observing the line 2X3 1, the general formula X, -C is added to the 3- position. =-C-(
X, +, X2 and χ (have the same meaning as above)
An object of the present invention is to produce cyclohegizanol having a vinyl halide l:': t in a good yield.

Ω−ハロゲン化ビニルシクロヘギザノール類は、脱水し
て4’rl 当する3−ハ1」ゲン化ビニルシクロヘギ
センとなしたのち、さらに酸化を行えば、2−ハロゲン
化ビニルアジピン酸が得られる。、2−ハロゲン化ビニ
ルアジピノ酸は、これを原料として製造されるリーイロ
ン、ボリエヌテル、合成ゴムおよびアルキッド樹脂など
に難燃性を付与するととができる重要な原料である。
Ω-Vinyl halide cyclohegizanol is dehydrated to form 4'rl or 3-ha1' vinylcyclohegicene, and then further oxidized to form 2-halogenated vinyl adipic acid. can get. , 2-halogenated vinyladipinoic acid is an important raw material that can impart flame retardancy to liiron, borie ether, synthetic rubber, alkyd resin, etc. produced using it as a raw material.

シクロヘキサノールから2−ハロゲン化ビニルシクロヘ
ギザノー)Vk合成する本方法は、シクロヘキサノール
のヒト゛ロキシル基を保護するためアセチル化物などの
誘導体となす必要がなく、直接シクロヘキサノールの2
−の位置にハロゲン化ビニル基を導入することができる
。なお、この際に/−の位置にハロゲン化ビニル基の入
った化合物(式中x1、X2、X3およびx4は前記と
同じ意味を持つ) 両者の化合物の割合は、高エネルギー放射線の種類およ
び反応条件によって異なる。
This method of synthesizing 2-vinyl halide cyclohegizanol (Vk) from cyclohexanol does not require derivatization such as an acetylated product to protect the human hydroxyl group of cyclohexanol, and directly converts cyclohexanol into
A halogenated vinyl group can be introduced at the - position. In addition, in this case, a compound containing a vinyl halide group at the /- position (in the formula, x1, X2, X3 and x4 have the same meanings as above). Depends on conditions.

このように本反応は一工程で目的の2−の位置にハロゲ
ン化ビニ)V基を有するシクロヘキザノー/Vを製造す
ることができる。
In this way, this reaction can produce the desired cyclohexano/V having a halogenated vinyl)V group at the 2-position in one step.

本発明の特徴は、シクロヘキサノールに対してハロゲン
化エチレンk 面光モル比(シクロヘキサノール1モル
に対して0.0 /〜100モル)混合したのち減圧下
にアンプル中に封じ、高エネルギー放射線を所定の反応
温度(0〜、200°C)および照射時間(70〜70
3時間)照射することによって、目的の化合物が容易に
得られることである。
The feature of the present invention is that after mixing cyclohexanol with halogenated ethylene k at a surface light molar ratio (0.0/~100 mol per 1 mol of cyclohexanol), the mixture is sealed in an ampoule under reduced pressure, and high-energy radiation is emitted. Predetermined reaction temperature (0 to 200 °C) and irradiation time (70 to 70 °C)
The target compound can be easily obtained by irradiation (for 3 hours).

ハロゲン化エチレンとしては、テトラクロロエチレン、
テトラクロロエチレンおよびテトラブロムエチレンなど
が用いられる。高エネルギー放射線としては、コバルト
乙0、セシウム/37を線源とするγ線が用いられ、そ
の照射線量は07〜103MHの範囲内で選ばれる。照
射線量率が低ければ照射時間は長く、その逆であれば短
くてすむ。
Examples of halogenated ethylene include tetrachlorethylene,
Tetrachlorethylene, tetrabromoethylene, etc. are used. As the high-energy radiation, gamma rays using cobalt Otsu0 and cesium/37 as a radiation source are used, and the irradiation dose is selected within the range of 07 to 103 MH. If the irradiation dose rate is low, the irradiation time will be long, and vice versa, the irradiation time will be short.

次に実施例により本発明をさらに詳細に説明する。Next, the present invention will be explained in more detail with reference to Examples.

実施例/ シクロヘキサノール200f! (,2O−E=ル)と
テトラクロロエチレンg23 P (03;モ)v )
の混合物全減圧下にアンプル中に飼じ、60C○よりの
γ線f23′C,線量率0337 X / 05R/h
rで、;1gMR照射した。照射後未反応の原料を回収
しタノちbp//S〜/乙5 ’C/グ*mHgの範囲
の留分2り!;7を得た。これをさらに分留しbp/3
グS°C/り朋Hgの留分風2g9を得た(収率5.5
%、d’: /3q/s、n、  /533r>。コノ
モノノC1−分析(i[はグ乙/3%で2−トリクロロ
ビニルシクロヘキサノールの計算値グ乙33と一致した
Example/ Cyclohexanol 200f! (,2O-E=L) and tetrachloroethylene g23P (03;Mo)v)
The mixture was kept in an ampoule under total vacuum, γ-ray f23'C from 60C○, dose rate 0337X / 05R/h
1g MR irradiation was performed at r. After irradiation, the unreacted raw materials are collected and the distillate in the range of bp//S~/Otsu5'C/g*mHg is extracted! ; got 7. This is further fractionated to bp/3
2g9 of a distillate of Hg S°C/Riho Hg was obtained (yield 5.5
%, d': /3q/s, n, /533r>. Cononomono C1-analysis (i[=g/3%) agreed with the calculated value of 2-trichlorovinylcyclohexanol (g/33).

またXBスペクトル Hg (7) /〜トリクロロビニルシクロヘキサノー
ル/乙.2oy<収率/グ/%)を副生物として得た。
Also, XB spectrum Hg (7) /~trichlorovinylcyclohexanol/Otsu. 2oy<yield/g/%) was obtained as a by-product.

実施例Ω シクロヘギサノー/I/;200IC20モル)とテト
ラクロロエチレンの混合物を減圧下にアンプル中に封じ
、6 0 C□よりのγ線を.2J−C、線量率0 /
33×/ O” R/hrで.2/MR照則した。照射
後未反応原料を回収したのちbp / / 3〜/乙S
’C /りπmI−’Jgの範囲の留分.2 3. 7
 Fを得た。留分全分留して、2−トリクロロビニルシ
クロヘキー’J−/−tv3299(収率グ乙%)およ
び副生物の/− l゛!l!lクロロビニルシクロヘキ
サノールフ220g10乙%)を得た。
Example Ω A mixture of cyclohegisanor/I/; 200IC (20 mol) and tetrachloroethylene was sealed in an ampoule under reduced pressure, and γ-rays from 60 C□ were emitted. 2J-C, dose rate 0/
33×/O” R/hr and .2/MR verification. After collecting unreacted raw material after irradiation, bp / / 3~/Otsu S
A fraction in the range 'C/πmI-'Jg. 2 3. 7
I got an F. All of the fractions were distilled to obtain 2-trichlorovinylcycloheki'J-/-tv3299 (yield: %) and by-products. l! 220 g of chlorovinyl cyclohexanol (10%) was obtained.

実施例3 シクロヘキサノール(20モル)とテトラクロロエチレ
ンg239(0.!;モル)の混合物を減圧下にアンプ
ル中に封じ、6°Coよりのγ線f:23″C、線量率
0 0g L7X / 05F/bγ°で27MR照射
した。未反応原料を回収したのちbp/./3〜/1.
3”C /り朋Hgの留分//3yを得た。留分を分留
してj− 1− !lクロロビニルシクロヘギサノール
2−2g9(収率2θ%)と副生の/−1−リクロ口ビ
ニルシクロヘギサノールl/!7に54(ltVMJグ
/%)を得た。
Example 3 A mixture of cyclohexanol (20 mol) and tetrachloroethylene g239 (0.!; mol) was sealed in an ampoule under reduced pressure, and γ-ray f from 6°Co: 23″C, dose rate 0 0g L7X/05F 27MR irradiation was carried out at /bγ°. After collecting unreacted raw materials, the temperature was bp/./3 to /1.
A fraction of 3"C/rihoHg//3y was obtained. The fraction was fractionally distilled to yield 2-2g9 of chlorovinylcyclohegisanol (yield 2θ%) and a by-product of /3y. 54 (ltVMJ g/%) was obtained for -1-licrovinylcyclohegisanol l/!7.

実施例ク シクロヘキサノール、2009 (,20モル)とテト
ラクロロエチレンg23?<03モル)の混合物を減圧
下にアンプル中に封じ、60COよりのr線を乙0°C
1線量率032乙x / 0” R/h工・で、23り
MR照年1した。未反応原料を回収したのち111p/
 / )〜/乙J ’C/り闘T−(gの留分ヂ07を
得た。留分を分留して2−トリクロロビニルシクロヘキ
サ/−)v27.5flc収率−21I%)と副生の/
−トリクロロビニルシクロヘギサノール37g9(収率
4t5%)を得た。
Example cyclohexanol, 2009 (,20 mol) and tetrachloroethylene g23? <03 mol) was sealed in an ampoule under reduced pressure, and the r-rays from 60CO were heated to 0°C.
At a dose rate of 032 x / 0'' R/h, 23 MR was set at 1. After collecting unreacted raw materials, 111 p/h was applied.
/)~/Otsu J'C/Rito T- (G of fraction も07 was obtained.The fraction was fractionated to obtain 2-trichlorovinylcyclohexa/-)v27.5flc yield-21I%) by-product/
-Trichlorovinylcyclohegisanol 37g9 (yield 4t5%) was obtained.

実施例j シクロヘキサノール/、!;Oy(/、3モ/I/)と
テトラクロロエチレンに、2.!;F!(03モル)の
混合物を実施例/と同様にアンプルに封じたのち、60
COよりのr線(z 、25 ’CX線量率0330×
70”R/hrで/S乙MR照則した。未反応原料を回
収したのち1)p / / 、!;〜/乙J’C/グ朋
Hgの留分/乙2りを得た。留分を分留して、2−トリ
クロロビニルシクロヘキサノール372IC14’f1
332%)ト副生の/−1・リクロロビニルシクロヘキ
サノー/vg乙/ P (ILV率75%)を得た。
Example j Cyclohexanol/,! ; Oy (/, 3 mo/I/) and tetrachlorethylene, 2. ! ;F! After sealing the mixture of (03 mol) in an ampoule in the same manner as in Example/,
r-rays from CO (z, 25'CX dose rate 0330×
70"R/hr was checked by /S MR. After recovering the unreacted raw materials, 1) p / / , ! ~ / Otsu J'C / Guho Hg fraction / Otsu 2 was obtained. The fraction was fractionated to give 2-trichlorovinylcyclohexanol 372IC14'f1
332%) /-1.lichlorovinylcyclohexanol/vg/P (ILV rate 75%) was obtained as a by-product.

特許出願人  工業波1111院長    石 坂 誠
 −指定代理人  工業技術院名古屋二[業技術試験所
長犬飼 鑑
Patent applicant: Makoto Ishizaka, director of Kogyo Wave 1111 - Designated agent: Akira Inukai, director of Institute of Industrial Science and Technology, Nagoya 2

Claims (1)

【特許請求の範囲】 シクロヘギザノールト一般式 (1 x、 −c = c −x4(式中X1、X2、X3オ
よびχ4はハロゲン原子である)で表わされるハロゲン
化エチレンとの混合物に高エネルギー放射線を照射して
反応させることを特徴とする3−の位置に一般χ2X。 1 式Xl−C= C−(χ1、χ2およびX3は前記と同
じ(式中X+ 、 X2オヨヒX3id 前記と同じ意味をもつ) で示されるシクtコヘギザノールの製法。
[Claims] Cyclohegizanolt is a mixture with halogenated ethylene represented by the general formula (1 x, -c = c -x4 (in the formula, X1, X2, X3 and χ4 are halogen atoms) General χ2X at the 3- position characterized by irradiation with high-energy radiation to cause a reaction.1 Formula Xl-C=C- (χ1, χ2 and X3 are the same as above (in the formula, ) has the same meaning).
JP10237581A 1981-07-01 1981-07-01 Method for producing 2-halogenated vinylcyclohexanol Expired JPS5936967B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10237581A JPS5936967B2 (en) 1981-07-01 1981-07-01 Method for producing 2-halogenated vinylcyclohexanol

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10237581A JPS5936967B2 (en) 1981-07-01 1981-07-01 Method for producing 2-halogenated vinylcyclohexanol

Publications (2)

Publication Number Publication Date
JPS584738A true JPS584738A (en) 1983-01-11
JPS5936967B2 JPS5936967B2 (en) 1984-09-06

Family

ID=14325707

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10237581A Expired JPS5936967B2 (en) 1981-07-01 1981-07-01 Method for producing 2-halogenated vinylcyclohexanol

Country Status (1)

Country Link
JP (1) JPS5936967B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01308454A (en) * 1988-06-06 1989-12-13 Tokai Rubber Ind Ltd Gas-impermeable resin composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01308454A (en) * 1988-06-06 1989-12-13 Tokai Rubber Ind Ltd Gas-impermeable resin composition

Also Published As

Publication number Publication date
JPS5936967B2 (en) 1984-09-06

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